公开(公告)号：US20100327159A1

公开(公告)日：2010-12-30

申请号：US12492894

申请日：2009-06-26

Applicant: Wilhelm P. Platow ,  Neil J. Bassom ,  Peter F. Kurunczi ,  Alexander S. Perel ,  Craig R. Chaney

Inventor： Wilhelm P. Platow ,  Neil J. Bassom ,  Peter F. Kurunczi ,  Alexander S. Perel ,  Craig R. Chaney

IPC: H01J37/317 ,  H01J37/05 ,  H01J49/26

CPC classification number: H01J49/10 ,  H01J27/02 ,  H01J37/08 ,  H01J37/3171 ,  H01J2209/017 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/30466

Abstract: In an ion implanter, a Faraday cup is utilized to receive an ion beam generated during ion source cleaning. The detected beam has an associated mass spectrum which indicates when the ion source cleaning process is complete. The mass spectrum results in a signal composed of a cleaning agent and the material comprising the ion source. This signal will rise over time as the ion source chamber is being cleaned and will level-off and remain constant once the deposits are etched away from the source chamber, thereby utilizing existing implant tools to determine endpoint detection during ion source cleaning.

Abstract translation: 在离子注入机中，法拉第杯用于接收在离子源清洁期间产生的离子束。 检测到的光束具有相关联的质谱，其指示何时完成离子源清洁过程。 质谱产生由清洁剂和包含离子源的材料组成的信号。 当离子源室被清洁时，该信号将随着时间的推移而升高，并且一旦沉积物从源室被蚀刻掉，就会保持恒定，从而利用现有的植入工具确定离子源清洁期间的端点检测。

公开(公告)号：US07772576B2

公开(公告)日：2010-08-10

申请号：US12150207

申请日：2008-04-24

Applicant: Cornel Danciu ,  Thomas Abels ,  Brian Good

Inventor： Cornel Danciu ,  Thomas Abels ,  Brian Good

IPC: G21F5/02

CPC classification number: H01J37/09 ,  C23C14/48 ,  C23C14/564 ,  H01J2237/05 ,  H01J2237/31701

Abstract: A shielding assembly for use in a semiconductor manufacturing apparatus, such as an ion implantation apparatus, includes one or more removable shielding members configured to cover inner surfaces of a mass analyzing chamber. The shielding assembly reduces process by-products from accumulating on the inner surfaces. In one embodiment, a shielding assembly includes first and second shielding members, each having a unitary construction and configured to cover a magnetic area in the mass analyzing chamber. The shielding members desirably are made entirely of graphite or impregnated graphite to minimize contamination of the semiconductor device being processed caused by metal particles eroded from the inner surfaces of the mass analyzing chamber.

Abstract translation: 用于半导体制造装置（例如离子注入装置）中的屏蔽组件包括构造成覆盖质量分析室的内表面的一个或多个可移除屏蔽构件。 屏蔽组件减少了积累在内表面上的过程副产物。 在一个实施例中，屏蔽组件包括第一和第二屏蔽构件，每个屏蔽构件具有整体构造并且构造成覆盖质量分析室中的磁性区域。 屏蔽构件理想地由石墨或浸渍石墨制成，以最小化由被质量分析室的内表面侵蚀的金属颗粒引起的被处理半导体器件的污染。

公开(公告)号：US20100059369A1

公开(公告)日：2010-03-11

申请号：US12449951

申请日：2008-03-27

Applicant: Yuichi Shiina

Inventor： Yuichi Shiina

IPC: C23C14/32 ,  H05H1/32

CPC classification number: H01J37/32633 ,  H01J37/147 ,  H01J37/3178 ,  H01J37/32055 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/3142 ,  H05H1/48

Abstract: There is provided a plasma generating apparatus having a plasma gun which can remove droplets mixed with plasma efficiently without reducing the effective amount of plasma generated by vacuum arc discharge and in which a droplet removing portion can be constituted easily and inexpensively, and precision of surface treatment of films by high purity plasma can be enhanced. Periphery of a cathode (407) of said plasma gun is surrounded by an enclosure member (420) and a droplet removing device (406) constituted by laying a plurality of droplet collecting members (411) in multilayer is provided on the inside of the enclosure member (420). The enclosure member (420), the collecting member (411) and a plasma advancing path (402) have no relation connected with an arc power supply (409) and are held in an electrically neutral floating state.

