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    2.
    发明专利
    未知

    公开(公告)号：DE4428597A1

    公开(公告)日：1996-02-15

    申请号：DE4428597

    申请日：1994-08-12

    Applicant: BASF AG

    Inventor： KRONER MATTHIAS DR ,  GEBHARDT NORBERT DR ,  SCHWENDEMANN VOLKER DR ,  SCHORNICK GUNNAR DR

    IPC: C02F5/12 ,  C08G73/10 ,  C11D3/37 ,  C08G73/14 ,  C08G69/10

    Abstract: Disclosed is a method for producing condensation polymers of aspartic acid by means of condensation polymerization of aspartic acid at temperatures of 140 DEG C in the presence of, relative to aspartic acid, from 1 to less than 5 mol % phosphorous acid or hypophosphorous acid catalyst, and the use of the resulting condensation polymers of aspartic acid as additives in washing and cleaning products, amounting to 0.1 to 10 wt % relative to the washing and cleaning products.

    4.
    发明专利
    未知

    公开(公告)号：DE4405621A1

    公开(公告)日：1995-08-24

    申请号：DE4405621

    申请日：1994-02-22

    Applicant: BASF AG

    Inventor： BOECKH DIETER DR ,  KISTENMACHER AXEL DR ,  DENZINGER WALTER ,  RAU IRIS DR ,  FUNHOFF ANGELIKA DR ,  BAUR RICHARD DR ,  SCHWENDEMANN VOLKER DR ,  KUD ALEXANDER DR

    IPC: C08F2/00 ,  C08F2/16 ,  C08F2/38 ,  C08F2/44 ,  C08F4/40 ,  C08F8/12 ,  C08F218/04 ,  C08F218/08 ,  C08F218/10 ,  C08F220/04 ,  C08F220/06 ,  C08F222/02 ,  C11D3/37

    Abstract: The invention relates to a process for preparing copolymers from vinyl esters and monoethylenically unsaturated carboxylic acids by the radical copolymerisation of: (a) 20 to 80 mol % vinyl esters of aliphatic monocarboxylic acids having at least two carbon atoms, (b) 80 to 20 mol % monoethylenically unsaturated carboxylic acids and, optionally, (c) 0 to 30 mol % of other monoethylenically unsaturated monomers which can be copolymerised, and/or (d) 0 to 10 mol % monomers containing at least two ethylenically unsaturated non-conjugated double bonds in the molecule, in the presence of at least one sulphur, phosphorus and/or nitrogen compound having a reducing effect and of 0.05 to 30 wt %, relative to the monomers, of at least one surfactant in an aqueous medium and in the presence of initiators and, optionally, regulators. The invention further relates to the use of the copolymers or the copolymers comprising vinyl alcohol units obtained therefrom by hydrolysis and/or oxidation, as additives for washing and cleaning agents.

    6.
    发明专利
    未知

    公开(公告)号：DE4307112A1

    公开(公告)日：1994-09-08

    申请号：DE4307112

    申请日：1993-03-06

    Applicant: BASF AG

    Inventor： FUNHOFF ANGELIKA DR ,  BOECKH DIETER DR ,  KRONER MATTHIAS DR ,  BAUR RICHARD DR ,  KUD ALEXANDER DR ,  SCHORNICK GUNNAR DR ,  SCHWENDEMANN VOLKER DR

    IPC: C02F5/10 ,  C08G2/14 ,  C08G2/18 ,  C08G2/30 ,  C09D17/00 ,  C09K8/528 ,  C09K23/52 ,  C11D3/00 ,  C11D3/37 ,  B01F17/52

    Abstract: The invention concerns polyacetal-block-containing polymers obtained by polymerizing, in the presence of initiators, carboxylic acid esters containing aldehyde groups and by reacting the polymers with at least bifunctional cross-linking agents, in the presence of acids or Lewis acids and optionally hydrolysing the ester groups thus incorporated in the polymer. The invention also concerns a method of producing polymers containing polyacetal blocks by polymerizing carboxylic acid esters containing aldehyde groups in the presence of initiators and reacting the polyacetals containing terminal hydroxy groups thus obtained with at least bifunctional cross-linking agents, in the presence of acids or Lewis acids, plus the use of the polymers thus obtained as additives in phosphate-free and phosphate-reduced washing and cleaning agents, as scale inhibitors and as dispersants for pigments.

