公开(公告)号：JP2002082438A

公开(公告)日：2002-03-22

申请号：JP2000273962

申请日：2000-09-08

Applicant: JSR CORP

Inventor： MURATA KIYOSHI ,  YAMAMOTO MASASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08K5/00 ,  C08L45/00 ,  C08L101/08 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition having high transparency to radiation, excellent in basic physical properties as a resist, e.g. sensitivity, resolution and pattern shape, excellent also in shelf stability as a composition and retaining satisfactory adhesiveness to a substrate. SOLUTION: The radiation sensitive resin composition contains (A) a low molecular compound obtained by preparing a compound having one or more amino groups with at least one hydrogen atom bonding to a nitrogen atom and substituting a t-butoxycarbonyl group for one or more of such hydrogen atoms bonding to a nitrogen atom, (B) a radiation sensitive acid generating agent and (C) an alkali-insoluble or slightly alkali-soluble acid dissociable group- containing resin having an alicyclic structure in the principal chain and/or a side chain and a carboxylic acid anhydride structure in a side chain and convertible to an alkali-soluble resin when the acid dissociable group is dissociated.

公开(公告)号：JP2001235863A

公开(公告)日：2001-08-31

申请号：JP2000044784

申请日：2000-02-22

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F2/46 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including dry etching resistance, sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) an abietic acid derivative of formula 1 [where R1-R4 are each H, hydroxyl, a 1-4C linear or branched alkyl or a 1-4C linear or branched alkoxyl and R5 is H, an optionally substituted 1-20C alkyl or -CH2COO6 (R6 is a 1-18C alkyl)].

公开(公告)号：JP2001235862A

公开(公告)日：2001-08-31

申请号：JP2000044179

申请日：2000-02-22

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  C08F220/06 ,  C08F220/10 ,  C08F222/06 ,  C08F232/08 ,  C08K5/103 ,  C08L33/02 ,  C08L33/04 ,  C08L35/00 ,  C08L45/00 ,  G03F7/004 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent particularly in pattern shape as a chemical amplification type resist and excellent also in balance of characteristics including sensitivity and resolution. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin which is made alkali-soluble when the acid dissociable group is dissociated, (B) a radiation sensitive acid generating agent and (C) a compound of formula 1 [where Z is an n-valent hydrocarbon group having an alicyclic carbon ring in which the total number of ring forming carbon atoms is 4-20 or its derivative and (n) is an integer of 1-4].

公开(公告)号：JP2001215708A

公开(公告)日：2001-08-10

申请号：JP2000028442

申请日：2000-02-04

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MIYAMATSU TAKASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in basic physical resist properties such as sensitivity and resolution and showing only a small sensitivity change due to long-term storage. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a 3-30C alicyclic skeleton substituted by a group of formula 1 [where R1 is a group of formula 2 (where R2 and R3 are each a 1-4C alkyl or combine to each other to form a 3- to 8-membered cyclic structure) or formula 3 (where R4 is a 1-4C alkyl)] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JPH11242335A

公开(公告)日：1999-09-07

申请号：JP6038198

申请日：1998-02-26

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: G03F7/004 ,  C08F32/00 ,  C08L45/00 ,  C09D145/00 ,  G03F7/038 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin compsn. excellent particularly in preservable stability, transparency to radiation, resolution and dry etching resistance as a chemical amplification type resist and excellent also in sensitivity, developability and a pattern shape. SOLUTION: This radiation sensitive resin compsn. contains an alkali-insoluble or slightly alkali-soluble resin having repeating units represented by formula and a radiation sensitive acid generating agent. In the formula R -R are each independently H, 1-6C linear or branched alkyl or 5- to 8-membered cycloalkyl, R and R may bond to each other to form 5- to 8-membered cycloalkyl or R and R may bond to each other to form 5- to 8-membered cycloalkyl and (n) is an integer of 0-3.

公开(公告)号：JPH11223950A

公开(公告)日：1999-08-17

申请号：JP3794498

申请日：1998-02-05

Applicant: JSR CORP

Inventor： SUWA MITSUFUMI ,  IWAZAWA HARUO ,  YAMAMOTO MASASHI ,  KAJITA TORU

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition superior in transparency to radiation and resolution, and also the balance of characteristics including sensitivity and developability, and pattern forms, and dry etching resistance, and the like. SOLUTION: The radiation sensitive resin composition comprises (A) an alkali-insoluble or hardly soluble resin having, as acid dissociable groups, repeating units each represented by the formula and solubilizable in alkali, when these acid-dissociable groups and/or lactone rings in these groups are dissociated, and (B) a radiation-sensitive acid-generator. In the formula, each of R -R is, independently, an H atom or a 1-6C straight or branched alkyl or 5- to 8-membered cycloalkyl group and R and R , or R and R may combine with each other to form a 5- to 8-membered cycloalkyl group; and (n) is an integer of 1-4.

公开(公告)号：JP2010026352A

公开(公告)日：2010-02-04

申请号：JP2008189445

申请日：2008-07-23

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ISHIKAWA MASAYOSHI ,  HAYASHI AKIHIRO ,  KAJITA TORU

IPC: G03F7/004 ,  C08F2/48 ,  G02B3/00 ,  G02F1/1335 ,  G03F7/027 ,  G03F7/033 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is superior in various properties, including film thickness, resolution, pattern shape, transparency, heat resistance and solvent resistance, in particular, in the heat resistance, and which is able to form a microlens that is superior in balance of the various properties.
SOLUTION: The radiation-sensitive resin composition comprises: a polymerizable unsaturated compound having an acidic functional group; an alkali-soluble copolymer obtained by polymerizing a polymerizable unsaturated compound having an alicyclic hydrocarbon group and another polymerizable unsaturated compound; a polymerizable unsaturated compound; a photopolymerization initiator; and a compound represented by a specific chemical formula and having monovalent groups, each of which independently has a hydrogen atom or a (meth)acryloyl group.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射敏感性树脂组合物，其特征在于耐热性优异的各种性能，包括膜厚度，分辨率，图案形状，透明度，耐热性和耐溶剂性，并且其中 能够形成平衡各种性能优异的微透镜。 解决方案：辐射敏感性树脂组合物包含：具有酸性官能团的可聚合不饱和化合物; 通过聚合具有脂环烃基的可聚合不饱和化合物和另一种可聚合不饱和化合物获得的碱溶性共聚物; 可聚合不饱和化合物; 光聚合引发剂; 和具有特定化学式的具有一价基团的化合物，其各自独立地具有氢原子或（甲基）丙烯酰基。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009221270A

