公开(公告)号：JP2003100583A

公开(公告)日：2003-04-04

申请号：JP2001287407

申请日：2001-09-20

Applicant: SONY CORP

Inventor： YOSHIZAWA MASAKI

IPC: G03F1/20 ,  G03F7/20 ,  H01L21/027 ,  G03F1/16

Abstract: PROBLEM TO BE SOLVED: To provide a mask with small dislocation or distortion of a pattern and a manufacturing method of the mask, and provide a manufacturing method of a semiconductor device for forming a minute pattern with high accuracy. SOLUTION: In the manufacturing method, the mask includes a thin film 101 containing a plurality of separation regions D keeping away from each other, a hole 103, through which a charged particle beam (preferably, electron beam) is transmitted, located at a part of the separation region D, a beam 102 formed in contact with one face of a thin film 101 between the separation regions, a groove 104 formed at a part of the thin film 101 between the separation regions and attaining the beam 102, and a supporting frame 112 formed in contact with the other face of the thin film 101 located other than the separation region for supporting the thin film. The manufacturing method of the semiconductor device includes the lithographic process by using the mask.

公开(公告)号：JP2002287360A

公开(公告)日：2002-10-03

申请号：JP2001089063

申请日：2001-03-27

Applicant: SONY CORP

Inventor： YOSHIZAWA MASAKI

IPC: G03F7/038 ,  G03F7/039 ,  G03F7/26 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a method for designing a photosensitive composition so that a photosensitive composition having preferable resolution as well as high sensitivity can be obtained. SOLUTION: In the method for designing a chemically amplifying photosensitive composition containing an acid producing agent, the average distance in the exposed particles in an exposed area of the photosensitive composition when the composition is exposed according to the pattern or the average distance in the acids produced by the pattern exposure is calculated based on the sensitivity required for the photosensitive composition. Then the structural composition of the photosensitive composition is determined in such a manner that the diffusion length of the acids produced from the acid producing agent by the above pattern exposure is longer than the calculated average distance.

公开(公告)号：JP2002208548A

公开(公告)日：2002-07-26

申请号：JP2001001344

申请日：2001-01-09

Applicant: SONY CORP

Inventor： YOSHIZAWA MASAKI

IPC: G03F7/38 ,  G03F7/20 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To improve the dimensional accuracy of a resist pattern by reducing variation in the dimension of the resist pattern that depends on the shelf time of a substrate in vacuum. SOLUTION: A resist-coating/developing device 10 measures transport time TF required for carrying a wafer that is coated with resist to a vacuum chamber 121 for carrying out/in of a vacuum aligner 12. Also, time TD from time it takes for exposing one chip on a wafer to light in the vacuum aligner 12 to the completion of exposure to all chips formed on the wafer is calculated. When the transport time TF is subtracted from the exposure time TD, transport to the vacuum chamber 21 for carrying out/in of the wafer is started, thus making constant the vacuum shelf time T when the wafer is exposed to vacuum in the vacuum aligner 12 including the vacuum chamber 12 for carrying out/in and stabilizing the dimensions of the resist pattern.

公开(公告)号：JP2000252340A

公开(公告)日：2000-09-14

申请号：JP5412999

申请日：1999-03-02

Applicant: SONY CORP

Inventor： YOSHIZAWA MASAKI ,  MORIYA SHIGERU

IPC: H01L21/68 ,  G03F7/20 ,  H01L21/027 ,  H01L21/66

Abstract: PROBLEM TO BE SOLVED: To measure a relative misalignment between transferred patterns which are successively exposed on a substrate by dividing a designed pattern into a plurality of parts. SOLUTION: An element for measuring connecting accuracy is composed of first and second patterns 31 and 41 which are respectively transferred onto a semiconductor wafer by exposing fields fa and fb, formed in a single conductor layer, and electrically interconnected in the connected positional relation corresponding to the relative misalignment between the transferred patterns. The patterns 31 and 41 have current applying terminals for applying current, and a plurality of potential measuring terminals which output the potential corresponding to the relative connected positional relation between the patterns 31 and 41 when a current is impressed.

公开(公告)号：JP2000090522A

公开(公告)日：2000-03-31

申请号：JP25863698

申请日：1998-09-11

Applicant: SONY CORP

Inventor： IKEDA KATSUMI ,  YOSHIZAWA MASAKI ,  KANO YASUAKI ,  NAKAMURA OSAMU

IPC: G11B15/665

Abstract: PROBLEM TO BE SOLVED: To reduce the occurrence frequency of errors of a loading motor. SOLUTION: By a system controller, the loading motor is controlled for driving (S001-S003) with a constant voltage at the time of normal loading operation. When the operational error of the loading motor is detected (S002), the control is made (S007, S008) so that the retry is carried out (S005, S006) by the driving with the constant voltage in the case of the operational error of the loading motor at the first time and by the PWM voltage in the case of the operational error at the second time or more.

公开(公告)号：JPH11312348A

公开(公告)日：1999-11-09

申请号：JP11764898

申请日：1998-04-28

Applicant: SONY CORP

Inventor： MAEKAWA KATSUMI ,  YOSHIZAWA MASAKI ,  KANO YASUAKI ,  YOSHIDA MASAKI ,  IKEDA KATSUMI ,  KATO TATSUYA

IPC: G11B23/30 ,  G11B15/07 ,  G11B15/675

Abstract: PROBLEM TO BE SOLVED: To prevent the occurrence of defective contact due to the sticking of foreign matter on contact point terminals or a connector of an auxiliary storage device of the cartridge at the time of loading the tape cartridge. SOLUTION: The device is provided with a movable connector holder 72, that a spring terminal 101 is attached/detached to and from the contact point terminals 53 of the auxiliary storage device 50 of the tape cartridge 1 with the turning operation, and constituted so that the spring terminal 101 is abutted on the contact terminals 53 while turning around a pivotal shaft 111 when the tape cartridge 1 comes to the position where the loading is completed, then the sliding distance of the spring terminal 101 from the contact point terminals 53 is extended so that the foreign matter being stuck to the contact terminals 53, etc., if any, is removed.

