公开(公告)号：EP2983679A4

公开(公告)日：2017-05-31

申请号：EP14782236

申请日：2014-03-31

Applicant: IBM ,  AGENCY SCIENCE TECH & RES

Inventor： COADY DANIEL JOSEPH ,  DIPIETRO RICHARD ANTHONY ,  ENGLER AMANDA CATHERINE ,  HEDRICK JAMES LUPTON ,  CHIN WILLY ,  LEE ASHLYNN L Z ,  NG VICTOR W L ,  ONG ZHAN-YUIN ,  YANG YI YAN

IPC: A61K31/785 ,  A01N33/12 ,  A61K31/80 ,  C08G64/02

CPC classification number: A61K31/785 ,  A01N33/12 ,  A61K31/80 ,  C08G64/0241 ,  A01N25/10

Abstract: Antimicrobial cationic polymers having one or two cationic polycarbonate chains were prepared by organocatalyzed ring opening polymerization. One antimicrobial cationic polymer has a polymer chain consisting essentially of cationic carbonate repeat units linked to one or two end groups. The end groups can comprise a covalently bound form of biologically active compound such as cholesterol. Other antimicrobial cationic polymers have a random copolycarbonate chain comprising a minor mole fraction of hydrophobic repeat units bearing a covalently bound form of a vitamin E and/or vitamin D2. The cationic polymers exhibit high activity and selectivity against Gram-negative and Gram-positive microbes and fungi.

Abstract translation: 通过有机催化开环聚合制备具有一个或两个阳离子聚碳酸酯链的抗微生物阳离子聚合物。 一种抗微生物阳离子聚合物具有基本上由连接至一个或两个端基的阳离子碳酸酯重复单元组成的聚合物链。 端基可以包含共价结合形式的生物活性化合物如胆固醇。 其它抗微生物阳离子聚合物具有无规共聚碳酸酯链，其包含具有共价结合形式的维生素E和/或维生素D2的疏水性重复单元的较小摩尔分数。 阳离子聚合物对革兰氏阴性和革兰氏阳性微生物和真菌表现出高活性和选择性。

公开(公告)号：EP2983692A4

公开(公告)日：2017-05-17

申请号：EP14782368

申请日：2014-03-27

Applicant: IBM ,  AGENCY SCIENCE TECH & RES

Inventor： COADY DANIEL JOSEPH ,  DIPIETRO RICHARD ANTHONY ,  ENGLER AMANDA CATHERINE ,  HEDRICK JAMES LUPTON ,  NG VICTOR W L ,  ONG ZHAN-YUIN ,  TAN JEREMY P K ,  YANG YI YAN

IPC: A61K38/10 ,  A01N33/12 ,  A01N43/50 ,  A01N57/34 ,  A61K9/00 ,  A61K31/337 ,  A61K31/765 ,  A61K47/50 ,  A61P31/00 ,  C08G63/64

CPC classification number: C08G63/64 ,  A01N33/12 ,  A01N43/50 ,  A01N57/34 ,  A61K9/0019 ,  A61K31/765 ,  A61K2800/54 ,  A61K2800/542 ,  A61K2800/5426 ,  C08G64/0233 ,  C08G64/0241 ,  C08G64/025 ,  C08G64/0258 ,  C08G64/0291 ,  C08G64/30 ,  A01N45/00

Abstract: Antimicrobial cationic polymers having one or two cationic polycarbonate chains were prepared by organocatalyzed ring opening polymerization. One antimicrobial cationic polymer has a polymer chain consisting essentially of cationic carbonate repeat units linked to one or two end groups. The end groups can comprise a covalently bound form of biologically active compound such as cholesterol. Other antimicrobial cationic polymers have a random copolycarbonate chain comprising a minor mole fraction of hydrophobic repeat units bearing a covalently bound form of a vitamin E and/or vitamin D2. The cationic polymers exhibit high activity and selectivity against Gram-negative and Gram-positive microbes and fungi.

