公开(公告)号：JP2008260909A

公开(公告)日：2008-10-30

申请号：JP2007329512

申请日：2007-12-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ITOU YUKIKO ,  ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08F265/00 ,  G02B5/20 ,  G02F1/1333 ,  G02F1/1335 ,  G03F7/033 ,  G03F7/40

CPC classification number: C09D201/08

Abstract: PROBLEM TO BE SOLVED: To provide a composition that may form a cured film with high flatness and is suitably used to form a liquid crystal display element and a protective film for solid state image sensors excellent in developability and heat-resistance, to provide a composition having excellent storage stability, to provide a method of forming a protective film using the composition, and to provide a protective film formed from the following composition. SOLUTION: The resin composition for forming a radiation sensitive protective film comprises [A] (a1) an unsaturated carboxylic acid and/or unsaturated carboxylic acid anhydride, (a2) an epoxy group-containing unsaturated compound, and (a3) a copolymer consisting of another unsaturated compound, [B] a monofunctional polymerizable unsaturated compound having carboxyl groups with molecular weight of ≥180, [C] a multifunctional polymerizable unsaturated compound, and [D] a photoinitiator. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供可以形成具有高平坦度的固化膜的组合物，并且适合用于形成液晶显示元件和用于显影性和耐热性优异的固态图像传感器的保护膜， 提供具有优异储存稳定性的组合物，提供使用该组合物形成保护膜的方法，并提供由以下组成形成的保护膜。 解决方案：用于形成辐射敏感保护膜的树脂组合物包含[A]（a1）不饱和羧酸和/或不饱和羧酸酐，（a2）含环氧基的不饱和化合物，和（a3）a 由另一不饱和化合物组成的共聚物，[B]具有分子量≥180的羧基的单官能可聚合不饱和化合物，[C]多官能可聚合不饱和化合物和[D]光引发剂。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007086565A

公开(公告)日：2007-04-05

申请号：JP2005277172

申请日：2005-09-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: G03F7/033 ,  G02F1/1333 ,  G02F1/1337 ,  G02F1/1339 ,  G03F7/027 ,  G03F7/031

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having a sufficient process margin, capable of suppressing contamination of a kiln, a photomask, etc., due to sublimation of a photoinitiator component, and having adhesion, transparency and heat resistance required for a protective film material, and resolution and compression property required for a spacer material. SOLUTION: The photosensitive resin composition contains [A] a copolymer of (a1) an ethylenically unsaturated carboxylic acid and/or an ethylenically unsaturated carboxylic acid anhydride and (a2) another ethylenically unsaturated compound, [B] a polymerizable compound having an ethylenically unsaturated bond, and [C] a photopolymerization initiator comprising a compound represented by formula (1). COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决的问题：提供具有足够的加工余量的能够抑制由于光引发剂组分的升华而导致的窑，光掩模等的污染并且具有粘合性，透明性和耐热性的光敏树脂组合物 保护膜材料所需的，隔离材料所需的分辨率和压缩性能。 解决方案：感光性树脂组合物含有[a1]烯键式不饱和羧酸和/或烯属不饱和羧酸酐的共聚物和（a2）另一种烯属不饱和化合物，[B]具有 烯键式不饱和键，[C]含有式（1）表示的化合物的光聚合引发剂。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2007056252A

公开(公告)日：2007-03-08

申请号：JP2006201610

申请日：2006-07-25

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YONEKURA ISAMU ,  ICHINOHE DAIGO ,  NISHIO HISAHIRO ,  SHIHO KOUJI ,  KAJITA TORU

IPC: C08F8/30 ,  C08F220/28 ,  C08F290/12 ,  G02F1/1339 ,  G03F7/027 ,  G03F7/038

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition which can acquire a sufficient spacer configuration even in low the exposure with high sensitivity and high resolution and also can form a spacer for a liquid crystal display element excellent in elastic recovery, rubbing resistance, adhesiveness with a transparent substrate, heat resistance, resistance to release liquid, etc. SOLUTION: The radiation sensitive resin composition comprises a polymer which is obtained by reacting a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride with (a2) a two or more hydroxyl groups-containing unsaturated compound expressed by formula (1) (wherein R 1 represents hydrogen atom or methyl group; p is an integer of 0-3 and q is an integer of 1-12) and (a3) another unsaturated compound with a methacryloyloxyalkyl isocyanate. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题为了获得即使以高灵敏度和高分辨率的曝光也能获得足够的间隔物构型的辐射敏感性树脂组合物，并且还可以形成用于弹性恢复性优异的液晶显示元件的间隔物， 耐摩擦性，与透明基材的粘合性，耐热性，耐剥离液等。解决方案：辐射敏感性树脂组合物包含通过使（a1）不饱和羧酸和/或 不饱和羧酸酐与（a2）由式（1）表示的两个或多个含羟基的不饱和化合物（其中R 1 表示氢原子或甲基; p为0〜 3和q是1-12的整数）和（a3）具有甲基丙烯酰氧基烷基异氰酸酯的另一种不饱和化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006301365A

