公开(公告)号：JP2008258606A

公开(公告)日：2008-10-23

申请号：JP2008072792

申请日：2008-03-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： DEN BOEF ARIE JEFFREY ,  VAN DER MAST KAREL DIEDERICK ,  SCHAAR MAURITS VAN DER

IPC: H01L21/66 ,  G01M11/00 ,  G01N21/00 ,  G01N21/47 ,  G01N23/02 ,  G01N23/203 ,  G03F7/20 ,  H01L21/027

CPC classification number: G01N21/4785 ,  G03F7/70516 ,  G03F7/70616 ,  G03F7/70633

Abstract: PROBLEM TO BE SOLVED: To provide a method and apparatus for compensating or reducing errors caused when searching TIS and/or the center of a pupil plane without any large increase in throughput time.
SOLUTION: In a method of measuring asymmetry in a scatterometer, a target portion is illuminated twice, first with 0° of substrate rotation and secondly with 180°of substrate rotation. One of those images is rotated and then that rotated image is subtracted from the other image. In this way, the asymmetry of the scatterometer can be corrected.
COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种用于补偿或减少在搜索TIS和/或瞳孔平面的中心而引起的错误而不会大大增加吞吐时间的方法和装置。 解决方案：在测量散射仪中的不对称性的方法中，目标部分被照射两次，首先以0°的基板旋转，其次是180°的基板旋转。 其中一个图像被旋转，然后从另一个图像中减去旋转的图像。 以这种方式，可以校正散射仪的不对称性。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2008021972A

公开(公告)日：2008-01-31

申请号：JP2007137324

申请日：2007-05-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PLUG REINDER TEUN ,  DEN BOEF ARIE JEFFREY ,  VAN DER MAST KAREL DIEDERICK

IPC: H01L21/027 ,  G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a high-speed metrology tool for measuring the parameter of a substrate patterned in a lithography apparatus. SOLUTION: The metrology tool includes a base frame, a substrate table 10 configured to hold a substrate 9, at least one sensor 7 configured to measure the parameter of the substrate 9, a displacement system for displacing one of the substrate table 10 and the sensor 7 from the other at least in a first direction, a first balance mass, and a first bearing for movably supporting the first balance mass such that the first balance mass substantially freely moves in the opposite direction from the first direction to compensate for a displacement of one of the substrate table 10 and the sensor 7 in the first direction. COPYRIGHT: (C)2008,JPO&INPIT

Abstract translation: 要解决的问题：提供用于测量在光刻设备中图案化的衬底的参数的高速计量工具。 解决方案：测量工具包括基架，被配置为保持基板9的基板台10，配置成测量基板9的参数的至少一个传感器7，用于移动基板台10之一的位移系统 至少在第一方向上的传感器7，第一平衡质量块和用于可移动地支撑第一平衡质量块的第一轴承，使得第一平衡块基本上沿与第一方向相反的方向自由移动，以补偿 基板台10和传感器7之一沿第一方向的位移。 版权所有（C）2008，JPO＆INPIT

公开(公告)号：JP2006013518A

公开(公告)日：2006-01-12

申请号：JP2005186491

申请日：2005-06-27

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： TROOST KARS Z ,  VAN DER MAST KAREL DIEDERICK

IPC: H01L21/027 ,  G02B5/30 ,  G03B27/54 ,  G03F7/20

CPC classification number: G03F7/70225 ,  G03F7/70291 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide an advanced lithography equipment for lighting a pattern and projecting it on a substrate.
SOLUTION: A lithography equipment provides a radiated ray beam to which pattern formation is carried out. After the division of a beam into first and second radiated ray beams, the first radiated ray beam forms a first pattern by the first array of a separately controllable element. The second radiated ray beam forms a second pattern by the second array of the separately controllable element. The first radiated beam and the second radiated beam are combined with each other. Further, the first radiation beam and the second radiation beam are linearly-polarized in directions perpendicular to each other.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供用于照亮图案并将其投影在基板上的先进光刻设备。 解决方案：光刻设备提供了进行图案形成的辐射射线束。 在将光束划分成第一和第二辐射射线束之后，第一辐射射线束由独立可控元件的第一阵列形成第一图案。 第二辐射射线束通过单独可控元件的第二阵列形成第二图案。 第一辐射光束和第二辐射光束彼此组合。 此外，第一辐射束和第二辐射束在垂直于彼此的方向上线性偏振。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2003100626A

