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    METHOD FOR PRODUCING OPTICAL FIBER PREFORM
    302.
    发明申请
    METHOD FOR PRODUCING OPTICAL FIBER PREFORM 审中-公开
    生产光纤预制件的方法

    公开(公告)号：US20120198892A1

    公开(公告)日：2012-08-09

    申请号：US13363748

    申请日：2012-02-01

    Applicant: Yoshiaki TAMURA ,  Masaaki Hirano ,  Tetsuya Haruna

    Inventor： Yoshiaki TAMURA ,  Masaaki Hirano ,  Tetsuya Haruna

    IPC: C03B37/012

    CPC classification number: C03B37/01861 ,  C03B37/01228 ,  C03B37/01869 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/20 ,  C03B2201/50

    Abstract: A method for producing an optical fiber preform according to the present invention includes an etching step of heating a silica-based glass tube using a heat source continuously traversed in the longitudinal direction of the glass tube to etch the inner surface portion of the glass tube containing impurities while an etching gas is allowed to flow into the glass tube. The glass tube has a maximum alkali metal concentration of 500 to 20,000 atomic ppm, a maximum chlorine concentration of 0 to 1000 atomic ppm, and a maximum fluorine concentration of 0 to 10,000 atomic ppm. In the etching step, the maximum temperature of the outer surface of the glass tube is in the range of 1900° C. to 2250° C., and the heating time is set to a time equal to or less than a time (min) given by ( 7 - alkai   metal   concentration   ppm 5000 ) .

    Abstract translation: 根据本发明的光纤预制棒的制造方法包括：蚀刻步骤，使用在玻璃管的纵向连续穿过的热源来加热二氧化硅基玻璃管，以蚀刻含有玻璃管的玻璃管的内表面部分 允许蚀刻气体流入玻璃管中的杂质。 玻璃管的碱金属浓度最高为500〜20,000原子ppm，最大氯浓度为0〜1000原子ppm，最大氟浓度为0〜10,000原子ppm。 在蚀刻步骤中，玻璃管的外表面的最高温度在1900℃至2250℃的范围内，加热时间设定为等于或小于时间（分钟）的时间， 由（7-烷烃金属浓度ppm ppm 5000）给出。

    TiO2-containing silica glass for optical member for EUV lithography
    303.
    发明授权
    TiO2-containing silica glass for optical member for EUV lithography 失效
    用于EUV光刻的光学元件的含TiO 2的二氧化硅玻璃

    公开(公告)号：US08039409B2

    公开(公告)日：2011-10-18

    申请号：US12904236

    申请日：2010-10-14

    Applicant: Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

    Inventor： Kenta Saitou ,  Akio Koike ,  Mitsuhiro Kawata

    IPC: C03C3/06 ,  C03C3/076

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

    Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3,000, of 70% or more.

    Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率，T400-3,000，70％以上。

    Method for manufacturing a lens of synthetic quartz glass with increased H2 content
    304.
    发明授权
    Method for manufacturing a lens of synthetic quartz glass with increased H2 content 有权
    制造具有增加的H2含量的合成石英玻璃透镜的方法

    公开(公告)号：US07934390B2

    公开(公告)日：2011-05-03

    申请号：US11748151

    申请日：2007-05-14

    Applicant: Eric Eva

    Inventor： Eric Eva

    IPC: C03C21/00 ,  C03C19/00

    CPC classification number: C03C3/06 ,  C03B23/0013 ,  C03B23/0026 ,  C03B32/00 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2203/54

    Abstract: The invention relates to a method for the manufacture of a lens of synthetic quartz glass with increased H2 content, in particular for a lens for an optical system with an operating wavelength of less than 250 nm, in particular less than 200 nm, with the steps: providing a precursor product of synthetic quartz glass, in particular with a first H2 content of less than 2·1015 molecules/cm3, with a circumferential border surface and two base surfaces lying on opposite sides, wherein at least one partial surface of at least one of said base surfaces has a curvature, and treating the precursor product in an H2-containing atmosphere in order to produce a precursor product of synthetic quartz glass with a second H2 content that is increased in relation to the first H2 content, in particular with a second H2 content of more than 1016 molecules/cm3, and measuring at least one optical property of said precursor product with said second H2 content.