公开(公告)日：2006-11-02

申请号：JP2005124035

申请日：2005-04-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： HAMADA KENICHI ,  MINOWA TAKAKI ,  KAJITA TORU

IPC: G03F7/023 ,  G02B3/00 ,  G03F7/004 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having no problem with safety, excellent in sensitivity, resolution and storage stability, having good development margin, capable of forming an interlayer insulation film having excellent solvent resistance, heat resistance, light transmittance and adhesion, and capable of forming microlenses having excellent solvent resistance, heat resistance, light transmittance and adhesion, and also having a good melt shape. SOLUTION: The radiation sensitive resin composition contains [A] an alkali-soluble copolymer obtained by copolymerizing (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an unsaturated compound having an oxetane ring structure and (a3) an olefinically unsaturated compound other than the above components, [B] a 1,2-quinonediazido compound and [C] an antimony-free thermosensitive acid generating compound. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 解决问题的方案为了提供一种不具有安全性，灵敏度，分辨率和储存稳定性优异，显影余量优异的能够形成耐溶剂性，耐热性优异的层间绝缘膜的辐射敏感性树脂组合物， 透光性和粘合性，并且能够形成具有优异的耐溶剂性，耐热性，透光性和粘合性的微透镜，并且还具有良好的熔体形状。 解决方案：辐射敏感性树脂组合物含有[A]通过使（a1）不饱和羧酸和/或不饱和羧酸酐共聚得到的碱溶性共聚物，（a2）具有氧杂环丁烷环结构的不饱和化合物和 （a3）不同于上述成分的烯属不饱和化合物，[B] 1,2-醌二叠氮化合物和[C]无锑热敏酸产生化合物。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006184841A

公开(公告)日：2006-07-13

申请号：JP2005073765

申请日：2005-03-15

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MANO HIROYUKI ,  ICHINOHE DAIGO ,  NISHIO HISAHIRO ,  KAJITA TORU

IPC: G03F7/032 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a photosensitive resin composition solution for spacer formation giving an even film uniform in thickness and suitable for a slit die coater method in which a reduced-pressure drying step is carried out in a short time. SOLUTION: The photosensitive resin composition comprises (A) a copolymer of at least one selected from the group consisting of ethylenically unsaturated carboxylic acids and ethylenically unsaturated carboxylic acid anhydrides, an epoxy group-containing ethylenically unsaturated compound, and another ethylenically unsaturated compound different from those, (B) a polymerizable compound having an ethylenically unsaturated bond, and (C) a photopolymerization initiator, wherein a solid concentration X (wt.%) and a viscosity Y (mPa s) at 25°C satisfy relationships of LogY≤0.04X-0.08 (1), LogY≥0.04X-0.50 (2), LogY≥0.30 (3) and LogY≤1.08 (4). COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于间隔物形成的感光性树脂组合物溶液，其赋予均匀的厚度均匀的膜并且适合于在短时间内进行减压干燥步骤的狭缝模涂法。 光敏树脂组合物包含（A）选自烯键式不饱和羧酸和烯属不饱和羧酸酐中的至少一种的共聚物，含环氧基的烯键式不饱和化合物和另一种烯属不饱和化合物 不同于（B）具有烯键式不饱和键的聚合性化合物和（C）光聚合引发剂，其中25℃下的固体浓度X（wt。％）和粘度Y（mPa·s）满足LogY ≤0.04X-0.08（1），LogY≥0.04X-0.50（2），LogY≥0.30（3）和LogY≤1.08（4）。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006176746A

公开(公告)日：2006-07-06

申请号：JP2005123104

申请日：2005-04-21

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： YOSHIZAWA JUNJI ,  KAJITA TORU ,  KATO YOSHIFUMI ,  YAMAUCHI HIDEKI ,  UEDA JIRO

