Process for the preparation of mixtures of low-foam non-ionic surfactants having acetal structure

    公开(公告)号:DE4338394A1

    公开(公告)日:1995-05-11

    申请号:DE4338394

    申请日:1993-11-10

    Applicant: BASF AG

    Abstract: Preparation of mixtures of low-foam non-ionic surfactants having acetal structure, containing A) 70 to 99% by weight of one or more asymmetrical acetals I where R is a C1- to C30-alkyl radical, a C3- to C30-alkenyl radical or a C7- to C30-aralkyl radical or -alkaryl radical, R is a C1- to C10-alkyl radical, A is a 1,2-alkylene group having 2 to 4 C atoms and x can assume values from 1 to 50, and B) 1 to 30% by weight of one or more symmetrical acetals II where the variables R , A and x have the abovementioned meanings, by reaction of alkoxylates III R -(OA)x-OH (III> with vinyl ethers IV H2C=CH-O-R (IV> in the presence of protic acids or Lewis acids as catalysts, by carrying out the reaction in the presence of one or more acetaldehyde dialkyl acetals V where R is a C1- to C10-alkyl radical and R and R can have the same or different meanings, in an amount from 0.1 to 20 mol of the compounds V per mole of III.

    5.
    发明专利
    未知

    公开(公告)号:DE4325237A1

    公开(公告)日:1995-02-02

    申请号:DE4325237

    申请日:1993-07-28

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP94/02195 Sec. 371 Date Jan. 29, 1996 Sec. 102(e) Date Jan. 29, 1996 PCT Filed Jul. 5, 1994 PCT Pub. No. WO95/04024 PCT Pub. Date Feb. 9, 1995Alkoxylation products are prepared by reacting compounds having active hydrogen atoms with C2-C4-alkylene oxides in the presence of a mixed hydroxide built up of polycations and modified with additives and having the general formula I or II[M(II)1-xM(III)x(OH)2]Ax/nxm L(I)[LiAl2(OH)6]A1/nxm L(II)where M(II) is at least one divalent metal ion, M(III) is at least one trivalent metal ion, A is at least one inorganic anion and L is an organic solvent or water, n is the valence of the inorganic anion A or in the case of a plurality of anions A is their mean valence and x can assume a value of from 0.1 to 0.5 and m can assume a value of from 0 to 10, as alkoxylation catalyst, wherein the mixed hydroxide contains additives.

    6.
    发明专利
    未知

    公开(公告)号:DE4216314A1

    公开(公告)日:1993-11-18

    申请号:DE4216314

    申请日:1992-05-16

    Applicant: BASF AG

    Abstract: A process is disclosed for preparing N-allyl compounds having general formula (I), in which (II) stands for a N-containing aromatic heterocycle; R , R and R represent independently from each other hydrogen or C1-C4-alkyl; R stands for hydrogen or methyl; n equals 1, 2, 3 or 4 and X is an anion for rendering water-soluble. The process is characterized in that compounds having formula (II) are reacted in an aqueous medium with compounds having formula (III), in which A stands for a residue which can be split as an anion. These compounds are very suitable as brighteners for nickel-plating.

    Easily prepared and separated catalyst giving pure alkoxylation product with narrow molecular weight distribution

    公开(公告)号:DE19632440A1

    公开(公告)日:1998-02-19

    申请号:DE19632440

    申请日:1996-08-12

    Applicant: BASF AG

    Abstract: - Mixed hydroxides of polycations, of formula (I) or (II), which are modified with various additives (III) and contain > 0 to 50 wt.% binder(s) (IV) based on aluminium and/or silicon compounds are claimed; in which M((I) = divalent metal ion(s); M(III) = trivalent metal ion(s); A = inorganic anion(s); L = an organic solvent or water; n = the valency of anion A or the average valency of several anions A; x = 0.1-0.5; m = 0-10. (III) are (a) (hetero)aromatic mono- or polycarboxylic acids or salts; (b) aliphatic mono- or polycarboxylic acids or salts with an isocyclic or heterocyclic ring in the side chain; (c) half esters of dicarboxylic acids or salts; (d) carboxylic anhydrides; (e) aliphatic or aromatic sulphonic acids or salts; (f) 8-18 carbon (C) alkyl sulphates; (g) long-chain paraffins; (h) polyether-(poly)ols; (j) alcohols or phenols; or (k) aliphatic 4-44 C dicarboxylic or aliphatic 7-34 C monocarboxylic acids. Also claimed are (a) a method for producing (I) and (II) modified with (III), in which these materials are moulded by consolidation; and (b) a method of preparing alkoxylation products (V) with improved filterability.

    10.
    发明专利
    未知

    公开(公告)号:DE4242194A1

    公开(公告)日:1994-06-16

    申请号:DE4242194

    申请日:1992-12-15

    Applicant: BASF AG

    Abstract: PCT No. PCT/EP93/03383 Sec. 371 Date Jun. 15, 1995 Sec. 102(e) Date Jun. 15, 1995 PCT Filed Dec. 2, 1993 PCT Pub. No. WO94/13862 PCT Pub. Date Jun. 23, 1994Nickel-plated shaped parts are produced by galvanic precipitation of nickel from aqueous-acid baths which contain as essential constituents one or several nickel salts, one or several inorganic acids and one or several brighteners. As brighteners are used thiourea salts having general formula (I), in which R1 to R4 stand for hydrogen, C1 to C18-alkyl, which may be substituted by carboxyl groups, C1 to C4-alkoxycarbonyl groups or cyano groups, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, C1 to C4-alkoxy residues, halogen atoms, hydroxyl groups, phenyl groups, phenyl residues or C1 to C4 alkoxycarbonyl groups; Y sands for a chemical bond or for linear or branched alkylene, alkenylene or alkinylene having each up to 20 C. atoms; A stands for hydrogen or a group having the formulae: -CO-H, -CO-R5, -CO-OH, -CO-OR5, -CO-NR6R7, -CO-CH2-CO-OR5, -O-CO-H, -O-CO-R5, -NR6-CO-R5, -NR6-CO-R5, -OR5, -SO2-R5, -SO2-OH, -SO2-OR5, -PO(PH)2, -PO(OH)(OR5), -PO(OR5)2, OPO(OH)2, -OPO(PH)(PR5) or -OPO(OR5)2 in which R5 stands for C1 to C12-alkyl, C2 to C12-alkenyl, C2 to C12-alkinyl, C5 to C8-cycloalkyl, C7 to C12-phenylalkyl or phenyl, which may be substituted by one or two C1 to C4-alkyl residues, halogen atoms, hydroxyl groups, phenyl residues or C1 to C4-alkoxycarbonyl groups; and R6 and R7 stand for hydrogen or C1 to C4-alkyl; n is a number from 1 to 4 and X(-) stands for s water solubility-promoting, n-valent inorganic or organic anion.

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