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    Fluidic cartridge for detecting chemicals in samples, in particular for performing biochemical analyses
    1.
    发明公开
    Fluidic cartridge for detecting chemicals in samples, in particular for performing biochemical analyses 审中-公开
    流体盒用于检测样品中的化学物质，特别是用于进行生化分析

    公开(公告)号：EP2399672A2

    公开(公告)日：2011-12-28

    申请号：EP11171813.6

    申请日：2011-06-28

    Applicant: STMicroelectronics S.r.l.

    Inventor： Ziglioli, Federico Giovanni ,  Maierna, Amedeo ,  Mastromatteo, Ubaldo ,  Barlocchi, Gabriele ,  Villa, Flavio Francesco

    IPC: B01L3/00 ,  G01N35/00 ,  C12Q1/00

    CPC classification number: B01L3/502715 ,  B01L2200/027 ,  B01L2300/044 ,  B01L2300/0636 ,  B01L2300/0645 ,  B01L2300/0672 ,  B01L2300/0816 ,  B01L2300/0867 ,  B01L2300/1827 ,  B01L2400/0439 ,  Y10T436/11

    Abstract: A fluidic cartridge (35; 135) for detecting chemicals, formed by a casing (40; 140), hermetically housing an integrated device (20) having a plurality of detecting regions (22) to bind with target chemicals; part of a supporting element (41; 141), bearing the integrated device; a reaction chamber (65; 165), facing the detecting regions (22); a sample feeding hole (50, 51; 150) and a washing feeding hole (52; 152), self-sealingly closed; fluidic paths (63, 64, 70, 71; 163, 164, 170, 171), which connect the sample feeding and washing feeding holes (50-52; 150, 152) to the reaction chamber (65; 165); and a waste reservoir (80; 180), which may be fluidically connected to the reaction chamber by valve elements (82, 76; 182, 176) that may be controlled from outside. The integrated device is moreover connected to an interface unit (42) carried by the supporting element (41; 141), electrically connected to the integrated device and including at least one signal processing stage and external contact regions (75; 175).

    Abstract translation: 甲流体盒（35; 135），用于检测化学品，由壳体（40; 140）形成为具有探测区域（22）多个与靶化学物质结合，气密壳体集成装置（20）; ，轴承集成装置;一个支撑元件（141 41）的一部分; 面向所述检测区域（22）;一个反应室（165 65）; 一个样品进料孔（50，51; 150）和一洗涤进料孔（52; 152），自密封地关闭; 流体通路（63，64，70，71; 163，164，170，171），连接所述进样和洗涤进料孔（50-52; 150,152）到所述反应室（65; 165）; 和废物容器（80; 180），其可被流体地连接到由阀元件在反应室（82，76; 182，176），并可以从外部进行控制。 集成器件是在多个连接到在由支撑元件所承载接口单元（42）（41; 141），电连接到所述集成器件和包括至少一个信号处理级和外部接触区域（75; 175）。

    Optical-type two-dimensional position sensor, in particular for automotive applications
    4.
    发明公开
    Optical-type two-dimensional position sensor, in particular for automotive applications 失效
    Optischer zweidimensionaler Positionsgeber，insbesonderefürAnwendungen in Kraftfahrzeugen

    公开(公告)号：EP0881470A1

    公开(公告)日：1998-12-02

    申请号：EP97830255.2

    申请日：1997-05-28

    Applicant: STMicroelectronics S.r.l.

    Inventor： Villa, Flavio Francesco ,  Vigna, Benedetto ,  Ferrari, Paolo

    IPC: G01D5/34

    CPC classification number: G01D5/34

    Abstract: The optical two-dimensional position sensor (1) comprises a selective optical unit (9) which faces, and is displaceable relative to an integrated device (2). The selective optical unit (9) is formed by a polarised light source (4,5) and a filter with four quadrants (3) which permits passage of the light onto two quadrants only. The selective optical unit (9) is attached to a control lever (6) such as to translate in a plane along a first direction (X) and a second direction (Y), and to pivot around a third direction (W) which is orthogonal to the preceding directions. In a transparent package, the integrated device (2) comprises a first group of sensor elements (10 1 -10 3 ) which are spaced along the first direction (X), a second group of sensor elements (10 4 -10 7 ) which are spaced along the second direction (Y) and a third group of sensor elements (10 8 -10 9 ) which detect the angular position of the selective optical sensor. Electronics which is integrated with the sensor elements generates a code which is associated with each position which is assumed by the selective optical unit (9) and a control signal (S) which corresponds to the function required.