公开(公告)日：2003-04-04

申请号：JP2002245963

申请日：2002-07-23

Applicant: ASML NETHERLANDS BV

Inventor： BLEEKER ARNO JAN ,  DE JAGER PIETER WILLEM HERMAN ,  HINTERSTEINER JASON DOUGLAS ,  KRUIZINGA BORGERT ,  MCCARTHY MATTHEW EUGENE ,  OSKOTSKY MARK ,  RYZHIKOV LEV ,  SAKIN LEV ,  SMIRNOV STANISLAV ,  SNIJDERS BART ,  VAN DER MAST KAREL DIEDERICK ,  VISSER HUIBERT

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide an imaging apparatus capable of using for the manufacture of an integrated circuit and other (semiconductor) devices as a commercially charming alternative plan instead of using a conventional lithographic projector (a method using a mask). SOLUTION: The imaging apparatus comprises a radiant ray system for supplying a projection beam of radiant ray, a supporting structure for supporting a pattern forming means effecting a pattern formation in accordance with the desired pattern, a substrate table for retaining a substrate, and a projection system for projecting a beam formed through the pattern formation on the target part of the substrate. The pattern formation means comprises a plurality of individual pattern formation subelements to produce subbeams formed through pattern formation, by using respective subelements. The imaging apparatus comprises a combining means for combining a plurality of subbeams formed through the pattern formation, to a single image formed through the pattern formation.

公开(公告)号：JP2011029652A

公开(公告)日：2011-02-10

申请号：JP2010211663

申请日：2010-09-22

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： PLUG REINDER TEUN ,  DEN BOEF ARIE JEFFREY ,  VAN DER MAST KAREL DIEDERICK

IPC: H01L21/027 ,  G03F7/20 ,  G12B5/00

CPC classification number: G03F7/70758 ,  G03F7/70766

Abstract: PROBLEM TO BE SOLVED: To provide a high-speed metrology tool for measuring a parameter of a substrate, where a pattern is provided in a lithographic apparatus. SOLUTION: The metrology tool is configured to measure a parameter of a substrate 9 where a pattern is provided in a lithography apparatus. The metrology tool includes a base frame 5; a substrate table 6 constructed to hold the substrate; one or more sensors each structured to measure a parameter of the substrate; a displacement system 25 for displacing either of the substrate table and the sensor(s), with respect to the other side at least in a first direction; a first balance mass; and a first bearing 21 for movably supporting the first balance mass 20 to substantially move freely, in a direction opposite to the first direction, so as to counteract the displacement of either of the substrate table and the sensor in the first direction. COPYRIGHT: (C)2011,JPO&INPIT

Abstract translation: 要解决的问题：提供用于测量在光刻设备中提供图案的基板的参数的高速计量工具。 测量工具被配置为测量在光刻设备中提供图案的基板9的参数。 计量工具包括基架5; 构造成保持基板的基板台6; 一个或多个传感器被构造成测量衬底的参数; 位移系统25，用于至少沿第一方向相对于另一侧移动衬底台和传感器中的任一个; 第一平衡块; 以及第一轴承21，用于可移动地支撑第一平衡块20，以沿与第一方向相反的方向基本上自由移动，以抵消基板台和传感器中的任一个在第一方向上的位移。 版权所有（C）2011，JPO＆INPIT

公开(公告)号：JP2004349706A

公开(公告)日：2004-12-09

申请号：JP2004151218

申请日：2004-05-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER MAST KAREL DIEDERICK ,  BLEEKER ARNO JAN ,  GUI CHENG-QUN ,  HOEFNAGELS JOHAN CHRISTIAAN GE

IPC: G02B3/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70275 ,  G03F7/70291

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic projection equipment with a long working distance using a programmable pattern forming means and micro lens array.
SOLUTION: The lithography projection apparatus of this invention comprises the micro lens array to generate a plurality of source images in a two dimensional array, the programmable pattern forming means having a plurality of addressable elements that act as shutters for source images, and a projection subsystem to project a source image onto a substrate. Thereby, a larger working distance can be obtained.
COPYRIGHT: (C)2005,JPO&NCIPI

公开(公告)号：JP2003243300A

公开(公告)日：2003-08-29

申请号：JP2002382826

申请日：2002-11-29

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER MAST KAREL DIEDERICK

IPC: G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a lithography apparatus and a device manufacturing method, where gray scaling is performed with a relatively high throughput, and a device is manufactured at a relatively high yield. SOLUTION: Two or more patterned projection beams having different patterns and intensities are simultaneously projected on a substrate. The gray scaling is realized by making component projection beams PB1-PB4 pass variable attenuaters VA1-VA4, respectively, to generate individual intensities I1-I4 which are arbitrarily selected. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2010114473A

公开(公告)日：2010-05-20

申请号：JP2010027357

申请日：2010-02-10

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  ALEKSEY YURIEVICH KOLESNYCHENKO ,  VAN DER MAST KAREL DIEDERICK ,  SIMON KLAUS ,  KNAAPEN RAYMOND JACOBUS ,  KRASSIMIR TODOROV KRASTEV

