公开(公告)号：DE102006043368A1

公开(公告)日：2007-03-29

申请号：DE102006043368

申请日：2006-09-15

Applicant: CORNING INC

Inventor： HARPER BRIAN L ,  HRDINA KENNETH E ,  LASALA JOHN E

IPC: C03C3/06 ,  C03B20/00 ,  C03C4/00 ,  C03C23/00

Abstract: The silica glass material is doped with molecular hydrogen having average molecular hydrogen concentration of 5x10 1>5>to 1x10 1>8>molecules/cm 3>. The ratio of minimum molecular hydrogen concentration and maximum molecular hydrogen concentration is 0.1-0.95. The silica glass material is used in light path of lithographic irradiation of lithographic device operated at wavelength of less than 300 nm. An independent claim is included for manufacture of silica glass material. The silica glass material is free of -O-O- bond.

公开(公告)号：DE10392336T5

公开(公告)日：2005-02-24

申请号：DE10392336

申请日：2003-03-04

Applicant: CORNING INC CORNING

Inventor： DAVIS JUN CLAUDE L ,  BOWDEN BRADLEY F ,  WIGHT JUN JOHN F ,  WASILEWSKI MICHAEL H ,  HRDINA KENNETH E ,  BARRETT W TIMOTHY ,  ROBINSON MICHAEL

IPC: G21K1/06 ,  C03B8/04 ,  C03B19/01 ,  C03B20/00 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00 ,  H01L21/027

公开(公告)号：AU5932500A

公开(公告)日：2001-02-13

申请号：AU5932500

申请日：2000-07-13

Applicant: CORNING INC

Inventor： DAVIS CLAUDE L ,  HRDINA KENNETH E ,  SABIA ROBERT

IPC: G03F1/00 ,  G03F1/24 ,  G03F1/60 ,  G03F7/20 ,  G21K1/06 ,  H01L21/027 ,  G03C5/00

公开(公告)号：DE102010042745A1

公开(公告)日：2011-04-28

申请号：DE102010042745

申请日：2010-10-21

Applicant: CORNING INC

Inventor： DURAN CARLOS ,  HRDINA KENNETH E ,  NEUKIRCH ULRICH WILHELM HEINZ

IPC: C03B32/00

公开(公告)号：AU2003216530A1

公开(公告)日：2003-09-22

申请号：AU2003216530

申请日：2003-03-04

Applicant: CORNING INC

Inventor： ROBINSON MICHAEL ,  DAVIS JR CLAUDE L ,  BOWDEN BRADLEY F ,  WIGHT JR JOHN F ,  WASILEWSKI MICHAEL H ,  HRDINA KENNETH E ,  BARRETT W TIMOTHY

IPC: G21K1/06 ,  C03B8/04 ,  C03B19/01 ,  C03B20/00 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00 ,  H01L21/027

公开(公告)号：AU6208300A

公开(公告)日：2001-02-13

申请号：AU6208300

申请日：2000-07-10

Applicant: CORNING INC

Inventor： DAVIS CLAUDE L ,  HRDINA KENNETH E

IPC: C03B8/04 ,  C03B20/00 ,  C03C17/36 ,  G02B5/08 ,  G02B5/10 ,  G02B5/26 ,  G02B5/28 ,  G02B17/06 ,  G03F1/00 ,  G03F1/24 ,  G03F1/60 ,  G03F7/20 ,  G21K1/06 ,  G21K5/02 ,  H01L21/027 ,  G21K5/00 ,  C23C14/02 ,  C23C28/00

Abstract: The projection lithographic method for producing integrated circuits and forming patterns with extremely small feature dimensions includes an illumination sub-system (36) for producing and directing an extreme ultraviolet soft x-ray radiation λ from an extreme ultraviolet soft x-ray source (38); a mask stage (22) illuminated by the extreme ultraviolet soft x-ray radiation λ produced by illumination stage and the mask stage (22) includes a pattern when illuminated by radiation λ. A protection sub-system includes reflective multilayer coated Ti doped high purity SiO2 glass defect free surface (32) and printed media subject wafer which has a radiation sensitive surface.

公开(公告)号：WO2006071936A2

公开(公告)日：2006-07-06

申请号：PCT/US2005047257

申请日：2005-12-28

Applicant: CORNING INC ,  BOOKBINDER DANA C ,  FIACCO RICHARD M ,  HRDINA KENNETH E ,  TANDON PUSHKAR ,  BLEAKING DANIEL J ,  MAXON JOHN E ,  WILBERT KIMBERLY A

Inventor： BOOKBINDER DANA C ,  FIACCO RICHARD M ,  HRDINA KENNETH E ,  TANDON PUSHKAR ,  BLEAKING DANIEL J ,  MAXON JOHN E ,  WILBERT KIMBERLY A

IPC: C03C3/06 ,  C03B19/14 ,  C03C4/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23

Abstract: Disclosed are high purity synthetic silica glass material having a high OH concentration homogeneity in a plane perpendicular to the optical axis, and process of making the same. The glass has high refractive index homogeneity. The glass can have high internal transmission of at least 99.65%/cm at 193 nm. The process does not require a post-sintering homogenization step. The controlling factors for high compositional homogeneity, thus high refractive index homogeneity, include high initial local soot density uniformity in the soot preform and slow sintering, notably isothermal treatment during consolidation.