    Abstract translation: 光学二维位置传感器（1）包括相对于集成器件（2）面向并可移位的选择性光学单元（9）。 选择性光学单元（9）由偏振光源（4,5）和具有四个象限（3）的滤光片形成，其允许仅将光通过两个象限。 选择性光学单元（9）附接到控制杆（6），以沿着第一方向（X）和第二方向（Y）在平面内平移，并且绕第三方向（W）枢转，第三方向 与前述方向正交。 在透明封装中，集成器件（2）包括沿着第一方向（X）间隔的第一组传感器元件（101-103），第二组传感器元件（104-107），沿着 第二方向（Y）和检测选择性光学传感器的角度位置的第三组传感器元件（108-109）。 与传感器元件集成的电子产生与由选择光学单元（9）假设的每个位置相关联的代码和对应于所需功能的控制信号（S）。

    Integrated odour sensor
    5.
    发明公开
    Integrated odour sensor 有权
    Integrierter Geruchssensor

    公开(公告)号：EP2352024A1

    公开(公告)日：2011-08-03

    申请号：EP11152632.3

    申请日：2011-01-29

    Applicant: STMicroelectronics S.r.l.

    Inventor： Ziglioli, Federico Giovanni ,  Maierna, Amedeo ,  Villa, Flavio Francesco ,  Mastromatteo, Ubaldo ,  Barlocchi, Gabriele

    IPC: G01N33/00

    CPC classification number: G01N33/0009

    Abstract: The cartridge-like chemical sensor (140) is formed by a housing (150) having a base (151) and a cover (152) fixed to the base and provided with an input opening (159), an output hole (169) and a channel (165) for a gas to be analyzed. The channel extends in the cover between the input opening and the output hole and faces a printed circuit board (153) carrying an integrated circuit (20) having a sensitive region (16) open toward the channel (165) and of a material capable to bind with target chemicals in the gas to be analyzed. A fan (170) is arranged in the housing, downstream of the integrated device (20), for sucking the gas after being analyzed, and is part of a thermal control system for the integrated circuit.

    Abstract translation: 盒式化学传感器（140）由具有基座（151）和固定到基座的盖（152）的壳体（150）形成，并且设置有输入开口（159），输出孔（169）和 用于待分析气体的通道（165）。 通道在输入开口和输出孔之间的盖中延伸并且面向承载具有朝向通道（165）开口的敏感区域（16）的集成电路（20）的印刷电路板（153）和能够 与要分析的气体中的目标化学物质结合。 集成装置（20）的下游配置有风扇（170），用于在分析后吸入气体，并且是集成电路的热控制系统的一部分。

    Process for manufacturing a pressure-monitoring device provided with a triaxial piezoresistive accelerometer
    6.
    发明公开
    Process for manufacturing a pressure-monitoring device provided with a triaxial piezoresistive accelerometer 有权
    一种制备Drucküberwachungsvorichtung，其设置有压阻三轴加速度计过程

    公开(公告)号：EP2096448A2

    公开(公告)日：2009-09-02

    申请号：EP09161586.4

    申请日：2005-01-25

    Applicant: STMicroelectronics S.r.l.

    Inventor： Combi, Chantal ,  Baldo, Lorenzo ,  Faralli, Dino ,  Villa, Flavio Francesco

    IPC: G01P15/12 ,  G01P15/08

    CPC classification number: G01P15/123 ,  G01P15/0802 ,  G01P15/18 ,  G01P2015/084

    Abstract: A manufacturing process of a semiconductor pressure-monitoring device (30) is disclosed, envisaging: providing a wafer (31) of semiconductor material; providing, in a first region (34a) of the wafer (31) a first buried cavity (22) and a first membrane (23), suspended over, and closing at the top, the first buried cavity (22); providing, in a second region (34b) of the wafer (31), a second buried cavity (40) and a second membrane (41), suspended over, and closing at the top, the second buried cavity (40); coupling an inertial mass (25) in a rigid way to the first membrane (23), by forming the inertial mass (25) on top of a surface of the first membrane (23) opposite to the first buried cavity (22); providing, in the first membrane (23), first piezoresistive transduction elements (24) sensitive to strains of the first membrane (23) due to movements of the inertial mass (25) in response to a sensed acceleration and generating corresponding electrical signals, so as to provide an acceleration sensor (35); and providing, in the second membrane (41), second piezoresistive transduction elements (42) sensitive to strains of the second membrane (41) in response to a sensed pressure and generating corresponding electrical signals, so as to provide a pressure sensor (36) integrated with the acceleration sensor (35) in the wafer (31). A semiconductor pressure-monitoring device (30) is also disclosed, made with the above manufacturing process.

