21.
    发明专利
    未知

    公开(公告)号:DE4039920A1

    公开(公告)日:1992-06-17

    申请号:DE4039920

    申请日:1990-12-14

    Applicant: BASF AG

    Abstract: The invention relates to novel polyethyleneimine and polyvinylamine derivatives, the polyethyleneimines containing the structural elements Ia and/or Ib and the polyvinylamines containing the structural elements IIa, IIb and IIc in which the following applies to the degrees of polymerisation n, m and p: n >/= 1, m >/= 0 and P >/= 0, and X is CR R PO3R R or CR R SO3R , X , independently of X , is a hydrogen atom, CR R PO3R R or CR R SO3R , Y and Y , independently of one another, are at least one CHR PO3R R or CHR SO3R group and possibly a hydrogen atom, Y and Y , independently of one another and of Y and Y , are hydrogen atoms, CHR PO3R R or CHR SO3R groups, and Z -Z are identical or different inorganic and/or organic radicals, where R and R , independently of one another, are a hydrogen atom, a C1-C12-alkyl group or an aryl group, and R and R , independently of one another, are a hydrogen atom or an alkali metal atom or NR R R R where R to R are identical or different radicals selected from the group consisting of hydrogen, alkyl, aryl, hydroxyalkyl and benzyl. The invention also relates to aluminium-based substrate materials coated with these polyethylenimines and/or polyvinylamines, and to the use thereof for the production of offset printing plates.

    22.
    发明专利
    未知

    公开(公告)号:DE4013575A1

    公开(公告)日:1991-10-31

    申请号:DE4013575

    申请日:1990-04-27

    Applicant: BASF AG

    Inventor: ROSER JOACHIM DR

    Abstract: Production of negative relief images by exposing to an image a recording plate comprising a backing and a photosensitive layer which is applied thereto which contains, as photosensitive compounds, esters of (1,2-naphthoquinone 2-diazide)-4- and/or -5-sulphonic acid or -carboxylic acid, heating the exposed plate, exposing the plate over the entire surface and developing the relief image by dissolving out the alkali-soluble constituents from the recording layer using an aqueous alkaline developer solution. The photosensitive layer of the recording plate contains a reaction product of a) 50 to 99% by weight of an oligomeric or polymeric condensation product of a1) 0.5 to 1 mol of an alkyl- and/or alkoxy-substituted mono- to trivalent hydroxybenzene, a2) 0 to 0.5 mol of phenol and a3) 0.5 to 1.5 mol of a C1-C12-carbonyl compound, where the sum of the amounts of a1) and a2) is 1 mol, b) 1 to 50% by weight of (1,2-naphthoquinone 2-diazide)-4-sulphonic acid or -carboxylic acid or a functional derivative of said acids, where up to 20% by weight of said compounds may be replaced by the corresponding esters of the 5-sulphonic or -carboxylic acid.

    23.
    发明专利
    未知

    公开(公告)号:DE3927632A1

    公开(公告)日:1991-02-28

    申请号:DE3927632

    申请日:1989-08-22

    Applicant: BASF AG

    Abstract: The invention relates to a reaction product containing urea and urethane groups and carboxyl groups and obtained by reacting …… i) a mono- or polyethylenically unsaturated mono- or polyalcohol with … ii) a diisocyanate or polyisocyanate, … iii) at least one amino compound and … iv) at least one acid anhydride of an at least dibasic carboxylic acid, where the total number of NCO and anhydride groups in ii) and iv) is less than or equal to the number of groups reactive therewith in i) and iii). …… This reaction product is suitable for the production of radiation-sensitive materials, in particular materials whose solubility in water or aqueous-alkaline solutions is increased by irradiation.

    28.
    发明专利
    未知

    公开(公告)号:DE4102173A1

    公开(公告)日:1992-07-30

    申请号:DE4102173

    申请日:1991-01-25

    Applicant: BASF AG

    Abstract: The invention relates to storage-stable solutions of film-forming copolymers containing carboxyl groups, whose carboxyl groups are reacted to 5 to 80 % with glycidyl (meth)acrylate, in an inert organic solvent or solvent mixture, these solutions additionally containing a phosphoric acid ester of a hydroxyalkyl (meth)acrylate and optionally o-phosphoric acid, and to a procedure for the manufacture of photosensitive coatings which contain photoinitiators, free-radical-polymerisable ethylenically unsaturated organic monomeric compounds, and if appropriate plasticisers, dyes, colour formers and inhibitors of thermal polymerisation, the manufacture of these coatings taking place in a storage-stable solution of this type. They are particularly suitable for the manufacture of offset printing plates.

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