1.
    发明专利
    未知

    公开(公告)号:DE4242194A1

    公开(公告)日:1994-06-16

    申请号:DE4242194

    申请日:1992-12-15

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

    3.
    发明专利
    未知

    公开(公告)号:DE4216314A1

    公开(公告)日:1993-11-18

    申请号:DE4216314

    申请日:1992-05-16

    Applicant: BASF AG

    Abstract: A process is disclosed for preparing N-allyl compounds having general formula (I), in which (II) stands for a N-containing aromatic heterocycle; R , R and R represent independently from each other hydrogen or C1-C4-alkyl; R stands for hydrogen or methyl; n equals 1, 2, 3 or 4 and X is an anion for rendering water-soluble. The process is characterized in that compounds having formula (II) are reacted in an aqueous medium with compounds having formula (III), in which A stands for a residue which can be split as an anion. These compounds are very suitable as brighteners for nickel-plating.

    Aryl-methylidene acyl-acetic or malonic ester prepn.

    公开(公告)号:DE4446347A1

    公开(公告)日:1996-06-27

    申请号:DE4446347

    申请日:1994-12-23

    Applicant: BASF AG

    Abstract: Prepn. of 2-(benzylidene or naphthylidene) acylacetic or malonic acid esters or amides of formula Ar-CH=C(COR )(COR ) (I) involves reacting an aromatic aldehyde of formula ArCHO (II) with an active methylene cpd. of formula CH2(COR )(COR ) (III). In the formulae, Ar = phenyl or naphthyl (both opt. substd. by 1-3 or 1-4C alkyl, 1-4C alkoxy and OH); R = 1-8C alkoxy, phenoxy, benzyloxy or -NR R ; R ,R = H or 1-6C alkyl; R = 1-4C alkyl, phenyl, benzyl or as R . The novelty is that the reaction mixt., at the end of the reaction, is washed with aq. alkali metal (hydrogen) sulphite soln. to remove residual, unconverted (II). Pref. the organic solvent in the organic phase obtd. after the (bi)sulphite wash is distilled off to give a technical prod. contg. (I). The use of this technical prod. as brightener is claimed. Preferably, Ar = phenyl (opt. substd. by 1 or 2 of Me, Et, OMe and OEt); R = 1-8C alkoxy; R = 1-4C alkyl or 1-6C alkoxy. Esp. Ar = Ph, R = OMe or OEt, and R = Me, OMe or OEt.

    7.
    发明专利
    未知

    公开(公告)号:DE4413251A1

    公开(公告)日:1995-10-19

    申请号:DE4413251

    申请日:1994-04-16

    Applicant: BASF AG

    Abstract: The production of shiny galvanised or zinc-alloy-coated mouldings by the electrolytic separation of zinc or a zinc alloy from aqueous-acid galvanic baths which contain as essential components one or more zinc salts and possibly salts of the other alloy metals, one or more conducting salts, one or more tensides and one or more gloss agents, in which the gloss agents used are compounds (I), in which R is C1 to C8 alkoxy, phenoxy, benzyloxy, amino, C1 to C6 alkyl amino or Di(C1 to C6) alkylamino, R is C1 to C4 alkyl, phenyl, benzyl or the substances under R , and Ar is phenyl or naphthyl which may additionally be substituted by one to three C1 to C4 alkyl groups or C1 to C4 alkoxy groups, and the auxiliary gloss agents are compounds of the general formula (II) H-(OA )m-S-(A O)n-H and/or (III) R -S-(A O)m-H, in which R is C1 to C24 alkyl, A and A are, mutually independently, an alkylene group or a mixture of alkylene groups with 2 or 3 C atoms and m and n are mutually independently an integer from 1 to 100.

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