公开(公告)号：JPH06332152A

公开(公告)日：1994-12-02

申请号：JP5737194

申请日：1994-03-28

Applicant: HOYA CORP

Inventor： MITSUI MASARU

IPC: G03F1/32 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027 ,  G03F1/08

Abstract: PURPOSE:To provide the phase shift mask which can be produced while the generation of microdefects is suppressed with relatively simple stages and with which pattern transfer with a high resolution is possible and the phase shift mask blank which is the blank material thereof. CONSTITUTION:The mask patterns to be formed on a transparent substrate 1 of this phase shift mask are composed of light transparent parts 4 which allow the transmission of light of the intensity substantially contributing to exposing and light translucent parts 2 which allow the transmission of the light of the intensity substantially contributing to exposing. The phase shift mask is so formed that the phase of the light past the light translucent parts 2 and the phase of the light past the light transparent parts 4 are varied by shifting the phase of the light passing the light translucent parts 2, by which the light rays passing near the boundary parts of the light transparent parts 4 and the light translucent parts 2 are negated with each other and the contrast in the boundary parts is well maintained. The light translucent parts 2 are composed of thin films consisting of materials consisting of oxygen, molybdenum and silicide as main constituting elements.

公开(公告)号：JPH01142637A

公开(公告)日：1989-06-05

申请号：JP30189787

申请日：1987-11-30

Applicant: HOYA CORP

Inventor： MITSUI MASARU ,  MAEDA YOSHIO ,  USHIDA SHOJI

IPC: G03F1/00 ,  G03F1/50 ,  G03F1/54 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To prevent degradation in the yield of products and to facilitate process control by providing a thin film for reinforcing the adhesion of a light shielding film to a resist by a metal silicide contg. oxygen on a light shieldable thin film consisting of the metal silicide. CONSTITUTION:The light shieldable thin film 3 consisting of the metal silicide is formed on one face of a transparent substrate 2 consisting of quartz glass and the thin film 4 for reinforcing the adhesion consisting of the metal silicide contg. oxygen is provided on this light shieldable thin film 3. The thin film 4 for reinforcing the adhesion has the compsn. resembling to the compsn. of the light shieldable thin film 3 and is formable by the thin film forming technique similar to the case of the light shieldable thin film 3. Said thin film is, therefore, easily formed as the extension of he stage for forming the light shieldable thin film. A photoresist film is satisfactorily adhered onto the light shieldable thin film of the photomask blank 1 even if an adhesion accelerator is not coated thereon. The degradation in the yield of the products is thus prevented.

公开(公告)号：JPS6237384B2

公开(公告)日：1987-08-12

申请号：JP19985583

申请日：1983-10-25

Applicant: HOYA CORP

Inventor： USHIDA MASAO ,  MATSUI SHIGEKAZU ,  YOSHIDA SHUJI ,  MITSUI MASARU

IPC: C23C14/06 ,  G03F1/00 ,  G03F1/50 ,  G03F1/58 ,  G03F1/88 ,  H01L21/027

公开(公告)号：JP2010038931A

公开(公告)日：2010-02-18

申请号：JP2008197961

申请日：2008-07-31

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI ,  MITSUI MASARU

IPC: G02F1/1368 ,  G03F1/50 ,  G03F1/58 ,  G03F1/68 ,  G03F1/80

Abstract: PROBLEM TO BE SOLVED: To provide a mask blank and a photomask capable of avoiding the problems that may occur, when a light-shielding film and light-translucent film close to each other are exposed to an etching liquid.
SOLUTION: A light-translucent film that partially transmits exposure light and a light-shielding film that blocks exposure light are provided, in a random order, on a transparent substrate and a light-transmitting part that transmits exposure light; a light-translucent part that partially transmits exposure light and a light-shielding part that blocks exposure light are formed, by respectively patterning the light-translucent film and the light-shielding film, wherein the light-translucent film and the light-shielding film are each made of a conductive material; and an insulating film made of a non-conductive material is provided between the light-translucent film and the light-shielding film.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供能够避免可能发生的问题的掩模毛坯和光掩模，当彼此接近的遮光膜和光半透明膜暴露于蚀刻液体时。 解决方案：在透明基板和透射曝光光的透光部分上以随机顺序设置部分透光曝光的光半透明膜和阻挡曝光光的遮光膜; 通过分别对透光性薄膜和遮光膜进行图案化，形成部分透射曝光用的光半透明部分和阻挡曝光光的遮光部，其中，所述光透射性膜和遮光膜 均由导电材料制成; 并且在光半透明膜和遮光膜之间设置由非导电材料制成的绝缘膜。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009187032A

公开(公告)日：2009-08-20

申请号：JP2009124973

申请日：2009-05-25

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： MITSUI MASARU ,  SANO MICHIAKI

