公开(公告)号：JP2003195507A

公开(公告)日：2003-07-09

申请号：JP2001399235

申请日：2001-12-28

Applicant: JSR CORP

Inventor： NISHIMURA YUKIO ,  ISHII HIROYUKI ,  SANO KIMIYASU ,  KOBAYASHI HIDEKAZU

IPC: G03F7/039 ,  C08F232/04 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency for radiation, excellent basic performances as a resist such as sensitivity, resolution, dry etching durability, pattern profile, and suitable as a chemical amplification type resist having high resolution property in a fine pattern region. SOLUTION: The radiation-sensitive resin composition contains (A) a resin which contains a norbornene-based repeating unit derived from 5-(2-methyl-2- adamantyl)oxycarbonylbicyclo[2.2.1]hept-2-ene, 5-(1-methyl-1-cyclopentyl) ocycarbonylbicyclo[2.2.1]hept-2-ene or the like and a (meth)acrylate-based repeating unit derived from 3-hydroxy-1-adamantyl(meth)acrylate, 1-methyl-1- cyclohexyl(meth)acrylate or the like and which is converted into alkali-soluble by the effect of an acid, and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2001056552A

公开(公告)日：2001-02-27

申请号：JP23295199

申请日：1999-08-19

Applicant: JSR CORP

Inventor： AKIYAMA MASAHIRO ,  SANO KIMIYASU ,  IWANAGA SHINICHIRO

IPC: H01L21/027 ,  C08K5/13 ,  C08K5/28 ,  C08K5/3417 ,  C08L61/06 ,  G03F7/004 ,  G03F7/023

Abstract: PROBLEM TO BE SOLVED: To obtain a radiation sensitive resin composition which effectively suppresses the occurrence of scum, is excellent in developability, gives a good pattern shape, is excellent also in resolution, adapts particularly to a stepper having a high opening factor and has good focus latitude by incorporating a specified N-hydroxyimide compound. SOLUTION: The radiation sensitive resin composition contains an alkali- soluble novolak resin, a phenolic low molecular compound, a quinonediazido compound and an N-hydroxyimide compound of formula I, wherein X is a group of formula II, wherein R1 and R2 are each H, halogen, alkyl, aryl or hydroxyl and Y is optionally substituted methylene, optionally substituted alkylene, O or S. The alkali-soluble novolak resin is not particularly defined if it is a resin obtained by condensing phenols and aldehydes in the presence of an acidic catalyst. The low molecular weight phenolic compound preferably has 2-5 benzene rings.

公开(公告)号：JP2001051419A

公开(公告)日：2001-02-23

申请号：JP22431599

申请日：1999-08-06

Applicant: JSR CORP

Inventor： AKIYAMA MASAHIRO ,  SANO KIMIYASU ,  IWANAGA SHINICHIRO

IPC: H01L21/027 ,  C08K5/13 ,  C08L61/06 ,  G03F7/004 ,  G03F7/023 ,  G03F7/039

Abstract: PROBLEM TO BE SOLVED: To suppress the occurrence of a side lobe in the formation of a contact hole(C/H) pattern and to ensure superior developability by incorporating an alkali-soluble novolak resin, a phenolic low molecular compound and at least one quinonediazidosulfonic ester compound of a specified phenol compound. SOLUTION: The radiation sensitive resin composition contains an alkali- soluble novolak resin, a phenolic low molecular compound and at least one quinonediazidosulfonic ester compound of a phenol compound of the formula. The alkali-soluble novolak resin is not particularly limited if it is a resin obtained by condensing phenols and aldehydes in the presence of an acidic catalyst. The phenols include phenol, o-cresol, m-cresol, p-cresol, 1,2- dimethylphenol, 2,4-dimethylphenol, phloroglucinol, thymol and isothymol.

公开(公告)号：JPH10319592A

公开(公告)日：1998-12-04

申请号：JP14330597

申请日：1997-05-16

Applicant: JSR CORP

Inventor： OTA TOSHIYUKI ,  OKADA SACHIKO ,  SANO KIMIYASU ,  SATO HOZUMI

IPC: G03F7/027 ,  C08F2/50 ,  G03F7/028 ,  G03F7/032 ,  G03F7/033 ,  G03F7/038 ,  H01L21/027 ,  H05K3/06 ,  H05K3/18

Abstract: PROBLEM TO BE SOLVED: To obtain the radiation sensitive resin composition superior in resolution in the case of a thick film and plating solution resistance and applicable to circuit board formation for forming bumps and wiring by incorporating an alkali-soluble copolymer, a compound having an ethylenically unsaturated double bond, an epoxy compound having an epoxy equivalent of

公开(公告)号：JP2005070735A

公开(公告)日：2005-03-17

申请号：JP2004045724

申请日：2004-02-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： TAKAMOTO EIJI ,  HAMADA KENICHI ,  MINOWA TAKAKI ,  SANO KIMIYASU ,  NISHIKAWA MICHINORI

