公开(公告)号：JPH10135102A

公开(公告)日：1998-05-22

申请号：JP28381496

申请日：1996-10-25

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  MURAKI MASATO ,  MATSUI SHIN ,  MIYAKE AKIRA ,  OKUNUKI MASAHIKO

IPC: G21K5/04 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To improve the throughput by correcting the aberration which occurs when the electron beam from an arcuate area of an object defined by two circular arcs with center at the optical axis of a microelectronic optical system passes through a projection optical system. SOLUTION: When an electron beam at a wire area is focused on a wafer, the aberration (esp. curvature of field, astigmatism) increases away from the optical axis (esp. raidally outward from the optical axis) of an electron optical system. An electron beam at an arcuate region defined between two circular arcs with center at the optical axis is used therefor to nearly eliminate the curvature of field at an exposed region but leaving an astigmatism which is also nearly eliminated by means for correcting the dispersion or convergence different in the radial and tangential directions of the electron beam in the exposed region, since this beam has focal positions nearly the same in the radial and tangential directions.

公开(公告)号：JPH0968599A

公开(公告)日：1997-03-11

申请号：JP22357095

申请日：1995-08-31

Applicant: CANON KK

Inventor： WATANABE YUTAKA ,  TERAJIMA SHIGERU

IPC: G21K5/00 ,  G21K5/02 ,  G21K5/04 ,  H01J5/18 ,  H05H7/00 ,  H05H13/04

Abstract: PROBLEM TO BE SOLVED: To prevent the occurrence of the breakage accident of a radiation transmitting window by providing a support frame for airtightly supporting the radiation transmitting window and the periphery of the transmitting window, and a flange for airtightly supporting the periphery of the support frame. SOLUTION: A diamond film is formed on a Si substrate and circularly back-etched, whereby an X-ray transmitting film 11 made of diamond is provided on a ring-like substrate 12. The substrate 12 is airtightly adhered and fixed to a ring-like support frame 13 circularly grooved to form a partially thinned part by epoxy adhesives. Further, the support frame 13 is airtightly adhered and fixed to the flange 13 by epoxy adhesives. According to such a structure, since the deformation of the flange in bolt fastening of the flange 13 is absorbed by the deformation of the thin part of the groove, the inside of the support frame 13 having the substrate 12 airtightly fixed thereto is never deformed, and the possibility of an accident of breaking the X-ray transmitting film 11 can be minimized.

公开(公告)号：JPH0267718A

公开(公告)日：1990-03-07

申请号：JP21852288

申请日：1988-09-02

Applicant: CANON KK

Inventor： KUROSAWA HIROSHI ,  AMAMIYA MITSUAKI ,  TERAJIMA SHIGERU ,  UDA KOJI ,  SHIMODA ISAMU ,  UZAWA SHUNICHI

IPC: H05H13/04 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To obtain data on a profile having a large S/N ratio by a method wherein the illuminance distribution of a synchrotron radiant light in the viscosity of a mask or a wafer is metered immediately after electrons are injected in a storage ring and after an exchange of a transmitting window. CONSTITUTION:If an aligner 9 is started, a controller 6 discriminates whether a transmitting window 5 is exchanged or not and if the window 5 is exchanged, electrons are injected in a storage ring 2 and after the injection is completed, an instrumentation of a profile is conducted by an X-ray detector 18. As the instrumentation method, a method of measuring by moving a stage 19 mounted with the detector 19 at several places decided in advance in an exposure region is applied. On the basis of this data, a control table for a shutter 11 is made. In case the window 5 is not exchanged, whether an electron injection is performed in the ring 2 or not is discriminated and in the case of being immediately after the electron injection, a measurement of an illuminance distribution, which is performed by the X-ray detector 18, is conducted. In case the electron injection is not performed, a normal exposure operation is conducted.

公开(公告)号：JPH028059A

公开(公告)日：1990-01-11

申请号：JP15795788

申请日：1988-06-28

Applicant: CANON KK

Inventor： SAKANO YOSHIKAZU ,  TERAJIMA SHIGERU ,  KAWASE TOSHIMITSU ,  ENARI MASAHIKO

IPC: B41J2/21 ,  B41J2/05 ,  B41J2/155

Abstract: PURPOSE:To enable a high-density, high-accuracy color recording by defining orifices, disposed skewly relative to the feeding direction of a recording material, alternately by continuous partition walls to that different-colored recording liquids can be supplied. CONSTITUTION:A heat generating element 14 is provided at each of part at which a transverse wiring 12 and a longitudinal wiring 13 intersect skewly each other on a substrate 11. On the upper side of the elements 14, orifices 15 are arranged skewly relative to the longitudinal direction, and odd ones of the orifices 15 and even ones of the orifices 15 are made to communicate respectively with different liquid passages 18 by partition walls 17. For instance, the liquid passage 18 communicating with orifices O1, O3,... is supplied with a yellow ink, the liquid passage 18 communicating with orifices O2, O4,... is supplied with a cyan ink, the liquid passage 18 communicating with orifices O33, O35,... is supplied with a magenta ink, and the liquid passage 18 communicating with orifices O34, O36,... is supplied with a magenta ink, and the liquid passage 18 communicating with orifices O34, O36,... is supplied with a black ink. When the heat generating elements 14 in the passages for the respective colors are driven on a time-sharing basis in synchronism with the feeding velocity of a recording paper, the respective color inks can be ejected selectively from the individual orifices 15 in a direction normal to an orifice plate 16, thereby performing multicolor recording.