公开(公告)日：2009-10-01

申请号：JP2008064991

申请日：2008-03-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08L101/06 ,  C08F8/48 ,  C08F24/00 ,  C08G59/68 ,  C08L33/14 ,  C08L37/00 ,  C08L63/00 ,  G02B5/20 ,  G02F1/1333 ,  G02F1/1335

Abstract: PROBLEM TO BE SOLVED: To provide a thermosetting resin composition which can be forming a highly flat cured film on a substrate, even on a substrate with low surface flatness, and be suitably used for manufacturing a protective film of a color filter which is highly transparent and enables good patterning of a wiring electrode. SOLUTION: The thermosetting resin composition includes [A] a polymer having a bicyclo-orthoester structure and [B] a thermosensitive acid generator. The thermosetting resin composition optionally further includes [C] a copolymer of a polymerizable unsaturated compound comprising (c1) at least one chosen from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride and (c2) at least one chosen from the group consisting of a polymerizable unsaturated compound having an oxiranyl group and a polymerizable unsaturated compound having an oxetanyl group. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种在基板上即使在具有低表面平整度的基板上形成高度平坦的固化膜的热固性树脂组合物，并且适合用于制造滤色器的保护膜， 高透明度，能够良好地构成布线电极。 解决方案：热固性树脂组合物包括[A]具有双环原酸酯结构的聚合物和[B]热敏酸发生剂。 热固性树脂组合物任选地还包含[C]包含（c1）至少一种选自不饱和羧酸和不饱和羧酸酐的至少一种的可聚合不饱和化合物的共聚物和（c2）选自下组的至少一种： 由具有环氧乙烷基的可聚合不饱和化合物和具有氧杂环丁烷基的可聚合不饱和化合物组成。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2009221269A

公开(公告)日：2009-10-01

申请号：JP2008064988

申请日：2008-03-13

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： ICHINOHE DAIGO ,  KAJITA TORU

IPC: C08F290/14 ,  C08F8/30 ,  C08F220/06 ,  C08G59/17 ,  C08G59/34 ,  G02F1/1335 ,  G02F1/1339 ,  G03F7/027 ,  G03F7/033 ,  G03F7/40

Abstract: PROBLEM TO BE SOLVED: To provide a radiosensitive resin composition capable of manufacturing a spacer or a protective film for a liquid display element excellent in heat resistance, and to provide a radiosensitive resin composition capable of manufacturing a spacer excellent in various performances such as elastic recovery, rubbing resistance and adhesion property when used for manufacturing a spacer for a liquid display element. SOLUTION: The radiosensitive resin composition comprises [A] (a1) a polymer of an unsaturated compound comprising at least one chosen from the group consisting of an unsaturated carboxylic acid and an unsaturated carboxylic anhydride, [B] a calixarene compound having a particular structure and [C] a radiosensitive polymerization initiator. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 解决问题：提供能够制造耐热性优异的液晶显示元件的间隔物或保护膜的放射线敏感性树脂组合物，提供能够制造各种性能优异的间隔物的放射线敏感性树脂组合物， 当用于制造用于液体显示元件的间隔件时的弹性恢复，耐摩擦性和粘附性。 解决方案：放射敏感性树脂组合物包含[A]（a1）包含选自不饱和羧酸和不饱和羧酸酐的至少一种的不饱和化合物的聚合物，[B]具有 特定结构和[C]一种放射敏感聚合引发剂。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2008225162A

公开(公告)日：2008-09-25

申请号：JP2007064660

申请日：2007-03-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MITANI KOJI ,  IIJIMA TAKAHIRO ,  KAJITA TORU ,  HAMADA KENICHI ,  HANAMURA MASAAKI

IPC: G03F7/023 ,  C08F220/04 ,  C08F220/28 ,  G02B1/04 ,  G02B3/00 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having a sufficient process margin and good storage stability and giving a cured product having heat and solvent resistances, transparency and adhesion to a substrate required as an interlayer insulation film or a microlens. SOLUTION: The radiation-sensitive resin composition comprises: a copolymer of an unsaturated carboxylic acid and/or an unsaturated carboxylic acid anhydride, a (meth)acryloyloxyalkyloxetane and another olefinically unsaturated compound; a 1,2-quinonediazide compound; and an epoxy group-containing compound and/or another oxetanyl group-containing compound. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供具有足够的工艺余量和良好的储存稳定性的辐射敏感性树脂组合物，并提供具有耐热和耐溶剂性的固化产物，对作为层间绝缘膜所需的基材的透明性和粘附性 微透镜。 解决方案：辐射敏感性树脂组合物包括：不饱和羧酸和/或不饱和羧酸酐的共聚物，（甲基）丙烯酰氧基烷氧基乙烷和另一种烯属不饱和化合物; 1,2-醌二叠氮化合物; 和含环氧基的化合物和/或其它含氧杂环丁烷基的化合物。 版权所有（C）2008，JPO＆INPIT