公开(公告)号：EP0341960A2

公开(公告)日：1989-11-15

申请号：EP89304644.1

申请日：1989-05-08

Applicant: Hewlett-Packard Company

Inventor： Wayne, Kenneth.J.

IPC: G01J9/02 ,  G01B9/02

CPC classification number: G01B9/02041 ,  G01B9/02059 ,  G01J9/02 ,  G01J2009/0234 ,  G01J2009/0261 ,  G01J2009/0284

Abstract: Method and apparatus for obtaining an enhanced clearer measurement signal with improved fringe contrast from a laser interferometer. The interferometer sends a laser beam (12) through atmospheric air to a polarizing or nonpolarizing beamsplitter (13) that sends one laser beam portion (14,16) to a fixed reference retroreflector (15) and another portion (19,21) to a movable measurement retroreflector (20). Both beams, upon retroreflection go back to the beamsplitter and are recombined to produce a combined beam (22) that is then sent to an aperture (30) such that only a small selected portion of that combined beam passes through the aperture, attenuating the energy of the combined beam but increasing its fringe contrast. This portion is sent to a detector (32) and is subsequently amplified by a high-gain amplifier.

Abstract translation: 用于与从激光干涉条纹改进造影增强的更清晰的测量信号的获取方法和装置。 干涉仪发送，通过大气的激光束（12）的偏振或非偏振分束器（13）没有在发送部分中的一个激光束（14,16），以固定的参考后向反射器（15）而另一部分（19,21）到 可动测量后向反射器（20）。 两个光束中，在回射返回到分束器和再结合以产生组合光束（22）并然后被发送到在孔（30）检测只做的并组合光束的小的选定部分通过所述开口部，衰减的能量 的组合波束的但增加其条纹对比度。 该部分被发送到检测器（32），并随后通过一个高增益放大器放大。

公开(公告)号：US20230144290A1

公开(公告)日：2023-05-11

申请号：US17915434

申请日：2020-12-11

Applicant: Beijing RSLaser Opto-Electronics Technology Co., Ltd.

Inventor： Guangyi LIU ,  Rui JIANG ,  Xiaoquan HAN ,  Jiangshan ZHAO ,  Pengfei SHA ,  Qingqing YIN ,  Hua ZHANG

IPC: G01J9/02

CPC classification number: G01J9/0246 ,  G01J2009/0234 ,  G01J2009/0257

Abstract: According to the present disclosure, there is provided a device (2) and a method for measuring a wavelength for a laser device. The device (2) for measuring a wavelength for a laser device includes: a first optical path assembly and a second optical path assembly. The first optical path assembly and the second optical path assembly constitute a laser wavelength measurement optical path. The second optical path assembly includes: an FP etalon assembly (11) and an optical classifier (13). The homogenized laser beam passes through the FP etalon assembly (11) to generate an interference fringe. The optical classifier (13) is arranged after the FP etalon assembly (11) in the laser wavelength measurement optical path, and configured to deflect the laser beam passing through the FP etalon assembly (11). The FP etalon assembly (11) allows two FP etalons (FP1, FP2) to share the same optical path for an interference imaging, and therefore a compact structure having a small volume, a simple design, and a high stability are achieved. In cooperation with the optical classifier (13), a precise measurement for a laser wavelength may be achieved, and at the same time a wavelength measurement range is large. It is suitable for an online measurement for a laser wavelength and a corresponding closed-loop control feedback.

公开(公告)号：US08294903B2

公开(公告)日：2012-10-23

申请号：US12864760

申请日：2009-09-29

Applicant: Hirotoshi Oikaze ,  Takashi Urashima

Inventor： Hirotoshi Oikaze ,  Takashi Urashima

IPC: G01B11/02

CPC classification number: G01B11/2441 ,  G01B9/02007 ,  G01B9/02069 ,  G01B9/02083 ,  G01B9/0209 ,  G01J2009/0234

Abstract: The measurement accuracy of an apparatus for measuring the surface shape of an object utilizing a two-wavelength phase-shift interferometry is improved. A low-coherence light source, a plurality of wavelength filters with different transmission wavelengths, an angle control unit and an analysis unit are provided. When performing a two-wavelength phase shift method, the analysis unit detects the wavelength difference between two wavelengths, and corrects a calculated wavelength value and a calculated phase value of one of the wavelengths for preventing a fringe-order calculation error. Next, the angle of the wavelength filters is controlled for making the actual wavelength difference coincident with a designed value. Thus, the wavelength difference between the two wavelengths is continuously controlled to be constant, which enables measurements of surface shapes with high accuracy, even when there are wavelength fluctuations due to the temperature change or the time elapse.

