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    RASTER OUTPUT SCANNING APPARATUS
    52.
    发明专利
    RASTER OUTPUT SCANNING APPARATUS 失效

    公开(公告)号：JPH10181096A

    公开(公告)日：1998-07-07

    申请号：JP32489597

    申请日：1997-11-26

    Applicant: XEROX CORP

    Inventor： KUBBY JOEL A ,  PEETERS ERIC ,  VITOMIROV OLIVERA ,  APPEL JAMES J ,  NOWAK WILLIAM J ,  LOFTHUS ROBERT M ,  CHEN JINGKUANG

    IPC: B41J2/44 ,  B41J11/42 ,  G02B26/10 ,  G06K15/12 ,  H04N1/047 ,  H04N1/113 ,  H04N1/12

    Abstract: PROBLEM TO BE SOLVED: To provide an inexpensive apparatus for correcting positional shift of a beam spot in a low speed scanning direction by vertically adjusting the position of laser beam, in a raster output scanning system. SOLUTION: A raster output scanning system 10 consists of a photosensitive image forming unit 30, a modulation type laser beam generating unit 13 for generating a beam spot toward the photosensitive image forming unit 30, a horizontal scanning unit 29 for horizontally sweeping the beam spot generated in the modulation type laser beam generating unit 13 so as to traverse the photosensitive image forming unit 30, and a vertical scanning unit 12 having the rotary mirror 15 adjacent to the modulation type laser beam generating unit 13 to perform the positioning in the vertical direction of the beam spot in the vertical developing direction of the photosensitive image forming unit 30.

    MASS MEASURING SYSTEM
    53.
    发明专利
    MASS MEASURING SYSTEM 失效

    公开(公告)号：JPH1073473A

    公开(公告)日：1998-03-17

    申请号：JP16956897

    申请日：1997-06-11

    Applicant: XEROX CORP

    Inventor： KUBBY JOEL A ,  PEETERS ERIC ,  VITURRO R ENRIQUE ,  HUBBLE III FRED F ,  WALLACE STANLEY J ,  WERNER JR ALAN J ,  JACKSON WARREN B ,  BIEGELSEN DAVID K ,  SWARTZ LARS-ERIK ,  APTE RAJ B ,  SPRAGUE ROBERT A

    IPC: G01G9/00 ,  B65H7/02 ,  B81B3/00 ,  G01G17/02

    Abstract: PROBLEM TO BE SOLVED: To provide the mass measuring system, which automatically detects the property of a paper sheet and automatically adjusts the setting of a paper- sheet conveying mechanism. SOLUTION: This system 140 includes an actuator 141, a paper-sheet-position sensor 142 and a touch-sense sensor system 200. The actuator 142 applies known force on a paper sheet 150, moves the paper sheet 150 and passes the paper sheet to the paper-sheet-position sensor 142. The paper-sheet-position sensor 142 measures the speed of the paper sheet 150 at each point. The paper sheet 150 passes the touch-sense sensor system 200. Thus, the friction coefficient of the paper sheet is measured. A controller can measure the mass of the paper sheet 150 by using these measured values. This is utilized, and the performance of the paper-sheet carrying path in a copying machine or the like is changed.

    Waveguide and waveguide forming method
    54.
    发明专利
    Waveguide and waveguide forming method 有权
    波形和波形形成方法

    公开(公告)号：JP2006011443A

    公开(公告)日：2006-01-12

    申请号：JP2005183909

    申请日：2005-06-23

    Applicant: Xerox Corp ,  ゼロックス コーポレイションXerox Corporation

    Inventor： GERMAN KRISTINE A ,  GULVIN PETER M ,  KUBBY JOEL A ,  LIN PINYEN ,  LIU XUEYUAN ,  WANG YAO RONG

    IPC: G02B6/122 ,  G02B6/10 ,  G02B6/13

    CPC classification number: G02B6/122 ,  G02B6/105

    Abstract: PROBLEM TO BE SOLVED: To provide a waveguide which will not be affected by polarized light, and to provide a forming method of the waveguide. SOLUTION: The waveguide includes a base plate 100 and a waveguide structure on the base plate, and the waveguide structure includes a base 102 and a rectangular waveguide 104. The base 102 has a base height (h), measured from the base plate. The rectangular waveguide 104 has a waveguide height (H), measured from the base plate and a waveguide width (W) which is the width between both side surfaces of the rectangular waveguide. The waveguide structure satisfies the equations:(1):H-4≤(W-3) 2 , (2):H-1≥(W-4) 2 , (3):H≤1.7*h+2.9 and (4):H≥0.87*h+1.8 (where * in the equations represents multiplication). COPYRIGHT: (C)2006,JPO&NCIPI

    Abstract translation: 要解决的问题：提供不受偏振光影响的波导，并提供波导的形成方法。 解决方案：波导包括基板100和基板上的波导结构，波导结构包括基座102和矩形波导104.基座102具有基座高度（h），从基座 盘子。 矩形波导104具有从基板测量的波导高度（H）和作为矩形波导的两侧表面之间的宽度的波导宽度（W）。 波导结构满足以下等式：（1）：H-4≤（W-3） 2 ，（2）：H-1≥（W-4） ，（3）：H≤1.7* h + 2.9和（4）：H≥0.87* h + 1.8（其中*表示乘法）。 版权所有（C）2006，JPO＆NCIPI

    SYSTEM AND METHOD FOR THERMAL ISOLATION OF SILICON STRUCTURE
    56.
    发明专利
    SYSTEM AND METHOD FOR THERMAL ISOLATION OF SILICON STRUCTURE 审中-公开

