公开(公告)号：EP3033613A1

公开(公告)日：2016-06-22

申请号：EP14835869.0

申请日：2014-08-08

Applicant: Swinburne University of Technology

Inventor： JUODKAZIS, Saulius ,  GERVINSKAS, Gediminas ,  SENIUTINAS, Gediminas

IPC: G01N23/00 ,  G21K1/00

CPC classification number: H01J37/265 ,  B82Y40/00 ,  G01N23/225 ,  G01N2223/073 ,  G01N2223/351 ,  G01N2223/611 ,  G21K5/00 ,  H01J37/00 ,  H01J37/263 ,  H01J37/28 ,  H01J37/3002 ,  H01J37/3178 ,  H01J2237/004 ,  H01J2237/0047 ,  H01J2237/28

Abstract: An apparatus for imaging or fabrication using charged particles, the apparatus including: a charged particle source configured to generate a charged particle beam of ions or electrons; a sample holder mounted relative to the charged particle source to hold a sample in the charged particle beam for the imaging or fabrication; and an optical source system configured to generate an optical beam, wherein the optical source system is mounted relative to the sample holder to direct the optical beam onto the sample to modify an electric charge of the sample during the imaging or fabrication to improve spatial resolution of the imaging or fabrication.

Abstract translation: 一种使用带电粒子进行成像或制造的设备，所述设备包括：带电粒子源，其被配置为产生离子或电子的带电粒子束; 相对于带电粒子源安装的样品架，以将样品保持在带电粒子束中用于成像或制造; 以及配置成产生光束的光源系统，其中所述光源系统相对于所述样本保持器安装以将所述光束引导到所述样本上以在所述成像或制造期间修改所述样本的电荷以改善 成像或制造。

公开(公告)号：EP2629079A2

公开(公告)日：2013-08-21

申请号：EP13155360.4

申请日：2013-02-15

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Stegmann, Heiko

IPC: G01N1/28

CPC classification number: G01N23/04 ,  G01N1/286 ,  G01N1/32 ,  G01N2001/045 ,  G01N2001/2886 ,  H01J37/00 ,  H01J37/317 ,  H01J2237/206 ,  H01J2237/31745 ,  H01J2237/31749

Abstract: Verfahren und Vorrichtungen zur Präparation mikroskopischer Proben mittels Lichtpulsen, wobei Volumen abgetragen werden, die größer als 100 µm 3 sind. Das Verfahren umfasst folgende Schritte:
- Inspizieren eines Objekts mittels eines Rasterelektronenmikroskops (REM) oder eines fokussierten Ionenstrahls (FIB), wobei ein Bild des Objekts aufgenommen wird
- Festlegen eines zu untersuchenden Bereichs des Objekts
- Festlegen eines Laser-Bearbeitungsweges anhand des Bilds des Objekts derart, dass eine Probe aus dem Objekt herauspräpariert werden kann.
- Entfernen eines abzutragenden Volumens durch Laserbearbeitung entlang des festgelegten Laser-Bearbeitungswegs
- Inspizieren des Objekts mittels Rasterelektronenmikroskop (REM) oder fokussiertem Ionenstrahl (FIB).

Abstract translation: 该方法包括基于对象的图像来确定要处理的对象的路径，使得从对象准备样本。 使用扫描电子显微镜（SEM）或聚焦离子束（FIB）测定图像。 该路径暴露于激光脉冲以从物体移除体积，其中体积大于100立方微米。 用SEM或FIB对物体进行检查（201），在暴露于激光脉冲的过程中物体不被观察。 物体从一个处理室转移到另一个处理室。 还包括用于通过使用脉冲光制备显微镜样品的方法的独立权利要求。

公开(公告)号：EP2613338A2

公开(公告)日：2013-07-10

申请号：EP13150442.5

申请日：2013-01-08

Applicant: FEI Company

Inventor： Swanson, Lynwood ,  Schwind, Gregory ,  Kellogg, Sean ,  Liu, Kun

IPC: H01J37/073

CPC classification number: H01J37/00 ,  G01T1/29 ,  H01J37/02 ,  H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/065

Abstract: The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by a series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.