Abstract translation: 提高了利用双波长相移干涉法测量物体的表面形状的装置的测量精度。 提供了低相干光源，具有不同透射波长的多个波长滤光器，角度控制单元和分析单元。 当执行双波长相移方法时，分析单元检测两个波长之间的波长差，并校正计算的波长值和计算出的波长之一的相位值，以防止边缘阶计算误差。 接下来，控制波长滤波器的角度，使实际波长差与设计值一致。 因此，即使当由于温度变化或时间经过而导致波长波动时，两个波长之间的波长差被连续地控制为恒定，这使得能够高精度地测量表面形状。

公开(公告)号：US20090219494A1

公开(公告)日：2009-09-03

申请号：US12392746

申请日：2009-02-25

Applicant: Osamu Kakuchi

Inventor： Osamu Kakuchi

IPC: G03B27/00 ,  G01B11/03 ,  G01B9/02 ,  G06F15/00

CPC classification number: G01M11/0271 ,  G01J2009/0234 ,  G03B27/00 ,  G03F7/706

Abstract: An evaluation method of evaluating an optical characteristic of an optical system to be evaluated using an interferometer, comprises a first acquisition step of acquiring a first interference fringe formed by the interferometer when a location of a movable element of the interferometer in an optical axis direction of the optical system is a first location, a second acquisition step of acquiring a second interference fringe formed by the interferometer when the location of the movable element in the optical axis direction is a second location different from the first location, a determination step of determining a pupil-center coordinate of the optical system based on the acquired first interference fringe and the acquired second interference fringe, and a computation step of computing the optical characteristic of the optical system using the pupil-center coordinate determined in the determination step.

Abstract translation: 使用干涉仪评价光学系统的光学特性的评价方法包括：第一获取步骤，当干涉仪的可动元件的位置在光轴方向上时，获取由干涉仪形成的第一干涉条纹 光学系统是第一位置，第二采集步骤，当可移动元件在光轴方向上的位置是不同于第一位置的第二位置时，获取由干涉仪形成的第二干涉条纹;确定步骤，确定 基于获取的第一干涉条纹和获取的第二干涉条纹，光学系统的瞳孔中心坐标，以及计算步骤，使用在确定步骤中确定的瞳孔中心坐标来计算光学系统的光学特性。

公开(公告)号：US07564568B2

公开(公告)日：2009-07-21

申请号：US11680968

申请日：2007-03-01

Applicant: Peter De Groot ,  Leslie L. Deck

Inventor： Peter De Groot ,  Leslie L. Deck

IPC: G01B11/02

CPC classification number: G01B9/02011 ,  G01B9/02002 ,  G01B9/02004 ,  G01B9/02007 ,  G01B9/02012 ,  G01B9/02057 ,  G01B2290/45 ,  G01B2290/70 ,  G01J2009/0234 ,  G01J2009/0265

Abstract: An interferometer system is disclosed which is configured to combine measurement light with reference light to form an optical interference pattern, where the interferometer system includes a modulator configured to repetitively introduce a sequence of phase shifts between the measurement and reference light; and a camera system positioned to measure the optical interference pattern, where the camera system is configured to separately accumulate time-integrated images of the optical interference pattern corresponding to the different phase shifts in the sequence during the repetitions of the sequence.

Abstract translation: 公开了一种干涉仪系统，其被配置为将测量光与参考光结合以形成光学干涉图案，其中所述干涉仪系统包括被配置为在所述测量参考光和所述参考光之间重复地引入相移序列的调制器; 以及定位成测量光学干涉图案的相机系统，其中相机系统被配置为在序列的重复期间分别累积对应于序列中的不同相移的光学干涉图案的时间集成图像。

公开(公告)号：US20080043224A1

公开(公告)日：2008-02-21

申请号：US11770582

申请日：2007-06-28

Applicant: Raymond Castonguay ,  Piotr Szwaykowski

Inventor： Raymond Castonguay ,  Piotr Szwaykowski

IPC: G01N21/00

CPC classification number: G01B9/02081 ,  G01B2290/45 ,  G01B2290/70 ,  G01J9/02 ,  G01J2009/0234 ,  G01J2009/0261

Abstract: An optical measuring apparatus for comprising, in combination, a polarization type interferometer including a polarization type beam splitter in which a polarized beam of light is split into orthogonally polarized reference and test beams, an array of detectors arranged in a line for creating a plurality of phase shifting interferograms, and a scanning device for moving the object in a direction perpendicular to a long axis of the detectors.

