公开(公告)号：FR2292780A1

公开(公告)日：1976-06-25

申请号：FR7531452

申请日：1975-10-06

Applicant: IBM

Inventor： ROMANKIW LUBOMYR T

IPC: C25D17/00 ,  H01B3/00 ,  H01G9/00 ,  C25D11/02 ,  H01J17/04 ,  H01L21/28 ,  H01L21/3063 ,  H01L21/316 ,  H01L21/3205 ,  H01L21/321 ,  H01L21/768 ,  H05K3/02 ,  H05K3/46

Abstract: An anodizing process includes depositing a first conductive layer on a dielectric layer; depositing a porous metal oxide-forming layer on the first conductive layer; anodizing the porous metal oxide-forming layer to provide porous anodized material; treating the first conductive layer to render it non-conductive. The process and articles fabricated thereby are especially suitable for use in multilevel metallurgical structures, and in electronic structures in which it is designed to have planar conductors.

公开(公告)号：DE3777072D1

公开(公告)日：1992-04-09

申请号：DE3777072

申请日：1987-10-06

Applicant: IBM

Inventor： AINSLIE NORMAN G ,  BRUSIC VLASTA A ,  CHAPMAN DANIEL W ,  ROMANKIW LUBOMYR T ,  WILMER RICHARD K

IPC: G11B5/60 ,  G11B5/31 ,  G11B5/48 ,  G11B5/17

Abstract: A thin film magnetic read/write head/arm assembly and method of manufacturing the same is disclosed herein. Contact soldering (37) of the opposite to disk side of the read/write head (35) to a cable (33) in laminate relationship to the suspension arm (31), or a polyimide strip with conductors deposited thereon provides both electrical interconnection and mechanical support. Semiconductor devices (40) can also be intermediately soldered between the head and cable for maximum noise suppression.

公开(公告)号：CA1259947A

公开(公告)日：1989-09-26

申请号：CA454199

申请日：1984-05-11

Applicant: IBM

Inventor： GELCHINSKI MORDECHAI H ,  ROMANKIW LUBOMYR T ,  VIGLIOTTI DONALD R ,  VON GUTFELD ROBERT J

IPC: H01L21/306 ,  C23C18/16 ,  C23F1/00 ,  C23F1/02 ,  C25D5/02 ,  C25D5/08 ,  C25F3/14 ,  H05K3/06 ,  H05K3/24 ,  C25F3/02

Abstract: This metal deposition/material removal technique modifies free-standing or submerged jet plating with an electromagnetic energy beam such as an intense laser beam, directed collinearly along the jet. Experiments were made to deposit gold contact areas on nickel plated beryllium-copper substrates used for microelectronic connectors. The deposits are found to be crack-free and dense, possessing excellent adhesion to the substrate. Deposition rates for 0.05 cm diameter gold spots are on the order of 10 micrometers per second. Also disclosed is a laser jet chemical treatment system wherein relative motion between a cathodically connected workpiece and a fluid jet is provided. The laser beam which is collinear with the jet, cooperates with it to enhance plating or etching rate on the surface of the workpiece.

公开(公告)号：CA1135410A

公开(公告)日：1982-11-09

申请号：CA361712

申请日：1980-10-07

Applicant: IBM

Inventor： ROMANKIW LUBOMYR T ,  THOMPSON DAVID A

IPC: G11B5/31 ,  G11B5/12

Abstract: THIN FILM INDUCTIVE TRANSDUCER A thin film inductive transducer head includes a magnetic circuit with a pair of legs and inductive coils. The legs are thinner near the pole tip than in the back gap region. The legs are also narrower in the pole tip region than in the back gap region. Resolution is enhanced by the thin pole tips and saturation of the yoke structure is avoided by increasing the cross-sectional area of the yoke structure away from the pole tip region. YO979-061

公开(公告)号：FR2337358A1

公开(公告)日：1977-07-29

申请号：FR7636405

申请日：1976-11-29

Applicant: IBM

Inventor： ROMANKIW LUBOMYR T

IPC: H05K3/14 ,  C23C14/04 ,  G03F7/26 ,  H01L21/28 ,  H01L21/306 ,  H01L21/3205 ,  G03F1/02 ,  H01L21/30

Abstract: A think film structure is made by vacuum deposition. (a) A mask is applied to a substrate and a pattern of windows made to form a mask (1). (b) A removable material is deposited in the windows, forming a top overhang of increased width. (c) Mask (1) is removed leaving a mask (2). A material is deposited in vacuo with a thickness less than mask (2) so openings remain round material (b). (e) Material (b), i.e. mask (2) is removed by a chemical soln. Mask (1) is pref. photolacquer, whereas mask (2) is pref. metal with greater thickness than mask (1) so the top overhang is formed in each window of mask (1). After step (e), a photolacquer may be selectively applied and parts of coating (d) removed. Coating (d) may consist of several materials; and photolacquer (a) may be provided with windows possessing inclined sides to produce a desired contour in mask (2); the inclined sides may be produced by heating the mask (1). Method may be used in mfr. of line patterns with extremely small dimensions for all types of magnetic structure; semiconductors, e.g. integrated circuits; optical- and electro-optical structures etc. One example is two layers of Permalloy (RTM) sped. by a glass layer.