公开(公告)号：JPH10320709A

公开(公告)日：1998-12-04

申请号：JP12937197

申请日：1997-05-20

Applicant: SONY CORP

Inventor： KIYOTA MASAHIRO ,  HIRAMOTO TAKAO ,  SAKAMA MITSUNORI ,  TAKAYAMA YOSHIHISA ,  YOSHIZAWA MASAKI ,  MAEKAWA KATSUMI ,  KOSEKI KAZUYA

IPC: G11B33/02 ,  G11B5/02 ,  G11B33/12

Abstract: PROBLEM TO BE SOLVED: To attain simplification of the structure of a tape reel and easiness of the assembling of a magnetic tape, in the case a latest recording/reproducing device with built-in magnetic tape is provided for which the magnetic tape originally used as removal media is used as fixed type recording media similar to a hard disk, etc., without adhering the compatibility. SOLUTION: The magnetic tape 5 wound between supply and take-up reels 3, 4, a capstan 8 for driving the running of this magnetic tape 5, a rotary head drum 11 for recording/reproducing the information against the magnetic tape 5, and the like, are all housed in one hermetically sealed case 2, then upper flanges of the supply and take-up reels 3, 4 are obviated and also a pair of these upper flanges are shared by one fixed upper flange plate.

公开(公告)号：JPH06150455A

公开(公告)日：1994-05-31

申请号：JP29850592

申请日：1992-11-09

Applicant: SONY CORP

Inventor： YOSHIZAWA MASAKI

IPC: G11B15/43 ,  G11B15/46

Abstract: PURPOSE:To control a tape tension in a constant state by absorbing the variance for each set, and to unnecessitate a large capacity ROM. CONSTITUTION:When the set is used, the current I corresponding to a tape winding diameter R for making the tape tension F constant in a microcomputer 11 is calculated by an approximate expression, and the calculated value is supplied to a modulation circuit 12 as a control signal SCi, and a PWM signal corresponding to the control signal SCi is obtained from this modulation circuit 12, then a motor 15 is driven by smoothing the PWM signal by an LPF 13 and supplying it to a constant current drive circuit 14. At the time of adjustment in a production line, constants A-C in the approximate expression optimum for each set are stored in the ROM 21, then the constants A-C are read out from the ROM 21 and used, when the current I is calculated. The tape tension can be controlled in the constant state since the variance for each set is perfectly absorbed. The large capacity ROM is unnecessitated as the current I is obtained by the calculation of the approximate expression.

公开(公告)号：JPH02149192A

公开(公告)日：1990-06-07

申请号：JP30366188

申请日：1988-11-30

Applicant: SONY CORP

Inventor： YOSHIZAWA MASAKI ,  SUDO YUTAKA

IPC: H04N5/93 ,  H04N9/87

Abstract: PURPOSE:To obtain picture quality equivalent to that in the normal reproduction mode by not passing a reproduced color video signal through a JOG circuit and inserting a pseudo vertical synchronizing signal to the reproduced color video signal in the specific mode being a vari-speed reproduction mode. CONSTITUTION:In the case of a specific mode being a vari-speed reproduction mode (JOG mode), a switch 8 is thrown to the position of a contact (a) and a switch 9 is thrown to the position of a contact (b) and a reproduced color video signal obtained at the output of an adder 6 does not pass through a JOG circuit 7 but is fed to a pseudo vertical synchronizing signal insertion circuit 10, in which the pseudo vertical synchronizing signal from an input terminal is inserted and the result is outputted to an output terminal 11. Thus, since the same color video signal is obtained as the substantial normal reproduction mode at the output terminal 11, the picture quality is not deteriorated.

公开(公告)号：JP2007179056A

公开(公告)日：2007-07-12

申请号：JP2006346100

申请日：2006-12-22

Applicant: Interuniv Micro Electronica Centrum Vzw ,  Sony Corp ,  アンテルユニヴェルシテール・ミクロ−エレクトロニカ・サントリュム・ヴェー・ゼッド・ドゥブルヴェInteruniversitair Micro−Elektronica Centrum Vzw ,  ソニー株式会社

Inventor： YOSHIZAWA MASAKI ,  LEUNISSEN LEONARDUS

IPC: G03F1/00

CPC classification number: G03F1/32

Abstract: PROBLEM TO BE SOLVED: To provide an improved attenuated phase shift mask, a method of manufacturing such an attenuated phase shift mask and a method for using such an attenuated phase shift mask. SOLUTION: The present invention relates to an attenuated phase shift mask suitable for hyper NA lithographic processing of a device, to a method for making such a mask and to hyper NA lithographic processing using such a mask. The attenuated phase shift mask is made taking into consideration the effect of the numerical aperture of the lithographic system. COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供改进的衰减相移掩模，制造这种衰减相移掩模的方法和使用这种衰减相移掩模的方法。 解决方案：本发明涉及适用于器件的超NA光刻处理的衰减相移掩模，涉及制造这种掩模的方法和使用这种掩模的超NA光刻处理。 衰减的相移掩模是考虑到光刻系统的数值孔径的影响。 版权所有（C）2007，JPO＆INPIT