Abstract:
PURPOSE: A highly durable quartz glass, its preparation method and apparatus, a quartz glass member, and a semiconductor manufacturing device and a liquid crystal manufacturing device employing the member are provided, wherein the quartz glass is improved in durability, processability and transparency. CONSTITUTION: The quartz glass comprises 0.01-2 wt% of at least element selected from the group consisting of Mg, Ca, Sr, Ba, Y, Hf and Zr. The quartz glass is prepared by dropping the silica powder containing Zr into the furnace using an acid hydride salt as a heat source, layering it, and extending the layer outward. Also the quartz glass is prepared by passing the powder mixture of a silicate powder and the silica powder containing Zr through the plasma arc-coupling region where at least two plasma arcs are coupled and at least two electrodes have opponent polarity, or its neighborhood, thereby melting the mixture.
Abstract:
할로겐화물 가스 및 그 플라즈마를 이용하는 반도체 제조장치 또는 액정 제조장치의 부재로서 적절히 사용할 수 있는 내구성이 높은 석영글라스, 그 제조방법 및 제조용장치, 및 이를 이용한 부재 및 이 부재를 구비한 반도체 제조장치 또는 액정 제조장치를 제공한다. Mg, Ca, Sr, Ba, Y, Hf 및 Zr로 이루어지는 군에서 선택되는 1종 이상의 원소를 0.047중량% 이상 1.100중량% 이하 함유하는 것을 특징으로 하는 고(高)내구성 석영글라스, 그 제조방법 및 제조용장치, 및 이를 이용한 부재 및 장치를 사용한다. 고내구성, 석영글라스, 제조방법, 제조용장치
Abstract:
제공된도핑된실리카-티타니아유리제품은, (i) 실리카-티타니아계유리, (ⅱ) 불소도펀트, 및 (ⅲ) 제2 도펀트를포함하는유리조성물을갖는유리제품을포함한다. 상기불소도펀트는 5 wt.%까지의불소농도를가지며, 및상기제2 도펀트는 50ppm 내지 6 wt.%의총 산화물농도로 Al, Nb, Ta, B, Na, K, Mg, Ca 및 Li 산화물로이루어진군으로부터선택된하나이상의산화물을포함한다. 더욱이, 상기유리제품은 20℃에서 0.5 ppb/K미만의팽창률기울기를갖는다. 상기제2 도펀트는선택적일수 있다. 상기유리제품의조성물은또한 100ppm 미만의 OH 농도를함유할수 있다.
Abstract:
In a method for connecting two elements (1, 2) at least one of which consists of fused silica, wherein both elements (1, 2) are connected to each other through fusion bonding in a gas atmosphere (5), preferably at temperatures between 300° C and 1000° C, the hydrogen portion in the gas atmosphere (5) is adjusted such that reduction of the hydrogen content of the fused silica first and/or second element(s) (1, 2) is substantially prevented. An optical component, in particular, a terminating element (6) for a projection objective of a microlithography projection exposure apparatus is produced in accordance with the method.
Abstract:
A method of making an optical fiber precursor includes generating vapors from an alkali metal source comprising compound containing oxygen and one or more alkali metals and applying the vapors to a surface of a glass article comprising silica at a temperature that promotes diffusion of the alkali metal into the surface of the glass article. An optical fiber has a core comprising silica and an alkali metal oxide of the form X 2 O, where X is selected from the group consisting of K, Na, Li, Cs, and Rb, wherein a concentration of the alkali metal oxide along a length of the core is uniform.
Abstract translation:制造光纤前体的方法包括从包含氧和一种或多种碱金属的化合物的碱金属源生成蒸气,并在促进碱金属扩散的温度下将蒸气施加到包含二氧化硅的玻璃制品的表面 玻璃制品的表面。 光纤具有包含二氧化硅和X 2 O 2形式的碱金属氧化物的核,其中X选自K,Na,Li,Cs和Rb,其中浓度 的碱金属氧化物沿芯的长度是均匀的。
Abstract:
A method of forming an alkali metal oxide-doped optical fiber by diffusing an alkali metal into a surface of a glass article is disclosed. The silica glass article may be in the form of a tube or a rod, or a collection of tubes or rods. The silica glass article containing the alkali metal, and impurities that may have been unintentionally diffused into the glass article, is etched to a depth sufficient to remove the impurities. The silica glass article may be further processed to form a complete optical fiber preform. The preform, when drawn into an optical fiber, exhibits a low attenuation.