    7.
    发明专利
    未知

    公开(公告)号：DE4242194A1

    公开(公告)日：1994-06-16

    申请号：DE4242194

    申请日：1992-12-15

    Applicant: BASF AG

    Inventor： BURKHART BERND DR ,  OFTRING ALFRED DR ,  SCHWENDEMANN VOLKER DR ,  SCHROEDER ULRICH DR ,  GLASER KLAUS

    IPC: C07C335/32 ,  C25D3/12 ,  C25D3/16

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

    8.
    发明专利
    未知

    公开(公告)号：DE4237337A1

    公开(公告)日：1994-05-11

    申请号：DE4237337

    申请日：1992-11-05

    Applicant: BASF AG

    Inventor： KRONER MATTHIAS DR ,  SCHORNICK GUNNAR DR ,  BAUR RICHARD DR ,  SCHWENDEMANN VOLKER DR ,  HARTMANN HEINRICH DR

    IPC: C08G65/34 ,  C08G81/00 ,  C08G81/02 ,  C08J3/24 ,  C09K23/52 ,  C11D3/37 ,  C11D1/76 ,  B01F17/52

    Abstract: There are described block copolyacetals obtainable by cationically initiated polyaddition of (A) polyacetals containing acetaldehyde acetal units and having at least 2 OH groups in the molecule and (B) polyacetals containing acetaldehyde acetal units and having at least 2 vinyl ether groups in the molecule. in a molar ratio of (A):(B) of from 2:1 to 1:2, processes for preparing the block copolyacetals by cationically initiated polyaddition of (A) and (B), and the use of the block polyacetals as additament to reduced-phosphate and phosphate-free detergents and cleaners and as low-foam surfactants in dishwashing compositions.

    10.
    发明专利
    未知

    公开(公告)号：DE4211140A1

    公开(公告)日：1993-10-07

    申请号：DE4211140

    申请日：1992-04-03

    Applicant: BASF AG

    Inventor： BURKHART BERND DR ,  OFTRING ALFRED DR ,  SCHWENDEMANN VOLKER DR ,  GLASER KLAUS

    IPC: C07F9/54 ,  C25D3/12 ,  C25D3/14

    Abstract: Phosphonium salts of formula (I) in which: R to R are C1 to C18 alkyl which may be substituted by carboxyl groups or C1 to C4 alkoxycarbonyl groups or cyano groups, C2 to C12 alkenyl, C2 to C12 alkinyl, C5 to C8 cycloalkyl, C7 to C12 phenylalkyl, phenyl which may be substitued by one or two C1 to C4 alkyl radicals, C1 to C4 alkoxy radicals, halogen atoms, hydroxyl groups, phenyl radicals or C1 to C4 alkoxy carbonyl groups, or mono or di(C1 to C4 alkyl)amino; R and R are hydrogen or C1 to C4 alkyl; A is hydrogen or a group of the formula -OCO-H, -CO-R , -CO-OH, -CO-OR , -CO-CH2-CO-OR , -O-CO-H, O-CO-R , -OR , -SO2-R , -SO2-OH, -SO2-OR , -PO(OH)2, PO(OH)(OR ), -PO(OR )2, -OPO(OH)2, -OPO(OH)(OR ) or -OPO(OR )2; where R is C1 to C12 alkyl, C2 to C12 alkenyl, C2 to C12 alkinyl, C5 to C8 cycloalkyl, C7 to C12 phenylalkyl or phenyl which may be substituted by one or two C1 to C4 alkyl radicals, C1 to C4 alkoxy radicals, halogen atoms, hydroxyl groups, phenyl radicals or C1 to C4 alkoxy carbonyl groups; Y stands for the group -CH=CH- or -C=C-; m is a number from 0 to 10; n is a number from 1 to 4; p is 0 or 1; and q is a number from 0 to 10; and X- is an n-valent inorganic or organic anion improving water solubility. The phosphonium salts I are suitable as brighteners for aqueous-acid galvanic nickel baths.

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