IPC: G03F7/038 ,  C08F220/04 ,  C08F222/04 ,  G03F7/022 ,  G03F7/04 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having high radiation sensitivity and a sufficient margin for development and capable of easily forming a patterned thin film excellent in adhesion, and to provide an interlayer insulation film and a microlens. SOLUTION: The radiation-sensitive composition contains [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, (a2) an epoxy-containing unsaturated compound, (a3) an unsaturated compound having at least one skeleton selected from the group consisting of a tetrahydrofuran skeleton, a furan skeleton, a tetrahydropyran skeleton, a pyran skeleton and the skeletons represented by formula (1), and (a4) an unsaturated compound other than the compounds (a1), (a2) and (a3), and [B] a 1,2-naphthoquinonediazido compound. The interlayer insulation film and the microlens are manufactured from the composition. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：提供具有高辐射敏感性和足够的显影余量并且能够容易地形成粘附性优异的图案化薄膜的辐射敏感性组合物，并提供层间绝缘膜和微透镜。 解决方案：辐射敏感组合物含有（a）不饱和羧酸和/或不饱和羧酸酐的共聚物，（a2）含环氧基的不饱和化合物，（a3）不饱和化合物，其具有 至少一种选自四氢呋喃骨架，呋喃骨架，四氢吡喃骨架，吡喃骨架和由式（1）表示的骨架的骨架，和（a4）除化合物（a1）以外的不饱和化合物， （a2）和（a3）和[B] 1,2-萘醌二叠氮化合物。 由组合物制造层间绝缘膜和微透镜。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004333964A

公开(公告)日：2004-11-25

申请号：JP2003131124

申请日：2003-05-09

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  MINOWA TAKAKI ,  SAITO CHIE ,  NISHIKAWA MICHINORI

IPC: G03F7/004 ,  G02F1/1339 ,  G03F7/023 ,  G03F7/032

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has excellent resolution and a film remaining rate, which can form projections and spacers having excellent pattern profiles, heat resistance, solvent resistance, transparency or the like, and which can realize a vertical alignment liquid crystal display device having an excellent aligning property, voltage holding rate or the like, and to provide a method of forming projections and/or spacers by using the above composition. SOLUTION: The radiation-sensitive resin composition contains (a) an alkali-soluble resin, (b) a 1,2-quinone diazide compound, and (c) (alkylol)melamine or alkylether melamine, and/or a polyepoxy compound. The method for forming projections and/or spacers includes the processes of: forming a film of the above composition; exposing the film through a photomask; developing the film after exposure with an alkaline solution to form a pattern; and exposing the pattern. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004333963A

公开(公告)日：2004-11-25

申请号：JP2003131114

申请日：2003-05-09

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  MINOWA TAKAKI ,  SAITO CHIE ,  NISHIKAWA MICHINORI

IPC: G03F7/033 ,  G02F1/1337 ,  G02F1/1339 ,  G03F7/004 ,  G03F7/022 ,  G03F7/023 ,  G03F7/032

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which has excellent resolution and a film remaining rate, which can form projections and spacers having excellent pattern profiles, heat resistance, solvent resistance, transparency or the like, and which can realize a vertically aligned liquid crystal display device having an excellent aligning property, voltage holding rate or the like, and to provide a method for forming projections and/or spacers by using the above composition. SOLUTION: The radiation-sensitive resin composition contains (a) an alkali-soluble resin and (b) a 1,2-quinone diazide compound. The method of forming projections and/or spacers includes the processes of: forming a film of the above composition; exposing the film through a photomask; developing the film after exposure with an alkaline solution to form a pattern; and exposing the pattern. COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2004258319A

公开(公告)日：2004-09-16

申请号：JP2003049032

申请日：2003-02-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SANO KIMIYASU ,  MINOWA TAKAKI ,  NISHIKAWA MICHINORI

IPC: G03F7/004 ,  C08K3/04 ,  C08K5/28 ,  C08L61/06 ,  C08L101/00 ,  G02F1/1333 ,  G03F7/033

CPC classification number: B82Y30/00 ,  B82Y10/00

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high heat resistance and a low dielectric constant and suitable for an interlayer insulating film, and to provide a liquid crystal display element using the same. SOLUTION: The radiation-sensitive resin composition contains (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound and (c) fullerene and/or fullerene derivatives. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2002268212A

公开(公告)日：2002-09-18

申请号：JP2001067307

申请日：2001-03-09

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C08G8/12 ,  C08K5/42 ,  C08L61/06 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in resolution, developability, heat resistance, pattern shape, margin for exposure and focus latitude, having good balance of these characteristics and suitable for use as a positive type resist. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin obtained by condensing specified first phenols (2,4- dimethylphenol, 2-methyl-4-ethylphenol, etc.), specified second phenols (m-cresol, p-cresol, 2,5-dimethylphenol, etc.), and an aldehyde and (B) a quinonediazidosulfonic ester compound of a phenol compound having a structure corresponding to quaternary carbon in a position adjacent to a hydroxyl group.