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公开(公告)号：SG11201807161RA
公开(公告)日：2018-09-27
申请号：SG11201807161R
申请日：2017-02-17
Applicant: CANON KK
Inventor： MATSUOKA YOICHI , YAMAMOTO KIYOHITO , AZUMA HISANOBU , TERASHIMA SHIGERU , MAEDA TOSHIHIRO , YONEKAWA MASAMI , EMOTO KEIJI , NAKAGAWA KAZUKI
IPC: H01L21/027 , B29C33/72 , B29C59/02 , H01L21/304
Abstract: An imprint apparatus forms a pattern on a substrate (101) by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck (102) having a substrate holding region for holding the substrate, a peripheral member (113) arranged to 5 surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member (170) including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member 10 relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.
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公开(公告)号：DE69727112T2
公开(公告)日：2004-07-08
申请号：DE69727112
申请日：1997-10-23
Applicant: CANON KK
Inventor： TERASHIMA SHIGERU , MURAKI MASATO , OKUNUKI MASAHIKO , MIYAKE AKIRA , MATSUI SHIN
IPC: H01J37/317 , H01J37/30 , H01L21/30 , H01J37/302 , H01J37/304
Abstract: An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer (114) via a reduction electron optical system (108), irradiates collimated electron beams toward an aperture board (104) having an arcuated aperture (201) sandwiched between two arcs having, as the center, the axis of the reduction electron optical system (108), and exposes the wafer (114) with electron beams having an arcuated sectional shape that have been transmitted through the aperture (201).
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公开(公告)号：DE68929187T2
公开(公告)日：2000-09-28
申请号：DE68929187
申请日：1989-08-31
Applicant: CANON KK
Inventor： KUROSAWA HIROSHI , AMEMIYA MITSUAKI , TERASHIMA SHIGERU , UDA KOJI , SHIMODA ISAMU , UZAWA SHUNICHI , OZAWA KUNITAKA , HARA SHINICHI , KAWAKAMI EIGO , MIZUSAWA NOBUTOSHI , MORI MAKIKO , EBINUMA RYUICHI
IPC: G03F7/20
Abstract: An exposure apparatus usable with synchrotron radiation source (201) wherein the synchrotron radiation (202,204) is generated by electron injection (210) into a ring (201). The exposure apparatus is to transfer a semiconductor element pattern of a mask (208) onto a semiconductor wafer (209) by the synchrotron radiation. The apparatus includes a shutter (207) for controlling the exposure of the wafer (209). The shutter (207) controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined (206,211,216) in response to the electron injection (210), and thereafter, the illuminance distribution is corrected (216,215,213,207) in a predetermined manner. By this, the illuminance distribution data for controlling (213,215) the shutter (207) always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer (209) are exposed with high precision.
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公开(公告)号：DE68927430T2
公开(公告)日：1997-03-13
申请号：DE68927430
申请日：1989-08-31
Applicant: CANON KK
Inventor： KUROSAWA HIROSHI , AMEMIYA MITSUAKI , TERASHIMA SHIGERU , UDA KOJI , SHIMODA ISAMU , UZAWA SHUNICHI , OZAWA KUNITAKA , MORI MAKIKO , EBINUMA RYUICHI , HARA SHINICHI , MIZUSAWA NOBUTOSHI , KAWAKAMI EIGO
IPC: G03F7/20
Abstract: An exposure apparatus usable with synchrotron radiation source (201) wherein the synchrotron radiation (202,204) is generated by electron injection (210) into a ring (201). The exposure apparatus is to transfer a semiconductor element pattern of a mask (208) onto a semiconductor wafer (209) by the synchrotron radiation. The apparatus includes a shutter (207) for controlling the exposure of the wafer (209). The shutter (207) controls the exposure with the illuminance distribution on the wafer surface taken into account. The illuminance distribution is determined (206,211,216) in response to the electron injection (210), and thereafter, the illuminance distribution is corrected (216,215,213,207) in a predetermined manner. By this, the illuminance distribution data for controlling (213,215) the shutter (207) always correspond to the actual illuminance distribution. The entire shot areas of the semiconductor wafer (209) are exposed with high precision.
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公开(公告)号：EP1926128A4
公开(公告)日：2010-08-04
申请号：EP06797168
申请日：2006-08-31
Applicant: CANON KK
Inventor： GOMEI YOSHIO , TAKASE HIROMITSU , TERASHIMA SHIGERU
IPC: H01L21/027 , G03F7/20
CPC classification number: G03F7/70958 , G03F7/70916 , G03F7/70925 , G03F7/70933
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Patent Agency Ranking
公开(公告)号：DE69727112D1
公开(公告)日：2004-02-12
申请号：DE69727112
申请日：1997-10-23
Applicant: CANON KK
Inventor： TERASHIMA SHIGERU , MURAKI MASATO , OKUNUKI MASAHIKO , MIYAKE AKIRA , MATSUI SHIN
IPC: H01J37/317 , H01J37/30 , H01L21/30 , H01J37/302 , H01J37/304
Abstract: An electron beam exposure apparatus for projecting an image formed by electron beams onto a wafer (114) via a reduction electron optical system (108), irradiates collimated electron beams toward an aperture board (104) having an arcuated aperture (201) sandwiched between two arcs having, as the center, the axis of the reduction electron optical system (108), and exposes the wafer (114) with electron beams having an arcuated sectional shape that have been transmitted through the aperture (201).
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公开(公告)号：DE68929356T2
公开(公告)日：2002-05-23
申请号：DE68929356
申请日：1989-06-05
Applicant: CANON KK
Inventor： TERASHIMA SHIGERU , AMEMIYA MITSUAKI , SHIMODA ISAMU , UZAWA SHUNICHI , KARIYA TAKAO
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公开(公告)号：DE68929356D1
公开(公告)日：2002-01-24
申请号：DE68929356
申请日：1989-06-05
Applicant: CANON KK
Inventor： TERASHIMA SHIGERU , AMEMIYA MITSUAKI , SHIMODA ISAMU , UZAWA SHUNICHI , KARIYA TAKAO
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公开(公告)号：DE60331874D1
公开(公告)日：2010-05-12
申请号：DE60331874
申请日：2003-01-02
Applicant: CANON KK
Inventor： HASEGAWA NORIYASU , SAKAMOTO EIJI , TERASHIMA SHIGERU
IPC: G03F7/20
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公开(公告)号：AT462991T
公开(公告)日：2010-04-15
申请号：AT03250001
申请日：2003-01-02
Applicant: CANON KK
Inventor： HASEGAWA NORIYASU , SAKAMOTO EIJI , TERASHIMA SHIGERU
IPC: G03F7/20
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