公开(公告)号：JP2011040736A

公开(公告)日：2011-02-24

申请号：JP2010162398

申请日：2010-07-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOOLE ROELOF ,  WUISTER SANDER FREDERIK

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography apparatus that can suppress excessive use of gas. SOLUTION: The apparatus includes: an imprint template arrangement used for imprinting a pattern on a substrate 22 provided with a predetermined amount of imprintable medium 24; a substrate holder 20 configured to hold the substrate 22; and a chamber 40 having an inlet 42 to allow gas to flow into the chamber 40 and an outlet 44 to allow gas to flow out of the chamber 40, wherein the chamber 40 in use contains a gaseous atmosphere. The inlet 42 and the outlet 44 of the chamber 40 are connected to other constituent elements of a gas circulation system. The constituent elements include a gas circulation driver 48 configured to circulate gas in the gas circulation system and/or a gas purification unit 50 configured to purify the gas as it circulates in the gas circulation system. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供可以抑制气体的过度使用的压印光刻设备。 该装置包括：用于在设置有预定量的可压印介质24的基板22上压印图案的印模模板布置; 构造成保持基板22的基板保持件20; 以及具有入口42的腔室40，以允许气体流入腔室40和出口44，以允许气体流出腔室40，其中使用中的腔室40含有气体气氛。 室40的入口42和出口44连接到气体循环系统的其它构成元件。 构成要素包括：气体循环驱动器48，被配置为在气体循环系统中循环气体;和/或气体净化单元50，被配置为在气体循环系统中循环时净化气体。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2012033929A

公开(公告)日：2012-02-16

申请号：JP2011163028

申请日：2011-07-26

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOOLE ROELOF ,  BANINE VADIM YEVGENYEVICH ,  SCACALOSSI LOELOF ,  OKTAY YILDIRIM

IPC: H01L21/027 ,  G01N21/64 ,  G03F1/84

CPC classification number: G01N21/6428 ,  G01N21/94 ,  G01N21/956 ,  G03F1/84

Abstract: PROBLEM TO BE SOLVED: To provide an inspection method for detecting a contaminant particle in an item such as an EUV lithography reticle.SOLUTION: An inspection method comprises: coating fluorescent dye material on an item; illuminating the item by using radiation in the wavelength suitable for exciting the fluorescent dye material; monitoring the item about the second radiation emission by the fluorescent dye in the wavelength different from the first radiation; generating a signal to show contamination when the second radiation is detected. In one example, such a means as low affinity coating is coated on a reticle to reduce affinity to the dye molecule while the dye molecule is coupled to a contaminant particle by physical or chemical absorption. The dye can be selected to have fluorescent behavior which can be improved by hydrophobicity and hydrophilicity, and the contaminant surface is processed accordingly by a buffer coating.

Abstract translation: 要解决的问题：提供一种检测EUV光刻掩模版等物品中的污染物粒子的检查方法。 检测方法包括：在物品上涂布荧光染料; 通过使用适合于激发荧光染料的波长的辐射来照亮物品; 通过荧光染料监测与第一辐射不同的波长的关于第二辐射发射的项目; 当检测到第二辐射时产生显示污染的信号。 在一个实例中，将低亲和性涂层的这种方法涂覆在掩模版上以降低对染料分子的亲和力，同时染料分子通过物理或化学吸收与污染物颗粒偶联。 可以选择染料具有可以通过疏水性和亲水性改善的荧光行为，并且通过缓冲涂层相应地处理污染物表面。 版权所有（C）2012，JPO＆INPIT

公开(公告)号：JP2011082514A

公开(公告)日：2011-04-21

申请号：JP2010220095

申请日：2010-09-30

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： LAMMERS JEROEN HERMAN ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  KOOLE ROELOF

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To provide imprint lithography for achieving lower levels of the defects caused by a void. SOLUTION: The imprint lithography method includes a step of bringing a patterned surface into contact with an imprintable liquid medium for a filling period. Light, such as scattered or reflected, emitted from an interface between the medium and the patterned surface is collected and measured during the filling period to obtain data concerning one or more voids at the interface, and an end time for the filling period is derived from a relationship between the data and time. The method may allow subsequent process steps to be performed further rapidly to reduce risk of defects arising from remnants of unfilled voids. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供压印光刻以实现由空隙引起的较低水平的缺陷。 压印光刻方法包括使图案化表面与可压印液体介质接触以进行填充时间的步骤。 在填充期间收集和测量从介质和图案化表面之间的界面发射的诸如散射或反射的光，以获得关于界面处的一个或多个空隙的数据，并且填充周期的结束时间从 数据和时间之间的关系。 该方法可以允许进一步快速进行随后的工艺步骤，以减少由未填充空隙的残余物引起的缺陷的风险。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011061195A

公开(公告)日：2011-03-24

申请号：JP2010184511

申请日：2010-08-20

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WUISTER SANDER FREDERIK ,  BANINE VADIM YEVGENYEVICH ,  DIJKSMAN JOHAN FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  LAMMERS JEROEN HERMAN ,  KOOLE ROELOF

