公开(公告)号：US20100224790A1

公开(公告)日：2010-09-09

申请号：US12708737

申请日：2010-02-19

Applicant: Elmar Platzgummer ,  Heinrich Fragner ,  Stefan Cernusca

Inventor： Elmar Platzgummer ,  Heinrich Fragner ,  Stefan Cernusca

IPC: H01J3/26

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00

Abstract: In a particle multi-beam structuring apparatus for forming a pattern on a target's surface using a beam of electrically charged particles, during exposure steps the particle beam is produced, directed through a pattern definition means producing a patterned particle beam composed of multiple beamlets, and projected by an optical column including a controllable deflection means onto the target surface to form, at a nominal location on the target, a beam image comprising the image of defining structures in the pattern definition means. The beam image's nominal location relative to the target is changed between exposure steps. The actual location of the beam image is varied within each exposure step around the nominal location, through a set of locations realizing a distribution of locations within the image plane around a mean location coinciding with the nominal location, thus introducing an additional blur which is homogenous over the entire beam image.

Abstract translation: 在用于使用带电粒子束在目标表面上形成图案的粒子多光束结构装置中，在曝光步骤期间，通过产生由多个子束组成的图案化粒子束的图案定义装置产生粒子束，并且 通过包括可控偏转装置的光学柱被投影到目标表面上，以在目标的标称位置处形成包括图案定义装置中的限定结构的图像的光束图像。 相对于目标的光束图像的标称位置在曝光步骤之间改变。 射束图像的实际位置在标称位置周围的每个曝光步骤内通过一组位置实现，该位置实现在与标称位置重合的平均位置周围的图像平面内的位置的分布，从而引入均匀的附加模糊 在整个光束图像上。

公开(公告)号：US20100038554A1

公开(公告)日：2010-02-18

申请号：US12535744

申请日：2009-08-05

Applicant: Elmar Platzgummer ,  Heinrich Fragner ,  Stefan Cernusca

Inventor： Elmar Platzgummer ,  Heinrich Fragner ,  Stefan Cernusca

IPC: G21K1/00 ,  H01J3/26

CPC classification number: B82Y40/00 ,  B82Y10/00 ,  G03F1/20 ,  G03F7/70433 ,  H01J37/3174

Abstract: An improved aperture arrangement in a device for defining a pattern on a target, for use in a particle-beam exposure apparatus, by being irradiated with a beam of electrically charged particles and allowing passage of the beam only through a plurality of apertures. The device includes an aperture array having a plurality of apertures of identical shape defining the shape and relative position of beamlets permeating the apertures. A blanking device switches off the passage of selected beamlets permeating the apertures and defined by them. The apertures are arranged on the aperture array according to an arrangement deviating from a regular arrangement by small deviations, adjusting for distortions caused by the particle-beam exposure apparatus, and the size of the apertures of the aperture array differs across the aperture array in order to allow for an adjustment of the current radiated on the target through the apertures and the corresponding openings.

Abstract translation: 用于在靶上限定图案的装置中的改进的孔布置，用于粒子束曝光装置，通过照射带电粒子束并允许光束仅通过多个孔。 该装置包括孔阵列，该孔阵列具有多个相同形状的孔，限定穿透孔的子束的形状和相对位置。 消隐装置关闭穿过孔并由它们限定的选定子束的通过。 根据通过小偏差偏离规则排列的布置，孔径布置在孔阵列上，调整由粒子束曝光装置引起的变形，并且孔径阵列的孔径的大小沿孔径阵列依次不同 以允许通过孔和相应的开口调节在靶上辐射的电流。

公开(公告)号：US20080283767A1

公开(公告)日：2008-11-20

申请号：US12120130

申请日：2008-05-13

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: H01J3/14

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/1472 ,  H01J37/3177 ,  H01J2237/0437

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is set up to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming beamlets, which are imaged onto a target. A deflection array has a plurality of electrostatic deflector electrodes for each beamlet. Each deflector electrode can be applied an electrostatic potential individually. Counter electrodes are electrically connected to a counter potential independently of the deflection array through a counter-electrode array. The counter potentials may be a common ground potential or individual potentials in order to improve system reliability. In conjunction with an associated counter electrode, each deflector electrode deflects its beamlet sufficiently to deflect the beamlet off its nominal path when applied an activating voltage against the respective counter electrode.