IPC: G03F1/50 ,  G03F1/54 ,  G03F7/20

CPC classification number: G03F1/50

Abstract: PROBLEM TO BE SOLVED: To provide a large mask and a mask blank for FPD suitable for multicolor exposure. SOLUTION: The mask blank for manufacturing an FPD device includes at least a semi-translucent film for gray tone mask having the function of adjusting transmission amount, which is provided on a translucent substrate. The semi-translucent film for gray tone mask is a film regulated so that, in a wavelength range at least from i line to g line radiated from an ultrahigh pressure mercury lamp, the transmittance (that is, semi-transmittance) fluctuation range of the semi-translucent film is within less than 5%. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供适用于多色曝光的FPD的大掩模和掩模毛坯。 解决方案：用于制造FPD器件的掩模坯料至少包括设置在透光性基板上的具有调整透射量功能的灰度色调掩模用半透明膜。 用于灰度色调掩模的半透明膜是调节膜，使得在从超高压汞灯辐射的至少从i线到g线的波长范围中，透射率（即半透射率）波动范围 半透明膜在5％以内。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009086383A

公开(公告)日：2009-04-23

申请号：JP2007256930

申请日：2007-09-29

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI ,  IMURA KAZUHISA ,  MITSUI MASARU

IPC: G02F1/1362 ,  G03F1/40 ,  G03F1/50 ,  G03F1/54 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a gray tone mask capable of suppressing the occurrence of electrostatic damages in a pattern during handling when the mask is used. SOLUTION: The gray tone mask has a mask pattern on a transparent substrate, the mask pattern comprising a light-shielding part, a light-transmitting part and a light-semitransmitting part that reduces a predetermined amount of the transmitted amount of exposure light used upon using the mask, and the gray tone mask is used for forming a desired transfer pattern including segments with different residual film values on a transfer object by selectively decreasing dose of exposure light on the transfer object in accordance with regions. A conductive film is formed on the whole surface of the transparent substrate, on which the mask pattern is formed and the light-shielding part or the light-semitransmitting part of each mask pattern in a region where at least the mask pattern is formed within the substrate plane is electrically equipotential through the conductive film. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种能够在使用掩模时在处理期间抑制图案中的静电损伤的发生的灰度调色剂掩模。 解决方案：灰度蒙版掩模在透明基板上具有掩模图案，掩模图案包括遮光部分，透光部分和光半透射部分，其减少预定量的透射曝光量 使用掩模时使用的光，灰色调掩模用于通过根据区域选择性地减少转印对象上的曝光光的剂量，在转印体上形成包括具有不同残留膜值的片段的期望的转印图案。 导电膜形成在其上形成有掩模图案的透明基板的整个表面上，并且在至少在其内形成掩模图案的区域中的每个掩模图案的遮光部分或光 - 半透射部分形成 衬底平面通过导电膜电等电位。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009086382A

公开(公告)日：2009-04-23

申请号：JP2007256928

申请日：2007-09-29

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI ,  IMURA KAZUHISA ,  KIMURA YASUKI ,  MITSUI MASARU

IPC: G03F1/28 ,  G03F1/68 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a gray tone mask blank and a gray tone mask, particularly a gray tone mask using a light-semitransmitting film, with which a desired pattern can be obtained on a transfer object upon forming a precise pattern.
SOLUTION: This invention relates to the gray tone mask blank to be used for manufacturing a gray tone mask for forming a desired transfer pattern including segments with different residual film values on a transfer object body by selectively decreasing the dose of exposure light to the transfer object depending on the exposure region, wherein the gray tone mask blank includes a light-semitransmitting film and a light-shielding film on a transparent substrate, with the light-semitransmitting film showing ≤4.0% dispersion (change rate) of the transmittance for the exposure light in a region where at least the mask pattern is formed within the substrate plane. By subjecting the mask blank to predetermined patterning, a light-shielding part, a light-transmitting part and a light-semitransmitting part are formed to obtain a gray tone mask.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供灰色调掩模空白和灰度调色掩模，特别是使用光半透膜的灰度调色掩模，在形成精确图案时可以在转印体上获得期望的图案 。 解决方案：本发明涉及用于制造灰色蒙版掩模的灰度蒙版掩模，用于通过选择性地将曝光光的剂量选择性地降低，在转印体上形成包括具有不同残留膜值的段的所需转印图案 所述转印对象取决于所述曝光区域，其中所述灰度色调掩模坯料在透明基板上包括光半透膜和遮光膜，所述发光半透膜的透射率分布（变化率）≤4.0％ 对于在基板平面内至少形成掩模图案的区域中的曝光光。 通过对掩模坯料进行规定的图案化，形成遮光部，透光部和光半透射部，得到灰色调掩模。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2009086381A

