公开(公告)号：WO2012168225A1

公开(公告)日：2012-12-13

申请号：PCT/EP2012/060578

申请日：2012-06-05

Applicant: CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE - CNRS - ,  UNIVERSITE LYON 1 CLAUDE BERNARD ,  GIERAK, Jacques ,  ALLEMANDOU, Nicolas ,  HASSELBACH, Klaus ,  LEGGERI, Jean-Paul ,  DONNIER-VALENTIN, Guillaume ,  PURCELL, Stephen ,  GAVAND, Pauline

Inventor： GIERAK, Jacques ,  ALLEMANDOU, Nicolas ,  HASSELBACH, Klaus ,  LEGGERI, Jean-Paul ,  DONNIER-VALENTIN, Guillaume ,  PURCELL, Stephen ,  GAVAND, Pauline

IPC: H01J37/08 ,  H01J37/305

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

Abstract: A ion source comprises: - a chamber (45), - an injection to inject matter into the chamber, wherein said matter comprises at least a first species, a tip with an apex located in the chamber, wherein the apex has a surface made of a metallic second species, - a generator to generate ions of said species, - a regulation system adapted to set operative conditions of the chamber to alternatively generate ions from the gaseous first species, and ions from the non¬ gaseous metallic second species.

Abstract translation: 离子源包括： - 室（45）， - 注入以将物质注入到室中，其中所述物质包括至少第一种类，具有位于所述室中的顶点的尖端，其中所述顶点具有由 金属第二种类， - 产生所述物质的离子的发生器， - 调节系统，其适于设置所述室的操作条件以交替地从所述气态第一种类产生离子，以及来自所述非气态金属第二种的离子。

公开(公告)号：WO2010143268A1

公开(公告)日：2010-12-16

申请号：PCT/JP2009/060532

申请日：2009-06-09

Applicant: 三菱電機株式会社 ,  原田 久 ,  岩田 高明

Inventor： 原田　久 ,  岩田　高明

IPC: A61N5/10

CPC classification number: H01J3/22 ,  A61N5/1042 ,  A61N5/1043 ,  A61N5/1077 ,  A61N5/1078 ,  A61N2005/1087 ,  H01J3/26

Abstract: 　照射自由度が高く、正常組織への照射量を低減できる粒子線治療装置を得ることを目的とする。　供給された荷電粒子ビームB ec を治療計画に基づく３次元の照射形状に整形するよう走査出力する走査電磁石２と、走査電磁石２から走査出力された荷電粒子ビームB ec が走査電磁石２からアイソセンタＣまでに設定された複数の軌道７ａ，７ｂ，７ｃのうち、選択されたひとつの軌道を経てアイソセンタＣに到達するように荷電粒子ビームB ec の軌道を切り替える偏向電磁石４、５と、を備え、走査電磁石からアイソセンタまでの距離を長くとるようにした。

Abstract translation: 公开了一种具有高度的照射自由度并且能够减少给予正常组织的剂量的粒子束治疗装置。 粒子束治疗装置包括扫描电磁体（2），用于根据治疗计划将供给的带电粒子束Bec成形为三维照射形式，并输出用于扫描和偏转电磁体（4,5）的带电粒子束用于选择 从扫描电磁体（2）到等角点（C）确定的路径（7a，7b，7c）中的带电粒子束Be的路径，使得从用于扫描的扫描电磁体（2）输出的带电粒子束Bec到达 来自扫描电磁体（2）的等距中心（C）沿所选择的一个路径。 因此，从扫描电磁体（2）到等角点的距离很长。

公开(公告)号：EP2718956B1

公开(公告)日：2015-08-05

申请号：EP12725462.1

申请日：2012-06-05

Applicant: Centre National de la Recherche Scientifique (CNRS) ,  Université Claude Bernard Lyon 1

Inventor： GIERAK, Jacques ,  ALLEMANDOU, Nicolas ,  HASSELBACH, Klaus ,  LEGGERI, Jean-Paul ,  DONNIER-VALENTIN, Guillaume ,  PURCELL, Stephen ,  GAVAND, Pauline

IPC: H01J27/02 ,  H01J27/22 ,  H01J37/317 ,  H01J37/08

CPC classification number: H01J37/08 ,  H01J3/18 ,  H01J3/26 ,  H01J27/022 ,  H01J27/024 ,  H01J27/22 ,  H01J37/05 ,  H01J37/317 ,  H01J37/3174 ,  H01J2237/0807 ,  H01J2237/0815 ,  H01J2237/0827