IPC: H01L21/027 ,  B29C59/02 ,  B81C99/00

CPC classification number: B29C43/34 ,  B29C43/021 ,  B29C43/58 ,  B29C2043/025 ,  B29K2101/12 ,  B44C1/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography method and an apparatus capable of eliminating or relaxing the problem of unevenness in an imprint template. SOLUTION: The imprint lithography method includes a step of providing a first amount 60 of an imprintable medium having a first etching rate when solidified on a first area of a substrate and a step of providing a second amount 62 of an imprintable medium having a second etching rate different from the first etching rate when solidified on a second area different from the first area on the substrate. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供压印光刻方法和能够消除或放松压印模板不均匀问题的装置。 压印光刻方法包括在基板的第一区域上固化时提供具有第一蚀刻速率的可压印介质的第一量60的步骤，以及提供可压印介质的第二量62的步骤， 在与基板上的第一区域不同的第二区域上固化时，与第一蚀刻速率不同的第二蚀刻速率。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2011049554A

公开(公告)日：2011-03-10

申请号：JP2010176894

申请日：2010-08-06

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KOOLE ROELOF ,  WUISTER SANDER FREDERIK

IPC: H01L21/027 ,  B29C59/02

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

Abstract: PROBLEM TO BE SOLVED: To rapidly separate a surface of an imprint template from a patterned layer on a substrate formed by imprint lithography. SOLUTION: This imprint lithography method for forming a patterned layer from a UV-curable liquid medium on a substrate includes steps of: sticking together a patterned surface and the UV-curable medium for a filling period A; illuminating the UV-curable medium with UV-radiation for an illumination period B; holding the patterned surface and the UV-curable liquid medium together for a holding period C such that the UV-curable medium forms a self-supporting layer; and separating the patterned surface from the patterned layer at the end 24 of the holding period. The start time 22 of the illumination period is earlier than the end time 21 of the filling period by a pre-cure period E. Also, a method is disclosed where the end time 23 of the illumination period is earlier than the end time 24 of the holding period. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：将压印模板的表面从通过压印光刻形成的基板上的图案化层快速分离。 解决方案：用于从基板上的可UV固化的液体介质形成图案层的压印光刻方法包括以下步骤：将图案化表面和可UV固化的介质粘合在一个填充周期A上; 用UV辐射照射紫外线固化介质照射周期B; 将图案化表面和UV可固化液体介质一起保持保持期间C，使得UV可固化介质形成自支撑层; 并且在保持期的端部24处将图案化表面与图案化层分离。 照明期间的开始时间22比预固化期间E早于填充期间的结束时间21.此外，公开了一种方法，其中照明期间的结束时间23早于 持有期间。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：WO2012031818A2

公开(公告)日：2012-03-15

申请号：PCT/EP2011062554

申请日：2011-07-21

Applicant: ASML NETHERLANDS BV ,  KOOLE ROELOF ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  PEETERS EMIEL

Inventor： KOOLE ROELOF ,  DIJKSMAN JOHAN ,  WUISTER SANDER ,  PEETERS EMIEL

IPC: B81C1/00

CPC classification number: B44C1/227 ,  B81C1/00031 ,  B81C2201/0149 ,  B81C2201/0198 ,  G03F7/0002 ,  H01L21/0337

Abstract: A method of lithography on a substrate uses a self-assembled polymer (SAP) layer deposited on the substrate, with first and second domains arranged in a pattern across the layer. A planarization layer is formed over the SAP and a development etch applied to substantially remove a portion of the planarization layer over the second domain leaving a cap of the planarization layer substantially covering the first domain. The uncapped second domain is then removed from the surface by a breakthrough etch leaving the capped first domain as a pattern feature on the surface. A transfer etch may then be used to transfer the pattern feature to the substrate using the capped first domain. The capping allows the second domain to be removed, e.g., without excessive loss of lateral feature width for the remaining first domain, even when the difference in etch resistance between the first and second domains is small.

Abstract translation: 衬底上的光刻方法使用沉积在衬底上的自组装聚合物（SAP）层，其中第一和第二畴以整个层的图案排列。 平坦化层形成在SAP之上，并且显影蚀刻被施加以在第二域上基本上去除平坦化层的一部分，留下平坦化层的盖基本覆盖第一域。 然后通过穿透蚀刻从表面除去未封端的第二结构域，留下封盖的第一结构域作为表面上的图案特征。 然后可以使用转移蚀刻来使用封盖的第一结构域将图案特征转移到衬底。 封盖允许除去第二区域，例如，即使当第一和第二区域之间的耐蚀刻性差异小时，也不会对剩余的第一区域造成横向特征宽度的过度损失。

公开(公告)号：WO2013127608A3

公开(公告)日：2013-10-24

申请号：PCT/EP2013052306

申请日：2013-02-06

Applicant: ASML NETHERLANDS BV

Inventor： PEETERS EMIEL ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  VAN HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  NGUYEN THANH ,  YILDIRIM OKTAY