Abstract translation: 具有一个或两个阳离子聚碳酸酯链的抗微生物阳离子聚合物通过有机催化开环聚合制备。 一种抗微生物阳离子聚合物具有基本上由连接到一个或两个端基的阳离子碳酸酯重复单元组成的聚合物链。 端基可以包含生物活性化合物如胆固醇的共价结合形式。 其他抗微生物阳离子聚合物具有无规共聚碳酸酯链，所述无规共聚碳酸酯链包含少量摩尔分数的具有共价结合形式的维生素E和/或维生素D 2的疏水性重复单元。 阳离子聚合物对革兰氏阴性和革兰氏阳性微生物和真菌表现出高活性和选择性。

公开(公告)号：WO2007039346A2

公开(公告)日：2007-04-12

申请号：PCT/EP2006065528

申请日：2006-08-21

Applicant: IBM ,  IBM UK ,  ALLEN ROBERT DAVID ,  DIPIETRO RICHARD ANTHONY ,  TRUONG HOA ,  BROCK PHILLIP JOE ,  SOORIYAKUMARAN RATNAM

Inventor： ALLEN ROBERT DAVID ,  DIPIETRO RICHARD ANTHONY ,  TRUONG HOA ,  BROCK PHILLIP JOE ,  SOORIYAKUMARAN RATNAM

CPC classification number: G03F7/0045 ,  C07J9/005 ,  C07J17/00 ,  G03F7/0392 ,  Y10S430/106 ,  Y10S430/11 ,  Y10S430/111 ,  Y10S430/115

Abstract: A photoresist composition including a polymer, a photoacid generator and a dissolution modification agent, a method of forming an image using the photoresist composition and the dissolution modification agent composition. The dissolution modification agent is insoluble in aqueous alkaline developer and inhibits dissolution of the polymer in the developer until acid is generated by the photoacid generator being exposed to actinic radiation, whereupon the dissolution modifying agent, at a suitable temperature, becomes soluble in the developer and allows the polymer to dissolve in the developer. The DMAs are glucosides, cholates, citrates and adamantanedicarboxylates protected with acid-labile ethoxyethyl, tetrahydrofuranyl, and angelicalactonyl groups.

Abstract translation: 包括聚合物，光致酸产生剂和溶解改性剂的光致抗蚀剂组合物，使用光致抗蚀剂组合物形成图像的方法和溶解改性剂组合物。 溶解改性剂不溶于含水碱性显影剂中，并且抑制聚合物在显影剂中的溶解，直至酸被光致酸性发生剂暴露于光化辐射为止，因此溶解改性剂在合适的温度下变得可溶于显影剂， 允许聚合物溶解在显影剂中。 DMA是用酸不稳定的乙氧基乙基，四氢呋喃基和天竺葵酰基保护的葡糖苷，胆酸盐，柠檬酸盐和金刚烷二羧酸盐。

公开(公告)号：EP0698230A4

公开(公告)日：1995-10-24

申请号：EP94900495

申请日：1993-10-29

Applicant: IBM

Inventor： BRUNSVOLD WILLIAM ROSS ,  BREYTA GREGORY ,  DIPIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  KNORS CHRISTOPHER JOHN ,  KWONG RANEE WAI-LING ,  MIURA STEVE SEIICHI ,  MONTGOMERY MELVIN WARREN ,  MOREAU WAYNE MARTIN ,  SACHDEV HARBANS SINGH ,  WELSH KEVIN MICHAEL

IPC: G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C5/16 ,  G03F7/029

CPC classification number: G03F7/039

Abstract: Resists for use in ultraviolet, electron beam and x-ray exposure devices comprising a polymeric or molecular composition the solubility of which is dependent upon the presence of acid removable protecting groups and a sulfonic acid precursor which generates a strong acid upon exposure to such radiation. The preferred sulfonic acid precursors are triflate esters or benzenesulfonyloxy esters of N-hydroxyimides.

公开(公告)号：JPH10135202A

公开(公告)日：1998-05-22

申请号：JP28164197

申请日：1997-10-15

Applicant: IBM

Inventor： BROWN HUGH RALPH ,  KENETH RAYMOND CARTER ,  CHA HYUK-JIN ,  DIPIETRO RICHARD ANTHONY ,  JAMES LUPTON HEDRICK ,  HUMMEL JOHN PATRICK ,  ROBERT DENNIS MILLER ,  YOON DO YEUNG

