Abstract:
PROBLEM TO BE SOLVED: To prepare a substantially homogeneous polymer blend suitable for use in photoresist compositions for lithography. SOLUTION: The polymer blend is provided for use in the photoresist compositions (specifically, chemical amplification-type photoresists) for lithography. In a preferable embodiment, the polymer blend is substantially transparent for far-ultraviolet radiation (i.e., a radiation having >250 nm wavelengths including 157 nm, 193 nm and 248 nm wavelengths) and has improved photosensitivity and resolution. The respective processes for preparing and using the polymer blend are also provided as well as the photoresist compositions for lithography containing the polymer blend. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a photoresist composition capable of ensuring suitability to high resolution lithography using imaging radiation of 193 nm and to provide a lithographic process using the photoresist composition. SOLUTION: An acid catalyzed positive photoresist composition is provided by using a resist composition containing a cycloolefin polymer with a cydoolefin monomer having a lactone moiety. The photoresist can be imaged with radiation of 193 nm and is developed to form a photoresist structure with improved development characteristics and improved etching resistance. The monomer has no oxygen atom between the lactone moiety and a cycloolefin ring. The lactone moiety is appropriately spirolactone (5- or 6-membered ring) which bonds directly to the cycloolefin ring.
Abstract:
PROBLEM TO BE SOLVED: To provide a photoresist composition having so improved resolution as to enable high resolution lithography performance using imaging radiation of 193 nm. SOLUTION: The photoresist composition is obtained by using an imaging copolymer so as to improve a known alternating copolymer-base photoresist. The imaging copolymer is characterized by the presence of at least a third monomer which enhances the resolution of the photoresist. The performance of the composition is further improved by using a bulky acid active protective group on the imaging copolymer. An alkyl functional cyclicolefin is particularly suitable for use as the third monomer.
Abstract:
PROBLEM TO BE SOLVED: To provide a resist which exhibits excellent nature and is capable of forming a resist image of high resolution by using a photoresist composition containing a photosensitive component as well as a group unstable to an acid, resin containing a polymer having m-hydroxyphenyl group and p-hydroxyphenyl group. SOLUTION: This composition contains the three distinct repeating units; 1) the unit containing the group unstable to the acid, 2) the unit containing the m-hydroxyphenyl group by the polymerization of m-hydroxystyrene or m- hydroxy α-methylstyrene and 3) the p-hydroxyphenyl group by the polymerization of p-hydroxystyrene or p-hydroxy α-methylstyrene. The desirable copolymer is denoted by formula. In the formula, W denotes the unit containing the photoacid unstable group; R1 and R2 denote substituents exclusive of hydrogen; R3, R4, R5 denote hydrogen or (substituted)alkyl; m and n denote 0 to 4 and x, y and z respectively denote the molar fractions or molar per cent of the respective units of the polymers.
Abstract:
PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition having high transparency to a radiation, excellent in basic properties as a resist, such as sensitivity, resolution, dry etching resistance and pattern shape and suitable for use as a chemically amplified resist. SOLUTION: The radiation-sensitive resin composition comprises (A) a resin which contains a repeating unit derived from α-perfluoroalkylacrylic esters typified by t-butyl α-trifluoromethylacrylate and a repeating unit derived from a norbornene compound typified by 5-ä2-hydroxy-2, 2-di(trifluoromethyl)ethyl}bicyclo[2.2.1]hept-2-ene or a compound of formula 7 as essential units and becomes alkali-soluble by the action of an acid and (B) a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO
Abstract:
PROBLEM TO BE SOLVED: To provide a recording device and a recording system shortening the backup time by reducing reading and writing during backup on invalid data such as erased data. SOLUTION: The recording devices 41, 42 are provided with data storage parts 12, 22 using storage media of disk shape; data arrangement storage parts 13, 23 storing arrangement information on the respective storage data; control parts 51, 61 carrying out writing and reading of data using the arrangement information of the data arrangement storage parts 13, 23; and operating condition storage parts 52, 62 for storing operating condition information showing whether the respective storage regions of the data storage parts 12, 22 are effective regions with data written or invalid regions without data written. In the case of receiving a read request stored in the data storage parts 12, 22, the control parts 51, 61 select only the effective region to read the data, using the operating condition information of the operating condition storage parts 52, 62. COPYRIGHT: (C)2003,JPO
Abstract:
PROBLEM TO BE SOLVED: To enable a user 15 to efficiently know a suitable translated word concerning an unknown word when a word, which is not registered on a dictionary 48, or unknown word as a compound word exists in a machine translation system 40. SOLUTION: A translated sentence preparing means 45 prepares a translated sentence, with which unknown words are not translated while keeping original descriptions and only known words are translated. A translated sentence display means 51 displays the translated sentence prepared by the translated sentence preparing means 45. Concerning the unknown words in the translated sentence under displaying, a link setting means 52 sets the link of retrieval performance in a retrieval field corresponding to the field of the subject of original sentences in the search field of a prescribed Internet connected search engine.
Abstract:
PURPOSE: To obtain a chemically sensitized photoresist compsn. having high heat stability and sensitive to an acid. CONSTITUTION: This photoresist compsn. contains a photosensitive acid generating body and a polymer contg. a reactional product of hydroxystyrene with an acrylate, a methacrylate or a mixture of them, has improved heat stability and is almost independent of pollutants in air.