COMPOSITION FOR METAL ELECTROPLATING COMPRISING LEVELING AGENT

    公开(公告)号:SG10201510522XA

    公开(公告)日:2016-01-28

    申请号:SG10201510522X

    申请日:2011-12-19

    Applicant: BASF SE

    Abstract: A method of detecting space debris includes: generating a virtual space debris in accordance with the law of conservation of mass by applying a debris breakup model to an object of breakup origin; calculating an orbit of each virtual space debris based on a debris orbit propagation model; and generating appearance frequency distribution of a motion vector of each virtual space debris on the celestial sphere based on the orbit calculation. The above operations are executed multiple times. The method further includes setting a search range vector based on a motion vector having a high level of the appearance frequency distribution of the motion vector, and applying a stacking method to regions in images captured at time intervals during the fixed point observation, the regions being shifted along the search range vector sequentially in the order of capture, thereby detecting space debris appearing on the images.

    COMPOSITION FOR METAL PLATING COMPRISING SUPPRESSING AGENT FOR VOID FREE SUBMICRON FEATURE FILLING

    公开(公告)号:SG174264A1

    公开(公告)日:2011-10-28

    申请号:SG2011064086

    申请日:2010-03-25

    Applicant: BASF SE

    Abstract: A composition for filling submicrometer sized features having an aperture size of 30 nanometers or less comprising a source of copper ions, and at least one suppressing agent selected from compounds of formula (I) wherein - the R1 radicals are each independently selected from a copolymer of ethylene oxide and at least one further C3 to C4 alkylene oxide, said copolymer being a random copolymer. - the R2 radicals are each independently selected from R1 or alkyl. - X and Y are spacer groups independently, and X for each repeating unit independently, selected from C1 to C6 alkylen and Z-(O-Z)m wherein the Z radicals are each independently selected from C2 to C6 alkylen, - n is an integer equal to or greater than 0. - m is an integer equal to or greater than 1.

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