IPC: C08G77/455 ,  C08G73/10 ,  C09D183/10 ,  H01L21/316 ,  H01L21/768 ,  H01L23/498 ,  H01L23/522

Abstract: PROBLEM TO BE SOLVED: To reduce required drive current and power consumption for the device, by laying interconnecting metal circuit lines on a substrate and disposing a specified dielectric material adjacent to the circuit lines. SOLUTION: The device comprises a substrate 2, meal circuit lines 4' and a dielectric material 6. The substrate 2 has vertical studs 8 formed therein. The dielectric material 6 in an org. polysilica, pref. a reaction product with polyaminate, having a terminal group (RO)m (R'')n SiR'-; m=1, 2 or 3, m+n=3, R and R' are hydrocarbyl group, R'' is hydride or hydrocarbyl group. The terminal group is a mono-, di- or tri-C1-C10 alkoxysilyl C1-10 alkyl or aryl group. This lowers the dielectric const. of the inserted dielectric material to allow the circuit line spacing to be reduced, without increasing the crosstalk or capacitive coupling, and also reduces the drive current and power consumption.

公开(公告)号：JP2001288224A

公开(公告)日：2001-10-16

申请号：JP2001051017

申请日：2001-02-26

Applicant: IBM

Inventor： PHILIP JOE BROCK ,  DIPIETRO RICHARD ANTHONY ,  DONALD CLIFFORD HOFER ,  RATONAMU SOORIYAKUMARAN ,  WALLRAFF GREGORY MICHAEL

IPC: C08F30/08 ,  C08F32/00 ,  C08F230/08 ,  C08K5/41 ,  C08K5/54 ,  C08L43/04 ,  C08L45/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03F7/09 ,  G11B5/31 ,  H01L21/027 ,  C08K5/541

Abstract: PROBLEM TO BE SOLVED: To provide a polymerizable monomer which has an ethylenically unsaturated group and silicon-containing groups transparent at 193 nm. SOLUTION: This polymerizable monomer has a polymerizable ethylenically unsaturated group and a plurality of silicon-containing groups separated from each other by groups X having no reactivity and transparent at 193 nm. A polymer obtained from the monomer can be used in the process for forming an image of 100 nm or lower by using a chemically amplified radiation-sensitive bilayer resist. The bilayer resist is arranged on a substrate and comprises (1) an upper image formation layer containing a radiation-sensitive acid-generating agent and (2) an organic lower layer. This bilayer resist can be used for producing integrated circuits.

公开(公告)号：WO2014168771A2

公开(公告)日：2014-10-16

申请号：PCT/US2014032313

申请日：2014-03-31

Applicant: IBM ,  AGENCY SCIENCE TECH & RES

Inventor： COADY DANIEL JOSEPH ,  DIPIETRO RICHARD ANTHONY ,  ENGLER AMANDA CATHERINE ,  HEDRICK JAMES LUPTON ,  CHIN WILLY ,  LEE ASHLYNN L Z ,  NG VICTOR W L ,  ONG ZHAN-YUIN ,  YANG YI YAN

IPC: A61K31/785 ,  A61K31/80

CPC classification number: A61K31/785 ,  A01N33/12 ,  A61K31/80 ,  C08G64/0241 ,  A01N25/10

Abstract: Antimicrobial cationic polymers having one or two cationic polycarbonate chains were prepared by organocatalyzed ring opening polymerization. One antimicrobial cationic polymer has a polymer chain consisting essentially of cationic carbonate repeat units linked to one or two end groups. The end groups can comprise a covalently bound form of biologically active compound such as cholesterol. Other antimicrobial cationic polymers have a random copolycarbonate chain comprising a minor mole fraction of hydrophobic repeat units bearing a covalently bound form of a vitamin E and/or vitamin D2. The cationic polymers exhibit high activity and selectivity against Gram-negative and Gram-positive microbes and fungi.

Abstract translation: 具有一个或两个阳离子聚碳酸酯链的抗微生物阳离子聚合物通过有机催化开环聚合制备。 一种抗微生物阳离子聚合物具有基本上由连接到一个或两个端基的阳离子碳酸酯重复单元组成的聚合物链。 端基可以包含生物活性化合物如胆固醇的共价结合形式。 其他抗微生物阳离子聚合物具有无规共聚碳酸酯链，所述无规共聚碳酸酯链包含少量摩尔分数的具有共价结合形式的维生素E和/或维生素D 2的疏水性重复单元。 阳离子聚合物对革兰氏阴性和革兰氏阳性微生物和真菌表现出高活性和选择性。

