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    33.
    发明专利
    未知

    公开(公告)号：ES2092885T3

    公开(公告)日：1996-12-01

    申请号：ES94901946

    申请日：1993-12-02

    Applicant: BASF AG

    Inventor： BURKHART BERND ,  OFTRING ALFRED ,  SCHWENDEMANN VOLKER ,  SCHROEDER ULRICH ,  GLASER KLAUS

    IPC: C07C335/32 ,  C25D3/12 ,  C25D3/16

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

    34.
    发明专利
    未知

    公开(公告)号：DE4242194A1

    公开(公告)日：1994-06-16

    申请号：DE4242194

    申请日：1992-12-15

    Applicant: BASF AG

    Inventor： BURKHART BERND DR ,  OFTRING ALFRED DR ,  SCHWENDEMANN VOLKER DR ,  SCHROEDER ULRICH DR ,  GLASER KLAUS

    IPC: C07C335/32 ,  C25D3/12 ,  C25D3/16

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

    35.
    发明专利
    未知

    公开(公告)号：DE4211140A1

    公开(公告)日：1993-10-07

    申请号：DE4211140

    申请日：1992-04-03

    Applicant: BASF AG

    Inventor： BURKHART BERND DR ,  OFTRING ALFRED DR ,  SCHWENDEMANN VOLKER DR ,  GLASER KLAUS

    IPC: C07F9/54 ,  C25D3/12 ,  C25D3/14

    Abstract: Phosphonium salts of formula (I) in which: R to R are C1 to C18 alkyl which may be substituted by carboxyl groups or C1 to C4 alkoxycarbonyl groups or cyano groups, C2 to C12 alkenyl, C2 to C12 alkinyl, C5 to C8 cycloalkyl, C7 to C12 phenylalkyl, phenyl which may be substitued by one or two C1 to C4 alkyl radicals, C1 to C4 alkoxy radicals, halogen atoms, hydroxyl groups, phenyl radicals or C1 to C4 alkoxy carbonyl groups, or mono or di(C1 to C4 alkyl)amino; R and R are hydrogen or C1 to C4 alkyl; A is hydrogen or a group of the formula -OCO-H, -CO-R , -CO-OH, -CO-OR , -CO-CH2-CO-OR , -O-CO-H, O-CO-R , -OR , -SO2-R , -SO2-OH, -SO2-OR , -PO(OH)2, PO(OH)(OR ), -PO(OR )2, -OPO(OH)2, -OPO(OH)(OR ) or -OPO(OR )2; where R is C1 to C12 alkyl, C2 to C12 alkenyl, C2 to C12 alkinyl, C5 to C8 cycloalkyl, C7 to C12 phenylalkyl or phenyl which may be substituted by one or two C1 to C4 alkyl radicals, C1 to C4 alkoxy radicals, halogen atoms, hydroxyl groups, phenyl radicals or C1 to C4 alkoxy carbonyl groups; Y stands for the group -CH=CH- or -C=C-; m is a number from 0 to 10; n is a number from 1 to 4; p is 0 or 1; and q is a number from 0 to 10; and X- is an n-valent inorganic or organic anion improving water solubility. The phosphonium salts I are suitable as brighteners for aqueous-acid galvanic nickel baths.

    PHOSPHONIUM SALTS AND USE THEREOF AS BRIGHTENERS FOR AQUEOUS ACIDIC ELECTRONICKELIZATION BATHS
    36.
    发明专利
    PHOSPHONIUM SALTS AND USE THEREOF AS BRIGHTENERS FOR AQUEOUS ACIDIC ELECTRONICKELIZATION BATHS 未知

    公开(公告)号：CA2132304A1

    公开(公告)日：1993-10-04

    申请号：CA2132304

    申请日：1993-03-23

    Applicant: BASF AG

    Inventor： BURKHART BERND ,  OFTRING ALFRED ,  SCHWENDEMANN VOLKER ,  GLASER KLAUS

    IPC: C07F9/54 ,  C25D3/12 ,  C25D3/14

    Abstract: Phosphonium salts useful as brighteners for aqueous acidic electronickelization bath have the formula (I) where R1 to R3 are each C1-C18-alkyl, which may be carboxyl-, C1-C4-alkoxycarbonyl- or cyano-substituted, C2-C12-alkenyl, C2-C12-alkynyl, C5-C8-cycloalkyl, C7-C12-phenylalkyl, phenyl, which may be substituted by one or two substituents selected from the group consisting of C1-C4-alkyl, C1-C4-alkoxy, halogen, hydroxyl, phenyl and C1-C4-alkoxycarbonyl, or mono- or di(C1-C4-alkyl)-amino, R4 and R5 are each hydrogen or C1-C4-alkyl, A is hydrogen or a group of the formula -CO-H, -CO-R6, -CO-OH, -CO-OR 6, -CO-CH2-CO-OR6, -O-CO-H, -O-CO-R6, -OR6, -SO2-R6, -SO2-OH, -SO2-OR6, -PO(OH)2, -PO(OH)(OR6), -PO(OR6)2, -PO(OH)3, -OPO(OH)(OR6) or -OPO(OR6)2, where R6 is C1-C12-alkyl, C2-C12-alkenyl, C2-C12-alkynyl, C5 C8-cycloalkyl, C7-C12-phenylalkyl or phenyl, which may be substituted by one or two substituents selected from the group consisting of C1-C4-alkyl, C1-C4-alkoxy, halogen, hydroxyl, phenyl and C1-C4-alkoxycarbonyl, Y is -CH=CH- or -C=C-, m is from 0 to 10, n is from 1 to 4, p is 0 or 1, q is from 0 to 10, and xe is an n-valent inorganic or organic anion that promotes solubility in water.

    38.
    发明专利
    未知

    公开(公告)号：DE3806306A1

    公开(公告)日：1989-09-07

    申请号：DE3806306

    申请日：1988-02-27

    Applicant: BASF AG

    Inventor： OFTRING ALFRED DR ,  TSCHANG CHUNG-JI DR ,  WINKLER EKHARD DR ,  GOTSMANN GUENTHER DR ,  GLASER KLAUS

    IPC: C23C18/38 ,  C23C18/40 ,  H05K3/18

    Abstract: The invention relates to the use of polyacetals which are obtainable by reacting… a) dialdehydes of the formula… OHC-An-CHO… in which… A is -CH2-, -CH2-CH2-, -CH2-CH2-CH2-, … … n is 0 or 1, with… b) polycarboxylic acids containing at least 2 OH groups and having 4 to 7 C atoms in a molar ratio (a) : (b) of 1 : 0.5 to 1 : 3,… as complexing agents in baths for the chemical deposition of copper, and a process for the chemical deposition of copper.

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