公开(公告)号：EP1586570A4

公开(公告)日：2007-06-20

申请号：EP04701104

申请日：2004-01-09

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  NIWATA HIROKAZU ,  EBATA SATOSHI ,  WANG YONG

IPC: C07D333/46 ,  C07D333/72 ,  C07D333/78 ,  G03F7/004 ,  G03F7/039 ,  C08L33/06

CPC classification number: C07D333/72 ,  C07D333/46 ,  C07D333/78 ,  G03F7/0045 ,  G03F7/0392 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/111 ,  Y10S430/123

Abstract: Sulfonium salts which are excellent in transparency to rays having wavelengths of 220nm or below and can attain excellent performances in sensitivity, resolution, pattern shape, LER, storage stability, and so on when used as radiation-sensitive acid generator; and positive radiation-sensitive resin compositions containing the salts as the radiation-sensitive acid generator. The sulfonium salts are represented by the general formula (I): (I) [wherein R1 is halogeno, alkyl, alicyclic hydrocarbyl, alkoxyl, -OR3 (wherein R3 is alicyclic hydrocarbyl), or the like; R2 is (substituted) alkyl, or two or more R2s are united to form a ring structure; p is 0 to 7; q is 0 to 6; n is 0 to 3; and X- is a sulfonate anion]. The positive radiation-sensitive resin compositions comprise (A) radiation-sensitive acid generators consisting of the sulfonium salts and (B) resins having acid-dissociable groups.

公开(公告)号：EP1843387A4

公开(公告)日：2010-01-13

申请号：EP06712065

申请日：2006-01-20

Applicant: JSR CORP

Inventor： FURUKAWA TAIICHI ,  HIEDA KATSUHIKO ,  MIYAMATSU TAKASHI ,  WANG YONG ,  YAMADA KINJI

IPC: H01L21/027 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/70341

公开(公告)号：EP1748469A4

公开(公告)日：2012-04-04

申请号：EP05741390

申请日：2005-05-19

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  NEMOTO HIROAKI ,  WANG YONG

IPC: H01L21/027 ,  G03F7/20 ,  G03F7/38

CPC classification number: G03F7/2041

公开(公告)号：JP2007067011A

公开(公告)日：2007-03-15

申请号：JP2005248265

申请日：2005-08-29

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  O ISAMU

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a high refractive index liquid for liquid immersion exposure capable of forming a pattern having more excellent resolution by preventing elusion and dissolution of a photoresist film or its overlying film component and suppressing deterioration of a pattern shape and capable of being reused and purified, and to provide a liquid immersion exposure method employing the liquid. SOLUTION: The liquid contains a mixed liquid of 90 wt.% or more of endo-tetrahydrodicyclopentadiene and exo-tetradhydrodicyclopentadiene, and a value of [endo-tetrahydrodicyclopentadiene/exo-tetradhydrodicyclopentadiene] as a mixed weight ratio of the mixed liquid is [80/20 to 0.001/99.999]. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于液浸的高折射率液体，其能够通过防止光致抗蚀剂膜或其上覆膜成分的剥离和溶解而形成具有更好分辨率的图案，并抑制图案形状的劣化， 能够进行再利用和净化，并且提供使用液体的液浸曝光方法。 溶液：液体含有内含四氢二环戊二烯和外四氢二环戊二烯的90重量％以上的混合液，混合液的混合重量比为[内四氢二环戊二烯/外四氢二环戊二烯] [80/20至0.001 / 99.999]。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006210542A

公开(公告)日：2006-08-10

申请号：JP2005019103

申请日：2005-01-27

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  O ISAMU

IPC: H01L21/027

Abstract: PROBLEM TO BE SOLVED: To form a pattern exhibiting excellent refractive index and translucence in far ultraviolet region while suppressing variation in purity among production lots, and exhibiting excellent sensitivity, resolution and pattern profile when it is used as liquid immersion exposure liquid while suppressing variation in light exposure (reproducibility) among the lots. SOLUTION: The process for producing liquid immersion exposure liquid for use in a liquid immersion exposure device or method performing exposure through liquid filling a space between the lens of a projection optical system and a substrate comprises a step for containing a hydrocarbon compound becoming the material of the liquid immersion exposure liquid in a container, a step performing sulfuric acid treatment of the hydrocarbon compound, and a step performing distillation refining following to the sulfuric acid treatment step. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了形成在远紫外区域显示优异的折射率和半透明性的图案，同时抑制生产批次之间的纯度变化，并且当用作液浸曝光液体时表现出优异的灵敏度，分辨率和图案轮廓，同时 抑制批次之间的曝光（再现性）的变化。 解决方案：用于浸液曝光装置的液浸曝光液的制造方法或者是通过在投影光学系统的透镜与基板之间的空间填充的液体进行曝光的方法包括： 容器内的浸液曝光液体的材料，对烃化合物进行硫酸处理的工序，以及在硫酸处理工序之后进行蒸馏精炼的工序。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005029548A

