公开(公告)号：KR1020130003055A

公开(公告)日：2013-01-09

申请号：KR1020110034687

申请日：2011-04-14

Applicant: 삼성전자주식회사

Inventor： 김진호 ,  안요한 ,  류주아 ,  김현준

IPC: G03F7/00 ,  G03F7/20 ,  G03F1/22

CPC classification number: G03F7/70741 ,  G03F1/22 ,  G03F1/64 ,  G03F7/2063 ,  G03F7/70033 ,  G03F7/70308

Abstract: PURPOSE: A reticle pod is provided to reduce process failure generated from using contaminated reticles. CONSTITUTION: A reticle pod comprises an inner pod and a Jacobus Johannes Pieter pod. The inner pod comprises a base plate and a cover unit(80). The reticle is mounted on the base plate. The cover unit covers the base plate. A plurality of respiration holes(86) is formed on the cover unit. The plurality of respiration holes is arranged to be faced with edge area deviating from the pattern formation area of the reticle. The Jacobus Johnnes Pieter pod packages the inner pod from outside. A particle filter(88) which covers the respiration holes is additionally included in the cover unit.

Abstract translation: 目的：提供光罩荚，以减少使用污染的掩模版产生的过程故障。 构成：光罩荚包括内荚和Jacobus Johannes Pieter荚。 内部容器包括底板和盖单元（80）。 标线安装在基板上。 盖单元覆盖基板。 多个呼吸孔（86）形成在盖单元上。 多个呼吸孔被布置为面对偏离掩模版的图案形成区域的边缘区域。 Jacobus Johnnes Pieter pod从外面包装内部吊舱。 覆盖单元中还包括覆盖呼吸孔的颗粒过滤器（88）。

公开(公告)号：KR1020110112074A

公开(公告)日：2011-10-12

申请号：KR1020100031477

申请日：2010-04-06

Applicant: 삼성전자주식회사

Inventor： 안요한 ,  김진호 ,  김범수

IPC: H01L21/22 ,  H01L21/205

CPC classification number: H01L21/67757 ,  C23C16/4401 ,  C23C16/54 ,  H01L21/67109 ,  H01L21/67201

Abstract: 본 발명은 기판 처리 장치 및 방법을 제공한다. 기판 처리 장치는 공정이 수행되는 공간을 제공하는 처리실의 하부에 배치되는 로드락 챔버를 포함한다. 기판을 지지하는 보트가 로드락 챔버 내에 위치하는 동안, 냉각부재는 로드락 챔버 내부를 상하방향으로 영역에 따라 상이하게 냉각한다.

公开(公告)号：KR1020090011216A

公开(公告)日：2009-02-02

申请号：KR1020070074586

申请日：2007-07-25

Applicant: 삼성전자주식회사

Inventor： 조창민 ,  김주영 ,  김지영 ,  류주아 ,  안요한 ,  최형석 ,  함동석

IPC: H01L21/02

CPC classification number: B01D46/0058 ,  B01D46/002 ,  B01D46/24 ,  B01D46/4272 ,  Y10S55/31

Abstract: An apparatus for filtering air including air interrupter and a cleaning system of semiconductor manufacturing facility including the same are provided to block many particles and to increase productivity by installing a second air filtering device and a second blower. A main frame(31) of a second air filtering device(30) has an opening connected to an air supplying line. A buffer frame(33) is inserted in the main frame. A plurality of slots(35) includes a plurality of air entrances(37). A plurality of filters(39) is positioned on a plurality of slots, and filters pollution material contained in an air. An air interrupter(43) controls the air coming through the air entrances in exchanging a plurality of filters, and includes a slide panel.

