21.
    发明专利
    未知

    公开(公告)号:DE3769422D1

    公开(公告)日:1991-05-23

    申请号:DE3769422

    申请日:1987-09-26

    Applicant: BASF AG

    Abstract: Novel photopolymerizable recording materials, in particular for the production of printing plates and relief plates, can be developed with water or an aqueous alkaline solution and predominantly consist of a photoinitiator-containing mixture of (a) one or more low molecular weight compounds having one or more photopolymerizable olefinically unsaturated double bonds and (b) one or more organic polymeric binders and contain a bisacylphosphine oxide as the photoinitiator. These recording materials are useful for the production of printing plates and relief plates.

    Synthetic resins, useful esp. as contact adhesives - has alkyl (meth)acrylate, unsatd. aceto- or benzophenone deriv. unsatd.- acid etc., with min 1 per cent of acid gps. neutralised

    公开(公告)号:DE3917881A1

    公开(公告)日:1990-12-06

    申请号:DE3917881

    申请日:1989-06-01

    Applicant: BASF AG

    Abstract: The new synthetic resins (I) consist of (a) 30-99.85 wt.% (1-18C alkyl)-(meth)acrylate(s), (b) 0.05-8 wt.% mono-unsatd. acetophenone or benzophenone deriv(s). contg. no Ph gp. with a free OH gp. ortho to the CO gp., (c) 0.1-10 wt.% 3-12C mono-unsatd., mono- or di-basic acid(s) and/or anhydride(s), (d) 0-50 wt.% vinyl 2-18C aliphatic monocarboxylate(s) and (e) 0-20 wt.% other mono-unsatd. comonomer(s) in polymerised form; at least 1 mol % of the acid and/or anhydride gps. incorporated with (c) is neutralised. (I) are produced by radical polymerisation of the above comonomer mixt. in organic soln., followed by partial or complete neutralisation of the acid/anhydride gps. and sepn. of the solvent and any other volatile components; or monomer (c) is partly or fully neutralised before copolymerisation with the other comonomers. (I) pref. contain 40-90 wt.% monomer (a), 0.1-5 wt.% (b) and 0.5-4 wt.% (c); (b) has the formula Ph-CO-Phe-OCO-(CH2)4-OCOCR3 =CH2 (II), Cl-Phe-CO-Phe-OCO-(CH2)2-OCOCR3=CH2 and/or Ph-CO-Phe-OCOO-Phe-NH-COCR3=CH2 (with R3 = H or Me); amts. of (a)-(e) are such that a copolymer of (a), (c), (d) and (e) only has T9 -50 to 0 deg.C; 40-60 mol % of the acid/anhydride gps. introduced with (c) are neutralised; the fully acid form of (I) has K-value 10-60 in THF at 25 deg.C; alkali metal hydroxide is used for neutralisation. USE/ADVANTAGE - (I) are useful as the basis for contact adhesives (claimed); also claimed is a self-adhesive article comprising a substrate material and a contact adhesive based on (I), and a process for the prodn. of such articles by coating the subtrate with (I) from soln. or melt and then irradiating with UV. W.r.t. prior-art systems, adhesives based on (I) have increased shear strength under static loading, esp. at elevated temp..

    28.
    发明专利
    未知

    公开(公告)号:ES2054981T3

    公开(公告)日:1994-08-16

    申请号:ES89119552

    申请日:1989-10-21

    Applicant: BASF AG

    Abstract: Compositions which can be crosslinked under an atmospheric oxygen atmosphere by means of ultraviolet irradiation and are based on (meth)acrylate copolymers having a K value of from 10 to 100, obtained by free-radical polymerisation in solid phase or solution of a) 5 to 97.4% by weight of i-amyl acrylate and/or i-amyl methacrylate and b) 0 to 89.9% by weight of (meth)acrylates whose hompolymers have a glass transition temperature of below -30 DEG C, c) 2.5 to 30% by weight of alpha , beta -monoolefinically unsaturated compounds whose homopolymers have a glass transition temperature of above - 30 DEG C, d) 0 to 10% by weight of monoolefinically unsaturated acids and/or anhydrides thereof, e) 0 to 20% by weight of further olefinically unsaturated monomers containing at least one of the following functional groups: hydroxyl, amide, epoxide, ether, ester, urethane, urea, primary, secondary or tertiary amine and ether, and f) 0.1 to 5% by weight of a copolymerisable benzophenone or acetophenone derivative, the sum of the percentages by weight x = a + b + c + d + f in each case being 100.

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