IPC: H01L21/027 ,  B29C59/02

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To solve a problem that since template holders occupy a significant amount of space in an imprint lithography apparatus, there is not sufficient space to provide an imprint template to imprint every imprint area at the same time. SOLUTION: The imprint lithography apparatus has a first array of template holders, a second array of template holders, and a substrate table arranged to support a substrate to be imprinted, wherein the first array of template holders is arranged to hold an array of imprint templates that can be used to imprint a first array of patterns onto the substrate, and the second array of template holders is arranged to hold an array of imprint templates that can be used to imprint a second array of patterns onto the substrate, the patterns imprinted by the second array being interspersed between the patterns imprinted by the first array. COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题为了解决由于模板保持器在压印光刻设备中占据大量空间的问题，没有足够的空间来提供压印模板以同时压印每个压印区域。 压印光刻设备具有第一阵列的模板保持器，第二阵列的模板保持器和布置成支撑待印刷的衬底的衬底台，其中模板保持器的第一阵列被布置成保持阵列 可用于将第一阵列图案印刷到基底上的印模模板，并且第二阵列的模板支架布置成保持可用于将第二阵列阵列印刷到基底上的压印模板阵列， 由第二阵列压印的图案散布在由第一阵列印刷的图案之间。 版权所有（C）2010，JPO＆INPIT

公开(公告)号：JP2007227890A

公开(公告)日：2007-09-06

申请号：JP2006344038

申请日：2006-12-21

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： KRUIJT-STEGEMAN YVONNE WENDELA ,  WUISTER SANDER FREDERIK ,  DIJKSMAN JOHAN FREDERIK ,  ALEKSEY YURIEVICH KOLESNYCHENK ,  VAN DER MAST KAREL DIEDERICK ,  SIMON KLAUS ,  KNAAPEN RAYMOND JACOBUS ,  KRASSIMIR TODOROV KRASTEV

IPC: H01L21/027 ,  B29C59/02

CPC classification number: B29C59/02 ,  B29C35/0888 ,  B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

Abstract: PROBLEM TO BE SOLVED: To provide an imprint lithography device which solves the problem of the shortage of the space for forming imprint templates when imprinting each imprint area at the same time, since a template holder occupies space significantly.
SOLUTION: The imprint lithography device comprises a first array of template holders, a second array of template holders, and a substrate table arranged for supporting a substrate to be imprinted. The first array of template holders is arranged for holding an array of imprint templates that can be used for imprinting a first array of patterns onto the substrate. The second array of template holders is arranged for holding an array of imprint templates that can be used for imprinting a second array of patterns onto the substrate. The patterns imprinted by the second array are interspersed between the patterns imprinted by the first array.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：为了提供一种压印光刻装置，其解决了当同时印刷每个压印区域时形成压印模板的空间不足的问题，因为模板保持器显着占据空间。 压印光刻设备包括模板保持器的第一阵列，模板保持器的第二阵列和布置成支撑待印刷的衬底的衬底台。 第一阵列的模板保持器布置成保持可用于将第一阵列图案压印到基板上的压印模板阵列。 第二阵列的模板支架布置成保持可用于将第二阵列阵列压印到基板上的压印模板阵列。 由第二阵列印制的图案散布在由第一阵列印刷的图案之间。 版权所有（C）2007，JPO＆INPIT

公开(公告)号：JP2006173629A

公开(公告)日：2006-06-29

申请号：JP2005362907

申请日：2005-12-16

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN DER MAST KAREL DIEDERICK ,  TROOST KARS ZEGER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70183 ,  G03F7/70216 ,  G03F7/70258 ,  G03F7/70291 ,  G03F7/70425

Abstract: PROBLEM TO BE SOLVED: To provide a system and a method which improves an efficiency of a mask-less lithography system, and improves a throughput of the system. SOLUTION: A projection system PS has a plurality of elements 11, 21, 12, and moveable lenses which can be arranged inside or outside of a radiation beam, and the radiation beam can be projected with a plurality of magnifications. By changing the magnification of the projection system an area of a substrate exposed per pixel can be adjusted, and the throughput of the system is optimized. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种提高无掩模光刻系统的效率并提高系统的吞吐量的系统和方法。 解决方案：投影系统PS具有多个元件11,21,12，以及可以布置在辐射束内部或外部的可移动透镜，并且辐射束可以以多个放大倍率投影。 通过改变投影系统的放大倍率，可以调整每像素曝光的衬底的面积，并优化系统的生产量。 版权所有（C）2006，JPO＆NCIPI