公开(公告)号：DE69123610T2

公开(公告)日：1997-04-24

申请号：DE69123610

申请日：1991-01-31

Applicant: CANON KK

Inventor： SHIMODA ISAMU ,  KARIYA TAKAO ,  MIZUSAWA NOBUTOSHI ,  OZAWA KUNITAKA ,  UZAWA SHUNICHI

IPC: G03F7/20

Abstract: A method of manufacture of semiconductor devices, includes exposing different portions of a semiconductor substrate (2) with a first exposure apparatus (100) having a first exposure range; placing and aligning the semiconductor substrate with respect to a second exposure range of a second exposure apparatus (200) which range is larger than the first exposure range of the first exposure apparatus; detecting an alignment error of each of the portions of the semiconductor substrate as covered by the second exposure range of the second exposure apparatus; calculating an overall alignment error of those portions of the semiconductor substrate with respect to the whole second exposure range of the second exposure apparatus, on the basis of the detected alignment errors; and controlling the exposure operation of the second exposure apparatus on the basis of the calculated overall alignment error.

公开(公告)号：DE3855482T2

公开(公告)日：1997-03-20

申请号：DE3855482

申请日：1988-02-04

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  SUZUKI AKIRA ,  SHIMODA ISAMU ,  KANEKO TETSUYA ,  TSUKAMOTO TAKEO ,  TAKEDA TOSHIHIKO ,  YONEHARA TAKAO ,  ICHIKAWA TAKESHI

IPC: H01J1/304 ,  H01J3/02 ,  H01J9/02 ,  H01J31/12 ,  H01J1/30

公开(公告)号：DE3855482D1

公开(公告)日：1996-09-26

申请号：DE3855482

申请日：1988-02-04

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  SUZUKI AKIRA ,  SHIMODA ISAMU ,  KANEKO TETSUYA ,  TSUKAMOTO TAKEO ,  TAKEDA TOSHIHIKO ,  YONEHARA TAKAO ,  ICHIKAWA TAKESHI

IPC: H01J1/304 ,  H01J3/02 ,  H01J9/02 ,  H01J31/12 ,  H01J1/30

公开(公告)号：DE68926873D1

公开(公告)日：1996-08-29

申请号：DE68926873

申请日：1989-10-04

Applicant: CANON KK

Inventor： TANAKA YUTAKA ,  MIZUSAWA NOBUTOSHI ,  AMEMIYA MITSUAKI ,  KARIYA TAKAO ,  SHIMODA ISAMU

IPC: G21K5/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE68922945D1

公开(公告)日：1995-07-13

申请号：DE68922945

申请日：1989-09-08

Applicant: CANON KK

Inventor： MIZUSAWA NOBUTOSHI ,  EBINUMA RYUICHI ,  KARIYA TAKAO ,  UZAWA SHUNICHI ,  SHIMODA ISAMU

IPC: G03F7/20

公开(公告)号：DE3784560D1

公开(公告)日：1993-04-15

申请号：DE3784560

申请日：1987-06-16

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  TSUKAMOTO TAKEO ,  SHIMIZU AKIRA ,  SUZUKI AKIRA ,  SUGATA MASAO ,  SHIMODA ISAMU

IPC: H01J37/073 ,  H01J1/316 ,  H01J3/02 ,  H01J37/06 ,  H01L21/027 ,  H01J1/30 ,  H01J37/317

公开(公告)号：AU8774991A

公开(公告)日：1992-01-09

申请号：AU8774991

申请日：1991-11-11

Applicant: CANON KK

Inventor： OKUNUKI MASAHIKO ,  SUZUKI AKIRA ,  SHIMODA ISAMU ,  KANEKO TETSUYA ,  TSUKAMOTO TAKEO ,  TAKEDA TOSHIHIKO ,  YONEHARA TAKAO ,  ICHIKAWA TAKESHI

IPC: H01J1/304 ,  H01J3/02 ,  H01J9/02 ,  H01J31/12 ,  H01J1/30 ,  H01L21/00 ,  H01L23/00

公开(公告)号：DE68929187D1

公开(公告)日：2000-04-27

申请号：DE68929187

申请日：1989-08-31

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  AMEMIYA MITSUAKI ,  TERASHIMA SHIGERU ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI ,  OZAWA KUNITAKA ,  HARA SHINICHI ,  KAWAKAMI EIGO ,  MIZUSAWA NOBUTOSHI ,  MORI MAKIKO ,  EBINUMA RYUICHI

IPC: G03F7/20

Abstract: An exposure apparatus usable with synchrotron radiation source (201) wherein the synchrotron radiation (202,204) is generated by electron injection (210) into a ring (201). The exposure apparatus is to transfer a semiconductor element pattern of a mask (208) onto a semiconductor wafer (209) by the synchrotron radiation. The apparatus includes a shutter (207) for controlling the exposure of the wafer (209). The shutter (207) controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined (206,211,216) in response to the electron injection (210), and thereafter, the illuminance distribution is corrected (216,215,213,207) in a predetermined manner. By this, the illuminance distribution data for controlling (213,215) the shutter (207) always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer (209) are exposed with high precision.

公开(公告)号：DE69228465T2

公开(公告)日：1999-08-05

申请号：DE69228465

申请日：1992-10-29

Applicant: CANON KK

Inventor： SHIMODA ISAMU

IPC: G06F3/00 ,  G06F3/01 ,  G09B21/00 ,  A61F9/08

Abstract: According to the invention, to make the reading operation of an eyesight handicapped person easy, the result of the image pickup of a camera unit to photoelectrically convert the character information is displayed by a pin pattern on a display. When the operator detects the character area from the display result, an area of an object for character recognition for the result of the image pickup is designated by an input unit and the execution of the character recognition is instructed. A processor recognizes the character with respect to the result of the image pickup of the designated area and displays the character so that it can be perceived in a tactile manner. Whether the result of the reading of the character is correct or not can be checked by a tactile perception. The recognition result of the character recognized can be generated by an audio output by an audio output unit.

公开(公告)号：DE3752249T2

公开(公告)日：1999-07-08

申请号：DE3752249

申请日：1987-07-03

Applicant: CANON KK

Inventor： TSUKAMOTO TAKEO ,  SHIMIZU AKIRA ,  SUZUKI AKIRA ,  SUGATA MASAO ,  SHIMODA ISAMU ,  OKUNUKI MASAHIKO

IPC: H01J1/14 ,  H01J1/316 ,  H01J9/04 ,  H01J1/30

Abstract: An electron emitting device for causing electron emission from a high resistance film by a current supply therein, wherein said high resistance film is composed of an agglomerate of fine metal particles having small gaps therebetween, characterized in that the size of said particles and the size of the gaps therebetween are relatively uniform.