公开(公告)号：DE4032162A1

公开(公告)日：1992-04-16

申请号：DE4032162

申请日：1990-10-10

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST DIPL ING

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027

公开(公告)号：AT74611T

公开(公告)日：1992-04-15

申请号：AT88100892

申请日：1988-01-22

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03C1/72 ,  C08F20/34 ,  C08F30/08 ,  C08F220/26 ,  C08F220/36 ,  C08F222/22 ,  C08F230/08 ,  G03F7/004 ,  G03F7/039 ,  G03F7/095 ,  G03F7/11 ,  H01L21/027 ,  H01L21/30

公开(公告)号：DE3677089D1

公开(公告)日：1991-02-28

申请号：DE3677089

申请日：1986-07-30

Applicant: BASF AG

Inventor： KOCH HORST DR ,  LOERZER THOMAS DR ,  BOETTCHER ANDREAS DR ,  SCHULZ GUENTHER DR ,  SCHWALM REINHOLD DR

IPC: C07D213/89 ,  C07D405/12 ,  C08F2/48 ,  C08F2/50 ,  G03F7/004 ,  G03F7/025 ,  G03F7/027 ,  G03F7/038

公开(公告)号：DE3902115A1

公开(公告)日：1990-08-02

申请号：DE3902115

申请日：1989-01-25

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BOETTCHER ANDREAS DR

IPC: C08F8/00 ,  C08F20/10 ,  C08F20/38 ,  C08F20/52 ,  C08F28/00 ,  C08F30/08 ,  C08F212/14 ,  C08F220/10 ,  C08F220/38 ,  C08F220/58 ,  C08F228/02 ,  C08F230/08 ,  C08F246/00 ,  C08G59/00 ,  C08L63/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075

公开(公告)号：DE3841437A1

公开(公告)日：1990-06-13

申请号：DE3841437

申请日：1988-12-09

Applicant: BASF AG

Inventor： NGUYEN KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST ,  SCHUHMACHER RUDOLF DR

IPC: B41M5/26 ,  G03F7/004 ,  G03F7/039 ,  G11B7/00 ,  G11B7/004 ,  G11B7/24

公开(公告)号：DE3827567A1

公开(公告)日：1990-02-22

申请号：DE3827567

申请日：1988-08-13

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03F7/32

Abstract: The invention relates to an aqueous developer solution for positively acting photoresists and also to a development process. The water-soluble basic compound contained in the developer solution is a compound of the general formula (I): … … where R to R are mutually identical or different and are H, OH, hydroxyalkyl, alkoxy or alkyl. … They are suitable for the development of positively acting photoresists.

公开(公告)号：DE3812325A1

公开(公告)日：1989-10-26

申请号：DE3812325

申请日：1988-04-14

Applicant: BASF AG

Inventor： SCHWALM REINHOLD DR

IPC: G03F7/039 ,  G03F7/004

Abstract: The invention relates to a radiation-sensitive mixture for light- sensitive coating materials, and also to a process for obtaining relief patterns and images. … The radiation-sensitive mixture contains… a) a water-insoluble polymeric binder which is soluble in aqueous alkaline solutions, and… b) an organic compound whose solubility in an aqueous alkaline developer is increased by exposure to acid and which contains at least one acid-cleavable grouping,… the polymeric binder (a) being a copolymer containing o-nitrobenzyl groupings. … The radiation-sensitive mixture according to the invention is suitable, in particular, for obtaining photoresists.

公开(公告)号：DE19710992A1

公开(公告)日：1997-10-30

申请号：DE19710992

申请日：1997-03-17

Applicant: BASF AG

Inventor： REICH WOLFGANG DR ,  SCHWALM REINHOLD DR ,  HAEUSLING LUKAS DR ,  NUYKEN OSKAR PROF DR ,  RAETHER ROMAN-BENEDIKT

IPC: C07D493/08 ,  C07C33/035 ,  C07C41/24 ,  C07C43/16 ,  C07D307/58 ,  C08G65/08

Abstract: A method for the preparation of 2,7-dioxa-bicyclo3.2.1octane - comprises: (a) a butene diol derivative of formula (I) undergoes an addition reaction with a vinyl ether of formula (II) in the presence of a halogenating agent to form an intermediate of formula (III); (b) ring closure of (III) forms a tetrahydrofuran compound of formula (IV); (c) the alcohol ROH is eliminated from (IV) to form a second intermediate of formula (V); and (d) ring closure in (V) takes place to form a 2,7-dioxa-bicyclo3.2.1octane or a derivative of formula (VI): R-O-CH(X')=CH(X) (I) HO-CH)2(Y)-CH(Z)=CH(Z')-CH2(Y')-OH (II) R = hydrocarbon; Hal = halogen; and X - Z` = hydrogen or 1-20 C hydrocarbon.

公开(公告)号：DE19610349A1

公开(公告)日：1997-09-18

申请号：DE19610349

申请日：1996-03-15

Applicant: BASF AG

Inventor： REICH WOLFGANG DR ,  SCHWALM REINHOLD DR ,  BECK ERICH DR ,  HAEUSLING LUKAS DR ,  NUYKEN OSKAR PROF DR ,  RAETHER ROMAN-BENEDIKT

IPC: C08G65/16 ,  C09D4/00 ,  C07D307/30 ,  C07D307/28 ,  C08F234/02 ,  C08J5/00 ,  C09D145/00

Abstract: A process for the production of coatings or moulded products by radiation curing, in which radiation-curable materials (I) containing 1-100 wt% compounds (A) with at least one cationically polymerisable 2,3-dihydrofuran (DHF) base unit (based on the total amt. of cationically and optionally radically polymerisable compounds) are irradiated with high-energy light. Also claimed are (i) radiation-curable materials (I), and (ii) compounds with 2 or more DHF units.

公开(公告)号：DE58909788D1

公开(公告)日：1997-05-07

申请号：DE58909788

申请日：1989-10-27

Applicant: BASF AG

Inventor： NGUYEN-KIM SON DR ,  HOFFMANN GERHARD DR ,  SCHWALM REINHOLD DR ,  BINDER HORST

IPC: G03F7/039 ,  C08F4/00 ,  G03F7/004 ,  H01L21/027 ,  H01L21/30

Abstract: The invention relates to a radiation-sensitive mixture essentially consisting of (a) a water-insoluble binder or binder mixture which is soluble in aqueous alkaline solutions, (b) a compound which upon irradiation forms a strong acid and (c) one or more organic compounds which inhibit the solubility of (a) in aqueous alkaline solutions, wherein the organic compound (c) is a beta -ketoacide ester. This radiation-sensitive mixture may be used to prepare photoresists.