Abstract:
In a substrate-level assembly (22), a device substrate (20) of semiconductor material has a top face (20a) and houses a first integrated device (1), provided with a buried cavity (3), formed within the device substrate (20), and with a membrane (4), suspended over the buried cavity (3) in the proximity of the top face (20a). A capping substrate (21) is mechanically coupled to the device substrate (20) above the top face (20a) so as to cover the first integrated device (1), in such a manner that a first empty space (25) is provided above the membrane (4). Electrical-contact elements (28a, 28b) electrically connect the integrated device (1) with the outside of the substrate-level assembly (22). The device substrate (20) integrates at least a further integrated device (1', 10) provided with a respective membrane (4'); and a further empty space (25'), fluidically isolated from the first empty space (25), is provided over the respective membrane (4') of the further integrated device (1', 10).
Abstract:
Method for manufacturing a semiconductor pressure sensor, wherein, in a silicon substrate (2), trenches (6a) are dug and delimit walls (7a); a closing layer (10) is epitaxially grown, that closes the trenches (6a) at the top and forms a suspended membrane (13); a heat treatment is performed so as to cause migration of the silicon of the walls (7a) and to form a closed cavity (11) underneath the suspended membrane; and structures (25a, 25b, 26a-26d) are formed for transducing the deflection of the suspended membrane (13) into electrical signals.