中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

46 records (took 0.023 seconds)

    22.
    发明专利
    未知

    公开(公告)号：DE3777741D1

    公开(公告)日：1992-04-30

    申请号：DE3777741

    申请日：1987-08-31

    Applicant: BASF AG

    Inventor： KURTZ KARL-RULDOF DR ,  KOCH HORST DR ,  SCHULZ GUENTHER DR

    IPC: C08F291/02 ,  C08F291/00 ,  C08K5/00 ,  C08K5/01 ,  C08L21/00 ,  G03F7/00 ,  G03F7/004 ,  G03F7/027

    Abstract: Flexible copying material, which can be developed with organic solvents or mixts. and gives printing plates with an anisotropy factor less than 1.5 and improved O3 cracking resistance, is produced from a light-sensitive mixt. of (A) elastomeric binder(s), (B) a mixt. of at least 2 non-gaseous, photopolymerisable olefinically unsatd. organic cpds, which are compatible with (A), (C) photoinitiator(s) and opt. (D) the usual additives. This mixt. is applied to a substrate and processed to produce pref. alignments. (B) consists of a mixt. of 5-20 (wt.)% (B1) photopolymerisable organic cpd(s) with at least 2 olefinic double bonds and 1-15% (B2) monoolefinically unsatd. photopolymerisable organic cpd(s), forming a homopolymer with Tg below room temp., (B1) and (B2) being compatible with (A) and the amts. being w.r.t. the total amt. of the mixt. of (A) to (D).

    27.
    发明专利
    未知

    公开(公告)号：DE3927632A1

    公开(公告)日：1991-02-28

    申请号：DE3927632

    申请日：1989-08-22

    Applicant: BASF AG

    Inventor： SEITZ FRIEDRICH DR ,  BECK ERICH DR ,  ROSER JOACHIM DR ,  SCHULZ GUENTHER DR ,  BUEESCHGES ELEONORE DR ,  ZWEZ THOMAS DR

    IPC: G03F7/027 ,  C08F20/36 ,  C08F299/06 ,  C08G18/32 ,  C08G18/34 ,  C08G18/67 ,  C08G18/83

    Abstract: The invention relates to a reaction product containing urea and urethane groups and carboxyl groups and obtained by reacting …… i) a mono- or polyethylenically unsaturated mono- or polyalcohol with … ii) a diisocyanate or polyisocyanate, … iii) at least one amino compound and … iv) at least one acid anhydride of an at least dibasic carboxylic acid, where the total number of NCO and anhydride groups in ii) and iv) is less than or equal to the number of groups reactive therewith in i) and iii). …… This reaction product is suitable for the production of radiation-sensitive materials, in particular materials whose solubility in water or aqueous-alkaline solutions is increased by irradiation.

    28.
    发明专利
    未知

    公开(公告)号：DE3672305D1

    公开(公告)日：1990-08-02

    申请号：DE3672305

    申请日：1986-11-17

    Applicant: BASF AG

    Inventor： HOFFMANN GERHARD DR ,  KOCH HORST DR ,  SCHULZ GUENTHER DR

    IPC: G03F7/032 ,  C08G65/32 ,  G03F7/00 ,  G03F7/033

    Abstract: The invention relates to a novel photosensitive recording material which can be developed in aqueous solvents after its imagewise irradiation with actinic light and which consists essentially of a dimensionally stable base (A) and of a photosensitive recording layer (B). The said photosensitive recording layer (B) contains from about 48 to about 85% by weight, based on the photosensitive recording layer (B) of one or more elastomeric graft copolymers (B1) which are selected from the group consisting of polyalkylene oxide - vinyl ester - graft copolymers whose vinyl ester structural units have been hydrolyzed to a degree of not less 50 mol.-% from about 0.01 to about 10% by weight, based on the photosensitive recording layer (B), of one or more photoinitiators (B2), and from about 5 to about 30% by weight, based on the photosensitive recording layer (B), of one or more photopolymerizable monomers (B3). In addition to these components, the photosensitive recording layer (B) might contain further assistants or additives. The novel photosensitive recording material is especially well suited for the production of lithographic printing plates, resists and relief plates, in particular relief printing plates. The invention is furthermore related to a process for preparing the novel photosensitive recording material by polymerizing vinylesters in the presence of polyalkylene oxides to yield polyalkylene oxide - vinylester - graft copolymers, hydrolyzing or transesterifying said polyalkylene oxide - vinylester - graft copolymers to yield the said elastomeric graft copolymer (B1), mixing the said elastomeric graft copolymers (B1) with the other components of the photosensitive recording layer (B), and forming the said photosensitive recording layer (B) from the mixture consisting of its components on the dimensionally stable base (A).

    30.
    发明专利
    未知

    公开(公告)号：DE3819456A1

    公开(公告)日：1989-12-14

    申请号：DE3819456

    申请日：1988-06-08

    Applicant: BASF AG

    Inventor： BOTT KASPAR DR ,  NICK BERNHARD DR ,  SCHULZ GUENTHER DR

    IPC: C07D231/12 ,  C07D261/08 ,  C08F20/60

    Abstract: The invention relates to novel 4-[(meth)acrylamidomethyl]pyrazoles and isoxazoles of the general formula (I) in which R denotes a hydrogen atom or a methyl group; R denotes a hydrogen atom, a methyl group or an ethyl group; R and R denotes an alkyl group having 1 to 6 C atoms or an unsubstituted or substituted aryl group having 6 to 20 C atoms, where R and R can be identical to or different from one another; X denotes an oxygen atom or an NR group in which R stands for a hydrogen atom or a radical having the meaning of R or R . The invention in addition relates to a process for the preparation of the 4-[(meth)acrylamidomethyl]pyrazoles and -isoxazoles of the general formula (I) and the use of these compounds, in particular for polymerisation and preparation of homo- and copolymers.

Patent Agency Ranking