Abstract translation: 发射极的状态可以通过测量电流如何随提取电压而变化来确定。 场因子²功能由在不同条件下发射的带电粒子的一系列相对简单的测量来确定。 然后可以使用场因子来确定在现有技术中难以确定的衍射特征，而不需要从聚焦柱移除源并将其安装在专门的装置中。 关系由源配置确定，并且已经被发现与发射体形状无关，因此，随着时间的推移，可以确定发射体形状随着发射体形状的变化，而不必确定发射体的形状，而不必重新定义 场因子和一系列相对简单的测量，以及场因子与其他发射参数之间的关系。

公开(公告)号：EP0054016B1

公开(公告)日：1986-08-06

申请号：EP82100887.7

申请日：1979-10-31

Applicant: Tetra Laval Holdings & Finance SA

Inventor： Cheever, Richard Norcross

IPC: H01J33/00 ,  A61L2/08 ,  G21K5/02

CPC classification number: H01J37/00 ,  A61L2/08

公开(公告)号：EP3005991A4

公开(公告)日：2017-03-29

申请号：EP14803631

申请日：2014-05-28

Applicant: LIFETECH SCIENT (SHENZHEN) CO LTD

Inventor： ZHANG DEYUAN ,  WANG WENBIN ,  LIU ZIQIANG

IPC: A61F2/82 ,  A61L31/02 ,  A61L31/14 ,  A61L31/16 ,  C23C8/02 ,  C23C8/26 ,  C23C8/38 ,  C23C8/80 ,  C23F1/00 ,  H01J37/00

CPC classification number: A61L31/022 ,  A61L31/148 ,  A61L31/16 ,  C23C8/02 ,  C23C8/26 ,  C23C8/38 ,  C23C8/80 ,  C23F1/00 ,  H01J37/00 ,  H01J2237/316

Abstract: Disclosed is a manufacturing method of an iron-based alloy medical apparatus, comprising: nitriding the iron-based alloy preformed unit at 350-550°C for 30- 100 minutes; and ion etching the iron-based alloy preformed unit with an ion etching time of 80-110% of the nitriding time. Ion nitriding and ion etching can be performed in situ in the same equipment using this manufacture method with high production efficiency, and in the ion nitriding and ion etching process, nitrogen atoms continuously permeate the preformed unit, making the time it takes for the medical apparatus to be absorbed by the human body and both the hardness and strength of the instrument surface achieve requirements.

Abstract translation: 本发明公开了一种铁基合金医疗装置的制造方法，其特征在于，在350〜550℃下将铁基合金预成型体氮化30〜100分钟。 离子腐蚀时间为氮化时间的80-110％，离子刻蚀铁基合金预成型单元。 离子氮化和离子蚀刻可以使用这种具有高生产效率的制造方法在同一设备中原位进行，并且在离子氮化和离子蚀刻工艺中，氮原子连续地渗透到预成型单元中，使得医疗设备需要时间 被人体吸收，仪器表面的硬度和强度都达到要求。

公开(公告)号：EP3079803A1

公开(公告)日：2016-10-19

申请号：EP14796145.2

申请日：2014-11-12

Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.

Inventor： RÖGNER, Frank-Holm ,  WEIDAUER, André ,  MATTAUSCH, Gösta ,  KUBUSCH, Jörg

IPC: B01J8/12 ,  B01J19/08 ,  H01J37/00 ,  H01J37/06

CPC classification number: A01C1/08 ,  A61L2/087 ,  A61L2/26 ,  A61L2202/11 ,  B01J8/12 ,  B01J19/085 ,  B01J2219/0815 ,  B01J2219/0833 ,  B01J2219/0879 ,  G21K5/00 ,  H01J37/00 ,  H01J37/06 ,  H01J37/077 ,  H01J2237/06375 ,  H01J2237/15

Abstract: The invention relates to an apparatus comprising at least one electron beam generator (301) for generating accelerated electrons with which bulk material particles (303) can be acted on while they are in freefall, wherein the electron beam generator (301) is of annular design and in which the electrons which are emitted and accelerated by an annular cathode exit from an electron outlet window in the direction of the ring axis; wherein the annular electron beam generator (301) is arranged in such a way that the ring axis of said electron beam generator is oriented perpendicular to or at an angle of up to 45° from the horizontal, and wherein a device for separating bulk material particles is arranged above the annular electron beam generator, the bottom wall (304) of said device having at least one opening out of which the bulk material particles (303) fall and from there fall through the ring which is formed by the electron beam generator (301).

Abstract translation: 一种装置包括至少一个用于产生加速电子的电子束发生器，在自由落体期间，大量材料颗粒可以被冲击。 电子束发生器具有环形设计，其中电子被环形阴极发射和加速。 电子从电子出口窗口沿着环轴线的方向离开。 环形电子束发生器被布置成使得电子束发生器的环轴垂直于或与水平方向成45度的角度定向。 该装置还可以包括用于分离布置在环形电子束发生器上方的散装材料颗粒的装置，所述装置的底壁具有至少一个开口，大块材料颗粒从该开口突出，并从其中通过环 由电子束发生器形成。

公开(公告)号：EP3005991A1

公开(公告)日：2016-04-13

申请号：EP14803631.2

申请日：2014-05-28

Applicant: Lifetech Scientific (Shenzhen) Co., Ltd.