公开(公告)号：JPH01305518A

公开(公告)日：1989-12-08

申请号：JP13561688

申请日：1988-06-03

Applicant: CANON KK

Inventor： TERAJIMA SHIGERU ,  AMAMIYA MITSUAKI

IPC: G03F7/20 ,  H01L21/027 ,  H01L21/30

Abstract: PURPOSE:To perform optimum temperature control for a mask and wafer, by a structure wherein illuminance is measured through predetermined filters, and the control for exposure time and the temperature control for the mask and wafer are performed on the basis of the measured results. CONSTITUTION:A supporting plate 201 is moved to align a hole 202 with the position of a sensor 206 by which illuminance is measured. The measured result is then stored in a CPU 307. Next, the supporting plate 201 is again moved to measure the illuminance through a filter. The measured result is again stored in the CPU 307. On the basis of the measured values, the CPU 307 issues a command to both a shutter control section 304 and a temperature control section 305, thereby controlling both exposure time and temperature. In a similar manner, the controlled results on the basis of the illuminance measured through the other filter are compared with each other to perform an optimum control.

公开(公告)号：JPS6420151A

公开(公告)日：1989-01-24

申请号：JP17658987

申请日：1987-07-15

Applicant: CANON KK

Inventor： ENARI MASAHIKO ,  SAKANO YOSHIKAZU ,  TERAJIMA SHIGERU ,  KAWASE TOSHIMITSU ,  KASUGAYAMA YUKIO

IPC: B41J2/05 ,  B41J2/16 ,  H01L29/861

Abstract: PURPOSE:To enhance yield and to reduce cost, by a method wherein a large number of longitudinal wirings and a large number of transverse wirings are provided to a substrate so as not cross each other at a right angle and rectifying elements generating heat by forward current continuity are provided to the intersecting parts of the longitudinal wirings and the transverse wirings. CONSTITUTION:The transverse wirings S1-S32 and longitudinal wirings I1-I104 provided to a substrate 1 cross each other at an angle theta (not a right angle) and the orifices sigma1-sigma3328 formed to an orifice plate 2 are arranged to the intersecting points thereof. P-type amorphous silicon 6 and N-type amorphous silicon 7 are respectively formed by a plasma CVD method and a P-N junction is constituted and, therefore, no current flows from the longitudinal wiring I to the transverse wirings S and only the current from the transverse wiring S to the longitudinal wiring I flows. At this time, when the resistor in the forward direction of a rectifying element is set to about 10OMEGA, a rectifying element generates heat by applying forward voltage of about 10V between the longitudinal wiring I and the transverse wring S and a liquid droplet is emitted from the orifice sigma and the rectifying element plays the role as a heat generating element.

公开(公告)号：JPS63247052A

公开(公告)日：1988-10-13

申请号：JP8112987

申请日：1987-04-03

Applicant: CANON KK

Inventor： KAWASE TOSHIMITSU ,  TERAJIMA SHIGERU ,  SHIMIZU TETSUYA ,  ENARI MASAHIKO ,  SAKANO YOSHIKAZU

IPC: B41J2/05 ,  B41J2/14

Abstract: PURPOSE:To enhance the yield of production of an ink jet recording head, by providing a plurality of ejecting ports for ejecting a liquid, a plurality of first heat generating elements disposed correspondingly to the ejecting ports, respectively, and second heat generating elements each of which is disposed over the positions of a plurality of the first heat generating elements. CONSTITUTION:Ejecting heat generating elements 1 are so provided that 64 ones thereof constitute one block, and heat generating elements 6 for preliminary heating are provided, one for each block, on the lower side of the elements 1, with an insulating layer 5 therebetween. Thus, 64 ejecting heat generating elements 1 are disposed for each one of the heat generating elements 6 for preliminary heating. When both heat generating signals are applied through a selective combination of driving electrodes 11 (I1-I64) for the ejecting heat generating elements and driving electrodes 10 (S1-S52), a recording liquid reaches a predetermined foaming temperature at the part in a liquid chamber 4 at which the signals are applied, and a bubble is generated in the recording liquid present on the upper side of the ejecting heat generating element 1, whereby the liquid can be ejected through an orifice 2.