Abstract translation: 提供了一种具有等离子体枪的等离子体发生装置，其能够有效地除去与等离子体混合的液滴，而不会减少由真空电弧放电产生的等离子体的有效量，并且其中可以容易且廉价地构成液滴除去部分，并且表面处理的精度 的高纯度等离子体膜可以提高。 所述等离子体枪的阴极（407）的周边被封闭构件（420）包围，并且通过将多个液滴收集构件（411）放置在多层中而构成的液滴去除装置（406）设置在外壳的内部 会员（420）。 封闭构件（420），收集构件（411）和等离子体行进路径（402）与电弧电源（409）没有关联，并且保持在电中性浮动状态。

公开(公告)号：US07378670B2

公开(公告)日：2008-05-27

申请号：US10177970

申请日：2002-06-21

Applicant: Cornel Danciu ,  Thomas Abels ,  Brian Good

Inventor： Cornel Danciu ,  Thomas Abels ,  Brian Good

IPC: G21K5/10

CPC classification number: H01J37/09 ,  C23C14/48 ,  C23C14/564 ,  H01J2237/05 ,  H01J2237/31701

Abstract: A shielding assembly for use in a semiconductor manufacturing apparatus, such as an ion implantation apparatus, includes one or more removable shielding members configured to cover inner surfaces of a mass analyzing chamber. The shielding assembly reduces process by-products from accumulating on the inner surfaces. In one embodiment, a shielding assembly includes first and second shielding members, each having a unitary construction and configured to cover a magnetic area in the mass analyzing chamber. The shielding members desirably are made entirely of graphite or impregnated graphite to minimize contamination of the semiconductor device being processed caused by metal particles eroded from the inner surfaces of the mass analyzing chamber.

Abstract translation: 用于半导体制造装置（例如离子注入装置）中的屏蔽组件包括构造成覆盖质量分析室的内表面的一个或多个可移除屏蔽构件。 屏蔽组件减少了积累在内表面上的过程副产物。 在一个实施例中，屏蔽组件包括第一和第二屏蔽构件，每个屏蔽构件具有整体构造并且构造成覆盖质量分析室中的磁性区域。 屏蔽构件理想地由石墨或浸渍石墨制成，以最小化由被质量分析室的内表面侵蚀的金属颗粒引起的被处理半导体器件的污染。

公开(公告)号：US5981948A

公开(公告)日：1999-11-09

申请号：US30477

申请日：1998-02-25

Applicant: Yoshifumi Taniguchi ,  Shigeto Isakozawa

Inventor： Yoshifumi Taniguchi ,  Shigeto Isakozawa

IPC: G01N23/04 ,  H01J37/22 ,  H01J37/26 ,  H01J37/153

CPC classification number: H01J37/26 ,  H01J2237/05

Abstract: Letting core-loss energy of an objective element be E.sub.c, and width of the energy selection slit be .DELTA.E. Initially, a pre-edge image obtained by increasing an acceleration voltage of an electron gun by E.sub.c -.DELTA.E and a pre-pre-edge image obtained by increasing an acceleration voltage by E.sub.c -.DELTA.E are taken with the same exposure time, and an intensity ratio R of the pre-edge image to the pre-pre-edge image is calculated. Next, a post-edge image obtained by increasing an acceleration voltage by E.sub.c is taken with an exposure time t.sub.pre, and a pre-edge image is taken with an exposure time R.times.t.sub.pre. An element distribution image of the objective element can be obtained by simply performing image subtraction of the pre-edge image from the post-edge image in a computer.

Abstract translation: 使目标元素的核心损耗能量为Ec，能量选择狭缝的宽度为DELTA E.首先，通过用Ec-DELTA E增加电子枪的加速电压而获得的前缘图像和预先 以相同的曝光时间拍摄通过用Ec-DELTA E增加加速电压而获得的-edge图像，并且计算前缘图像与前前缘图像的强度比R. 接下来，利用曝光时间tpre拍摄通过用Ec增加加速电压而获得的后边缘图像，并且以曝光时间Rxtpre拍摄前边缘图像。 可以通过简单地从计算机中的后边缘图像执行预边缘图像的图像相减来获得目标元素的元素分布图像。

公开(公告)号：US5578823A

公开(公告)日：1996-11-26

申请号：US571060

申请日：1995-12-12

Applicant: Yoshifumi Taniguchi

Inventor： Yoshifumi Taniguchi

IPC: H01J37/28 ,  H01J37/153

CPC classification number: H01J37/28 ,  H01J2237/05 ,  H01J2237/221 ,  H01J2237/24455

Abstract: A transmission electron microscope system equipped with an energy filter and capable of displaying a two-dimensional distribution map of element of concern on a real time basis. A transmission electron microscope incorporating an energy filer is equipped with a television camera for recording two types of energy-loss images in separate frame memories, respectively. For effecting background processing for image data, intensity of an image to be stored in one frame memory is attenuated with a constant ratio by an intensity regulating mechanism. A signal indicative of difference between the image data stored in the respective frame memories is outputted to a monitor as a picture signal.

