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    41.
    发明专利
    未知

    公开(公告)号：DE60025303T2

    公开(公告)日：2006-09-14

    申请号：DE60025303

    申请日：2000-02-09

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN

    IPC: G03F7/20 ,  H01L21/027 ,  H01J37/317

    Abstract: A lithographic projection device according to the present invention includes a first radiation source which supplies a projection beam of radiation of a first type, a mask table for holding a mask, a substrate table for holding a substrate and a projection system for imaging a portion of the mask, irradiated by the projection beam, onto a target portion of the substrate. Further, a second radiation source supplies a second beam of radiation of a second type which can be directed onto the substrate and a controller which patterns the second beam of radiation so that it impinges on the substrate in a particular pattern. The two radiation beams are controlled such that the sum of the fluxes of the radiation of the first and second type on the substrate causes an elevation of the substrate temperature which is substantially constant across at least a given area of the substrate.

    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    43.
    发明专利
    LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 未知

    公开(公告)号：SG111129A1

    公开(公告)日：2005-05-30

    申请号：SG200304166

    申请日：2003-07-07

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN ,  BANINE VADIM YEVGENYEVICH

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D 1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

    46.
    发明专利
    未知

    公开(公告)号：DE60230663D1

    公开(公告)日：2009-02-12

    申请号：DE60230663

    申请日：2002-11-27

    Applicant: ASML NETHERLANDS BV

    Inventor： VAN DER MAST KAREL DIEDERICK ,  BLEEKER ARNO JAN

    IPC: G01B11/00 ,  G03F7/20 ,  G01B11/24 ,  H01L21/027

    Abstract: An imaging apparatus having an illuminator configured to condition a beam of radiation having a wavelength equal to or shorter than 365 nm; a support structure to support a programmable patterning device, the programmable patterning device configured to pattern the beam according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a beam splitter located between the programmable patterning device and the substrate table configured to divert aside a portion of the patterned beam; and an image detector configured to analyze the portion of the patterned beam.

    47.
    发明专利
    未知

    公开(公告)号：DE60320202D1

    公开(公告)日：2008-05-21

    申请号：DE60320202

    申请日：2003-11-26

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN ,  BENSCHOP JOZEF PETRUS HENRICUS

    IPC: G03F7/20 ,  H01L21/027

    Abstract: Apparatus and methods for compensating for the movement of a substrate in a lithographic apparatus during a pulse of radiation include providing an optical structure configured to move a patterned projection beam incident on the substrate in synchronism with the substrate.

    48.
    发明专利
    未知

    公开(公告)号：DE60319635D1

    公开(公告)日：2008-04-24

    申请号：DE60319635

    申请日：2003-07-07

    Applicant: ASML NETHERLANDS BV

    Inventor： BLEEKER ARNO JAN ,  BANINE VADIM YEVGENYEVICH

    IPC: G03F7/20 ,  H01L21/027

    Abstract: A programmable patterning structure for use with a lithographic projection apparatus according to one embodiment of the invention includes a plurality of reflective elements A, B, C, each reflective element having two distributed Bragg reflectors 51, 52. A separation D 1 between the two distributed Bragg reflectors is adjustable between a first relation, at which destructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in substantially zero reflectivity, and a second relation, in which constructive interference between reflections from the first and second distributed Bragg reflectors 51, 52 results in high reflectivity.

    Light patterning device using tilting mirrors in asuperpixel form
    49.
    发明专利
    Light patterning device using tilting mirrors in asuperpixel form 未知

    公开(公告)号：SG126907A1

    公开(公告)日：2006-11-29

    申请号：SG200602825

    申请日：2006-04-26

    Applicant: ASML HOLDING NV ,  ASML NETHERLANDS BV

    Inventor： BABA-ALI NABILA ,  BLEEKER ARNO JAN ,  TROOST KARS ZEGER

    Abstract: A light patterning system comprises an illumination system that supplies a beam of radiation having a certain wavelength (X). An array of reflective pixels patterns the beam, wherein the array includes pixels having at least a first tilting mirror that is logically coupled to a second tilting mirror. In an embodiment, the first and second tilting mirrors are (i) substantially adjacent to each other; and (ii) offset in height from each other by a first mirror displacement. A projection system is included that projects the patterned beam onto a target. In alternate embodiment, the array of reflective pixels includes pixels having first through fourth tilting mirrors that are logically coupled to each other. The first through fourth tilting mirrors are (i) respectively offset in height from a reference plane by first through fourth mirror displacements, and (ii) are respectively arranged clockwise in a substantially square pattern.

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