Abstract translation: 提供一种用于过滤空气的装置，包括空气断路器和包括其的半导体制造设备的清洁系统，以阻止许多颗粒并通过安装第二空气过滤装置和第二鼓风机来提高生产率。 第二空气过滤装置（30）的主框架（31）具有连接到供气管线的开口。 缓冲框架（33）插入主框架中。 多个狭槽（35）包括多个空气入口（37）。 多个过滤器（39）定位在多个槽上，并且对包含在空气中的污染物质进行过滤。 空气断路器（43）控制通过空气入口的空气交换多个过滤器，并且包括滑动面板。

公开(公告)号：KR1020070064901A

公开(公告)日：2007-06-22

申请号：KR1020050125493

申请日：2005-12-19

Applicant: 삼성전자주식회사

Inventor： 임성재 ,  김동연 ,  이혜미 ,  안요한 ,  황태진 ,  함동석 ,  장현천 ,  이수웅 ,  김우정

IPC: G01N27/00 ,  H01L21/66 ,  G01N33/00

Abstract: A system and method for detecting contamination materials are provided to shorten installation time, reduce maintenance costs, and maintenance operations and times of an operator. A system for detecting contamination materials includes an introduction member(110), an integration member(120), a suction member(130), a buffer member(140), a detection part(150), a controller(160), and a display member(170). The introduction member is disposed in a predetermined space(10) to introduce the air. The integration member receives the air from the introduction member. The suction member forcedly sucks the air. The buffer member receives the air to distribute the air into detection members. The detection part has detection members to detect different contaminants. The controller receives the detected signal to transmits the signal to the display member.

Abstract translation: 提供一种用于检测污染物质的系统和方法，以缩短安装时间，降低维护成本，以及操作者的维护操作和时间。 用于检测污染物质的系统包括引入构件（110），整合构件（120），抽吸构件（130），缓冲构件（140），检测部分（150），控制器（160）和 显示构件（170）。 引入构件设置在预定空间（10）中以引入空气。 集成部件从导入部件接收空气。 抽吸构件强制吸入空气。 缓冲构件接收空气以将空气分配到检测构件中。 检测部件具有用于检测不同污染物的检测部件。 控制器接收检测到的信号以将信号发送到显示构件。

公开(公告)号：KR1020070005795A

公开(公告)日：2007-01-10

申请号：KR1020050060812

申请日：2005-07-06

Applicant: 삼성전자주식회사

Inventor： 양재현 ,  안요한 ,  윤소영 ,  고길선 ,  윤동환 ,  오용운

IPC: H01L21/027

CPC classification number: G03F7/162 ,  B05C11/10 ,  B05D1/005 ,  H01L21/6715

Abstract: A spin coating equipment for use in manufacturing of a semiconductor device is provided to minimize particle type contamination source on a wafer by using a preventive wall with an opening unit. A bowl(105) has an inner space where a spin coating process is performed. A spin unit(152) rotates a wafer loaded in the bowl in a fixed state thereof. At least one auxiliary exhaust pipe(110) is formed on a base plate of the bowl. A main exhaust pipe(115) is formed on the base plate located between sidewalls of the auxiliary exhaust pipe and the bowl. A preventive wall(120) is upwardly extended from the base plate of the bowl located between the auxiliary and main exhaust pipes. The preventive wall includes at least opening unit(125). The opening unit passes through the preventive wall and connects both spaces of the prevention wall.

Abstract translation: 提供用于制造半导体器件的旋涂设备，以通过使用具有开口单元的预防壁来最小化晶片上的颗粒型污染源。 碗（105）具有进行旋涂处理的内部空间。 旋转单元（152）在其固定状态下旋转装载在碗中的晶片。 至少一个辅助排气管（110）形成在碗的底板上。 主排气管115形成在位于辅助排气管的侧壁和碗之间的基板上。 预防壁（120）从位于辅助排气管和主排气管之间的碗的底板向上延伸。 防护墙至少包括开口单元（125）。 开口单元穿过预防壁并连接预防壁的两个空间。

公开(公告)号：KR1020040064326A

公开(公告)日：2004-07-19

申请号：KR1020030001542

申请日：2003-01-10

Applicant: 삼성전자주식회사

Inventor： 김혁기 ,  김기두 ,  안요한

IPC: H01L21/68

Abstract: PURPOSE: A substrate processing apparatus capable of controlling contamination of a substrate transfer module is provided to reduce an interval of recovery time in an initial operation and improve efficiency of etching equipment by installing gate valves in the upper, lower, and side surfaces of a cover attached to the outside of a substrate transfer chamber. CONSTITUTION: A plurality of substrates are received in a receptacle. A transfer chamber provides a space for transferring the substrates. A substrate transfer unit transfers the substrates in the receptacle to a substrate processing part for performing a predetermined process on the substrate, disposed in the substrate transfer chamber(514). A load port(518a,518b) supports the receptacle, disposed in the outside of the substrate transfer chamber. A cover has a gas circulation path that circulates the purge gas supplied to the substrate transfer chamber and re-supplies the circulated purge gas to the substrate transfer chamber, attached to the substrate transfer chamber in a way that the cover surrounds the outer surface of the substrate transfer chamber.

