公开(公告)号：JPS63311315A

公开(公告)日：1988-12-20

申请号：JP14861687

申请日：1987-06-15

Applicant: CANON KK

Inventor： SUZUKI MASAYUKI ,  MOCHIZUKI NORITAKA ,  WATANABE YUTAKA ,  OGURA SHIGETARO ,  KARIYA TAKUO ,  FUKUDA YOSHIAKI ,  KAWAI YASUO ,  MINAMI SETSUO

IPC: G01N23/00 ,  G02B17/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027

Abstract: PURPOSE:To execute the image formation of an efficient object image by constituting the titled converter so that a light beam of an X-ray area, which has illuminated an object passes through an entrance pupil of an optical means, namely, the vicinity of a front focal position, made incident roughly vertically on the prescribed surface through a part of one side with regard to an optical axis, and forms the object image on the prescribed surface. CONSTITUTION:X rays which have been emitted from an X-ray source irradiate a mask MS, and a circuit pattern of the mask MS is brought to an image formation in a prescribed area on a wafer WF through a reducing projection optical system consisting of a light guiding member 3, a reflecting mirror M0, and reflecting mirrors M1, M2 and M3. That is, information related to the circuit pattern of the mask MS is transferred onto the wafer WF in a shape of an intensity distribution of X rays, and a latent image of the circuit pattern is formed on an X-ray use photosensitive body which is applied onto the wafer WF. As for the X rays to be used, those of an arbitrary wavelength area can be applied to match a characteristic of the photosensitive body and the projection optical system. Also, an exhaust of the inside of the device is executed by an exhaust means such as a vacuum pump, etc., and an exposure is executed in a vacuum state of about 10 Torr. In such a way, most of light beams are made incident vertically on the prescribed surface, therefore, an image information of an efficient object image is obtained.

公开(公告)号：JPS61294442A

公开(公告)日：1986-12-25

申请号：JP13594385

申请日：1985-06-24

Applicant: CANON KK

Inventor： KARIYA TAKUO

IPC: H01L21/30 ,  G03F1/00 ,  G03F1/66 ,  G03F7/20 ,  H01L21/027

Abstract: PURPOSE:To assure stable operation and inexpensive manufacture by impressing an attenuating alternating voltage to a solenoid coil and demagnetizing the 1st and 2nd residual magnetism thereby detaching a mask from a holder body. CONSTITUTION:The solenoid coil 3 is energized via lead wires 6 to excite a yoke 2 and a mask frame 5 when or while the frame 5 is brought near to the yoke 2. The magnetism remains in the frame 5 and the yoke 2 and forms a closed magnetic path consisting of the yoke 2 and the frame 5 after the end of excitation and therefore the magnetic attraction of the frame 5 is continued. The attenuating alternating voltage is impressed to the coil 3 to de-energize the coil and to erase the residual magnetism of the yoke 2 and the frame 5 to detach the frame 5 from the yoke 2, then the frame 5 is detached from the yoke 2. The attenuating alternating voltage for the demagnetization is automatically obtd. by application of the AC voltage by using a posister or the like. the holder is thereby stably operated to surely hold the mask.

公开(公告)号：JPS61192435A

公开(公告)日：1986-08-27

申请号：JP3349785

申请日：1985-02-21

Applicant: CANON KK

Inventor： KARIYA TAKUO

IPC: H01L21/683 ,  B23Q3/15 ,  H01J37/20 ,  H01L21/67

Abstract: PURPOSE:To shorten the time necessary for adsorbing and releasing a held article by installing a photo-conductive film which possesses the photo- conductiveness onto the surface of an insulating material and installing an optical source which lights up the photo-conductive film. CONSTITUTION:An electric-conductive sample 5 is installed onto a photo- conductive layer 6 having a thickness of 1mum-100mum, and a voltage is applied onto electrodes 2 and 3 in the state where the illuminating apparatus 7 such as incandescent lamp is put out, by an electric power source apparatus. Then, an insulating layer 4 and the photo-conductive film 6 are polarized, and the sample 5 is adsorbed onto the photo-conductive film 6. When the illuminating apparatus 7 is turned On in this state, the photo-conductive film 6 is put into conductive state, and the sample 5 can be released even if the part between the electrodes 2 and 3 is applied with a voltage and the insulating layer 4 is in polarized state. When the illuminating apparatus 7 is put out in this state, the sample 5 can be adsorbed.