    Abstract translation: 半导体组合的加速度计和压力监控装置的制造过程（30）游离缺失盘，着的正视：提供半导体材料的晶片（31）; 提供，在晶片的第一区域（34A）（31）的第一掩埋空腔（22），并悬浮在，并且在顶部闭合的第一膜（23），所述第一掩埋空腔（22）; 提供，在第二区域（34B）的晶片（31），第二掩埋空腔（40），并悬浮在，并且在顶部闭合第二膜（41），所述第二掩埋空腔（40）; 耦合到在刚性方式惯性质量（25）到所述第一膜（23）通过在第一膜的表面的顶部上形成惯性质量（25）（23）相对于该第一掩埋空腔（22）; 提供，在所述第一膜（23），第一压阻转换元件（24）到所述第一膜（23）的敏感的菌株由于响应于感测到的加速度的惯性质量（25）的运动和产生相应的电信号，从而 以提供到加速度传感器（35）; 和提供，在第二膜（41），第二压阻转换元件（42），以响应于感测到的压力和产生所述第二膜（41）的菌株相应的电信号，以提供一个压力传感器敏感（36） 与在晶片（31）加速度传感器（35）集成在一起。 一种组合半导体加速度计和压力监控装置（30）是这样游离缺失盘，与上述制造方法制得。

    Process for manufacturing a high-quality SOI wafer
    7.
    发明公开
    Process for manufacturing a high-quality SOI wafer 审中-公开
    Herstellungsverfahrenfüreine hochwertige SOI Scheibe

    公开(公告)号：EP1732121A1

    公开(公告)日：2006-12-13

    申请号：EP05425406.5

    申请日：2005-06-06

    Applicant: STMicroelectronics S.r.l.

    Inventor： Villa, Flavio Francesco ,  Corona, Pietro ,  Barlocchi, Gabriele

    IPC: H01L21/762

    CPC classification number: H01L21/76264 ,  H01L21/3247

    Abstract: In a process for manufacturing a SOI wafer, the following steps are envisaged: forming, in a monolithic body (20) of semiconductor material having a front face (20a), a buried cavity (27), which extends at a distance from the front face (20a) and delimits, with the front face (20a), a surface region (28) of the monolithic body (20), the surface region (28) being surrounded by a bulk region (21) and forming a flexible membrane suspended above the buried cavity (27); forming, through the monolithic body (20), at least one access passage (30; 40), which reaches the buried cavity (27); and filling the buried cavity (27) uniformly with an insulating region (35, 36). The surface region (28) is continuous and formed by a single portion of semiconductor material, and the buried cavity (27) is contained and completely insulated within the monolithic body (20); the step of forming at least one access passage (30; 40) is performed after the step of forming a buried cavity (27).

    Abstract translation: 在制造SOI晶片的工艺中，设想以下步骤：在具有前表面（20a）的半导体材料的整体式（20）中形成埋藏空腔（27） 面（20a）并且与前表面（20a）分隔开整体式主体（20）的表面区域（28），所述表面区域（28）被块体区域（21）包围并形成悬浮的柔性膜 在掩埋腔（27）之上; 通过所述整体式主体（20）形成到达所述埋入腔（27）的至少一个进入通道（30; 40）; 以及用绝缘区域（35,36）均匀地填充所述掩埋空腔（27）。 表面区域（28）由半导体材料的单个部分连续地形成，并且埋入空腔（27）被包含并在整体式体（20）内完全绝缘; 在形成掩埋腔（27）的步骤之后，进行形成至少一个进入通道（30; 40）的步骤。

    Piezoresistive accelerometer with mass on membrane, and manufacturing process
    8.
    发明公开
    Piezoresistive accelerometer with mass on membrane, and manufacturing process 审中-公开
    具有质量上的膜，和制造过程压阻加速度传感器

    公开(公告)号：EP1684079A9

    公开(公告)日：2006-10-25

    申请号：EP05425028.7

    申请日：2005-01-25

    Applicant: STMicroelectronics S.r.l.

    Inventor： Combi, Chantal ,  Baldo, Lorenzo ,  Faralli, Dino ,  Villa, Flavio Francesco

    IPC: G01P15/12 ,  G01P15/08

    CPC classification number: G01P15/123 ,  G01P15/0802 ,  G01P15/18 ,  G01P2015/084

    Abstract: A manufacturing process of a semiconductor piezoresistive accelerometer (35) includes the steps of: providing a wafer (11) of semiconductor material; providing a membrane (23) in the wafer (11) over a cavity (22); rigidly coupling an inertial mass (25) to the membrane (23); and providing, in the wafer (11), piezoresistive transduction elements (24), that are sensitive to strains of the membrane (23) and generate corresponding electrical signals. The step of coupling is carried out by forming the inertial mass (25) on top of a surface of the membrane (23) opposite to the cavity (22). The accelerometer (35) is advantageously used in a device for monitoring the pressure (30) of a tyre of a vehicle. The cavity may be formed as a buried cavity. The mass may be formed by silk-screen printing of a metal paste.

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