Abstract translation: 目的：提供一种能够控制基板转印模块的污染的基板处理装置，以减少初始操作中的恢复时间的间隔，并且通过在盖的上，下和侧表面中安装闸阀来提高蚀刻设备的效率 连接到基板传送室的外部。 构成：多个基板被容纳在容器中。 传送室提供用于传送基板的空间。 衬底转移单元将容器中的衬底转移到衬底处理部分，用于在衬底传送室（514）中设置在衬底上进行预定处理。 负载端口（518a，518b）支撑设置在基板传送室外侧的插座。 盖具有气体循环路径，其循环供给到基板传送室的吹扫气体，并且将循环的净化气体重新供给到基板传送室，所述基板传送室以覆盖物的外表面的方式附着到基板传送室 底物转移室。

公开(公告)号：KR1020020096608A

公开(公告)日：2002-12-31

申请号：KR1020010035295

申请日：2001-06-21

Applicant: 삼성전자주식회사

Inventor： 안요한 ,  김현준 ,  김재봉 ,  이병무

IPC: H01L21/02

Abstract: PURPOSE: A contamination removal apparatus for a semiconductor equipment is provided to prevent the secondary contamination by exhausting contaminants generated from isolated spaces within a short time. CONSTITUTION: A main pipe unit(130) is directly connected with a plurality of connection pipes(169). A plurality of exhaust pipes(155) are indirectly connected with the main pipe unit(130) through the connection pipes(169). One ore more isolated bodies(110,120) are connected with the exhaust pipes(155). Contaminants generated from the isolated body(110) are supplied to the exhaust pipes(155) through an exhaust port(140) and a pipe connector(150) connected with the exhaust port(140). The contaminants are supplied to the main pipe unit(130) through the connection pipes(169). The contaminants are supplied to a scrubber system(170) through the main pipe unit(130).

Abstract translation: 目的：提供一种用于半导体设备的污染物去除装置，以在短时间内排出由隔离空间产生的污染物来防止二次污染。 构成：主管单元（130）与多个连接管（169）直接连接。 多个排气管155通过连接管169与主管单元130间接连接。 一个更多的隔离体（110,120）与排气管（155）连接。 从隔离体（110）产生的污染物通过与排气口（140）连接的排气口（140）和管连接器（150）供给排气管155。 污染物通过连接管（169）供应到主管单元（130）。 污染物通过主管单元（130）供应到洗涤器系统（170）。

公开(公告)号：KR1020020095362A

公开(公告)日：2002-12-26

申请号：KR1020010033556

申请日：2001-06-14

Applicant: 삼성전자주식회사

Inventor： 김재봉 ,  김현준 ,  이병무 ,  안요한

IPC: H01L21/02

Abstract: PURPOSE: An air current generating apparatus installed in a semiconductor fabricating area is provided to reduce a dead point portion in which air does not circulate, by controlling the direction of supplied air current. CONSTITUTION: An air supplying terminal(110) sprays circulated air on a particular area. A variable apparatus(120) can control the direction of the circulated air sprayed from the air supplying terminal. An air introducing terminal(130) has an air current control plate for dispersing an air path so that air current is not formed in the lower portion and drift current is not formed in the lower portion having the air path, installed in a position opposite to the air supplying terminal. An air circulation path(140) connects the air introducing terminal with the air supplying terminal. A circulation fan(150) is installed in the end of the air circulation path.