公开(公告)号：JP2004339522A

公开(公告)日：2004-12-02

申请号：JP2004181278

申请日：2004-06-18

Applicant: Internatl Business Mach Corp ,  インターナショナル・ビジネス・マシーンズ・コーポレーションInternational Business Maschines Corporation

Inventor： PHILIP JOE BROCK ,  DIPIETRO RICHARD ANTHONY ,  DONALD CLIFFORD HOFER ,  RATONAMU SOORIYAKUMARAN ,  WALLRAFF GREGORY MICHAEL

IPC: C08F30/08 ,  C08F32/00 ,  C08F230/08 ,  C08K5/41 ,  C08K5/54 ,  C08L43/04 ,  C08L45/00 ,  G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  G03F7/075 ,  G03F7/09 ,  G11B5/31 ,  H01L21/027

CPC classification number: G03F7/094 ,  G03F7/0045 ,  G03F7/0382 ,  G03F7/0395 ,  G03F7/0758 ,  G11B5/3163

Abstract: PROBLEM TO BE SOLVED: To obtain a polymerizable monomer having Si-containing groups, transparent at 193 nm and ethylenically unsaturated group.
SOLUTION: The polymerizable monomer has the Si-containing groups separated each other by a group X transparent at 193 nm and having no reactivity and has the ethylenically unsaturated group. Polymers obtained from the monomer can be used in processes for forming sub-100 nm images by using a chemically amplified, radiation sensitive bilayer resist. The bilayer resist is disposed on a substrate and comprises (i) a top imaging layer comprising a radiation sensitive acid generator and (ii) an organic underlayer. The bilayer resist can be used in the production of integrated circuits.
COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 要解决的问题：为了获得具有含Si基团的可聚合单体，在193nm下是透明的，具有烯属不饱和基团。 解决方案：可聚合单体具有通过在193nm透明且不具有反应性的基团X彼此分离并具有烯键式不饱和基团。 从单体获得的聚合物可用于通过使用化学放大的，辐射敏感的双层抗蚀剂形成亚100nm图像的方法。 双层抗蚀剂设置在基板上，并且包括（i）包含辐射敏感酸产生器和（ii）有机底层的顶部成像层。 双层抗蚀剂可用于集成电路的生产。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2002014472A

公开(公告)日：2002-01-18

申请号：JP2001130763

申请日：2001-04-27

Applicant: IBM

Inventor： WALLOW THOMAS I ,  ROBERT D ALLEN ,  PHILIP JOE BROCK ,  DIPIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  TRUONG HOA DAO ,  VARANASI PUSHKARA RAO

IPC: G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition capable of ensuring suitability to high resolution lithography using imaging radiation of 193 nm and to provide a lithographic process using the photoresist composition. SOLUTION: An acid catalyzed positive photoresist composition is provided by using a resist composition containing a cycloolefin polymer with a cydoolefin monomer having a lactone moiety. The photoresist can be imaged with radiation of 193 nm and is developed to form a photoresist structure with improved development characteristics and improved etching resistance. The monomer has no oxygen atom between the lactone moiety and a cycloolefin ring. The lactone moiety is appropriately spirolactone (5- or 6-membered ring) which bonds directly to the cycloolefin ring.

公开(公告)号：JP2001356482A

公开(公告)日：2001-12-26

申请号：JP2001130713

申请日：2001-04-27

Applicant: IBM

Inventor： ROBERT D ALLEN ,  PHILIP JOE BROCK ,  DIPIETRO RICHARD ANTHONY ,  ITO HIROSHI ,  VARANASI PUSHKARA RAO

IPC: C08F222/06 ,  C08F222/40 ,  C08F232/00 ,  C08K5/00 ,  C08L45/00 ,  G03F7/004 ,  G03F7/039 ,  G03F7/11 ,  G03F7/40 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a photoresist composition having so improved resolution as to enable high resolution lithography performance using imaging radiation of 193 nm. SOLUTION: The photoresist composition is obtained by using an imaging copolymer so as to improve a known alternating copolymer-base photoresist. The imaging copolymer is characterized by the presence of at least a third monomer which enhances the resolution of the photoresist. The performance of the composition is further improved by using a bulky acid active protective group on the imaging copolymer. An alkyl functional cyclicolefin is particularly suitable for use as the third monomer.