Abstract translation: 一种用于粒子束处理或检查装置的多光束图案定义装置，其被设置为被一束带电粒子照射，并允许光束通过多个孔，从而形成子束， 成像到目标上。 偏转阵列具有用于每个子束的多个静电偏转器电极。 每个偏转器电极可以分别施加静电电位。 反电极通过对电极阵列独立于偏转阵列电连接到反电位。 为了提高系统的可靠性，反电势可能是共同的潜力或个别的潜力。 结合相关的对电极，当向相应的对电极施加激活电压时，每个偏转器电极充分偏转其子束以使子束偏离其标称路径。

公开(公告)号：US20080258084A1

公开(公告)日：2008-10-23

申请号：US11816353

申请日：2006-02-16

Applicant: Elmar Platzgummer ,  Stefan Cernusca ,  Gerhard Stengl

Inventor： Elmar Platzgummer ,  Stefan Cernusca ,  Gerhard Stengl

IPC: G21K5/00

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/3175 ,  H01J2237/31788 ,  H01J2237/31793

Abstract: A particle-beam projection processing apparatus for irradiating a target, with an illumination system for forming a wide-area illuminating beam of energetic electrically charged particles; a pattern definition means for positioning an aperture pattern in the path of the illuminating beam; and a projection system for projecting the beam thus patterned onto a target to be positioned after the projection system. A foil located across the path of the patterned beam is positioned between the pattern definition means and the position of the target at a location close to an image of the aperture pattern formed by the projection system.

Abstract translation: 一种用于照射目标的粒子束投影处理装置，具有用于形成能量带电粒子的广域照明光束的照明系统; 用于将光圈图案定位在照明光束的路径中的图案定义装置; 以及投影系统，用于将如此图案化的光束投影到待投影系统上的待定位的靶上。 位于图案化光束的路径上的箔位于图案定义装置之间并且位于靠近由投影系统形成的孔径图案的图像的位置处的目标的位置。

公开(公告)号：US20070125956A1

公开(公告)日：2007-06-07

申请号：US11700468

申请日：2007-01-31

Applicant: Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

Inventor： Herbert Buschbeck ,  Gertraud Lammer ,  Alfred Chalupka ,  Robert Nowak ,  Elmar Platzgummer ,  Gerhard Stengl

IPC: H01J3/14 ,  G21K1/08

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/21 ,  H01J37/304 ,  H01J2237/024 ,  H01J2237/10 ,  H01J2237/216 ,  H01J2237/30455

Abstract: In a particle-optical projection system a pattern is imaged onto a target by means of energetic electrically charged particles. The pattern is represented in a patterned beam of said charged particles emerging from the object plane through at least one cross-over; it is imaged into an image with a given size and distortion. To compensate for the Z-deviation of the image position from the actual positioning of the target (Z denotes an axial coordinate substantially parallel to the optical axis), without changing the size of the image, the system includes a position detector for measuring the Z-position of several locations of the target, and a controller for calculating modifications of selected lens parameters of the final particle-optical lens and controlling said lens parameters according to said modifications.

Abstract translation: 在粒子光学投影系统中，通过能量带电粒子将图案成像到靶上。 所述图案表示在所述带电粒子的图案化束中，所述带电粒子通过至少一个交叉从对象平面出射; 它被成像为具有给定尺寸和失真的图像。 为了补偿图像位置的Z偏差与目标的实际定位（Z表示基本上平行于光轴的轴向坐标），而不改变图像的尺寸，系统包括用于测量Z的位置检测器 - 位置，以及用于计算最终粒子 - 光学透镜的所选透镜参数的修改并根据所述修改来控制所述透镜参数的控制器。

公开(公告)号：US20050242303A1

公开(公告)日：2005-11-03

申请号：US11119514

申请日：2005-04-29

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G03F7/20 ,  G21K1/08 ,  G21K5/10 ,  H01J37/04 ,  H01J37/08 ,  H01J37/09 ,  H01J37/302 ,  H01J37/305 ,  H01J37/317 ,  H01L21/027

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  G21K1/08 ,  H01J37/045 ,  H01J37/3174 ,  H01J2237/31774

Abstract: In a pattern definition device for use in a particle-beam exposure apparatus a plurality of blanking openings (910) are arranged within a pattern definition field (bf) composed of a plurality of staggered lines (b1) of blanking openings, each provided with a deflection means controllable by a blanking signal (911); for the lines of blanking openings, according to a partition of the blanking openings of a line into several groups (g4,g5,g6), the deflection means of the blanking openings of each group are fed a common group blanking signal (911), and the group blanking signal of each group of a line is fed to the blanking means and connected to the respective blanking openings independently of the group blanking signals of the other groups of the same line.

Abstract translation: 在用于粒子束曝光装置的图案定义装置中，多个消隐开口（910）被布置在由多个交错布线（b 1）组成的图案定义区域（bf）内，每个设置有消隐开口 由消隐信号（911）控制的偏转装置; 对于消隐开口的线，根据将线的消隐开口划分成若干组（g 4，g 5，g 6），每组的消隐开口的偏转装置被馈送到公共组消隐信号（ 911），并且每组一组的组消隐信号被馈送到消隐装置并且独立于同一行的其他组的组消隐信号连接到各个消隐开口。