IPC: C08F220/26 ,  C08G59/40 ,  C08L33/14 ,  G02B5/20

Abstract: PROBLEM TO BE SOLVED: To provide a resin composition which can form highly flat cured films, is suitably be used for forming optical device-protecting films having high transparency, surface hardness and various kinds of excellent resistance such as heat and pressure resistance, acid resistance, alkali resistance, spattering resistance, and etching resistance, and has excellent storage stability, to provide a method for forming a protecting film from the composition, and to provide a protecting film formed from the composition. SOLUTION: This composition comprises a copolymer comprising (a1) polymerization units originated from a polymerizable unsaturated compound having an oxiranyl group or oxetanyl group, (a2) polymerization units originated from a polymerizable unsaturated compound having a specific structure and represented by 1-diethylpropyl methacrylate, and (a3) polymerization units different from the polymerization units (a1) and (a2). The protecting film is formed from the composition. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供可形成高度平坦的固化膜的树脂组合物，适合用于形成具有高透明度，表面硬度和各种优异的耐热耐压性的光学器件保护膜 ，耐酸性，耐碱性，耐溅射性和耐蚀刻性，并且具有优异的储存稳定性，提供从组合物形成保护膜的方法，并提供由该组合物形成的保护膜。 解决方案：该组合物包含共聚物，其包含（a1）源自具有环氧乙烷基或氧杂环丁烷基的可聚合不饱和化合物的聚合单元，（a2）源自具有特定结构的可聚合不饱和化合物的聚合单元， （a3）与聚合单元（a1）和（a2）不同的聚合单元。 保护膜由组合物形成。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2003241383A

公开(公告)日：2003-08-27

申请号：JP2002046520

申请日：2002-02-22

Applicant: JSR CORP ,  IBM

Inventor： NISHIMURA YUKIO ,  HOSHI MICHIAKI ,  SOYANO AKIMASA ,  KAJITA TORU ,  ALLEN ROBERT D ,  VARANASI PUSHKARA RAO

IPC: G03F7/039 ,  C08F220/26 ,  C08F220/34 ,  C08F220/38 ,  C08F222/06 ,  C08F232/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in contrast, capable of forming a fine resist pattern with a high degree of accuracy and excellent also in transparency to a radiation, sensitivity and resolution. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin comprising an acid-dissociable group-containing norbornene compound typified by 5-[(1-methylcyclohexyl)oxycarbonyl]norbornene or 5-(2-methyl-1- adamantyloxycarbonyl)norbornene and maleic anhydride, (B) a radiation-sensitive acid generator and (C) a compound typified by a di-t-butyl 1,3- adamantanedicarboxylate or 2,5-dimethyl-2,5-di(1-adamantylcarbonyloxy)hexane. Preferably the resin (A) further comprises a polar group-containing alicyclic ester of (meth)acrylic acid typified by 3-hydroxy-1-adamantyl (meth)acrylate. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2002128831A

公开(公告)日：2002-05-09

申请号：JP2000329503

申请日：2000-10-27

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  KATAOKA ATSUKO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: C07C69/753 ,  C08F32/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To provide a novel norbornene-based compound having high transpar ency to radiation and excellent in sensitivity, resolution, pattern shape or the like and also having small variation in line width to temperature change when heated after exposure and is usable as a raw material or the like of a resin component in a chemical amplification type resist, provide a polymer of the compound, and also provide a radiation-sensitive resin composition containing a copolymer of the compound and a maleic anhydride. SOLUTION: The norbornene compound is represented by 5-[(2-norbornyl) methoxycarbonyl]norbornene, 5-[1-(2-methyl-2-norbornyl) ethoxycarbonyl]norbornene, 8-[(2-norbornyl) methoxycarbonyl]tetracyclo[4.4.1.12,5.17,10]dodecane or the like. The polymer is represented by the polymer of the norbornene-based compound or the like. The radiation-sensitive resin composition contains the copolymer of the norbornene-based compound or the like and the meleic anhydride and a radiation-sensitive acid generating agent.

公开(公告)号：JP2002082438A

公开(公告)日：2002-03-22

申请号：JP2000273962

申请日：2000-09-08

Applicant: JSR CORP

Inventor： MURATA KIYOSHI ,  YAMAMOTO MASASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L45/00 ,  C08L101/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist, e.g. sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having one or more amino groups with at least one hydrogen atom bonding to a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of such hydrogen atoms bonding to a nitrogen atom, (B) a radiation sensitive acid generating agent and (C) an alkali-insoluble or slightly alkali-soluble acid dissociable group- containing resin having an alicyclic structure in the principal chain and/or a side chain and a carboxylic acid anhydride structure in a side chain and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

公开(公告)号：JP2001235863A

公开(公告)日：2001-08-31

申请号：JP2000044784

申请日：2000-02-22

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F2/46 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including dry etching resistance, sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) an abietic acid derivative of formula 1 [where R1-R4 are each H, hydroxyl, a 1-4C linear or branched alkyl or a 1-4C linear or branched alkoxyl and R5 is H, an optionally substituted 1-20C alkyl or -CH2COO6 (R6 is a 1-18C alkyl)].