公开(公告)号：FR2316633A1

公开(公告)日：1977-01-28

申请号：FR7611977

申请日：1976-04-16

Applicant: IBM

Inventor： FEDER RALPH ,  HALLER IVAN ,  HATZAKIS MICHAEL ,  ROMANKIW LUBOMYR T ,  SPILLER EBERHARD A

IPC: G03F7/20 ,  G03F7/039 ,  G03F7/32 ,  G03F7/38 ,  H01L21/027 ,  G03F1/00 ,  G03C1/68 ,  G03C5/30

Abstract: A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are distinguished by their different respective abilities to be swelled in an appropriate swelling agent, and the swelled areas are removed by dispersal in a nonsolvent liquid.

公开(公告)号：DE2628467A1

公开(公告)日：1977-01-27

申请号：DE2628467

申请日：1976-06-25

Applicant: IBM

Inventor： FEDER RALPH ,  HALLER IVAN ,  HATZAKIS MICHAEL ,  ROMANKIW LUBOMYR T ,  SPILLER EBERHARD A

IPC: G03F7/20 ,  G03F7/039 ,  G03F7/32 ,  G03F7/38 ,  H01L21/027 ,  G03C1/68

Abstract: A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are distinguished by their different respective abilities to be swelled in an appropriate swelling agent, and the swelled areas are removed by dispersal in a nonsolvent liquid.

公开(公告)号：DE2453035A1

公开(公告)日：1975-07-03

申请号：DE2453035

申请日：1974-11-08

Applicant: IBM

Inventor： ROMANKIW LUBOMYR T

IPC: G11C11/02 ,  C23F1/00 ,  C25D5/00 ,  C25D5/02 ,  G11B5/31 ,  H01F41/34 ,  H01L21/306 ,  H05K3/06 ,  H05K3/10 ,  H05K3/38 ,  C23F17/00 ,  G03F7/00

Abstract: The preparation of a discrete and well-defined pattern of metal or alloy of uniform thickness and composition of magnetic properties by plating the alloy or metal onto a conductive surface which contains narrow photoresist frames outlining the outer edges of the pattern.

公开(公告)号：DE69113845T2

公开(公告)日：1996-05-30

申请号：DE69113845

申请日：1991-03-02

Applicant: IBM

Inventor： GUPTA ARUNAVA ,  HABA BELGACEM ,  HUSSEY BRIAN W ,  ROMANKIW LUBOMYR T

IPC: B23K26/00 ,  B23K26/12 ,  B23K26/18 ,  B23K26/36 ,  C04B41/91 ,  C23F4/02 ,  G11B5/31 ,  G11B5/60 ,  H01L21/302 ,  G11B5/127 ,  G11B15/64 ,  G11B17/32

公开(公告)号：CA1241741A

公开(公告)日：1988-09-06

申请号：CA477749

申请日：1985-03-28

Applicant: IBM

Inventor： BEST JOHN S ,  ROMANKIW LUBOMYR T ,  SCRANTON ROBERT A ,  THOMPSON DAVID A

IPC: G11B5/58 ,  G11B5/596 ,  G11B5/74 ,  G11B5/82 ,  G11B7/09 ,  G11B7/24 ,  G11B13/00 ,  G11B21/10 ,  G11B23/30

Abstract: A structure provides variable electromagnetic property (variable, resistance, capacitive, or other variable impedance or other variable electromagnetic property) contrast on the surface marking servo tracks on data storage media, Such media include magnetic or optical storage disks and tapes. The media can be conductive metallic or nonmetallic and can be composed for example of poorly conductive media, dielectric media, or semiconductive media. The variable electromagnetic impedance can vary in the optical, electrical or other portions of the electromagnetic spectrum. A very small variation of the thickness of the protective layer above the magnetic recording medium is employed to mark the servo track information of the medium. Information to be detected by means of a capacitive sensor can be recorded in the protective layer above or below the magnetic recording or optical storage medium. For example, a thin film metallic protective layer 0.07 micrometers thick can be patterned with about 0.02 micrometers of the protective layer. For a plated disk, the top 0.02 micrometers of the protective layer can be patterned. A pattern for providing a variable impedance for representing data can be formed subtractively by sputter etching, or additively formed by a lift-off process or by deposition through a mask, or by the oxidation of or nitriding of materials such as Al, Si or valve metals. This system provides capacitive or other variable impedance contrast for position signals on conductive metallic media for magnetic disks and tapes by means of a very small amount of modulation of the thickness of the protective layer above the magnetic recording medium. Optionally, the protective layer may be planarized by subsequent oxidation, or the use of an additional layer.