公开(公告)号：EP2620951A4

公开(公告)日：2015-04-01

申请号：EP12797097

申请日：2012-05-25

Applicant: KUMAKHOV MURADIN ABUBEKIROVICH

Inventor： KUMAKHOV MURADIN ABUBEKIROVICH

IPC: G21K1/087 ,  H05H7/04

CPC classification number: H01J3/26 ,  G21K1/02 ,  G21K1/087 ,  H01J3/34 ,  H05H7/04 ,  H05H7/06 ,  H05H2007/046

Abstract: The inventions relate to a group that includes means for directing charged particles, enabling the acceleration and interaction thereof, and producing radiation caused by their movement, namely a method for changing the direction of an accelerated charged particle beam, a device for implementing said method, a source of undulator electromagnetic radiation, a linear and a circular charged particle accelerator, and a collider and means for producing a magnetic field created by a stream of accelerated charged particles. The method and the device for implementing same are based on the use of a curved channel (1) for transporting particles, which is made from a material that is able to be electrically charged, and the formation of the same kind of charge on the inside surface of the channel wall as that of the particles. The characterizing feature of these inventions is that they require the maintenance of a condition that relates the energy and the charge of the particles to the geometrical parameters of the channel, in particular the radius R of curvature of the longitudinal axis (14) thereof, and to the electrical strength of the wall material. The other devices in this group include a device for changing the direction of a beam, which defines the trajectory of the particles inside these devices to produce the required shape according to the function of the corresponding device and focuses the beam. The technical result is the possibility of rotating the beam through large angles without loss of intensity, significantly simplifying the design, and also reducing the mass and dimensions of all the devices, particularly by obviating the need for magnets and supply voltage and control voltage sources for such devices.

公开(公告)号：EP2572756A4

公开(公告)日：2014-03-05

申请号：EP10856162

申请日：2010-08-20

Applicant: MITSUBISHI ELECTRIC CORP

Inventor： KATAYOSE TADASHI

IPC: A61N5/10

CPC classification number: A61N5/1077 ,  A61N5/1043 ,  A61N2005/1087 ,  G21K5/02 ,  H01J3/26

公开(公告)号：EP2471086A2

公开(公告)日：2012-07-04

申请号：EP10812685.5

申请日：2010-08-28

Applicant: FEI Company

Inventor： MIRRO, Gene ,  KOOIJMAN, Cornelis, Sander ,  VOS, Hendrik Jan de ,  MILLER, Tom

IPC: H01J37/147 ,  H01J37/04

CPC classification number: H01J3/26 ,  H01J37/1472 ,  H01J37/1477 ,  H01J37/3026 ,  H01J2237/1504 ,  H01J2237/1518 ,  H01J2237/1526 ,  H01J2237/30416 ,  H01J2237/3045 ,  H01J2237/30461

Abstract: An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated.

公开(公告)号：KR1020120107939A

公开(公告)日：2012-10-04

申请号：KR1020127011610

申请日：2010-09-24

Applicant: 이온빔 어플리케이션스 에스.에이.

Inventor： 용건,이브

IPC: A61N5/01 ,  G21K1/093 ,  G21K5/04

CPC classification number: H01J3/26 ,  A61N5/01 ,  A61N5/10 ,  A61N5/1077 ,  A61N5/1081 ,  A61N2005/1087 ,  G21K1/093 ,  G21K5/04

Abstract: 본 발명은 방사선 치료에 사용되는 입자 치료 장치, 더욱 상세하게는 갠트리의 회전축에 수직한 입자빔을 전달하는 작은 등선량 중심 갠트리에 관한 것이다. 갠트리는 3개의 이중극 자석들을 포함한다. 마지막 이중극 자석의 각도는 90°보다 작으며 이러한 마지막 이중극 자석의 대부분의 바람직한 굽힘 각도는 60°이다.

公开(公告)号：US09443691B2

公开(公告)日：2016-09-13

申请号：US14144187

申请日：2013-12-30

Applicant: General Electric Company

Inventor： Vance Scott Robinson ,  Carey Shawn Rogers ,  Sergio Lemaitre ,  Mark Alan Frontera ,  Sergiy Zalyubovskiy ,  Xi Zhang

IPC: H01J35/06 ,  H01J29/48 ,  H01J29/04 ,  H01L23/367 ,  H01L23/373 ,  H01J3/26 ,  H01J29/00 ,  H01L33/44 ,  H01L33/64 ,  H01L23/31 ,  H01J1/14 ,  H01J1/15

