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公开(公告)号：US10145876B2
公开(公告)日：2018-12-04
申请号：US14960547
申请日：2015-12-07
Inventor： Jae-Yong Kwon , Dong-Joon Lee
Abstract: Provided is an electromagnetic wave power sensing apparatus. The electromagnetic wave power measuring apparatus includes a waveguide to which electromagnetic wave power is incident, an electromagnetic wave absorber disposed at a termination of the waveguide and absorbing the electromagnetic wave power incident to a front surface of the electromagnetic wave absorber, parallel plates disposed at a rear of the electromagnetic wave absorber and arranged on and under a center line of the waveguide, a waveguide guide for fixing the waveguide and the electromagnetic wave absorber, wherein the parallel plates are positioned in the waveguide guide, an electro-optic element configured to sense the electromagnetic wave power, an electro-optic element fixer to which the electro-optic element is coupled, and a movement guide coupled to the electro-optic element fixer and controlling movement of the electro-optic element into the inside of the waveguide guide in order to sense the electromagnetic wave power.
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292.发明申请公开(公告)号：US20180218874A1
公开(公告)日：2018-08-02
申请号：US15576687
申请日：2016-01-06
Inventor： Bok Lae CHO , In Yong PARK
IPC: H01J37/065 , H01J37/26
CPC classification number: H01J37/065 , H01J37/06 , H01J37/26 , H01J2237/061 , H01J2237/06341
Abstract: The present invention relates to an electron gun for facilitating position adjustment, and an electron microscope including the same, the electron gun improving a vacuum structure so as to easily move a filament block or an electron tip of an electron gun without having bellows for maintaining a vacuum when the center axis of the filament block or the electron tip of the electron gun is mechanically misaligned with the center axis of a anode and a focusing lens.
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293.发明申请公开(公告)号：US20180188646A1
公开(公告)日：2018-07-05
申请号：US15306990
申请日：2015-09-25
Inventor： Eun-Ah YOU
CPC classification number: G03F7/0005 , B29D11/0074 , B29K2075/00 , B29K2883/00 , G01N21/658 , G03F7/039 , G03F7/16 , G03F7/2002 , G03F7/26
Abstract: Provided is a method for manufacturing a transparent substrate according to an exemplary embodiment of the present invention including: a) forming a photoresist layer satisfying D=m*(λ/2n); b) manufacturing a ring-shaped pattern by exposing the photoresist layer and developing the exposed photoresist layer, using a photo mask including a transparent base and a plate-type metal dot formed contacting a light emitting surface of the transparent base; c) manufacturing a second mold to which the ring-shaped pattern is reversely transferred by using a substrate on which the ring-shaped pattern is formed as a first mold; and d) manufacturing the transparent substrate in which a ring-shaped transparent protrusion is integrally formed with the transparent base by filling a liquefied transparent resin in the second mold and curing the transparent resin and removing the second mold to transfer the ring-shaped pattern.
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公开(公告)号：US20180136136A1
公开(公告)日：2018-05-17
申请号：US15580117
申请日：2017-04-27
Inventor： Hyuksang KWON
CPC classification number: G01N21/658 , G01N21/255 , G01N2201/06113 , G01N2201/12
Abstract: The present invention relates to a method for evaluating a SERS sensor substrate, comprising the steps of: a) measuring, through a dark-field microscope, the color of nanoparticles positioned on the SERS sensor substrate; b) converting the measured color into a distance between the nanoparticles; c) acquiring the Raman signal intensity of the SERS sensor substrate; d) acquiring the standard Raman signal intensity of a standard SERS sensor substrate including the nanoparticles having the distance that is the same as the converted distance; and e) comparing the Raman signal intensity and the standard Raman signal intensity.
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公开(公告)号：US20180105930A1
公开(公告)日：2018-04-19
申请号：US15562545
申请日：2016-07-28
Inventor： Sang Woo KANG , Ji Hun MUN
IPC: C23C16/30 , C23C16/455 , C01G39/06
CPC classification number: C23C16/305 , C01B17/20 , C01G39/06 , C01P2002/82 , C01P2002/85 , C01P2004/03 , C01P2004/04 , C23C16/0227 , C23C16/45527 , C23C16/45553 , C23C16/45555 , C23C16/52 , C30B25/16 , C30B25/186 , C30B29/46 , C30B29/64
Abstract: The present invention relates to a method for preparing a two-dimensional transition metal dichalcogenide and, more particularly, to a method for preparing a highly uniform two-dimensional transition metal dichalcogenide thin film. More specifically, the present invention is directed to a preparation method for a highly uniform two-dimensional transition metal dichalcogenide thin film at low temperature of 500° C. or below.