    公开(公告)号：JP2003260695A

    公开(公告)日：2003-09-16

    申请号：JP2003002748

    申请日：2003-01-09

    Applicant: XEROX CORP

    Inventor： KUBBY JOEL A

    IPC: B81B3/00 ,  B81C1/00 ,  G02F1/01 ,  G02F1/025 ,  H01L21/764

    Abstract: PROBLEM TO BE SOLVED: To provide a micro-machined element thermally isolated from a substrate. SOLUTION: The silicon structure is at least partially thermally isolated from the substrate by a gap formed in an insulation layer disposed between the substrate and a silicon layer in which the silicon structure is formed. In embodiments, the substrate is made of silicon and the silicon layer is made of single crystal silicon. In embodiments, the gap is formed such that a surface of the substrate under the gap is maintained substantially unetched. In other embodiments, the gap is formed without affecting the surface of the of the substrate underlying the gap. In particular, the gap may be formed by removing one portion of the insulation layer by etching not affecting the surface of the substrate underlying the gap. In embodiments, the etching is highly selective between the material of the insulation layer and the material of the substrate. Selectivity of the etching may be 20:1 or greater. COPYRIGHT: (C)2003,JPO

    MONOLITHIC AND RECONFIGURABLE OPTICAL MULTIPLEXER SYSTEM AND METHOD OF OPTICAL MULTIPLEXING
    57.
    发明专利
    MONOLITHIC AND RECONFIGURABLE OPTICAL MULTIPLEXER SYSTEM AND METHOD OF OPTICAL MULTIPLEXING 审中-公开

    公开(公告)号：JP2003185856A

    公开(公告)日：2003-07-03

    申请号：JP2002321943

    申请日：2002-11-06

    Applicant: XEROX CORP

    Inventor： KUBBY JOEL A ,  LIN PINYEN ,  CHEN JINGKUANG ,  SU YI

    IPC: G02B6/12 ,  B81B3/00 ,  G02B6/34 ,  G02B6/35

    Abstract: PROBLEM TO BE SOLVED: To provide a silicon demultiplexer, a plurality of silicon switches and a silicon multiplexer monolithically integrated on a single silicon chip. SOLUTION: In some embodiments, each of the silicon demultiplexer 220 and the silicon multiplexer 240 has a grating. In other embodiments, each of the silicon demultiplexer 220 and the silicon multiplexer 240 has an arrayed waveguide grating. In various exemplary embodiments, the silicon optical switch has at least one of a micromachined torsion mirror, an electrostatic micromirror and a tilting micromirror. COPYRIGHT: (C)2003,JPO

    MEMBRANE STRUCTURE FOR MICRO-DEVICE, MICRO-DEVICE INCLUDING SAME, AND METHOD FOR MAKING THE SAME
    58.
    发明专利
    MEMBRANE STRUCTURE FOR MICRO-DEVICE, MICRO-DEVICE INCLUDING SAME, AND METHOD FOR MAKING THE SAME 审中-公开

    公开(公告)号：JP2003175498A

    公开(公告)日：2003-06-24

    申请号：JP2002317115

    申请日：2002-10-31

    Applicant: XEROX CORP

    Inventor： GULVIN PETER M ,  EKLUND ELLIOTT A ,  KUBBY JOEL A

    IPC: B81C1/00 ,  B81B3/00

    Abstract: PROBLEM TO BE SOLVED: To reduce deflection caused by etching. SOLUTION: Structure for a micro-device is fabricated by forming a first layer of sacrifical material, a layer of a structural material over the first sacrifical material layer, a second layer of sacrifical material over the structural material layer, and a protective layer over the second sacrifical material layer. A release etch is used to remove the first and second sacrifical material layers at substantially same rate. A structural feature is fabricated by forming a first layer of a first material, a layer of structural material over the first layer of the first material, at least one cut in the structural material layer, and a first layer of a sacrifical material different from the first material over the structural material layer such that an interface is created between the first layer of the sacrifical material and the first layer of the first material in at least one cut. COPYRIGHT: (C)2003,JPO

    Microminiature optoelectronic machine system(moems)
    59.
    发明专利
    Microminiature optoelectronic machine system(moems) 审中-公开
    微电子光电机系统（MOEMS）

    公开(公告)号：JP2003014997A

    公开(公告)日：2003-01-15

    申请号：JP2002120185

    申请日：2002-04-23

    Applicant: Xerox Corp ,  ゼロックス・コーポレーション

    Inventor： CHEN JINGKUANG ,  KUBBY JOEL A ,  SUN DECAI

    IPC: B81B7/02 ,  G02B6/35 ,  G02B6/42 ,  G02B26/08

    CPC classification number: G02B6/35 ,  G02B6/3512 ,  G02B6/3582 ,  G02B6/3584 ,  G02B6/3598 ,  G02B6/4214

    Abstract: PROBLEM TO BE SOLVED: To provide a mechanism aligning chips and an optical fiber with a simple method by using a mirror without aligning them under the use of a microscope. SOLUTION: When an MEMS-based adjustable mirror module is used, it is possible to make an optical fiber existing in a substrate to be in an alignment state more quickly, at a lower cost and more simply. Moreover, when the movable mirrors formed on the substrate are used, it is possible to prevent alignment failure by adjusting an optical path after the optical fiber is attached to the substrate and, thereafter, by fixing the mirrors at that positions.

    Abstract translation: 要解决的问题：通过使用不使用显微镜对准的镜子，通过简单的方法提供使芯片和光纤对准的机构。 解决方案：当使用基于MEMS的可调镜模块时，可以以更低的成本和更简单的方式使存在于基板中的光纤更快地对准状态。 此外，当使用形成在基板上的可动反射镜时，可以通过在将光纤附着到基板之后调整光路，然后通过将反射镜固定在该位置来防止对准故障。

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