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公开(公告)号：DE69322345D1
公开(公告)日：1999-01-14
申请号：DE69322345
申请日：1993-09-13
Applicant: CANON KK
Inventor： AMEMIYA MITSUAKI , FUKUDA YASUAKI , WATANABE YUTAKA , MIYAKE AKIRA
Abstract: An exposure method using X-rays from synchrotron radiation source including determining a relationship between an X-ray intensity distribution and exposure amount distribution in an exposure area; and effecting exposure operation while controlling a dose amount for respective positions in the exposure area using the relationship, wherein the dose amount is controlled by changing a driving profile of a movable shutter (7) for controlling the exposure operation, and wherein the relationship is in the form of a proportional coefficient between an X-ray intensity and the exposure amount as a function of position information in the exposure area.
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公开(公告)号：CA2077237C
公开(公告)日：1998-08-18
申请号：CA2077237
申请日：1992-08-31
Applicant: CANON KK
Inventor： MORI MAKIKO , OZAWA KUNITAKA , AMEMIYA MITSUAKI
IPC: G03F7/20 , H01L21/027
Abstract: In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR light reflected by an X-ray reflecting mirror, a first shutter device for shielding at least .gamma. rays and a second shutter device for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device for adjusting the amount of exposure when a circuit pattern on a mask is transferred to a wafer is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays, generated from the SOR ring when electrons are implanted thereto or when the SOR ring is stopped. Damage to the X-ray reflecting mirror caused by radiation rays is reduced, and stable reflectance of the mirror can be obtained. Maintenance of the SOR exposure system is also made easier.
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公开(公告)号：DE69223202D1
公开(公告)日：1998-01-02
申请号：DE69223202
申请日：1992-08-28
Applicant: CANON KK
Inventor： MORI MAKIKO , OZAWA KUNITAKA , AMEMIYA MITSUAKI
IPC: G03F7/20 , H01L21/027
Abstract: In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR light (4) reflected by an X-ray reflecting mirror (9A,9B), a first shutter device (5A,5B) for shielding at least gamma rays and a second shutter device (8A,8B) for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device (11A,11B) for adjusting the amount of exposure when a circuit pattern on a mask (12A,12B) is transferred to a wafer (13A,13B) is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays, generated from the SOR ring when electrons are injected or when the SOR ring is stopped. Damage to the X-ray reflecting mirror caused by radiation rays is reduced, and stable reflectance of the mirror can be obtained. Maintenance of the SOR exposure system is also made easier.
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Patent Agency Ranking
公开(公告)号：DE69126378D1
公开(公告)日：1997-07-10
申请号：DE69126378
申请日：1991-07-31
Applicant: CANON KK
Inventor： AMEMIYA MITSUAKI , MIYAKE AKIRA
Abstract: Disclosed is a device for determining an angle of incident light or a shift in incident light based on the output value of a detector. In a predetermined angle detection range, a beam of light incident on a detector for detecting the intensity of light incident thereon is restricted such that the amount of light continuously increases or decreases in accordance with the angle between an optical axis of the incident light and a referential axis of an exposure apparatus. Outside of the predetermined angle detection range, the amount of light is restricted depending on the direction in which the optical axis of the light is shifted from the angle detection range. The amount of light incident on the detector continuously increases or decreases in accordance with the angle between the optical axis of the incident light and the referential axis when the light is made incident within the angle detection range by means of the light restriction means. It is therefore possible to determine the angle of the incident light from the output value of the detector. When the light is made incident outside of the angle detection range, and since the amount of incident light is restricted in accordance with the direction in which the light is shifted, it is possible to determine the direction in which the light is shifted.
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公开(公告)号：DE68926873T2
公开(公告)日：1996-12-12
申请号：DE68926873
申请日：1989-10-04
Applicant: CANON KK
Inventor： TANAKA YUTAKA , MIZUSAWA NOBUTOSHI , AMEMIYA MITSUAKI , KARIYA TAKAO , SHIMODA ISAMU
IPC: G21K5/00 , G03F7/20 , H01L21/027 , H01L21/30
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公开(公告)号：DE69115756T2
公开(公告)日：1996-05-15
申请号：DE69115756
申请日：1991-05-17
Applicant: CANON KK
Inventor： HARA SHINICHI , AMEMIYA MITSUAKI , UZAWA SHUNICHI
IPC: G03F1/22 , G03F7/20 , H01L21/027 , H01L21/30 , G03F1/14
Abstract: An X-ray exposure apparatus using radiation light as exposure light is disclosed, wherein the apparatus includes: a display device; a detecting device for detecting in each exposure the amount of exposure as absorbed by a mask during the exposure; a memory for memorizing an accumulated dose of the mask; and a controller for causing the display device to display a dose of the mask, wherein the does to be displayed corresponds to the sum of the accumulated dose as memorized in the memory and the amount of exposure as detected by the detecting device. Also disclosed is a mask structure suitably usable in such an exposure apparatus.
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公开(公告)号：DE69115156T2
公开(公告)日：1996-05-15
申请号：DE69115156
申请日：1991-07-31
Applicant: CANON KK
Inventor： WATANABE YUTAKA WATANABE YUTAK , UZAWA SHUNICHI , FUKUDA YASUAKI , MIZUSAWA NOBUTOSHI , EBINUMA RYUICHI , AMEMIYA MITSUAKI
Abstract: An X-ray transmitting window for use in X-ray lithography, for allowing transmission therethrough of X-rays from a vacuum ambience to a different ambience, is disclosed. The window includes an X-ray transmitting film; and a gasket material gas-tightly provided on at least one of opposite surfaces in a peripheral portion of the X-ray transmitting film, the gasket material having a Brinell hardness smaller than that of the X-ray transmitting film. The formed X-ray transmitting window is able to be sandwiched and fastened between a pair of flanges gas-tightly.
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公开(公告)号：CA2077237A1
公开(公告)日：1993-03-04
申请号：CA2077237
申请日：1992-08-31
Applicant: CANON KK
Inventor： MORI MAKIKO , OZAWA KUNITAKA , AMEMIYA MITSUAKI
IPC: G03F7/20 , H01L21/027 , G03F7/207
Abstract: In an SOR exposure system for transferring patterns on masks to semiconductor wafers by using SOR light (4) reflected by an X-ray reflecting mirror (9A,9B), a first shutter device (5A,5B) for shielding at least gamma rays and a second shutter device (8A,8B) for shielding X-rays are provided between the SOR ring and the mirror inside a beam port, and an exposure adjustment device (11A,11B) for adjusting the amount of exposure when a circuit pattern on a mask (12A,12B) is transferred to a wafer (13A,13B) is provided between the mirror and the wafer. As a result, the human body can be protected against radiation rays, such as gamma rays, generated from the SOR ring when electrons are injected or when the SOR ring is stopped. Damage to the X-ray reflecting mirror caused by radiation rays is reduced, and stable reflectance of the mirror can be obtained. Maintenance of the SOR exposure system is also made easier.
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