Abstract:
The optical two-dimensional position sensor (1) comprises a selective optical unit (9) which faces, and is displaceable relative to an integrated device (2). The selective optical unit (9) is formed by a polarised light source (4,5) and a filter with four quadrants (3) which permits passage of the light onto two quadrants only. The selective optical unit (9) is attached to a control lever (6) such as to translate in a plane along a first direction (X) and a second direction (Y), and to pivot around a third direction (W) which is orthogonal to the preceding directions. In a transparent package, the integrated device (2) comprises a first group of sensor elements (10 1 -10 3 ) which are spaced along the first direction (X), a second group of sensor elements (10 4 -10 7 ) which are spaced along the second direction (Y) and a third group of sensor elements (10 8 -10 9 ) which detect the angular position of the selective optical sensor. Electronics which is integrated with the sensor elements generates a code which is associated with each position which is assumed by the selective optical unit (9) and a control signal (S) which corresponds to the function required.
Abstract:
The method described provides for the formation of a region of silicon dioxide on a substrate (11) of monocrystalline silicon, the epitaxial growth of a silicon layer, the opening of holes (14') in the silicon layer above the silicon dioxide region, and the removal of the silicon dioxide which constitutes the region by means of chemical attack through the holes (14') until a silicon diaphragm (12'), attached to the substrate (11) along the edges and separated therefrom by a space (15), is produced. In order to form an absolute pressure microsensor, the space has to be sealed. To do this, the method provides for the holes (14') to have diameters smaller than the thickness of the diaphragm (12') and to be closed by the formation of a silicon dioxide layer (16) by vapour-phase deposition at atmospheric pressure.
Abstract:
An electromagnetic head (130) for a storage device comprises a magnetic core (205) forming a magnetic circuit, the magnetic core (205) being interrupted by a first air-gap (230) for magnetic coupling with a memory cell of the device, and by at least one second air-gap (235) which separates a first pole (240) and a second pole (245) of the magnetic core (205), and magnetoresistive means (250) disposed in the region of the second air-gap (235) for reading the memory cell; the magnetoresistive means (250) are connected to the magnetic core (205) in the region of the first pole (240) and of the second pole (245) so as to be connected in the magnetic circuit.
Abstract:
An integrated semi-conductor device (1) comprises, reciprocally superimposed, a thermally insulating region (3, 11); a thermal conduction region (25) of a high thermal conductivity material; a passivation oxide layer (30); and a gas sensitive element (34). The thermally insulating region (25) defines a preferential path towards the gas sensitive element (34) for the heat generated by the heater element (20), thereby the heat dispersed towards the substrate (2, 3) is negligible during the operation of the device (1).
Abstract:
The process for manufacturing a through insulated interconnection is performed by forming, in a body (1) of semiconductor material, a trench (2) extending from the front (7) of the body (1) for a thickness portion thereof; filling the trench with dielectric material (6); thinning the body starting from the rear (5) until the trench (2), so as to form an insulated region (3) surrounded by dielectric material; and forming a conductive region (30b) extending inside said insulated region (3) between the front and the rear of the body and having a higher conductivity than the first body (1). The conductive region (8, 25, 28, 30b) includes a heavily doped semiconductor region (30b), made prior to filling of the trench.