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公开(公告)号：KR1020080006911A
公开(公告)日：2008-01-17
申请号：KR1020060066245
申请日：2006-07-14
Applicant: 전자부품연구원
Abstract: An AFM(Atomic Force Microscope) cantilever probe and a method for manufacturing the same are provided to facilitate setting of thickness of the cantilever with the microscopic probe and obtain desired natural resonance frequency of the cantilever. An AFM(Atomic Force Microscope) cantilever probe(200) comprises a handling part(240), a cantilever part(230), a probe part(210), and a probe(220). The handling part is made of a semiconductor substrate. The cantilever is elongated in bar-shape on the bottom of the handling part. The probe part, elongating on one side of the cantilever part, is shaped in vertically projected peak. The probe, provided on the peak of the probe part, makes contact with a surface of an analyzing object.
Abstract translation: 提供了一种AFM（原子力显微镜）悬臂探头及其制造方法，以便于利用微型探针设置悬臂的厚度，并获得悬臂的所需天然共振频率。 AFM（原子力显微镜）悬臂探针（200）包括处理部分（240），悬臂部分（230），探针部分（210）和探针（220）。 处理部由半导体基板构成。 悬臂在处理部分的底部呈杆形伸长。 在悬臂部分的一侧伸长的探针部分成形为垂直投影的峰。 在探针部分的峰上提供的探针与分析对象的表面接触。
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公开(公告)号：KR1020070009789A
公开(公告)日：2007-01-19
申请号：KR1020050063672
申请日：2005-07-14
Applicant: 전자부품연구원
IPC: G01Q60/38 , H01L21/027 , H01L21/31 , H01L21/324
CPC classification number: G01Q60/38 , H01L21/0273 , H01L21/31 , H01L21/324
Abstract: A probe of an AFM(Atomic Force Microscope) cantilever using a ferroelectric is provided to precisely measure the electric polarization of the ferroelectric by using the ferroelectric in the probe of the cantilever. A probe of an AFM(Atomic Force Microscope) cantilever using a ferroelectric includes a cantilever support(100), an insulation layer(110), a metal layer(120), and a ferroelectric(130). The insulation layer is formed on the cantilever support. The metal layer is formed on the insulation layer. The ferroelectric is formed at the tip head of the metal layer. The ferroelectric has a domain of 180 degrees. The ferroelectric uses a PZT.
Abstract translation: 提供使用铁电体的AFM（原子力显微镜）悬臂的探针，通过在悬臂的探针中使用铁电体来精确测量铁电体的电极化。 使用铁电体的AFM（原子力显微镜）悬臂的探针包括悬臂支撑件（100），绝缘层（110），金属层（120）和铁电体（130）。 绝缘层形成在悬臂支架上。 金属层形成在绝缘层上。 铁电体形成在金属层的尖端处。 铁电体具有180度的域。 铁电使用PZT。
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公开(公告)号：KR1020060005047A
公开(公告)日：2006-01-17
申请号：KR1020040053875
申请日：2004-07-12
Applicant: 전자부품연구원
IPC: H01L27/105
CPC classification number: H01L28/55 , H01L21/02197 , H01L21/02266
Abstract: 본 발명은 단결정 기판과, 상기 단결정 기판 위에 증착되어 하부 전극으로 작용하며 고온 초전도 특성을 가지는 전도성 산화물 박막과, 상기 전도성 산화물 박막 위에 증착되는 강유전체 박막을 포함하는 초전도 전극을 이용한 나노스토리지 강유전체 매체구조에 관한 것이다.
본 발명에 따르면 나노스토리지 강유전체 매체구조에서 요구되는 특성인 표면 거칠기가 나노미터 정도일 것과 결정학적 정렬성이 우수할 것과 강유전체 도메인의 표면 전위가 충분히 클 것과 같은 조건을 만족하는 매체구조를 실현할 수 있다.