IPC: G03F7/00

CPC classification number: G03F7/20 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/038 ,  G03F7/2002

Abstract: A method of forming a patterned chemical epitaxy template, for orientation of a self-assemblable block copolymer comprising first and second polymer blocks, on a surface of a substrate, the method including applying a primer layer of a primer composition to the surface, the primer composition comprising a first polymer moiety having a chemical affinity with the first polymer blocks and a second polymer moiety having a chemical affinity with the second polymer blocks, selectively exposing the surface, the primer layer and any overlying layer to actinic radiation to provide exposed and unexposed regions, to render labile the first polymer moiety in the exposed region, and removing the labile first polymer moiety from the exposed region to deplete the primer layer surface in the exposed region of first polymer moiety to form the patterned chemical epitaxy template.

Abstract translation: 一种形成图案化的化学外延模板的方法，用于在基材的表面上包含第一和第二聚合物嵌段的自组装嵌段共聚物的取向，该方法包括将底漆组合物的底漆层施加到表面，引物 组合物，其包含与第一聚合物嵌段具有化学亲合力的第一聚合物部分和与第二聚合物嵌段具有化学亲合力的第二聚合物部分，选择性地将表面，底漆层和任何上覆层暴露于光化辐射以提供曝光和未曝光 使得暴露区域中的第一聚合物部分不稳定，以及从暴露区域除去不稳定的第一聚合物部分，以消除第一聚合物部分的暴露区域中的底漆层表面，以形成图案化的化学外延模板。

公开(公告)号：WO2012175342A3

公开(公告)日：2013-02-28

申请号：PCT/EP2012060783

申请日：2012-06-07

Applicant: ASML NETHERLANDS BV ,  BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

Inventor： BRIZARD AURELIE ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  KOOLE ROELOF ,  PEETERS EMIEL ,  VAN HEESCH CHRIS ,  BOOTS HENRI ,  NGUYEN THANH

IPC: G03F7/00

CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  C08F299/02 ,  C08F299/04 ,  H01L51/0043

Abstract: A BCP having first block of first monomer and second block of second monomer, adapted to undergo a transition from disordered state to ordered state at a temperature less than T0D, further including a bridging moiety having a functional group to provide hydrogen bonding between bridging moieties of adjacent first and second BCP molecules when in the ordered state and at a temperature in excess of a glass transition temperature Tg for the BCP. Composition including BCP comprising first block of first monomer and second block of second monomer, and a crosslinking compound having first and second terminal groups joined by a central moiety and arranged to crosslink second blocks of adjacent first and second BCP molecules by providing non-covalent bonding between the terminal groups and a functional group of the second monomer of the second blocks when the BCP is in the ordered state.

Abstract translation: BCP具有第一单体的第一嵌段和第二单体的第二嵌段，适于在低于T0D的温度下经历从无序状态转化为有序状态，还包括具有官能团的桥连部分以在桥连部分之间提供氢键 相邻的第一和第二BCP分子处于有序状态并且在超过BCP的玻璃化转变温度Tg的温度下。 包含BCP的组合物包含第一单体的第一嵌段和第二单体的第二嵌段，以及具有通过中心部分连接的第一和第二端基的交联化合物，并且被布置成通过提供非共价键来交联相邻的第一和第二BCP分子的第二嵌段 当BCP处于有序状态时，端子组与第二块的第二单体的官能团之间。

公开(公告)号：NL2010004A

公开(公告)日：2013-07-16

申请号：NL2010004

申请日：2012-12-18

Applicant: ASML NETHERLANDS BV

Inventor： BRIZARD AURELIE ,  KOOLE ROELOF ,  PEETERS EMIEL

IPC: G03F7/20

Abstract: A method of forming a self-assembled block polymer layer, oriented to form an ordered array of alternating domains, is disclosed. The method involves providing a layer of the self-assemblable block copolymer on the substrate and depositing a first surfactant onto the external surface of the layer prior to inducing self-assembly of the layer to form the ordered array of domains. The first surfactant has a hydrophobic tail and a hydrophilic head group and acts to reduce the interfacial energy at the external surface of the block copolymer layer in order to promote formation of assembly of the block copolymer polymer into an ordered array having the alternating domains.

公开(公告)号：NL2009555A

公开(公告)日：2013-04-08

申请号：NL2009555

申请日：2012-10-02

Applicant: ASML NETHERLANDS BV

Inventor： NGUYEN THANH ,  FINDERS JOZEF ,  KETELAARS WILHELMUS ,  WUISTER SANDER ,  HEIJDEN EDDY ,  MEESSEN HIERONYMUS ,  KOOLE ROELOF ,  PEETERS EMIEL ,  HEESCH CHRIS ,  BRIZARD AURELIE ,  BOOTS HENRI ,  DRUZHININA TAMARA ,  RUITER JESSICA

IPC: G03F7/20