Abstract translation: 一种透射电子显微镜系统，配备有能量过滤器，能够实时显示关注元件的二维分布图。 并入能量滤波器的透射型电子显微镜配备有分别在分离的帧存储器中记录两种类型的能量损失图像的电视摄像机。 为了进行图像数据的背景处理，通过强度调节机构以一定比例衰减要存储在一帧存储器中的图像的强度。 指示存储在各个帧存储器中的图像数据之间的差异的信号作为图像信号输出到监视器。

公开(公告)号：US4135088A

公开(公告)日：1979-01-16

申请号：US810970

申请日：1977-06-28

Applicant: Isao Ishikawa ,  Michiyasu Itoh ,  Katsuhisa Usami

Inventor： Isao Ishikawa ,  Michiyasu Itoh ,  Katsuhisa Usami

IPC: G01N23/227 ,  G01N23/225 ,  G05B7/02 ,  H01J49/44 ,  H01J49/48 ,  H01J39/00

CPC classification number: G01N23/225 ,  H01J49/482 ,  H01J2237/05

Abstract: A charged-particle beam correction arrangement for a charged-particle analyzer having deflecting electrodes which focus charged particles emitted from a sample onto a center axis, an extension thereof, or onto an identical circumference with its center on the axis, a slit which is disposed at the focus point, and an energy analyzer whose object point lies at the focus point. The charged-particle beam correction arrangement is disposed axially symmetrically in the vicinity of the path of the charged particles between the sample and the slit to correct a deformation in the focusing of the charged-particle beam. BACKGROUND OF THE INVENTIONThe present invention relates to a charged-particle analyzer.For the analysis of a feeble electron beam of low energy, such as Auger electrons and photoelectrons in the surface analysis, it is important to efficiently utilize the electrons emitted from a sample. Accordingly, it is necessary that the accepted solid angle (= the solid angle of electron rays entering an analyzing system/the entire solid angle of electron rays emitted from a sample) be wide.As an optimum structure based on such requirement, an analyzing equipment shown in FIG. 1 has been proposed (Japanese Patent Application No. 12283/76). The feature of this equipment is that a deflecting system consisting of two inner and outer electrodes is arranged axially symmetrically around a sample and that signals emitted from the sample and entering the deflecting system are caused to depict a greatly curved track, whereupon they are focused on the center axis of the equipment or a circumference with its center on the axis again. Further, at a stage succeeding the deflecting system, an analyzing system is arranged in such electrooptical relation that the point of the above focusing is considered as the emission point of the signals. Thus, an energy analysis of photo-electrons, Auger electrons, etc. is carried out.FIG. 1 is a constructional view showing the prior art equipment described above including an electron gun. An electron beam 2 produced from the electron gun is focused by a focusing lens 3, and irradiates a sample 4. Charged particles 5, such as Auger electrons, are emitted from the irradiated point P of the sample 4 in substantially the COS-Law spacial distribution. Among the charged particles, rays of electrons are surrounded by two cones whose vertexes are the point P and whose half vertical angles are .theta. + a and .theta. - a, which rays enter between deflecting electrodes 6 and 7. The deflecting electrodes 6 and 7 are disposed axially symmetrically and are L-shaped in section so as to form a double electrode system.Within the deflecting electrode system, the rays of electrons depict greatly curved tracks owing to a deflecting electric field. Further, the rays of electrons have the tracks corrected by an auxiliary electrode 8 and are converged in the first order of the angle a onto a slit 9 situated at a stage succeeding the auxiliary electrode 8. After passing through the slit 9, the rays travel so as to cross on the axis of the equipment. They are subjected then to the energy analysis by a cylindrical mirror type analyzer 10 arranged after the slit 9 with only electrons having certain specific energy being converged onto a detection slit 9' which is placed on the axis, signals being detected by a detector 11 which is disposed behind the detecting slit 9'.The energy analysis of the charged particles 5 emitted from the sample becomes possible in such a way that voltages to be applied to the deflecting electrodes 6, 7, the auxiliary electrode 8, and the electrode of the cylindrical mirror type analyzer 10 are appropriately selected with divider resistances 12, 13 and 14 connected to a power source 20 and then scanned at a fixed ratio.When it is desired to have a high sensitivity of analysis utilizing the aforedescribed analyzing system, the signal obtained from the sample must of course be received at the widest possible accepted solid angle as stated above. Additionally, the loss of signal between the deflecting system and the slit must be confined to a minimum. To this end, it is necessary that the rays of electrons at the time when they pass through the slit 9 have the best possible circularity so as to reduce the amount to which the rays are intercepted by the end face of the slit 9.In this respect, a glass plate coated with a phosphor was placed at the position of the slit 9 in the aforedescribed equipment, and the shape of the rays of electrons focused on this point was directly observed. It was determined that the rays of electrons were not truly circular, but rather often presented a ring shape deformed in one direction or a shape having a long tail at a certain part.The cause therefor was studied, and has been revealed to be a kind of electrooptical astigmatism attributed to the fact that the electrodes were not fixed coaxially or that the parallelism of each electrode was not maintained. Therefore, in constructing the equipment, careful attention was pair to the finish precision of the electrodes and the assembling was carefully executed. While considerable improvements were thus effected, it has been determined that a satisfactory result has not been attained.SUMMARY OF THE INVENTIONAn object of the present invention is to provide an improved charged-particle analyzer.Another object of the present invention is to provide a charged-particle analyzer which makes it possible to set a wide accepted solid angle for signals and to attach a sample of large area without greatly decreasing the accepted solid angle.These and other objects are attained by a charged-particle analyzer having an irradiation device for irradiating a sample with a primary beam, a deflecting electrode system for focusing charged particles emitted from the sample onto the center axis of the primary beam or an extension thereof or onto an identical circumference with its center located on the axis or the extension, a slit which is disposed at the focus point of the charged particles, an energy analyzing system whose object point lies at the focus point, a detector for detecting the charged particles analyzed by the energy analyzing system, and a charged-particle beam correction arrangement disposed axially symmetrically in the vicinity of the path of the charged particles between the sample and the slit.

