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    Imprint lithography apparatus
    22.
    发明专利
    Imprint lithography apparatus 审中-公开
    IMPRINT LITHOGRAPHY APPARATUS

    公开(公告)号：JP2010272860A

    公开(公告)日：2010-12-02

    申请号：JP2010109724

    申请日：2010-05-12

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DE SCHIFFART CATHARINUS ,  JEUNINK ANDRE BERNARDUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  JANSEN NORBERT ERWIN THERENZO

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: G03F7/0002 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00

    Abstract: PROBLEM TO BE SOLVED: To provide a novel or substitutional structure suitable for holding, moving or deforming an imprint template structure by being used in an imprint lithography apparatus. SOLUTION: A structure suitable for being used in an imprint lithography apparatus is disclosed. The structure includes: a support structure arranged to support an imprint template structure; a first actuator structured to apply force to the imprint template structure; and a second actuator mounted to the support structure, arranged to extend between the support structure and the imprint template structure in use, structured to apply force to the imprint template structure, and having a movement range larger than that of the first actuator. COPYRIGHT: (C)2011,JPO&INPIT

    Abstract translation: 要解决的问题：提供适用于通过在压印光刻设备中使用来保持，移动或变形压印模板结构的新颖或替代结构。 解决方案：公开了适用于压印光刻设备的结构。 该结构包括：支撑结构，其布置成支撑压印模板结构; 构造成对压印模板结构施加力的第一致动器; 以及安装到所述支撑结构的第二致动器，其布置成在使用中在所述支撑结构和所述压印模板结构之间延伸，被构造成向所述压印模板结构施加力并且具有大于所述第一致动器的移动范围的移动范围。 版权所有（C）2011，JPO＆INPIT

    Imprint lithography
    23.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2010114473A

    公开(公告)日：2010-05-20

    申请号：JP2010027357

    申请日：2010-02-10

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  ALEKSEY YURIEVICH KOLESNYCHENKO ,  VAN DER MAST KAREL DIEDERICK ,  SIMON KLAUS ,  KNAAPEN RAYMOND JACOBUS ,  KRASSIMIR TODOROV KRASTEV

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To solve a problem that since template holders occupy a significant amount of space in an imprint lithography apparatus, there is not sufficient space to provide an imprint template to imprint every imprint area at the same time. SOLUTION: The imprint lithography apparatus has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged to hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题为了解决由于模板保持器在压印光刻设备中占据大量空间的问题，没有足够的空间来提供压印模板以同时压印每个压印区域。 压印光刻设备具有第一阵列的模板保持器，第二阵列的模板保持器和布置成支撑待印刷的衬底的衬底台，其中模板保持器的第一阵列被布置成保持阵列 可用于将第一阵列图案印刷到基底上的印模模板，并且第二阵列的模板支架布置成保持可用于将第二阵列阵列印刷到基底上的压印模板阵列， 由第二阵列压印的图案散布在由第一阵列印刷的图案之间。 版权所有（C）2010，JPO＆INPIT

    Imprint lithography
    24.
    发明专利
    Imprint lithography 审中-公开
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2010067969A

    公开(公告)日：2010-03-25

    申请号：JP2009204211

    申请日：2009-09-04

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： DEN BOEF ARIE JEFFREY ,  JEUNINK ANDRE BERNARDUS ,  VERMEULEN JOHANNES PETRUS MARTINUS ,  SMITS PASCAL ANTONIUS ,  WUISTER SANDER FREDERIK ,  KRUIJT-STEGEMAN YVONNE WENDELA ,  DE SCHIFFART CATHARINUS

    IPC: H01L21/027

    CPC classification number: G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/7049

    Abstract: PROBLEM TO BE SOLVED: To describe a method for determining the position of a substrate relative to an imprint template. SOLUTION: The imprint template has at least three gratings, the substrate has at least three gratings, positioned such that each imprint template grating forms a composite grating with an associated substrate grating with each imprint template grating, and at least three imprint template gratings and the associated substrate gratings have offsets relative to one another. The method includes steps of detecting an intensity of radiation which is reflected by the three composite gratings; and using the detected intensity to determine a displacement of the substrate or imprint template from a position. COPYRIGHT: (C)2010,JPO&INPIT