公开(公告)号：US08546767B2

公开(公告)日：2013-10-01

申请号：US12959270

申请日：2010-12-02

Applicant: Elmar Platzgummer ,  Hans Loeschner

Inventor： Elmar Platzgummer ,  Hans Loeschner

IPC: G21K1/08

CPC classification number: H01J37/045 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/28 ,  H01J37/3174 ,  H01J2237/0437 ,  H01J2237/0458 ,  H01J2237/1501 ,  H01J2237/1502

Abstract: A multi-beam pattern definition device (102) for use in a particle-beam processing or inspection apparatus is configured to be irradiated with a beam (lp,bp) of electrically charged particles so as to form a number of beamlets to be imaged to a target. An aperture array means (202) comprises at least two sets of apertures (221, 222) for defining respective beamlets (b1-b5), wherein the sets of apertures comprise a plurality of apertures arranged in interlacing arrangements and the apertures of different sets are offset to each other by a common displacement vector (d12). An opening array means (201) has a plurality of openings (210) configured for the passage of a subset of beamlets corresponding to one of the sets of apertures but lacking openings (being opaque to the beam) at locations corresponding to the other sets of apertures. A positioning means shifts the aperture array means relative to the opening array means in order to selectively bring one of the sets of apertures into alignment with the openings in the opening array means.

Abstract translation: 用于粒子束处理或检查装置的多光束图案定义装置（102）被配置为用带电粒子的束（lp，bp）照射，以便形成若干待成像的子束 一个目标。 孔径阵列装置（202）包括用于限定各个子束（b1-b5）的至少两组孔（221,222），其中所述孔组包括布置在隔行布置中的多个孔，并且不同组的孔是 通过公共位移矢量（d12）彼此偏移。 开口阵列装置（201）具有多个开口（210），所述多个开口（210）构造成用于通过对应于所述一组孔的子束的子集，但是在对应于其它组的位置处的位置处缺少开口（对于不透明的） 孔。 定位装置相对于开口阵列装置移动孔径阵列装置，以选择性地使组的一组孔与开口阵列装置中的开口对准。

公开(公告)号：US08368030B2

公开(公告)日：2013-02-05

申请号：US11988922

申请日：2006-07-20

Applicant: Elmar Platzgummer ,  Gerhard Stengl

Inventor： Elmar Platzgummer ,  Gerhard Stengl

IPC: G21K5/04

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/3174 ,  H01J2237/0435

Abstract: A beam manipulating arrangement for a multi beam application using charged particles comprises a multi-aperture plate having plural apertures traversed by beams of charged particles. A frame portion of the multi-aperture plate is heated to reduce temperature gradients within the multi-aperture plate. Further, a heat emissivity of a surface of the multi-aperture plate may be higher in some regions as compared to other regions in view of also reducing temperature gradients.

公开(公告)号：US08115183B2

公开(公告)日：2012-02-14

申请号：US12770904

申请日：2010-04-30

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: G21K5/10

CPC classification number: H01J37/3174 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/302 ,  H01J2237/30483

Abstract: For maskless irradiating a target with a beam of energetic electrically charged particles using a pattern definition means with a plurality of apertures and imaging the apertures in the pattern definition means onto a target which moves (v) relative to the pattern definition means laterally to the axis, the location of the image is moved along with the target, for a pixel exposure period within which a distance of relative movement of the target is covered which is at least a multiple of the width (w) of the aperture images as measured on the target, and after said pixel exposure period the location of the beam image is changed, which change of location generally compensates the overall movement of the location of the beam image.

Abstract translation: 对于使用具有多个孔的图案定义装置的用能量带电粒子束无目标地照射目标并且将图案定义装置中的孔成像到相对于图案定义装置（v）相对于轴线横向移动（v）的目标， 对于像素曝光期间，图像的位置与目标一起移动，在该像素曝光期间，覆盖目标的相对运动的距离，该距离至少是孔径图像的宽度（w）的倍数， 目标，并且在所述像素曝光周期之后，光束图像的位置改变，位置的变化通常补偿光束图像的位置的整体移动。

公开(公告)号：US08026495B2

公开(公告)日：2011-09-27

申请号：US12090632

申请日：2005-10-28

Applicant: Elmar Platzgummer

Inventor： Elmar Platzgummer

IPC: H01J37/04

CPC classification number: H01J37/3177 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/045 ,  H01J37/3023 ,  H01J2237/0435 ,  H01J2237/30472 ,  H01J2237/31754 ,  H01J2237/31774

Abstract: A charged particle beam exposure system has a blanking aperture array (31) having groups of apertures (53) controlled by shift registers (75), wherein different inputs (C) to the shift registers influence a different number of apertures. Charged particle beamlets traversing the apertures are scanned across a charged particle sensitive substrate in synchronism with a clock signal of the shift registers.

Abstract translation: 带电粒子束曝光系统具有由移位寄存器（75）控制的孔组（53）的消隐孔阵列（31），其中移位寄存器的不同输入（C）影响不同数量的孔。 与移位寄存器的时钟信号同步地，穿过孔径的带电粒子子束跨过带电粒子敏感衬底扫描。