公开(公告)号：JP5909547B2

公开(公告)日：2016-04-26

申请号：JP2014509083

申请日：2013-03-04

Applicant: 株式会社日立ハイテクノロジーズ

Inventor： 野間口 恒典 ,  揚村 寿英

IPC: H01J37/244 ,  H01J37/22 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/10 ,  H01J37/26 ,  H01J2237/05 ,  H01J2237/2446 ,  H01J2237/24495

公开(公告)号：JP5189784B2

公开(公告)日：2013-04-24

申请号：JP2007093356

申请日：2007-03-30

Applicant: 株式会社フェローテック

Inventor： 祐一 椎名

IPC: C23C14/24 ,  C23C14/00 ,  H05H1/32

CPC classification number: H01J37/32633 ,  H01J37/147 ,  H01J37/3178 ,  H01J37/32055 ,  H01J2237/022 ,  H01J2237/05 ,  H01J2237/3142 ,  H05H1/48

公开(公告)号：JP2010025912A

公开(公告)日：2010-02-04

申请号：JP2008261565

申请日：2008-10-08

Applicant: Kratos Analytical Ltd ,  クレイトス アナリティカル リミテッドKratos Analytical Limited

Inventor： PAGE SIMON

IPC: G01N23/227 ,  H01J27/02 ,  H01J37/08 ,  H01J49/48

CPC classification number: H01J37/05 ,  G01N23/2273 ,  H01J37/08 ,  H01J37/295 ,  H01J37/30 ,  H01J2237/05 ,  H01J2237/08 ,  H01J2237/0815

Abstract: PROBLEM TO BE SOLVED: To provide an ion source for electron spectroscopy that can be used especially for selectively removing a sample from a surface layer for an electron spectroscopy and a device for performing electron spectroscopy.
SOLUTION: The electron spectroscopy device 2 includes an ultra-high vacuum vessel 4 where a sample stand 6 has been installed inside. An ion gun 8 is extended into the ultra-high vacuum vessel 4 and supplies a polycyclic aromatic hydrocarbon ion beam 10. The ion beam is directed to a sample on the sample stand when the ion beam is used. A photon source 12 is suitable for supplying photon beams 14 projected onto the sample in use. A photoelectron spectroscope 16 is installed inside the vacuum vessel 4 and detects electrons 18 radiated from the sample in use.
COPYRIGHT: (C)2010,JPO&INPIT

Abstract translation: 要解决的问题：提供可用于特别用于从用于电子光谱的表面层选择性去除样品的电子能谱离子源和用于进行电子光谱的装置。 解决方案：电子分析装置2包括超高真空容器4，其中样品台6已经安装在其内部。 离子枪8延伸到超高真空容器4中并提供多环芳烃离子束10.当使用离子束时，离子束被引导到样品台上的样品。 光子源12适用于在使用中提供投射到样品上的光子束14。 光电子分光器16安装在真空容器4的内部，并检测在使用中从样品辐射的电子18。 版权所有（C）2010，JPO＆INPIT