강유전체 박막, 고온 초전도 특성, 나노스토리지, 전도성 산화물, 전극-
公开(公告)号：KR1020050020052A
公开(公告)日：2005-03-04
申请号：KR1020030057695
申请日：2003-08-20
Applicant: 전자부품연구원
IPC: G01N13/16
Abstract: PURPOSE: A method for forming a channel of a cantilever for an atomic force microscope having an FET is provided to reduce a width of a channel of the cantilever without using an electric beam lithography process. CONSTITUTION: A method for forming a channel of a cantilever for an atomic force microscope having an FET includes forming a probe at a front end of the cantilever upwardly extending from a supporting part. A channel is formed at a lower region of the probe of the cantilever. At least two insulation layers(120) are stacked on an upper surface of a silicon layer(110) in which first conductive impurities are doped. The channel is formed at the silicon layer(110). The two insulation layers(120) are formed by using mutually different materials.
Abstract translation: 目的：提供一种用于形成具有FET的原子力显微镜的悬臂的通道的方法，以便不使用电子束光刻工艺来减小悬臂的通道的宽度。 构成：用于形成具有FET的原子力显微镜的悬臂的通道的方法包括在悬臂的前端形成从支撑部向上延伸的探针。 在悬臂的探针的下部区域形成有通道。 至少两个绝缘层（120）堆叠在其中掺杂有第一导电杂质的硅层（110）的上表面上。 沟道形成在硅层（110）处。 两个绝缘层（120）通过使用相互不同的材料形成。
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Patent Agency Ranking
公开(公告)号：KR1020170077369A
公开(公告)日：2017-07-06
申请号：KR1020150187190
申请日：2015-12-28
Applicant: 전자부품연구원
Abstract: 본발명의일 실시예에따른인쇄기술을활용한전파흡수패턴제조방법은전파흡수패턴을설계하는단계, 인쇄기술을통하여전도성잉크또는자성잉크를기판에인쇄하여, 상기기판에상기전파흡수패턴을형성하는단계, 및상기인쇄된전파흡수패턴을건조시키는단계를포함할수 있다.
Abstract translation: 根据本发明实施例的使用印刷技术制造电磁波吸收图案的方法包括以下步骤：设计电磁波吸收图案，通过印刷技术在基底上印刷导电油墨或磁性油墨， 并干燥印刷的无线电波吸收图案。
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公开(公告)号：KR1020160074182A
公开(公告)日：2016-06-28
申请号：KR1020140183163
申请日：2014-12-18
Applicant: 전자부품연구원 , 울산대학교 산학협력단
CPC classification number: H01L51/5262 , H01L27/3206 , H01L51/5016 , H01L51/5036 , H01L2227/32
Abstract: 유기발광필름및 이를사용한디스플레이장치가개시된다. 본발명의유기발광필름은, 미세패턴으로인쇄되어적색, 녹색및 청색의화소로구성되는유기발광체와, 상기유기발광물체상부에배치되며, 입사되는빛을상기유기발광체에전달하는호스트부를포함한다.
Abstract translation: 公开了具有通过印刷方法简单地形成的精细图案的高分辨率有机发光膜和使用其的显示装置。 本发明的有机发光膜包括：印有微细图案的有机发光体，由红色，绿色和蓝色像素构成; 以及主体单元，其布置在所述发光体的上部，并且将入射光转移到所述有机发光体。
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公开(公告)号：KR1020140109706A
公开(公告)日：2014-09-16
申请号：KR1020130024034
申请日：2013-03-06
Applicant: 전자부품연구원
CPC classification number: H01L51/56 , H01L21/0228 , H01L21/205 , H05B33/10
Abstract: Disclosed is a manufacturing method of an OLED substrate. A manufacturing method of an OLED substrate, according to an embodiment of the present invention comprises: a first step of forming a plurality of nanostructures separated at fixed intervals to expose part of the surface of the substrate by using a chemical bath deposition (CBD) method on one surface or both surfaces of the substrate; and a second step of etching the exposed part of the substrate and forming an uneven structure on the surface of the substrate.