公开(公告)号：JPS60202935A

公开(公告)日：1985-10-14

申请号：JP5835784

申请日：1984-03-28

Applicant: CANON KK

Inventor： KARIYA TAKUO ,  IWAMOTO KAZUNORI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To unnecessitate the use of a pure water making device, to simplify even a countermeasure against insulation and to improve heat shielding efficiency by combining a deflection electrode with a heat shielding plate, bringing the deflection electrode to grounding potential and applying positive high voltage to a target. CONSTITUTION:A heat shielding plate 4' combining a Wehnelt 1 and a deflection electrode is brought to grounding potential, and positive high voltage is applied to a target 3. A filament 2 is heated by a filament power supply 6 under the state to generate electron rays 7. Electron rays 7 are accelerated toward the target 3 while being focussed by the action of the Wehnelt 1, and an orbit thereof is bent by the deflection electrode 4' and electron rays are projected to the desired position of the target 3 to generate X-rays 8. Heat generated at the same time as X-rays 8 are generated is cooled by cooling pipes 9 disposed to the heat shielding plate 4' acting as the deflection electrode in combination.

公开(公告)号：JPS60201626A

公开(公告)日：1985-10-12

申请号：JP5721184

申请日：1984-03-27

Applicant: CANON KK

Inventor： KARIYA TAKUO ,  GOTOU SUSUMU ,  OKUNUKI MASAHIKO

IPC: G03F9/00 ,  H01J37/304 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To enable alignment of a mask which has a minute pattern of submicron region and a wafer in high precision by detecting the relative positioning error of the mask and the wafer scanning the mask or the wafer by a separate electro-optic electron beam respectively. CONSTITUTION:An electron beam 2 from an electron gun 1 is deflected by a deflecting electrode 5 through a condenser lens 3 and an objective lens 4 and scanning by the electron beam is carried out in cylinders A, B respectively. A reflected electron is generated from a reference mark 8a and the mark Ma of a mask M in the cylinder A and from a reference mark 8b and the mark Wb of a wafer W in the cylinder B. The reflected electron is detected by a detector 9a or 9b respectively. Consequently, the X direction positioning error of the mask M and the wafer W can be detected considering the reference distance between the reference marks 8a and 8b.

公开(公告)号：JPS60178112A

公开(公告)日：1985-09-12

申请号：JP6959584

申请日：1984-04-06

Applicant: CANON KK

Inventor： KARIYA TAKUO ,  KAWAI YASUO ,  OKUNUKI MASAHIKO ,  GOTOU SUSUMU

IPC: B65G47/82 ,  B65G25/06 ,  G03F7/20 ,  H01L21/027 ,  H01L21/67 ,  H01L21/677

Abstract: PURPOSE:To transfer stably a wafer without damaging the surface thereof in a wafer transferring device suited for a semiconductor manufacturing apparatus by providing a bed capable of locating and mounting the wafer on a slide portion slidable along a guide. CONSTITUTION:A wafer transferring device 32 for transferring wafer 12 from a cassette to a main chamber (both not shown) in a semiconductor manufacturing apparatus, particularly a X-ray transfer apparatus has a bed 33 for withdrawing from a cassette 13 the wafer 12 received in the cassette 13 and mounted on the upper surface of the bed. This bed 33 is attached to a slide 35 slidable horizontally along a guide 34 and driven by a drive unit 40. Also, the bed 33 is formed with a shoulder 41 abutting against a portion of the periphery of the wafer 12 so that the wafer 12 in the cassette 13 can be hooked and withdrawn by the shoulder 41. And the wafer 12 reaching above a wafer lifting device 36 is received and lifted by a support surface 37.

公开(公告)号：JPS6034018A

公开(公告)日：1985-02-21

申请号：JP14412683

申请日：1983-08-06

Applicant: CANON KK

Inventor： KAWAI YASUO ,  KARIYA TAKUO

IPC: G03F7/20 ,  G21K1/02 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To improve parallelism and permeability of soft X-ray flux and improve the performance of an exposing apparatus by a method wherein, when a semiconductor wafer, coated with a photoresist film, is irradiated by soft X-rays through a photomask, a soft X-ray collimating part made of glass is provided to an emission window of the soft X-rays. CONSTITUTION:A photomask chuck 17 which contains a wafer 18, coated with a photoresist film, and a chuck 19 holding the wafer is provided on a guide 20 moving at a constant speed and a photomask 16 with an IC pattern is put on the photomask chuck 17. A window 15 of a vacuum air-tight chamber 12 in which an electron gun 13 and a soft X-ray producing target 14 are contained is so provided as to face the mask 16. In this structure, a soft X-ray collimating part 7 made of glass is provided between the window 15 and the mask 16. The collimating part 7 is composed of countless fine piercing holes which have inside diameter (d) of an order of 10mum and a length (l) of an order of mm. and these holes are fixed vertically in a bundle by a glass holding frame 8.