Abstract translation: 一种光学测量装置，其组合包括偏振型干涉仪，该偏振型干涉仪包括偏振光束分离器，其中偏振光束被分成正交偏振的参考和测试光束，检测器阵列布置成一行，用于创建多个 相移干涉图，以及用于沿与检测器的长轴垂直的方向移动物体的扫描装置。

公开(公告)号：US20060007447A1

公开(公告)日：2006-01-12

申请号：US11216548

申请日：2005-08-30

Applicant: James Snyder ,  Stephen Kwiatkowski

Inventor： James Snyder ,  Stephen Kwiatkowski

IPC: G01B9/02

CPC classification number: H01S3/13 ,  G01J9/0246 ,  G01J2009/0234

Abstract: A method and system for controlling the wavelength of light emitted by a tunable laser. The system includes a wavelength tuner that provides information of a desired wavelength; a coupler for tapping a portion of the light from the tunable laser; and an apparatus for measuring the actual wavelength of the light. The apparatus takes the portion of the light as an input signal and splits the input signal into two beams that are directed through two paths of different optical lengths. Then, the two beams are interfered with each other in order to form a fringe pattern at an observation plane, where the fringe pattern is detected and analyzed to determine the wavelength of the light. A processor compares the difference between the desired and determined wavelengths, and sends a tuning signal to the tunable laser forming a feedback control of the tunable laser.

Abstract translation: 一种用于控制由可调激光器发射的光的波长的方法和系统。 该系统包括提供期望波长的信息的波长调谐器; 用于对来自可调激光器的一部分光进行点击的耦合器; 以及用于测量光的实际波长的装置。 该装置将光的一部分作为输入信号，并将输入信号分成两束通过不同光学长度的两条路径的光束。 然后，两个光束彼此干涉，以在观察平面上形成条纹图案，其中检测和分析条纹图案以确定光的波长。 处理器比较期望波长和确定波长之间的差异，并将调谐信号发送到可调激光器，形成可调激光器的反馈控制。

公开(公告)号：US4836681A

公开(公告)日：1989-06-06

申请号：US867026

申请日：1986-05-27

Applicant: John G. Van Saders ,  Andrew Tarasevich ,  Michael C. Reichenbach

Inventor： John G. Van Saders ,  Andrew Tarasevich ,  Michael C. Reichenbach

IPC: G01J9/02

CPC classification number: G01J9/02 ,  G01J2009/0234

Abstract: Electro-optical apparatus measures the average relative phase of an incident wave fringe pattern. The subject fringe, e.g., an interferometric pattern, passes through three sections of an optical mask, one characterized by fixed transmissivity and the other two by quadrature-displaced spatial fringe patterns. The light passing through each section is separately collected and detected to average the respective incident wave/mask section interactions. The phase of the incident fringe pattern relative to the mask is then determined by arithmetically processing the detected signals.In accordance with one aspect of the present invention, the subject fringe pattern is time modulated and the quadrature-shifted mask signals A-C coupled to obviate the requirement for the third, fixed transmissivity mask section.

Abstract translation: 电光装置测量入射波纹图案的平均相对相位。 被摄体边缘（例如干涉图案）通过光学掩模的三个部分，其中一个特征在于固定的透射率，另外两个部分通过正交位移的空间条纹图案。 通过每个部分的光被单独收集和检测以平均相应的入射波/掩模部分相互作用。 然后通过对检测到的信号进行算术处理来确定入射条纹图案相对于掩模的相位。 根据本发明的一个方面，本发明的条纹图案是时间调制的，并且正交移位的掩模信号A-C耦合以消除对第三固定透射率掩模部分的要求。

