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    31.
    发明专利
    未知

    公开(公告)号：DE69204271D1

    公开(公告)日：1995-09-28

    申请号：DE69204271

    申请日：1992-12-28

    Applicant: COMMISSARIAT ENERGIE ATOMIQUE

    Inventor： LEROUX THIERRY ,  PY CHRISTOPHE

    IPC: H01J1/304 ,  H01J3/02 ,  H01J3/18 ,  H01J3/30 ,  H01J1/30

    Abstract: System to control the form of a charged particle beam. The particle beam emanates from a source (58) of these particles. This source is associated with a collecting electrode which collects the particles. The system comprises at least one resistive zone (56) and at least two control electrodes (52, 54), this resistive zone and these control electrodes being arranged substantially at the same level as the source, these control electrodes being furthermore placed on either side of the resistive zone and intended for polarising the latter, the electrical resistance profile of the resistive zone being chosen so as to have the distribution of potential making it possible to obtain the desired form of the beam emanating from the source when the control electrodes are suitably polarised. Application to the focusing of a charged particle beam.

    33.
    发明专利
    未知

    公开(公告)号：NL8901075A

    公开(公告)日：1990-11-16

    申请号：NL8901075

    申请日：1989-04-28

    Applicant: PHILIPS NV

    IPC: H01J1/304 ,  H01J1/308 ,  H01J3/02 ,  H01J3/18 ,  H01J29/48 ,  H01J29/62 ,  H01J31/12

    Abstract: A planar electron-optical lens is obtained on a semiconductor cathode surface by providing an extra electrode (16) around the gate electrode (14). Dependent on the applied voltage, this configuration operates, for example, as a positive lens which supplies parallel beams without dispersion, suitable for thin, flat display devices. A large positioning tolerance is obtained due to the inherent magnification of the beam diameter in the semiconductor device, while a grid can be dispensed with.

    ELECTRON-BEAM DEVICE AND SEMICONDUCTOR DEVICE FOR USE IN SUCH AN ELECTRON-BEAM DEVICE
    35.
    发明专利
    ELECTRON-BEAM DEVICE AND SEMICONDUCTOR DEVICE FOR USE IN SUCH AN ELECTRON-BEAM DEVICE 未知

    公开(公告)号：CA1249012A

    公开(公告)日：1989-01-17

    申请号：CA495932

    申请日：1985-11-21

    Applicant: PHILIPS NV

    Inventor： HOEBERECHST ARTHUR M E ,  VAN GORKOM GERARDUS G P

    IPC: H01J29/04 ,  H01J1/308 ,  H01J3/02 ,  H01J3/18 ,  H01J29/48

    Abstract: 19 A device for recording or displaying images or for electron lithographic or electron microscopic uses, comprising in an evacuated envelope (1) a target (7) on which at least one electron beam (6) is focussed. This beam is generated by means of a semiconductor device (10) which comprises an electrically insulating layer (42) having an aperture (38) through which passes the beam. The layer carries at least four beam-forming electrodes (43 up to and including 50) which are situated at regular intervals around the aperture (38), each of which electrodes has such a potential that an n-pole field or a combination of n-pole fields is generated in which n is an even integer greater than or equal to 4 and smaller than or equal to 16. A suitable choice of the n-pole field will make it possible to impart substantially any desired shape to the beam (6) and thus the focus on the target.

    UNIPOTENTIAL LENS ASSEMBLY FOR CHARGED PARTICLE BEAM TUBES AND METHOD FOR APPLYING CORRECTION POTENTIALS THERETO
    38.
    发明专利
    UNIPOTENTIAL LENS ASSEMBLY FOR CHARGED PARTICLE BEAM TUBES AND METHOD FOR APPLYING CORRECTION POTENTIALS THERETO 未知

    公开(公告)号：CA1140197A

    公开(公告)日：1983-01-25

    申请号：CA365137

    申请日：1980-11-20

    Applicant: CONTROL DATA CORP

    Inventor： BONO DAVID C ,  FISHBEIN MARVIN ,  HARTE KENNETH J

    IPC: H01J3/18 ,  H01J37/12 ,  H01J37/305 ,  H01J37/317 ,  H01J29/62

    Abstract: A unipotential electrostatic lens and method of operation for charged particle beam tubes of the electron beam, compound fly's eye type having both coarse and fine deflection sections wherein the objective lens assembly may lack coaxial symmetry about the lens axis. The unipotential lens comprises an assembly of axially aligned electrostatic lens elements with each lens element having an array of micro lenslet apertures and with each set of axially aligned micro lenslet apertures forming a micro lenslet. Preferably, there are three such lens elements in the assembly with a high voltage excitation potential supplied to the center lens element. A dynamic focus correction potential derived from the deflection potentials applied to the tube is supplied to the entrance outer lens element closest to the electron gun of the beam tube. The remaining outer lens element is maintained at system ground reference potential. In preferred arrangements, a fixed offset potential is added to the high voltage excitation potential supplied to the center lens element and a compensating offset potential is supplied to the entrance outer lens element along with the dynamic focusing correction potential to thereby distribute and minimize the effect of deflection sweep and astigmatism errors which otherwise might be introduced by the uncompensated dynamic focus correction potential.

    MICRO DEFELCTOR SUB-ASSEMBLY FOR USE IN ELECTRON BEAM TUBES OF THE FLY'EYE TYPE
    40.
    发明专利
    MICRO DEFELCTOR SUB-ASSEMBLY FOR USE IN ELECTRON BEAM TUBES OF THE FLY'EYE TYPE 未知

    公开(公告)号：GB2091938A

    公开(公告)日：1982-08-04

    申请号：GB8203751

    申请日：1979-10-23

    Applicant: CONTROL DATA CORP

    IPC: H01J3/18 ,  H01J3/12 ,  H01J9/02 ,  H01J29/18 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J29/80 ,  H01J3/30

    Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential. The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.

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