公开(公告)号：JPH03293716A

公开(公告)日：1991-12-25

申请号：JP9493790

申请日：1990-04-12

Applicant: CANON KK

Inventor： FUJIOKA HIDEHIKO ,  MIYAJI GOJI ,  CHIBA YUJI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI ,  FUKUDA YOSHIAKI

IPC: G03F1/22 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To alleviate influence of a thermal stress with adhesive and a stress at the time of contraction and to form an X-ray mask for accurately forming parallel surfaces on a mask surface and a wafer by holding the mask between first and second bases having highly flattened surfaces, and adhering a mask board to a supporting frame while holding an interval between the bases at a predetermined value. CONSTITUTION:A mask board 2 having a surface formed with a mask pattern and including high flatness, and a supporting frame 1 for securing the board 2 through adhesive 6 are provided. The mask 2 is held between two bases 12 and 17 having highly flattened surfaces, and both are aligned before the adhesive 6 between the board 2 and the frame 1 is cured. The parallel interval of high accuracy is held until the adhesive 6 is cured in this state. Thus, an X-ray mask in which the mask surface opposed to the wafer and the mask chuck mounting surface of opposite side thereto are accurately disposed in parallel, is adhesively assembled.

公开(公告)号：JPH03273663A

公开(公告)日：1991-12-04

申请号：JP7188690

申请日：1990-03-23

Applicant: CANON KK

Inventor： MARUMO KOJI ,  IWAMOTO KAZUNORI ,  MIZUSAWA NOBUTOSHI ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: H01L21/673 ,  G03F7/20 ,  H01L21/027 ,  H01L21/677 ,  H01L21/683 ,  H01L21/687

Abstract: PURPOSE:To prevent the falling-off of a substrate at the time of service interruption and at the time of sensor trouble and the insufficient flatness of the substrate by providing a falling-off preventive means for obviating the falling-off of the substrate. CONSTITUTION:When a wafer 30 is extracted from a wafer carrier 20, the height of the wafer carrier 20 is adjusted so that a suction arm 13 is positioned on the side slightly lower than the wafer to be extracted 30. A wafer hand 10 is moved from the right direction to the left direction until a front end enters under the wafer 30 in the suction arm 13 under the state in which falling-off preventive arms 11, 12 are opened as shown in the figure. The suction arm 13 is elevated slightly and the wafer 30 is picked up from the wafer carrier 20, the wafer 30 is sucked and held under a vacuum, the wafer hand 10 is shifted in the right direction up to a position shown in A, and the falling-off preventive arms 11, 12 are closed.

公开(公告)号：JPH03234979A

公开(公告)日：1991-10-18

申请号：JP2849490

申请日：1990-02-09

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  OZAWA KUNITAKA ,  KARIYA TAKUO ,  UZAWA SHUNICHI

IPC: F16K3/18 ,  H01L21/027

Abstract: PURPOSE:To eliminate a generation of dust by providing a partition wall furnishing an opening, a valve main body moving along the partition wall and opening and closing the opening, a driving means, and a pressing means to squeeze the valve main body to the partition wall side and to allow to project to and retreat from the valve main body side. CONSTITUTION:When a pressured air is led in to a piping 37, a pressing rod 33 moves to the right against a spring 34 so as to occupy a position retreating from a side wall 41, and when the pressured air is led in to a piping 38, the rod 33 moves to the left to occupy a projecting position. When a wafer is processed in a precess chamber 11, a valve main body 14 is made in the closing position by a cylinder 15, and when a pressing cylinder 26 is driven to project the rod 33, the rod 33 is inserted to a recess 42 of the valve main body 14, to press and contact the valve main body 14 to the side wall 41 (partition wall), a seal member 20 seals an opening 13, and the chamber 11 and a prelimenary chamber 12 are partitioned airtight. When the opening 13 is opened, the rod 33 is moved to the retreating position by the cylinder 26, then the valve main body 14 is made in the opening position, and then, the rod 33 is projected to press the valve main body 14.