Abstract translation: 公开了在垂直于光轴的平面内具有高OH浓度均匀性的高纯度合成石英玻璃材料及其制造方法。 玻璃具有高折射率均匀性。 该玻璃在193nm下可以具有至少99.65％/ cm的高内部透射率。 该方法不需要烧结后均化步骤。 高成分均匀性因此高折射率均匀性的控制因素包括在烟灰预制棒中的初始局部烟灰密度均匀性和慢速烧结，特别是在固结期间的等温处理。

公开(公告)号：WO03077038A2

公开(公告)日：2003-09-18

申请号：PCT/US0306825

申请日：2003-03-04

Applicant: CORNING INC

Inventor： HRDINA KENNETH E ,  MAXON JOHN E ,  MCLEAN BRENT R

IPC: G02B1/00 ,  C03B8/04 ,  C03B19/14 ,  C03B20/00 ,  C03C3/06 ,  C03C4/00 ,  G03F1/24 ,  G03F7/20 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  C03B19/1446 ,  C03B19/1484 ,  C03B2201/42 ,  C03B2207/62 ,  C03B2207/66 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  C03C2203/40 ,  G03F1/24 ,  G03F7/70958

Abstract: Titania-containing silica glass bodies and extreme ultraviolet elements having low levels of striae are disclosed. Methods and apparatus for manufacturing and measuring striae in glass elements and extreme ultraviolet elements are also disclosed.

Abstract translation: 公开了含有二氧化钛的二氧化硅玻璃体和具有低水平条纹的极紫外线元件。 还公开了用于制造和测量玻璃元件和极紫外元件中的条纹的方法和装置。

公开(公告)号：WO03076352A2

公开(公告)日：2003-09-18

申请号：PCT/US0306809

申请日：2003-03-04

Applicant: CORNING INC

Inventor： DAVIS JR CLAUDE L ,  BOWDEN BRADLEY F ,  WIGHT JR JOHN F ,  WASILEWSKI MICHAEL H ,  HRDINA KENNETH E ,  BARRETT W TIMOTHY ,  ROBINSON MICHAEL

IPC: G21K1/06 ,  C03B8/04 ,  C03B19/01 ,  C03B20/00 ,  C03B32/00 ,  C03C3/06 ,  C03C4/00 ,  H01L21/027 ,  C03B

CPC classification number: C03B32/005 ,  C03B19/01 ,  C03B2201/42 ,  C03C3/06 ,  C03C4/0085 ,  C03C2201/42 ,  C03C2203/10

Abstract: Methods and apparatus for manufacturing titania-containing fused silica bodies are disclosed. The titania-containing fused silica bodies are subsequently processed to make extreme ultraviolet soft x-ray masks. The methods and apparatus involve providing powders external to a furnace cavity and depositing the powders in the furnace cavity to form a titania-containing fused silica body.

Abstract translation: 公开了制造含二氧化钛的熔融石英体的方法和装置。 随后处理含二氧化钛的熔融二氧化硅体以制造极紫外线软X射线掩模。 所述方法和装置包括在炉腔外部提供粉末并将粉末沉积在炉腔中以形成含二氧化钛的熔融二氧化硅体。

公开(公告)号：EP1224047A4

公开(公告)日：2004-11-17

申请号：EP00937499

申请日：2000-02-17

Applicant: CORNING INC

Inventor： HRDINA KENNETH E ,  KAR GITIMOY ,  WIGHT JOHN F ,  YU CHUNZHE C

IPC: B28B3/20 ,  B28B11/00 ,  C03B19/06 ,  C03B23/047 ,  C03B23/06 ,  C03B32/00 ,  C03B37/012 ,  G02B6/02 ,  B23B1/00

CPC classification number: G02B6/02347 ,  B28B3/269 ,  B28B11/003 ,  C03B19/025 ,  C03B19/06 ,  C03B23/047 ,  C03B23/065 ,  C03B32/00 ,  C03B37/0124 ,  C03B2203/42 ,  G02B6/02361 ,  G02B6/02371 ,  G02B6/02376 ,  Y10T428/236 ,  Y10T428/24149

Abstract: The present invention describes an extrusion process for manufacturing a titanium-containing silicate glass honeycomb structure (100), having a variety of shapes and sizes depending on its ultimate application. The titanium-containing glass honeycomb has a very low coefficient of thermal expansion (CTE) and the CTE can be varied by adjusting the titanium level to match the CTE of members that are bonded to the honeycomb. Furthermore, the inventive honeycomb structure is lightweight, yet able to advantageously used as a light-weight support for such objects as mirrors. Especially extraterrestrial environments where temperature extremes are present. These honeycombs can be used singularly or in aggregates to provide such support. Embodiments are described wherein the mass of the honeycomb is further reduced by removing select portions of the honeycomb without deleteriously impacting its ability for load bearing.