Abstract translation: 公开了OLED基板的制造方法。 根据本发明的实施例的OLED基板的制造方法包括：第一步骤，形成以固定间隔分开的多个纳米结构，以通过使用化学浴沉积（CBD）方法来暴露基板表面的一部分 在基板的一个表面或两个表面上; 以及蚀刻所述基板的暴露部分并在所述基板的表面上形成不均匀结构的第二步骤。
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公开(公告)号：KR1020090019226A
公开(公告)日：2009-02-25
申请号：KR1020070083492
申请日：2007-08-20
Applicant: 전자부품연구원
IPC: C03C17/30
CPC classification number: C03C23/006 , C03C17/32 , C03C23/007
Abstract: A silica glass film formation method for passivating surface using polysilazane is provided to have no deformity by impurity when cured in a room temperature and to form glass film having high density. A glass film formation method for passivating surface comprises steps of: coating polysilazane on a substrate; and curing the polysilazane by using atmospheric pressure plasma process. A process time of the curing step is 10-20 minutes. A processing temperature of the curing step is 50~120°C. A process gas of the atmospheric pressure plasma process is argon gas and oxygen gas.
Abstract translation: 提供使用聚硅氮烷钝化表面的二氧化硅玻璃膜形成方法，其在室温下固化时不会产生杂质变形，并形成高密度的玻璃膜。 钝化表面的玻璃成膜方法包括以下步骤：在基材上涂布聚硅氮烷; 并使用大气压等离子体处理固化聚硅氮烷。 固化步骤的处理时间为10-20分钟。 固化步骤的加工温度为50〜120℃。 大气压等离子体工艺的工艺气体是氩气和氧气。
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公开(公告)号：KR1020090019059A
公开(公告)日：2009-02-25
申请号：KR1020070083195
申请日：2007-08-20
Applicant: 전자부품연구원
IPC: B32B33/00
CPC classification number: B32B33/00 , B32B17/06 , B32B38/0008 , B32B2255/205 , B32B2307/402 , B32B2307/554 , B32B2307/584 , B32B2310/14
Abstract: A structure having a glass protection layer formed on the surface thereof is provided to protect the surface of the structure from scratches, wear, finger printing, dust, etc. while maintaining color or gloss of the substrate, to reduce the entire coating process time, and to allow the glass protection layer to exhibit best physical properties even at room temperature. In a structure having a glass protection layer(240) in which a matrix(210) and a silver coating layer(220) are sequentially formed, a structure having a glass protection layer formed on the surface thereof comprises the glass protection layer formed on the silver coating layer using polysilazane. The structure having a glass protection layer formed on the surface thereof further comprises a coloring layer(230) formed between the silver coating layer and glass protection layer to display gloss and color of the structure. The formation of the glass protection layer is performed using atmospheric pressure plasma hardening, pressurized wet hardening, or seam hardening. The sliver coating layer and glass protection layer are formed by spray coating, dip coating, or spin coating. The glass protection layer is coated to a thickness of 0.1 to 5 mum.
Abstract translation: 提供了在其表面上形成有玻璃保护层的结构，以保持结构的表面免受划伤，磨损，指纹印刷，灰尘等，同时保持基底的颜色或光泽，从而减少整个涂布处理时间， 并且即使在室温下也允许玻璃保护层表现出最好的物理性能。 在其中依次形成有基体（210）和银涂层（220）的玻璃保护层（240）的结构中，在其表面上形成有玻璃保护层的结构包括形成在玻璃保护层 银涂层采用聚硅氮烷。 具有形成在其表面上的玻璃保护层的结构还包括形成在银涂层和玻璃保护层之间的着色层（230），以显示结构的光泽和颜色。 玻璃保护层的形成使用大气压等离子体硬化，加压湿固化或接缝硬化进行。 纱线涂层和玻璃保护层通过喷涂，浸涂或旋涂形成。 将玻璃保护层涂覆至0.1〜5μm的厚度。
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