CPC classification number: H01J29/484 ,  H01J1/14 ,  H01J1/15 ,  H01J3/26 ,  H01J29/006 ,  H01J29/04 ,  H01J29/485 ,  H01J35/06 ,  H01L23/3178 ,  H01L23/367 ,  H01L23/373 ,  H01L23/3736 ,  H01L23/3738 ,  H01L33/44 ,  H01L33/641 ,  H01L33/642 ,  H01L2924/0002 ,  Y10T428/24612 ,  Y10T428/24802 ,  Y10T428/24826 ,  Y10T428/24942 ,  Y10T428/2495 ,  H01L2924/00

Abstract: Embodiments of the disclosure relate to electron emitters for use in conjunction with X-ray emitting devices. In certain embodiments the emitter includes features that prevent, limit, or control deflection of the electron emitter at operating temperatures. In this manner, the electron emitter may be kept substantially flat or at a desired curvature during operation.

Abstract translation: 本公开的实施例涉及与X射线发射装置结合使用的电子发射器。 在某些实施例中，发射器包括防止，限制或控制电子发射器在工作温度下的偏转的特征。 以这种方式，电子发射器可以在操作期间保持基本上平坦或处于期望的曲率。

公开(公告)号：US09153404B2

公开(公告)日：2015-10-06

申请号：US13705084

申请日：2012-12-04

Applicant: Lawrence Livermore National Security, LLC

Inventor： Yu-Jiuan Chen

IPC: H01J3/26 ,  A61N5/10 ,  G21K1/087

CPC classification number: H01J3/26 ,  A61N5/1043 ,  A61N5/1077 ,  A61N2005/1087 ,  G21K1/087

Abstract: Devices and methods are provided to allow rapid deflection of a charged particle beam. The disclosed devices can, for example, be used as part of a hadron therapy system to allow scanning of a target area within a patient's body. The disclosed charged particle beam deflectors include a dielectric wall accelerator (DWA) with a hollow center and a dielectric wall that is substantially parallel to a z-axis that runs through the hollow center. The dielectric wall includes one or more deformed high gradient insulators (HGIs) that are configured to produce an electric field with an component in a direction perpendicular to the z-axis. A control component is also provided to establish the electric field component in the direction perpendicular to the z-axis and to control deflection of a charged particle beam in the direction perpendicular to the z-axis as the charged particle beam travels through the hollow center of the DWA.

Abstract translation: 提供了装置和方法以允许带电粒子束的快速偏转。 所公开的装置可以例如用作强子治疗系统的一部分，以允许扫描患者体内的目标区域。 所公开的带电粒子束偏转器包括具有中空中心的电介质壁加速器（DWA）和基本平行于穿过中空中心的z轴平行的电介质壁。 电介质壁包括一个或多个变形的高梯度绝缘体（HGI），其被配置为产生具有垂直于z轴的方向的分量的电场。 还提供控制组件以在垂直于z轴的方向上建立电场分量，并且当带电粒子束穿过中空中心时，控制带电粒子束在垂直于z轴的方向上的偏转 DWA。

公开(公告)号：US08921805B2

公开(公告)日：2014-12-30

申请号：US14218563

申请日：2014-03-18

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Josef Biberger ,  Ralph Pulwey ,  Andreas Adolf

IPC: H01J3/14 ,  H01J3/26 ,  H01J37/147 ,  H01J37/28 ,  H01J37/317

CPC classification number: H01J3/26 ,  H01J3/14 ,  H01J37/1477 ,  H01J37/28 ,  H01J37/317 ,  H01J2237/303 ,  H01J2237/31749

Abstract: An ion beam system comprises a voltage supply system 7 and at least one beam deflector 39 having at least one first deflection electrode 51a, 51b, 51c and plural second deflection electrodes 52a, 52b, 52c, wherein the voltage supply system is configured to supply different adjustable deflection voltages to the plural second deflection electrodes such that electric deflection fields between the plural second deflection electrodes and the opposite at least one first deflection electrode have a common orientation. The system has a high kinetic energy mode in which a distribution of the electric deflection field has a greater width, a low kinetic energy mode in which a distribution of the electric deflection field has a smaller width.

Abstract translation: 离子束系统包括电压供应系统7和至少一个具有至少一个第一偏转电极51a，51b，51c和多个第二偏转电极52a，52b，52c的光束偏转器39，其中电压供应系统被配置为提供不同的 可变偏转电压到多个第二偏转电极，使得多个第二偏转电极和相对的至少一个第一偏转电极之间的电偏转场具有共同的取向。 该系统具有高动能模式，其中电偏转场的分布具有较大的宽度，其中电偏转场的分布具有较小宽度的低动能模式。