    Abstract translation: 要解决的问题：描述用于确定衬底相对于压印模板的位置的方法。 解决方案：压印模板具有至少三个光栅，衬底具有至少三个光栅，定位成使得每个压印模板光栅形成具有每个压印模板光栅的相关衬底光栅的复合光栅，以及至少三个压印模板 光栅和相关的衬底光栅相对于彼此具有偏移。 该方法包括检测由三个复合光栅反射的辐射强度的步骤; 并且使用检测到的强度来确定基板或压印模板从位置的位移。 版权所有（C）2010，JPO＆INPIT

    Imprint lithography
    25.
    发明专利
    Imprint lithography 有权
    IMPRINT LITHOGRAPHY

    公开(公告)号：JP2007227890A

    公开(公告)日：2007-09-06

    申请号：JP2006344038

    申请日：2006-12-21

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  ALEKSEY YURIEVICH KOLESNYCHENK ,  VAN DER MAST KAREL DIEDERICK ,  SIMON KLAUS ,  KNAAPEN RAYMOND JACOBUS ,  KRASSIMIR TODOROV KRASTEV

    IPC: H01L21/027 ,  B29C59/02

    CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

    Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography device which solves the problem of the shortage of the space for forming imprint templates when imprinting each imprint area at the same time, since a template holder occupies space significantly.
    SOLUTION: The imprint lithography device comprises a first array of template holders, a second array of template holders, and a substrate table arranged for supporting a substrate to be imprinted. The first array of template holders is arranged for holding an array of imprint templates that can be used for imprinting a first array of patterns onto the substrate. The second array of template holders is arranged for holding an array of imprint templates that can be used for imprinting a second array of patterns onto the substrate. The patterns imprinted by the second array are interspersed between the patterns imprinted by the first array.
    COPYRIGHT: (C)2007,JPO&INPIT

    Abstract translation: 要解决的问题：为了提供一种压印光刻装置，其解决了当同时印刷每个压印区域时形成压印模板的空间不足的问题，因为模板保持器显着占据空间。 压印光刻设备包括模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的衬底的衬底台。 第一阵列的模板保持器布置成保持可用于将第一阵列图案压印到基板上的压印模板阵列。 第二阵列的模板支架布置成保持可用于将第二阵列阵列压印到基板上的压印模板阵列。 由第二阵列印制的图案散布在由第一阵列印刷的图案之间。 版权所有（C）2007，JPO＆INPIT

    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS
    26.
    发明申请
    METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS 审中-公开
    通过嵌段共聚物自组装提供基板上的刻蚀特征的方法

    公开(公告)号：WO2015180966A3

    公开(公告)日：2016-01-28

    申请号：PCT/EP2015060620

    申请日：2015-05-13

    Applicant: ASML NETHERLANDS BV

    Inventor： WUISTER SANDER FREDERIK ,  JEUNINK ANDRE BERNARDUS ,  PEETERS EMIEL

    IPC: G03F7/00

    CPC classification number: H01L21/76816 ,  B81C1/00031 ,  B81C1/00396 ,  B81C2201/0149 ,  C09K13/00 ,  C30B1/04 ,  C30B29/58 ,  G03F7/0002 ,  G03F7/0041 ,  G03F7/2004 ,  G03F7/3021 ,  G03F7/70375 ,  H01L21/0271 ,  H01L21/3083 ,  H01L21/76829

    Abstract: A method of forming at least one lithography feature, the method comprising: providing at least one lithography recess on a substrate, the or each lithography recess comprising side-walls and a base, with the side-walls having a width therebetween; providing a self-assemblable block copolymer having first and second blocks in the or each lithography recess; causing the self-assemblable block copolymer to self-assemble into an ordered layer within the or each lithography recess, the ordered layer comprising at least a first domain of first blocks and a second domain of second blocks; causing the self-assemblable block copolymer to cross-link in a directional manner; and selectively removing the first domain to form lithography features comprised of the second domain within the or each lithography recess.

    Abstract translation: 一种形成至少一个光刻特征的方法，所述方法包括：在基底上提供至少一个光刻凹槽，所述或每个光刻凹槽包括侧壁和底座，其中所述侧壁之间具有宽度; 提供在所述或每个光刻凹槽中具有第一和第二块的自组装嵌段共聚物; 使得所述可自组装嵌段共聚物自组装成所述或每个光刻凹槽内的有序层，所述有序层包含至少第一区域的第一区域和第二区域的第二区域; 导致自组装嵌段共聚物以定向方式交联; 并且选择性地移除第一区域以形成由该光刻凹槽或每个光刻凹槽内的第二区域组成的光刻特征。

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