Abstract translation: 目的：设置安装在半导体制造区域中的气流发生装置，通过控制供给的气流的方向来减少空气不循环的死点部分。 构成：空气供应端口（110）在特定区域上喷射循环空气。 可变装置（120）可以控制从供气端子喷射的循环空气的方向。 空气导入端子（130）具有用于分散空气路径的气流控制板，使得下部没有形成气流，并且在具有空气路径的下部未形成漂移电流，安装在与 供气端子。 空气循环路径（140）将空气引入端子与空气供给端子连接。 循环风扇（150）安装在空气循环路径的末端。

公开(公告)号：KR100269945B1

公开(公告)日：2000-12-01

申请号：KR1019970013577

申请日：1997-04-14

Applicant: 삼성전자주식회사

Inventor： 안요한 ,  김태호

IPC: H01L21/66

Abstract: PURPOSE: A system for monitoring air particles using a manifold is provided to consecutively perform a zero counting process without dismantling the system, by fixing a purge filter having a predetermined cleaning function in the manifold, and by occasionally supplying predetermined clean air through the purge filter. CONSTITUTION: A manifold has a plurality of collecting pipes for collecting particles included in air induced through particle probes. A counter counts an optical size of the particles exhausted from the manifold, and converts the optical size to a predetermined pulse signal. A monitor displays the pulse signal outputted from the counter. A purge filter(100) connected to one of the collecting pipes is installed in a predetermined portion of the manifold. The purge filter is inserted into the sidewall of the manifold. A body(100a) has a plurality of penetration holes(100d). Porous filtering units(100b) filter the particles contained in the air, inserted into the penetration holes by one-to-one correspondence. A composition of outlets(100c) withdraws the air filtered by the filtering units to a corresponding collecting pipe, protruded from a surface of the body and connected to one of the collecting pipes.

Abstract translation: 目的：提供一种使用歧管监测空气颗粒的系统，通过将具有预定清洁功能的吹扫过滤器固定在歧管中，并偶尔通过吹扫过滤器提供预定的清洁空气，连续执行零计数过程而不拆卸系统 。 构成：歧管具有多个收集管，用于收集通过颗粒探针引起的空气中包含的颗粒。 计数器计数从歧管排出的颗粒的光学尺寸，并将光学尺寸转换成预定的脉冲信号。 显示器显示从计数器输出的脉冲信号。 连接到一个收集管的吹扫过滤器（100）安装在歧管的预定部分中。 吹扫过滤器插入歧管的侧壁。 主体（100a）具有多个贯通孔（100d）。 多孔过滤单元（100b）通过一一对应地将包含在空气中的颗粒过滤到插入孔中。 出口（100c）的组合物将由过滤单元过滤的空气抽出到相应的收集管中，从该体的表面突出并连接到一个收集管。

公开(公告)号：KR100252216B1

公开(公告)日：2000-04-15

申请号：KR1019970017065

申请日：1997-05-02

Applicant: 삼성전자주식회사

Inventor： 안요한 ,  김태협

IPC: H01L21/66

Abstract: PURPOSE: Apparatus for testing a transfer state of signal is provided to inspect semiconductor equipment efficiently by confirming simply the input/output for the signal to make use of the RS-485 or RS-422 communication standard. CONSTITUTION: The transmitting signal(TD+, TD-) and the receiving signal(RD+, RD-) of RS-485 or RS-422 communication standard is inputted in an input terminal(30) and output to an output terminal(32). A signal counter(34) between the input terminal(30) and the output terminal(32) samples the transmitting signal(TD+, TD-) and the receiving signal(RD+, RD-) to apply to a signal level controlling unit(36). The signal level controlling unit(36) applies the sampled signal to a light emitting unit(38), and controls the light intensity of light emission diodes(LED1¯LED4) in response to the state of the transmitting signal(TD+, TD-) and the receiving signal(RD+, RD-).

Abstract translation: 目的：提供用于测试信号传输状态的设备，通过简单地确认信号的输入/输出来有效地检测半导体设备，以利用RS-485或RS-422通信标准。 构成：RS-485或RS-422通信标准的发送信号（TD +，TD-）和接收信号（RD +，RD-）输入到输入端（30）并输出到输出端（32）。 输入端子（30）和输出端子（32）之间的信号计数器（34）对发送信号（TD +，TD-）和接收信号（RD +，RD-）进行采样，以应用于信号电平控制单元 ）。 信号电平控制单元（36）将取样信号施加到发光单元（38），并且响应于发送信号（TD +，TD-）的状态来控制发光二极管（LED1〜LED4）的光强度， 和接收信号（RD +，RD-）。