公开(公告)号：SG115641A1

公开(公告)日：2005-10-28

申请号：SG200401492

申请日：2004-02-27

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  EUSSEN EMIEL JOZEF MELANIE ,  KLIJNTUNTE ENGELBERTUS JOHANNE

IPC: G03F7/20 ,  H01L21/027 ,  G02B5/04 ,  G02B26/00

Abstract: A lithographic projection apparatus is equipped with a device for manipulation and routing of at least one portion of a metrology beam of radiation. The device includes a first and a second optical wedge, wherein the second optical wedge and the first optical wedge having a relative position with respect to each other. The at least one portion of the metrology beam enters the device along an incoming optical axis at a first major surface of the first optical wedge, passes through the first and second optical wedges, and exits at a second major surface of the second optical wedge. The first and second optical wedges are arranged to at least one of rotate and translate the at least one portion of the metrology beam relative to the incoming optical axis by changing the relative position of the first and the second optical wedges.

公开(公告)号：SG115815A1

公开(公告)日：2005-10-28

申请号：SG200501975

申请日：2005-03-30

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LEENDERS MARTINUS HENDRIKUS AN

IPC: G03F7/20 ,  H01L21/027

Abstract: A lithographic apparatus includes a radiation source (SO) configured to provide radiation to an illumination system (IL), the radiation source (SO) being configured to provide radiation in a first wavelength range and in a second wavelength range, the second wavelength range being different from the first wavelength range. The first wavelength range (2) is the primary wavelength of the lithographic apparatus. The second wavelength range (3) is used for setup of the lithographic apparatus, the setup including one or more of calibration, qualification, performance test, and alignment. The second wavelength range may also be used for exposure of a further substrate.

公开(公告)号：SG115660A1

公开(公告)日：2005-10-28

申请号：SG200401894

申请日：2004-04-02

Applicant: ASML NETHERLANDS BV

Inventor： COX HENRIKUS HERMAN MARIE ,  FRANKEN DOMINICUS JACOBUS PETR ,  KEMPER NICOLAAS RUDOLF ,  VAN DER PASCH ENGELBERTUS ANTO ,  VERBUNT MARTIJN JOHANNES ,  VAN DEN WILDENBERG LAMBERTUS A

IPC: G21K5/00 ,  G03F7/20 ,  G21K5/02 ,  H01L21/027

公开(公告)号：SG111234A1

公开(公告)日：2005-05-30

申请号：SG200406150

申请日：2004-10-19

Applicant: ASML NETHERLANDS BV

Inventor： BEEMS MARCEL HENDRIKUS MARIA ,  VAN DER PASCH ENGELBERTUS ANTO

IPC: G01B11/00 ,  G03F7/20 ,  H01L21/027

公开(公告)号：SG136065A1

公开(公告)日：2007-10-29

申请号：SG2007017817

申请日：2007-03-09

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

Abstract: A lithographic apparatus includes a liquid confinement system to confine liquid in a space between a final element of a projection system and a substrate, and a first and a second substrate stage that are configured to mutually cooperate in order to perform a joint movement for bringing the lithographic apparatus from a first configuration, in which the liquid is confined between a first substrate held by the first substrate stage and the final element, towards a second configuration, in which the liquid is confined between a second substrate held by the second substrate stage and the final element, such that during the joint movement the liquid is essentially confined within the space with respect to the final element. The apparatus also includes a position measurement system configured to at least during the joint movement measure the position of the first and second substrate stages.

公开(公告)号：SG132504A1

公开(公告)日：2007-06-28

申请号：SG2003068731

申请日：2003-11-24

Applicant: ASML NETHERLANDS BV

Inventor： PRIL WOUTER ONNO ,  VAN DER PASCH ENGELBERTUS ANTO ,  DILLON ROBERT F ,  HENSHAW PHILIP DENNIS

IPC: G01B9/02 ,  G01B11/00 ,  G03F7/20 ,  H01L21/027 ,  G03B27/52

Abstract: Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature and turbulence using measurements from a second harmonic interferometer (10). A ramp, representing the dependence of the SHI data on path length, is removed before use of the SHI data. The SHI may use a passive Q-switched laser (11) as a light source and Brewster prisms (142,144) in the receiver module. Optical fibers may be used to conduct light to the detectors (145-147). A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.

公开(公告)号：SG143037A1

公开(公告)日：2008-06-27

申请号：SG2004018925

申请日：2004-04-02

Applicant: ASML NETHERLANDS BV

Inventor： VAN DER PASCH ENGELBERTUS ANTO ,  BEEMS MARCEL HENDRIKUS MARIA ,  LOOPSTRA ERIK ROELOF ,  MEIJER HENDRICUS JOHANNES MARI ,  GALBURT DANIEL N

IPC: G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: POSITION CORRECTION IN Y OF MASK OBJECT SHIFT DUE TO Z OFFSET AND NON- PERPENDICULAR ILLUMINATION In a reflective lithographic projection apparatus, shifts in the image of a pattern of a mask in the scanning direction caused by variations in the position of the pattern surface of the mask along the optical axis are corrected by shifting of the relative position of the mask and/or the substrate in the scanning direction. Correction of the image rotation error may also be accomplished by rotation of the relative positions of the mask and/or the substrate about the optical axis. Variations in the position of the pattern surface of the mask along the optical axis may be determined by interferometers upon installation of the mask to the lithographic projection apparatus. The variations may be mapped and stored to provide control of the lithographic projection apparatus.

公开(公告)号：SG131056A1

公开(公告)日：2007-04-26

申请号：SG2006062681

申请日：2006-09-11

Applicant: ASML NETHERLANDS BV

Inventor： LOOPSTRA ERIK ROELOF ,  VAN DER PASCH ENGELBERTUS ANTO

Abstract: The invention relates to a lithographic apparatus comprising a substrate table for holding a substrate, a projection system for projecting a patterned beam onto a target portion of the substrate; and a displacement measuring system configured to measure the position of said substrate table in at least three degrees of freedom. Said displacement measuring system comprises a first x-sensor configured to measure the position of the substrate table in a first direction and a first and a second y-sensor configured to measure the position of the substrate table in a second direction. Said displacement measuring system further comprises a second x-sensor, wherein said first and said second x-sensor and said first and second y-sensors are encoder type sensors configured to measure the position of each of said sensors with respect to at least one grid plate. Said displacement measuring system is configured to selectively use, depending on the position of said substrate table, three of said first and second x- sensors and said first and second y-sensors to determine the position of said substrate table in three degrees of freedom.

公开(公告)号：SG130183A1

公开(公告)日：2007-03-20

申请号：SG2006060180

申请日：2006-09-01

Applicant: ASML NETHERLANDS BV

Inventor： PRIL WOUTER ONNO ,  EUSSEN EMIEL JOZEF MELANIE ,  VAN DER PASCH ENGELBERTUS ANTO

Abstract: A position measurement system for measuring a position of an object is described, the system including: a first incremental measurement unit for measuring a first number of first distance steps in a distance between a reference frame and the object, wherein the first number equals a first integer value plus a first fraction, and a second incremental measurement unit for measuring a second number of second distance steps in a distance between the reference frame and the object, wherein the second number equals a second integer value plus a second fraction, wherein the position measurement system is constructed and arranged to initialize the second incremental measurement unit on the basis of the first number and the second fraction.