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Patent Agency Ranking
公开(公告)号：US09927224B2
公开(公告)日：2018-03-27
申请号：US14988332
申请日：2016-01-05
Inventor： Jong-Ahn Kim , Jae-Wan Kim , Jae-Yong Lee , Jae-Heun Woo
CPC classification number: G01B11/06 , G01B9/02041 , G01B11/0675 , H04N5/2254 , H04N5/2256 , H04N7/18
Abstract: A thickness measuring apparatus and a thickness measuring method. The thickness measuring apparatus includes a light source outputting an extended monochromatic light with coherence; a collimating lens converting output light of the light source into incident beam of parallel ray; a beam splitter reflecting and providing the incident beam to a measurement target and transmitting first reflection light reflected on a top surface of the measurement target and second reflection light reflected on a bottom surface of the measurement target; an imaging lens disposed between the measurement target and the beam splitter with a predetermined focal distance to receive and provide the incident beam to a measurement position of the measurement target disposed on the focal distance; a camera photographing an interference fringe formed by the first and second reflection lights and outputting an interference fringe image; and a processing part.
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公开(公告)号：US20180016374A1
公开(公告)日：2018-01-18
申请号：US15650594
申请日：2017-07-14
Inventor： Dong-Joo Shin , Ki-Lyong Jeong
IPC: C08F214/26 , B29C53/76
Abstract: An integrating sphere includes twelve pentagonal spherical shells and twenty hexagonal spherical shells. The hexagonal spherical shell includes a first circular spherical shell having a first diameter and six first auxiliary spherical shells formed by cutting the first circular spherical shell. The pentagonal spherical shell includes a first circular spherical shell having the first diameter and five second auxiliary spherical shell formed by cutting a second circular spherical shell having a second diameter.
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公开(公告)号：US20180015543A1
公开(公告)日：2018-01-18
申请号：US15652839
申请日：2017-07-18
Inventor： Seung Wook BAEK , Seung Hoon NAHM , Un Bong BAEK
IPC: B22F3/15
CPC classification number: B22F3/15 , B22F2301/35 , B22F2998/10 , C22C1/05 , C22C1/10 , B22F9/082 , B22F9/14 , B22F9/16 , B22F9/04 , B22F3/02 , B22F3/10 , B22F3/17 , B22F3/20 , B22F3/18
Abstract: Provided is a metal powder bonded body having excellent hydrogen embrittlement resistance, wherein the metal powder bonded body is a metallic material having excellent hydrogen embrittlement resistance, the metallic material is a metal powder bonded body manufactured by bonding metal powder, and the metal powder bonded body has characteristics of ductile fracture in an area of 80% or more of a total area of a fracture section when fractured in a hydrogen atmosphere.
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299.发明申请公开(公告)号：US20180015540A1
公开(公告)日：2018-01-18
申请号：US15652884
申请日：2017-07-18
Inventor： Seung Wook BAEK , Seung Hoon NAHM , Un Bong BAEK
CPC classification number: B22F3/008 , B22F3/10 , B22F3/1055 , B22F2301/35 , B33Y80/00 , C22C1/045 , C22C1/0458 , C22C1/10 , C22C1/1084 , C22C33/02 , F17C1/00 , F17C1/14 , F17C2203/0617 , F17C2203/0636 , F17C2221/012 , F17C2223/0123 , F17C2223/035 , Y02P10/295
Abstract: Provided is a metal powder bonded body having excellent hydrogen embrittlement resistance, wherein the metal powder bonded body is a metallic material having excellent hydrogen embrittlement resistance, the metallic material is a metal powder bonded body manufactured by incrementally adding metal powder layer by layer, and the metal powder bonded body has characteristics of ductile fracture in an area of 80% or more of a total area of a fracture section when fractured in a hydrogen atmosphere.
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公开(公告)号：US09834855B2
公开(公告)日：2017-12-05
申请号：US15103368
申请日：2014-12-26
Inventor： Chanyong Hwang
CPC classification number: C30B1/08 , C01B32/186 , C01B32/194 , C01B2204/20 , C23C16/26 , C30B29/02
Abstract: The present invention provides a method for manufacturing a monocrystalline graphene layer, comprising the steps of: forming polycrystalline graphene on a substrate by using a hydrocarbon gas to grow a graphene layer aligned on a wafer-scale insulator substrate in one direction like a monocrystal; forming a catalyst on the polycrystalline graphene; and recrystallizing the polycrystalline graphene to monocrystalline graphene by heat-treating the polycrystalline graphene and the catalyst.
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