公开(公告)日：2009-04-23

申请号：JP2007256927

申请日：2007-09-29

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： SANO MICHIAKI ,  IMURA KAZUHISA ,  MITSUI MASARU

IPC: G03F1/00 ,  G03F1/54 ,  G03F1/68 ,  G03F1/76

Abstract: PROBLEM TO BE SOLVED: To provide a method for manufacturing a gray tone mask by which variance in CD (line width) during producing a gray tone mask can be decreased, and to provide a gray tone mask. SOLUTION: A gray tone mask is obtained by preparing a gray tone mask blank having a light-semitransmitting film and a light-shielding film in this order on a transparent substrate, subjecting the mask blank to first patterning, forming a resist film on the whole substrate surface including the patterned light-shielding film and the bare light-semitransmitting film, and then subjecting the blank to second patterning to form the respective patterns in the light-semitransmitting film and the light-shielding film. The difference between the surface reflectance of the light-shielding film for the drawing light in the first patterning and the surface reflectance of the light-semitransmitting film for the drawing light in the second patterning is adjusted to be ≤35%. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种制造灰度调色剂掩模的方法，通过该方法可以减少在产生灰度色调掩模期间CD（线宽）的变化，并提供灰度色调掩模。 解决方案：通过在透明基板上依次制备具有光半透膜和遮光膜的灰度调色掩模坯料，对掩模坯料进行第一图案化，形成抗蚀剂膜，得到灰度调色掩模 在包括图案化遮光膜和裸光半透膜的整个基板表面上，然后对坯料进行第二图案化以在光半透膜和遮光膜中形成各自的图案。 将第一图案化中的拉伸光的遮光膜的表面反射率与第二图案化中的拉伸光的半透射膜的表面反射率之间的差调整为≤35％。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007219038A

公开(公告)日：2007-08-30

申请号：JP2006037461

申请日：2006-02-15

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： MITSUI MASARU ,  SANO MICHIAKI ,  USHIDA MASAO

IPC: G03F1/50 ,  G03F1/54

CPC classification number: G03F1/50

Abstract: PROBLEM TO BE SOLVED: To provide a mask blank and a photomask suitable for processes (such as a resist coating method, an etching method and a cleaning method) in a large mask for an FDP (flat panel display). SOLUTION: The mask blank for manufacturing an FPD device includes at least one of a light shielding film, and a semitransmitting film having a function of controlling the transmitted light quantity on a light transmitting substrate, wherein the light shielding film and the semitransmitting film show a square root average roughness Rq of 2.0 nm or less on the film surface. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种适合用于FDP（平板显示器）的大掩模中的工艺（例如抗蚀剂涂覆方法，蚀刻方法和清洁方法）的掩模坯料和光掩模。 解决方案：用于制造FPD器件的掩模板包括遮光膜和具有控制透光基板上透射光量的功能的半透膜中的至少一种，其中遮光膜和半透射膜 膜在膜表面上显示2.0nm以下的平方根平均粗糙度Rq。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006184356A

公开(公告)日：2006-07-13

申请号：JP2004375333

申请日：2004-12-27

Applicant: Hoya Corp ,  Hoya株式会社

Inventor： MITSUI MASARU

IPC: G03F1/32 ,  G03F1/68 ,  G03F1/80 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a halftone phase shift mask blank and a halftone phase shift mask having superior light resistance and chemical resistance and favorable production yield of a mask, without causing changes in transmittance or changes in a phase angle even when the wavelength of exposure light is as short as 200 nm or shorter.
SOLUTION: The halftone phase shift mask blank 10 has a semi-transparent film 2, having a predetermined transmittance at the wavelength of exposure light, with mainly nitrogen, metal and silicon as the constituents, formed on a transparent substrate 1, wherein the surface layer of the semi-transparent film 2 has ≤15 atm% oxygen content, the surface layer of the semi-transparent film 2 has ≤5 atm% metal content, and the film thickness of the surface layer is ≥1 nm. The semi-transparent film 2 is patterned to obtain the halftone phase shift mask 20 having a semi-transparent portion 2a formed in the film.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有优异的耐光性和耐化学性的半色调相移掩模毛坯和半色调相移掩模，并且掩模的生产成本良好，即使在不影响透射率或相位角变化的情况下 曝光光的波长短至200nm以下。 解决方案：半色调相移掩模坯料10具有半透明膜2，其在曝光光的波长处具有预定的透射率，主要以氮，金属和硅为组分，形成在透明基板1上，其中 半透明膜2的表层具有≤15atm％的氧含量，半透明膜2的表面层的金属含量≤5atm％，表面层的膜厚≥1nm。 对半透明膜2进行图案化以获得具有形成在膜中的半透明部分2a的半色调相移掩模20。 版权所有（C）2006，JPO＆NCIPI