METROLOGY METHOD AND DEVICE FOR DETERMINING A COMPLEX-VALUED FIELD

    公开(公告)号:WO2021043514A1

    公开(公告)日:2021-03-11

    申请号:PCT/EP2020/071666

    申请日:2020-07-31

    Abstract: Disclosed is a method of measuring a structure, and associated metrology device and computer program. The method comprises obtaining an amplitude profile of scattered radiation relating to a measurement of a first structure on a first substrate and obtaining a reference phase profile relating to a reference measurement of at least one reference structure on a reference substrate. The at least one reference structure is not the same structure as said first structure but is nominally identical in terms of at least a plurality of key parameters. The method further comprises determining a complex-valued field to describe the first structure from the amplitude profile and reference phase profile.

    DEVICE AND METHOD FOR PROCESSING A RADIATION BEAM WITH COHERENCE
    46.
    发明申请
    DEVICE AND METHOD FOR PROCESSING A RADIATION BEAM WITH COHERENCE 审中-公开
    具有相干性的辐射束处理装置和方法

    公开(公告)号:WO2018024476A1

    公开(公告)日:2018-02-08

    申请号:PCT/EP2017/068047

    申请日:2017-07-17

    Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.

    Abstract translation: 公开了用于处理具有相干性的辐射束的设备和方法。 在一种布置中,光学系统接收具有相干性的辐射束。 辐射束包括分布在一个或多个辐射束空间模式上的分量。 波导支持多个波导空间模式。 光学系统将属于公共辐射束空间模式并且具有不同频率的辐射束的多个分量引导到波导上,使得多个分量中的每一个耦合到不同组的波导空间模式, 每组包括一个或多个波导空间模式。

    TOPOGRAPHY MEASUREMENT SYSTEM
    47.
    发明申请
    TOPOGRAPHY MEASUREMENT SYSTEM 审中-公开
    地形测量系统

    公开(公告)号:WO2017063789A1

    公开(公告)日:2017-04-20

    申请号:PCT/EP2016/070922

    申请日:2016-09-06

    CPC classification number: G03F9/7076 G03F9/7049 G03F9/7092

    Abstract: A topography measurement system comprising a radiation source configured to generate a radiation beam, a spatially coded grating configured to pattern the radiation beam and thereby provide a spatially coded radiation beam, optics configured to form an image of the spatially coded grating at a target location on a substrate, detection optics configured to receive radiation reflected from the target location of the substrate and form an image of the grating image at a second grating, and a detector configured to receive radiation transmitted through the second grating and produce an output signal.

    Abstract translation: 包括配置成产生辐射束的辐射源,配置成对所述辐射束进行图案化并由此提供经空间编码的辐射束的空间编码光栅,配置成形成所述辐射束的图像的光学器件, 在衬底上的目标位置处的空间编码光栅,被配置为接收从所述衬底的所述目标位置反射的辐射并且在第二光栅处形成所述光栅图像的图像的检测光学器件,以及被配置为接收透过所述第二光栅 并产生一个输出信号。

    TOPOGRAPHY MEASUREMENT SYSTEM
    48.
    发明申请
    TOPOGRAPHY MEASUREMENT SYSTEM 审中-公开
    地形测量系统

    公开(公告)号:WO2017060014A1

    公开(公告)日:2017-04-13

    申请号:PCT/EP2016/070873

    申请日:2016-09-05

    Inventor: PANDEY, Nitesh

    Abstract: Measurement system comprising a radiation source configured to generate a measurement radiation beam, a polarizer and a grating to receive the measurement radiation beam and provide a polarized measurement radiation beam patterned by the grating, optics to form an image of the grating at a target location on a substrate. The image comprises a first part having a first polarization and a second part having a second polarization, detection optics to receive radiation from the target location of the substrate and form an image of the grating image at a second grating, and a detector to receive radiation transmitted through the second grating and produce a two output signal indicative of the intensity of the transmitted radiation for the first and second parts of the grating image respectively. Topography of the substrate can be determined from the signals.

    Abstract translation: 测量系统包括被配置为产生测量辐射束的辐射源,偏振器和光栅以接收测量辐射束并且提供由光栅图案化的偏振测量辐射束,光学器件以在目标位置上形成光栅的图像 底物。 该图像包括具有第一偏振的第一部分和具有第二偏振的第二部分,用于接收来自基板的目标位置的辐射并在第二光栅处形成光栅图像的图像的检测光学器件,以及用于接收辐射的检测器 透射通过第二光栅并且分别产生指示光栅图像的第一和第二部分的透射辐射强度的两个输出信号。 可以从信号确定衬底的形貌。

    METHOD FOR CONTROLLING A DISTANCE BETWEEN TWO OBJECTS, INSPECTION APPARATUS AND METHOD
    49.
    发明申请
    METHOD FOR CONTROLLING A DISTANCE BETWEEN TWO OBJECTS, INSPECTION APPARATUS AND METHOD 审中-公开
    用于控制两个对象之间的距离的方法,检查装置和方法

    公开(公告)号:WO2016030227A1

    公开(公告)日:2016-03-03

    申请号:PCT/EP2015/068925

    申请日:2015-08-18

    Inventor: PANDEY, Nitesh

    Abstract: A broadband spectroscopic analysis is used for controlling a distance (d) between a miniature solid immersion lens (SIL, 60) and a metrology target (30'). An objective lens arrangement (15, 60) including the SIL illuminates the metrology target with a beam of radiation with different wavelengths and collects a radiation (709) reflected or diffracted by the metrology target. A mounting (64) holds the SIL within a distance from the metrology target that is less than the coherence length of the illuminating radiation (703). A detection arrangement (812, 818) produces a spectrum of the radiation reflected or diffracted by the metrology target. The distance between the SIL and the metrology target or other target surface can be inferred from spectral shifts observed in the detected spectrum. Servo control of the distance is implemented based on these shifts, using an actuator (66).

    Abstract translation: 使用宽带光谱分析来控制微型固体浸没透镜(SIL,60)和测量目标(30')之间的距离(d)。 包括SIL的物镜布置(15,60)利用具有不同波长的辐射束照亮计量目标,并收集由计量目标反射或衍射的辐射(709)。 安装件(64)将SIL保持在远离测量目标的距离小于照射辐射(703)的相干长度的距离处。 检测装置(812,818)产生由计量目标反射或衍射的辐射的光谱。 SIL和测量目标或其他目标表面之间的距离可以从在检测到的光谱中观察到的光谱偏移推断出来。 使用致动器(66),基于这些偏移来实现距离的伺服控制。

    METROLOGY APPARATUS
    50.
    发明公开
    METROLOGY APPARATUS 审中-公开

    公开(公告)号:EP3614207A1

    公开(公告)日:2020-02-26

    申请号:EP18189926.1

    申请日:2018-08-21

    Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

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