公开(公告)号：BR8903078A

公开(公告)日：1990-02-06

申请号：BR8903078

申请日：1989-06-23

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  DOESSEL KARL-FRIEDRICH ,  LINGNAU JUERGEN ,  THEIS JUERGEN

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F7/10 ,  G03C1/68

Abstract: A radiation-curable composition which comprises a compound that forms an acid under the action of high-energy radiation and an acid-hardening substance, wherein the compound forming an acid contains aromatically linked chlorine or bromine and has a pKa value below 12. The composition and the recording material prepared therefrom display increased sensitivity, improved resolution and a high etch resistance after development.

公开(公告)号：SG43324A1

公开(公告)日：1997-10-17

申请号：SG1996008359

申请日：1990-08-30

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  MERREM HANS-JOACHIM ,  LINGNAU JUERGEN ,  DAMMEL RALPH ,  ROESCHERT HORST

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/016 ,  G03F7/075 ,  H01L21/027 ,  H01L21/30 ,  G03F

Abstract: A positive-working radiation-sensitive mixture is described which contains, as essential constituents, a) an alpha , alpha -bis(sulphonyl)diazomethane which forms a strong acid on irradiation and has the general formula where R is an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical, b) a compound containing at least one acid-cleavable C-O-C or C-O-Si bond, and c) a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solutions. The radiation-sensitive mixture according to the invention is remarkable for a high sensitivity over a wide spectral range. It also exhibits a high thermal stability and does not form any corrosive photolysis products on exposure.

公开(公告)号：ZA9201455B

公开(公告)日：1992-11-25

申请号：ZA9201455

申请日：1992-02-27

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  HORST ROESCHERT ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  DAMMEL RALPH ,  RALPH DAMMEL ,  MERREM HANS-JOACHIM ,  HANS-JOACHIM MERREM ,  FUCHS JUERGEN ,  JUERGEN FUCHS

IPC: B41M5/26 ,  C08F12/00 ,  C08F212/14 ,  G03F7/023 ,  H01L21/027 ,  C08F ,  C08L ,  G03F ,  H01L

CPC classification number: G03F7/023

公开(公告)号：CA2066086A1

公开(公告)日：1992-10-21

申请号：CA2066086

申请日：1992-04-15

Applicant: HOECHST AG

Inventor： PAWLOWSKI GEORG ,  ROESCHERT HORST ,  SPIESS WALTER ,  DAMMEL RALPH

IPC: C09K11/00 ,  C07C235/00 ,  C07C235/08 ,  C07C271/12 ,  C07C271/14 ,  C07C271/16 ,  C07C275/04 ,  C07C275/06 ,  C07C275/24 ,  C07C275/28 ,  C07C323/10 ,  C07D317/54 ,  C08G69/00 ,  C08G71/00 ,  G01D15/14 ,  G03F7/004 ,  G03F7/039 ,  C07C271/26 ,  C08G73/00 ,  C08G75/00 ,  C07F17/02 ,  G03F7/032 ,  C07D333/24 ,  C07C275/32 ,  C07C323/60 ,  C07D317/60 ,  G03C1/73

Abstract: Compounds having repeating units of the formula I (I) in which R1 is an alkylene, cycloalkylene, alkenylene, alkynylene, or arylenebisalkyl group, in which one or more aliphatic CH2 groups may be replaced by oxygen or sulfur atoms, R2 is an alkyl, alkenyl, alkynyl, cycloalkyl, alkoxyalkyl, aryl, aralkyl or aryloxyalkyl radical, R3 is an alkyl or aryl radical, X is -CO-, -O-CO- or -NH-CO-, and n is an integer greater than 1, especially from 3 to 50. are cleavable by acid and, in combination with photolytic acid donors and alkali-soluble binders, are constituents of positive-working mixtures which are used especially in recording materials for UV radiation and high-energy radiation. The materials are distinguished by a high resolution in conjunction with high image contrast.

公开(公告)号：MX9200826A

公开(公告)日：1992-08-01

申请号：MX9200826

申请日：1992-02-26

Applicant: HOECHST AG

Inventor： ROESCHERT HORST ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  FUCHS JUERGEN ,  DAMMEL RALPH

IPC: C08F8/30 ,  C08F12/00 ,  C08F12/14 ,  C08F212/14 ,  C08F220/20 ,  G03F7/039 ,  C08L61/00

Abstract: The invention relates to radiation-sensitive polymers, to a mixture essentially containing these radiation-sensitive polymers as binders and to a process for preparing the radiation-sensitive polymeric binder and also to a positive-working radiation-sensitive recording material which is produced using the radiation-sensitive mixture.