Inventor： ZHANG, Deyuan ,  WANG, Wenbin ,  LIU, Ziqiang

IPC: A61F2/82

CPC classification number: A61L31/022 ,  A61L31/148 ,  A61L31/16 ,  C23C8/02 ,  C23C8/26 ,  C23C8/38 ,  C23C8/80 ,  C23F1/00 ,  H01J37/00 ,  H01J2237/316

Abstract: Disclosed is a manufacturing method of an iron-based alloy medical apparatus, comprising: nitriding the iron-based alloy preformed unit at 350-550°C for 30- 100 minutes; and ion etching the iron-based alloy preformed unit with an ion etching time of 80-110% of the nitriding time. Ion nitriding and ion etching can be performed in situ in the same equipment using this manufacture method with high production efficiency, and in the ion nitriding and ion etching process, nitrogen atoms continuously permeate the preformed unit, making the time it takes for the medical apparatus to be absorbed by the human body and both the hardness and strength of the instrument surface achieve requirements.

公开(公告)号：EP2613338A3

公开(公告)日：2015-04-08

申请号：EP13150442.5

申请日：2013-01-08

Applicant: FEI Company

Inventor： Swanson, Lynwood ,  Schwind, Gregory ,  Kellogg, Sean ,  Liu, Kun

IPC: H01J37/073

CPC classification number: H01J37/00 ,  G01T1/29 ,  H01J37/02 ,  H01J37/073 ,  H01J2237/06316 ,  H01J2237/06341 ,  H01J2237/065

Abstract: The state of an emitter can be determined by measurements of how the current changes with the extraction voltage. A field factor β function is determined by a series of relatively simple measurements of charged particles emitted at different conditions. The field factor can then be used to determine derived characteristics of the emission that, in the prior art, were difficult to determine without removing the source from the focusing column and mounting it in a specialized apparatus. The relations are determined by the source configuration and have been found to be independent of the emitter shape, and so emission character can be determined as the emitter shape changes over time, without having to determine the emitter shape and without having to redefine the relation between the field factor and the series of relatively simple measurements, and the relationships between the field factor and other emission parameters.

公开(公告)号：EP2808118A1

公开(公告)日：2014-12-03

申请号：EP14163895.7

申请日：2014-04-08

Applicant: Master Dynamic Limited

Inventor： Hui, Koon Chung ,  Ching, Ho ,  Kong, Ching Tom

IPC: B23K26/00

CPC classification number: B01J19/081 ,  B41M3/14 ,  C30B29/04 ,  C30B29/16 ,  C30B29/20 ,  C30B29/34 ,  C30B33/04 ,  H01J37/00 ,  H01J37/3178 ,  Y10T428/24355

Abstract: A method of forming one or more protrusions on an outer surface of a polished face of a solid state material includes the step of applying focused inert gas ion beam local irradiation (105) towards an outer surface of a polished facet of a solid state material (109) so as to form a protrusion (401) on the outer surface; wherein irradiated focused inert gas ions from said focused inert gas ion bean penetrate the outer surface of said polished facet of said solid state material; and wherein irradiated focused inert gas ions cause expansive strain within the solid state crystal lattice of the solid state material below said outer surface at a pressure so as to induce expansion of solid state crystal lattice, and form a protrusion on the outer surface of the polished face of said solid state material.

Abstract translation: 形成一个或多个凸部的方法是在（在固态材料的抛光面的外表面包括施加朝聚焦惰性气体离子束局部照射（105），以固态材料的抛光面的外表面的步骤 109），以便形成所述外表面上的突起（401）; worin照射从所述聚焦惰性气体离子聚焦惰性气体离子束穿透所述固态材料。所述抛光面的外表面; 和worin照射聚焦惰性气体离子引起下面所述外表面的固态材料的固态晶格内膨胀应变的压力以便诱导固态晶格的膨胀，和抛光的外表面上形成的突起 固态材料的所述面。

公开(公告)号：EP0044926A1

公开(公告)日：1982-02-03

申请号：EP81104435.3

申请日：1981-06-10

Applicant: International Business Machines Corporation

Inventor： Aliotta, Carmelo Ferdinand ,  Anschel Morris

IPC: H01J37/00

CPC classification number: H01J37/00 ,  Y10T428/12465 ,  Y10T428/12826 ,  Y10T428/12875 ,  Y10T428/12993

Abstract: A resolution standard for a scanning electron microscope consists of spiked clusters of palladium formed on a molybdenum substrate. The clusters are widely scattered so that a cluster can be acquired easily for a resolution test. The tips of the spikes on the clusters are of the order of 50 Angstroms and they present a sharp clear image to an electron microscope that is operating properly. The palladium clusters can be formed by treating the cleaned surface of a molybdenum substrate with an aqueous solution of palladium chloride.