公开(公告)号：US4624569A

公开(公告)日：1986-11-25

申请号：US514875

申请日：1983-07-18

Applicant: Osuk Y. Kwon

Inventor： Osuk Y. Kwon

IPC: G01J9/02 ,  G01B9/02

CPC classification number: G01J9/02 ,  G01J2009/0223 ,  G01J2009/0234

Abstract: A real-time diffraction interferometer for analyzing an optical beam comprises converging means (13) for bringing the beam to a focus at focal point (14), and an apertured grating structure (20) positionable adjacent the focal point (14). The apertured grating structure (20) comprises a transparent substrate (10'), an obverse surface of which is coated with a translucent coating (11) except for a pinhole-sized spot (12) that is left uncoated so as to function as an aperture in the coating (11). A reverse surface of the substrate (10') has a lenticulate surface configuration, which functions as a diffraction grating. The beam incident upon the apertured grating structure (20) is separated into a major portion, which is transmitted with attenuated intensity through the translucent coating (11), and a minor portion, which is transmitted with undiminished intensity through the pinhole aperture (12). The major portion of the beam is diffracted into spatially separated diffraction components, and the minor portion of the beam is diffracted by the pinhole aperture (12) so as to acquire a spherical wavefront. Interference patterns produced by interference of the spherical wavefront with each of the wavefronts of the zeroth order and the positive and negative first-order diffraction components of the intensity-attenuated beam transmitted by the coating (11) are separately imaged on conventional solid-state photodetectors (21, 22 and 23).

Abstract translation: 用于分析光束的实时衍射干涉仪包括用于使光束在焦点（14）处聚焦的会聚装置（13）和可邻近焦点（14）定位的有孔光栅结构（20）。 有孔光栅结构（20）包括透明基板（10'），其正面具有半透明涂层（11），除了未被涂覆的针孔尺寸的光斑（12）以便发挥作用 涂层（11）中的孔径。 衬底（10'）的反面具有微透镜表面构造，其用作衍射光栅。 入射到有孔光栅结构（20）上的光束被分离成主要部分，其通过半透明涂层（11）以衰减的强度透射，并且小部分以未衰减的强度通过针孔（12）传播， 。 光束的主要部分衍射成空间分离的衍射分量，并且光束的次要部分被针孔（12）衍射，以获得球面波前。 通过球面波前与由涂层（11）传播的强度衰减光束的零阶的波前和正和负的一阶衍射分量产生的干涉图案分别成像在常规固态光电检测器 （21,22,23）。

公开(公告)号：WO2010023442A3

公开(公告)日：2010-08-26

申请号：PCT/GB2009002071

申请日：2009-08-25

Applicant: UNIV GLASGOW ,  WEAVER JONATHAN MARK RALPH ,  DOBSON PHILLIP STEPHEN ,  BURT DAVID PAUL ,  THOMS STEPHEN ,  DOCHERTY KEVIN EDWARD ,  ZHANG YUAN

Inventor： WEAVER JONATHAN MARK RALPH ,  DOBSON PHILLIP STEPHEN ,  BURT DAVID PAUL ,  THOMS STEPHEN ,  DOCHERTY KEVIN EDWARD ,  ZHANG YUAN

IPC: G01D5/26 ,  G01D11/00

CPC classification number: G01D5/266 ,  G01D5/38 ,  G01D11/00 ,  G01J9/0246 ,  G01J2009/0234 ,  G01N21/45 ,  G03H1/0005

Abstract: Various uses of visible light interference patterns are provided. Suitable interference patterns are those formed by diffraction from patterns of apertures. Typical uses disclosed herein relate to spatial metrology, such as a translational and/or angular position determination system. Further uses include the analysis of properties of the light itself (such as the determination of the wavelength of the electromagnetic radiation). Still further uses include the analysis of one or more properties (e.g. refractive index) of the matter through which the light passes. Part of the interference pattern is captured at a pixellated detector, such as a CCD chip, and the captured pattern compared with a calculated pattern. Very precise measurements of the spacing between maxima is possible, thus allowing very precise measurements of position of the detector in the interference pattern.

Abstract translation: 提供了可见光干涉图案的各种用途。 合适的干涉图案是由孔径图案衍射形成的图案。 这里公开的典型用途涉及空间度量，例如平移和/或角度位置确定系统。 其他用途包括光本身性质的分析（例如确定电磁辐射的波长）。 另外的用途包括分析光通过的物质的一种或多种性质（例如折射率）。 部分干涉图案在诸如CCD芯片的像素化检测器处捕获，并且捕获的图案与计算出的图案相比较。 可以非常精确地测量最大值之间的间距，从而可以非常精确地测量干涉条纹中探测器的位置。