    Abstract translation: 本发明涉及一种用于制造具有增加的H 2含量的合成石英玻璃透镜的方法，特别是用于具有小于250nm，特别是小于200nm的工作波长的光学系统的透镜，步骤 ：提供合成石英玻璃的前体产物，特别是具有小于2×1015分子/ cm 3的第一H 2含量，周边边界表面和位于相对侧上的两个基底表面，其中至少一个部分表面至少 所述基面之一具有曲率，并且在含H2气氛中处理前体产物，以便产生具有相对于第一H 2含量增加的第二H 2含量的合成石英玻璃的前体产物，特别是与 大于1016分子/ cm 3的第二H 2含量，并测量所述前体产物与所述第二H 2含量的至少一种光学性质。

    TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY
    305.
    发明申请
    TIO2-CONTAINING SILICA GLASS FOR OPTICAL MEMBER FOR EUV LITHOGRAPHY 失效
    用于EUV光刻的光学成员的含TIO2的二氧化硅玻璃

    公开(公告)号：US20110028299A1

    公开(公告)日：2011-02-03

    申请号：US12904236

    申请日：2010-10-14

    Applicant: Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

    Inventor： Kenta SAITOU ,  Akio Koike ,  Mitsuhiro Kawata

    IPC: C03C3/04

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/30 ,  C03B2201/42 ,  C03C3/076 ,  C03C4/0085 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/30 ,  C03C2201/42 ,  C03C2203/44 ,  C03C2203/52 ,  Y02P40/57

    Abstract: The present invention provides a TiO2-containing silica glass from which a transparent extremely low thermal expansion glass having excellent transparency and having a temperature region in which the coefficient of thermal expansion is substantially zero can be obtained. The present invention relates to a TiO2-containing silica glass for optical member for EUV lithography, having a TiO2 concentration of from 3 to 14% by mass; an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 700 nm, T400-700, of 97% or more; and an internal transmittance per 1-mm thickness in a wavelength region of from 400 to 3,000 nm, T400-3000, of 70% or more.

    Abstract translation: 本发明提供一种含TiO 2的二氧化硅玻璃，可以得到透明度极高的透明性高且热膨胀系数基本上为零的温度区域的玻璃。 本发明涉及TiO 2浓度为3〜14质量％的用于EUV光刻用的光学部件的含TiO 2的二氧化硅玻璃， 在400〜700nm波长范围内，每1mm厚的内透射率，T400-700，97％以上; 在400〜3000nm的波长范围内，每1mm厚的内透射率为T400〜3000，为70％以上。

    BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER
    310.
    发明申请
    BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER 审中-公开
    黑色合成石英玻璃与透明层

    公开(公告)号：US20090098370A1

    公开(公告)日：2009-04-16

    申请号：US12249616

    申请日：2008-10-10

    Applicant: Tatsuhiro Sato ,  Nobumasa Yoshida

    Inventor： Tatsuhiro Sato ,  Nobumasa Yoshida

    IPC: B32B17/06 ,  C03C15/00

    CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/20 ,  C03C4/02 ,  C03C4/082 ,  C03C23/008 ,  C03C2201/02 ,  C03C2201/26 ,  C03C2203/54 ,  Y10T428/261

    Abstract: To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.A porous silica glass body containing hydroxyl groups is subjected to a gas phase reaction in a volatile organosilicon compound atmosphere at a temperature between 100° C. and 1200° C. and, following the reaction, evacuation is commenced and, on reaching a degree of vacuum exceeding 10 mmHg (1343 Pa), heating is carried out at a temperature between 1200° C. and 2000° C. to produce a compact glass body.

    Abstract translation: 为了提供具有透明层的黑色合成石英玻璃，其在远红外区域具有高发射率，具有优异的遮光性能，在金属杂质方面保持与合成石英玻璃相同的纯度，具有高温粘度 与天然石英玻璃相当的特性，可进行焊接等高温加工，不会从表面释放碳; 以及其生产方法。 含有羟基的多孔二氧化硅玻璃体在100℃〜1200℃的温度下在挥发性有机硅化合物气氛中进行气相反应，反应开始后，达到一定程度的 真空度超过10mmHg（1343Pa），在1200℃〜2000℃的温度下进行加热，生成紧凑的玻璃体。

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