公开(公告)日：2005-02-03

申请号：JP2003273778

申请日：2003-07-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  O ISAMU

IPC: G03F7/004 ,  C07C381/12 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a sulfonium compound that can be used as a radiation sensitive acid generator for the chemically amplified resist that can prevent the troubles on the standing wave effect, halation effect, swing curve and the like, even when used on the substrate of high radiation reflection coefficient; and provide a radiation-sensitive acid generator that comprises the sulfonium compound and provide a radiation-sensitive resin composition including the radiation-sensitive acid generator. SOLUTION: The sulfonium compound is represented by general formula (1) [wherein R 1 is a monovalent (substituted) aromatic hydrocarbon; R 2 and R 3 are each a (cyclo)alkyl, a (cyclo)alkoxy, an organic sulfanyl, an organic sulfonyl; p and q are each an integer of 0 to 6; X - is a monovalent organic acid anion or OH - ]. The radiation-sensitive acid generator comprises this sulfonium. The radiation-sensitive resin composition includes a resin bearing an acid-dissociating group, when it is a positive type in addition to the radiation-sensitive acid generator or includes an alkali soluble resin, when it is a negative type. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供可用作化学放大抗蚀剂的辐射敏感性酸发生剂的锍化合物，其可以防止驻波效应，晕影效应，挥发曲线等的麻烦，即使 在基板上使用高辐射反射系数; 并提供包含锍化合物的辐射敏感性酸产生剂，并提供包含辐射敏感性酸产生剂的辐射敏感性树脂组合物。 解决方案：锍化合物由通式（1）表示[其中R 1是一价（取代的）芳族烃; （环）烷基，（环）烷氧基，有机硫烷基，有机磺酰基; p和q各自为0〜6的整数; X - 是一价有机酸阴离子或OH - ]。 辐射敏感性酸产生剂包含该锍。 当辐射敏感性树脂组合物为负型时，除了辐射敏感性酸产生剂之外还包含具有酸解离基团的树脂，或者包含碱溶性树脂。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2003255538A

公开(公告)日：2003-09-10

申请号：JP2002056401

申请日：2002-03-01

Applicant: JSR CORP

Inventor： MIYAMATSU TAKASHI ,  ISHII HIROYUKI ,  NISHIMURA YUKIO ,  ISHIDA EIKO

IPC: G03F7/039 ,  C08F220/18 ,  C08F220/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lactone copolymer resin having high transparency to a radiation and suitable for use as the resin component of a chemically amplified resist capable of solving the problem of trade-off of resolution and exposure latitude and excellent also in dry etching resistance and pattern shape and to provide a radiation-sensitive resin composition comprising the lactone copolymer resin. SOLUTION: The lactone copolymer resin comprises a resin which has a repeating unit represented by formula (1) and at least one selected from a repeating unit represented by formula (2-1) and a repeating unit represented by formula (2-2) and becomes alkali-soluble under the action of an acid. The radiation-sensitive resin composition comprises the lactone copolymer resin and a radiation-sensitive acid generator. In the formulae, R 1 -R 3 are each H or methyl. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2001215708A

公开(公告)日：2001-08-10

申请号：JP2000028442

申请日：2000-02-04

Applicant: JSR CORP

Inventor： DOUKI KATSUJI ,  MIYAMATSU TAKASHI ,  SOYANO AKIMASA ,  KAJITA TORU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  G03F7/004

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in basic physical resist properties such as sensitivity and resolution and showing only a small sensitivity change due to long-term storage. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- insoluble or slightly alkali-soluble acid dissociable group-containing resin having a 3-30C alicyclic skeleton substituted by a group of formula 1 [where R1 is a group of formula 2 (where R2 and R3 are each a 1-4C alkyl or combine to each other to form a 3- to 8-membered cyclic structure) or formula 3 (where R4 is a 1-4C alkyl)] and convertible to an alkali-soluble resin when the acid dissociable group is dissociated and (B) a radiation sensitive acid generating agent.

公开(公告)号：JP2012222106A

公开(公告)日：2012-11-12

申请号：JP2011085408

申请日：2011-04-07

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KAWAGUCHI KAZUO ,  MIYAMATSU TAKASHI

IPC: H01L23/373 ,  C03C14/00

Abstract: PROBLEM TO BE SOLVED: To provide a heat transfer member excellent in heat resistance.SOLUTION: The heat transfer member comprises: a base material formed of at least a binder containing an amorphous material (A) having a low softening point; and thermally conductive particles (B) contained in the base material. Preferably, the binder does not substantially contain an organic polymer material.

Abstract translation: 要解决的问题：提供耐热性优异的传热构件。 传热构件包括：由至少含有软化点低的无定形材料（A）的粘合剂形成的基材; 和包含在基材中的导热颗粒（B）。 优选地，粘合剂基本上不含有机聚合物材料。 版权所有（C）2013，JPO＆INPIT

公开(公告)号：JP2011225814A

公开(公告)日：2011-11-10

申请号：JP2011006127

申请日：2011-01-14

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： MIYAMATSU TAKASHI ,  KAWAGUCHI KAZUO ,  GOTO HIROFUMI ,  OKUDA RYUICHI ,  TAKAMATSU NOBUHIRO ,  TAKAHASHI SEIICHIRO ,  HIRO AKIHITO ,  MORI TAKASHI ,  TAKAMURA HAZUKI

IPC: C09J181/06 ,  C09J7/02 ,  C09J11/00 ,  C09J201/00 ,  H01L21/301 ,  H01L21/304 ,  H01L21/3065

Abstract: PROBLEM TO BE SOLVED: To provide a composition for provisional fixation, capable of forming provisional fixation materials having retention retaining substrates in a process where the high temperature load is applied, and having easily peelable property in a process where the substrates are peeled from supports.SOLUTION: There is provided a composition for provisional fixation, comprising (A) a polyethersulfone, (B) a viscosity-imparting agent such as a phenoxy resin, a polymer having a phenolic hydroxy group, a polymer having a pyrrolidone group and a polyalkylene glycol, and (C) a solvent.

Abstract translation: 要解决的问题：提供一种用于临时固定的组合物，其能够在施加高温负荷的过程中形成具有保持保持基板的临时固定材料，并且在基板被剥离的过程中具有易剥离性 从支持。 提供了一种用于临时固定的组合物，其包含（A）聚醚砜，（B）粘度赋予剂，例如苯氧基树脂，具有酚羟基的聚合物，具有吡咯烷酮基的聚合物和 聚亚烷基二醇和（C）溶剂。 版权所有（C）2012，JPO＆INPIT