公开(公告)号：BR9001121A

公开(公告)日：1991-03-05

申请号：BR9001121

申请日：1990-03-09

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  LINGNAU JUERGEN ,  PAWLOWSKI GEORG ,  THEIS JUERGEN

IPC: G03F7/039 ,  C07C271/28 ,  C07C275/50 ,  C08K5/00 ,  C08L61/00 ,  C08L61/04 ,  G03F7/004 ,  H01L21/027 ,  G03F7/04

Abstract: A radiation-curable mixture is proposed which contains a compound which forms an acid when exposed to high-energy radiation and a compound which is acid-cleavable, and which is characterised in that the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa of less than 12 or is a derivative of a compound having such a pKa, which derivative can be converted into the free compound by acid catalysis. The composition claimed, and in particular the recording material prepared therefrom, has a higher sensitivity and an improved resolution, and in addition exhibits no image haze after development.

公开(公告)号：ZA901797B

公开(公告)日：1990-11-28

申请号：ZA901797

申请日：1990-03-08

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  PAWLOWSKI GEORG ,  GEORG PAWLOWSKI ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F

Abstract: A positive radiation-sensitive mixture is disclosed which contains a compound which forms an acid under the action of high-energy radiation, and an acid-cleavable compound, wherein the compound which forms an acid contains aliphatically bound halogen (chlorine or bromine) and has a pKa value of less than about 12 or is a derivative of a compound having such a pKa value which can be converted into the free compound by acid catalysis. A positive recording material and a process for recording high-energy radiation using the material are also disclosed. The mixture, and in particular the recording material produced therefrom, has relatively high sensitivity and improved resolution and, in addition, does not exhibit image fogging after development.

公开(公告)号：CA2007546A1

公开(公告)日：1990-07-12

申请号：CA2007546

申请日：1990-01-11

Applicant: HOECHST AG

Inventor： WILHARM PETER ,  MERREM HANS-JOACHIM ,  PAWLOWSKI GEORG ,  DAMMEL RALPH

IPC: G03F7/039 ,  A61K8/00 ,  A61Q17/04 ,  C07C245/18 ,  C07C271/10 ,  C07C271/20 ,  C07C271/24 ,  C07C275/10 ,  C07C275/26 ,  C07C275/32 ,  C07C275/40 ,  C07C323/12 ,  C07D209/48 ,  C07D251/34 ,  C07D295/14 ,  C08F2/50 ,  C09K3/00 ,  G03C1/52 ,  G03F7/004 ,  G03F7/016 ,  H01L21/027 ,  H01L21/30 ,  G03F7/021

Abstract: A positively operating radiation-sensitive mixture comprising a binder which is insoluble in water but soluble or at least swellable in aqueous alkaline solution, and as a photoactive component a polyfunctional .alpha.-diazo-.beta.-keto ester of the general formula I (I) in which R1 denotes an aliphatic, cycloaliphatic or araliphatic or aromatic radical having 4 to 20 carbon atoms, in which individual CH2 groups can be replaced by oxygen or sulfur atoms or by ? or NH groups and/or contain keto groups, X denotes an aliphatic, cycloaliphatic, carbocyclic, heterocyclic or aralilphatic radical having 2-to 22 carbon atoms, in which individual CH2 groups can be replaced by oxygen or sulfur atoms or by the groups -NR2-, -C(O)-O-, -C(O)-NR2-, -C(O)-?, NR2-C(O)-NR3-, -O-C(O)-NR2-, -O-C(O)-? or -O-C(O)-O-, or CH groups can be replaced by ?, in which R2 and R3 independently of one another represent hydrogen or an aliphatic, carbocyclic or araliphatic radical, m denotes an integer from 2 to 10 and ? n denotes an integer from 0 to 2, wherein m-n is ? 2, is described. The radiation-sensitive mixture is particularly suitable for exposure using radiation of wavelength 190 to 300 nm. ?

公开(公告)号：ZA8904743B

公开(公告)日：1990-04-25

申请号：ZA8904743

申请日：1989-06-22

Applicant: HOECHST AG

Inventor： DAMMEL RALPH ,  RALPH DAMMEL ,  DOESSEL KARL-FRIEDRICH ,  KARL-FRIEDRICH DOESSEL ,  LINGNAU JUERGEN ,  JUERGEN LINGNAU ,  THEIS JUERGEN ,  JUERGEN THEIS

IPC: G03F7/004 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  H01L21/30 ,  G03F ,  G03C

CPC classification number: G03F7/0295 ,  G03F7/0045

公开(公告)号：FI900537A0

公开(公告)日：1990-02-02

申请号：FI900537

申请日：1990-02-02

Applicant: HOECHST AG

Inventor： KAEMPF GUNTHER ,  FELDHUES MICHAEL ,  SCHEUNEMANN UDE ,  LINGNAU JURGEN ,  DAMMEL RALPH

IPC: G03F7/004 ,  C08G61/10 ,  C08G61/12 ,  G03F7/027 ,  G03F7/032 ,  G03F7/038 ,  H01L21/027 ,  G03F

Abstract: Standard polymers which are sensitive to ionising radiation and are used to produce resists cause electrostatic charges on irradiation and, consequently, fields which can be avoided by the resist composition according to the invention. A soluble, electrically conductive oligomer or polymer is added to the polymer. … …