公开(公告)号：GB2485941A

公开(公告)日：2012-05-30

申请号：GB201203971

申请日：2010-11-26

Applicant: IBM

Inventor： SANDERS DANIEL PAUL ,  CHENG JOY ,  HINSBERG WILLIAM ,  KIM HO-CHEOL ,  COLBURN MATTHEW ,  HARRER STEFAN ,  HOLMES STEVEN

IPC: G03F7/00

Abstract: A method of forming a layered structure comprising a self-assembled material comprises: disposing a non-crosslinking photoresist layer on a substrate; pattern-wise exposing the photoresist layer to first radiation; optionally heating the exposed photoresist layer; developing the exposed photoresist layer in a first development process with an aqueous alkaline developer, forming an initial patterned photoresist layer; treating the initial patterned photoresist layer photochemically, thermally and/or chemically, thereby forming a treated patterned photoresist layer comprising non-crosslinked treated photoresist disposed on a first substrate surface; casting a solution of an orientation control material in a first solvent on the treated patterned photoresist layer, and removing the first solvent, forming an orientation control layer; heating the orientation control layer to effectively bind a portion of the orientation control material to a second substrate surface; removing at least a portion of the treated photoresist and, optionally, any non-bound orientation control material in a second development process, thereby forming a pre-pattern for self-assembly; optionally heating the pre-pattern; casting a solution of a material capable of self-assembly dissolved in a second solvent on the pre-pattern and removing the second solvent; and allowing the casted material to self-assemble with optional heating and/or annealing, thereby forming the layered structure comprising the self-assembled material.

公开(公告)号：MX2012002864A

公开(公告)日：2012-04-20

申请号：MX2012002864

申请日：2011-04-28

Applicant: IBM

Inventor： SANDERS DANIEL PAUL ,  HEDRICK JAMES LUPTON ,  MANABU YASUMOTO ,  FUJIWARA MASAKI

IPC: C07D317/36 ,  C07D319/04 ,  C08G64/30

Abstract: Se describe un método en recipiente único para preparar compuestos de carbonilo cíclico que comprenden un grupo de pentafluorofenilcarbonato colgante activo. Los compuestos de carbonilo cíclico pueden ser polimerizados por métodos mediante abertura de anillo para formar polímeros ROP que comprendan unidades repetidas que comprenden un grupo pentafluorofenilcarbona to de cadena secundaria. Al usar un nucleófilo adecuado, el grupo de pentafluorofenilcarbonato colgante puede ser selectivamente transformado en una variedad de otros grupos funcionales antes o después de la polimerización mediante abertura de anillo.