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公开(公告)号：US10345712B2
公开(公告)日：2019-07-09
申请号：US15918575
申请日：2018-03-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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公开(公告)号：US10222706B2
公开(公告)日：2019-03-05
申请号：US14743775
申请日：2015-06-18
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri Lof , Antonius Theodorus Anna Maria Derksen , Christiaan Alexander Hoogendam , Aleksey Kolesnychenko , Erik Roelof Loopstra , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Joannes Theodoor De Smit , Alexander Straaijer , Bob Streefkerk , Helmar Van Santen
Abstract: In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space.
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公开(公告)号：US09639006B2
公开(公告)日：2017-05-02
申请号：US14624118
申请日：2015-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Catharinus Hubertus Mulkens
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70258 , G03F7/709
Abstract: A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part.
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公开(公告)号：US09568840B2
公开(公告)日：2017-02-14
申请号：US14956075
申请日：2015-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以降低光刻投影设备的精细部件污染的风险。
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公开(公告)号：US09507907B2
公开(公告)日：2016-11-29
申请号：US14730993
申请日：2015-06-04
Applicant: ASML NETHERLANDS B.V.
Inventor： Christophe David Fouquet , Bernardo Kastrup , Arie Jeffrey Den Boef , Johannes Catharinus Hubertus Mulkens , James Benedict Kavanagh , James Patrick Koonmen , Neal Patrick Callan
CPC classification number: G06F17/5081 , G03F7/705 , G03F7/70525 , G03F7/7065 , G06F17/5009 , G06N7/005 , H01L22/20
Abstract: Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; and determining or predicting, using the actual value, an existence, a probability of existence, a characteristic, or a combination selected therefrom, of a defect produced from the hot spot with the device manufacturing process.
Abstract translation: 这里公开了一种用于设备制造过程的计算机实现的缺陷预测方法，该方法涉及将设计布局的一部分处理到衬底上，所述方法包括：从所述设计布局的所述部分中识别热点; 确定所述热点的装置制造过程的处理参数的值的范围，其中当所述处理参数具有超出所述范围的值时，通过所述装置制造过程从所述热点产生缺陷; 确定处理参数的实际值; 并且使用实际值确定或预测由设备制造过程产生的缺陷产生的缺陷的存在，存在概率，特征或其选择的组合。
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Patent Agency Ranking
公开(公告)号：US09477159B2
公开(公告)日：2016-10-25
申请号：US13951222
申请日：2013-07-25
Applicant: ASML NETHERLANDS B.V.
Inventor： Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70058 , G03F7/70108 , G03F7/70225 , G03F7/70358 , G03F2007/2067
Abstract: In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens.
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公开(公告)号：US09285685B2
公开(公告)日：2016-03-15
申请号：US14261208
申请日：2014-04-24
Applicant: ASML NETHERLANDS B.V. , CARL ZEISS SMT GmbH
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Adrianus Franciscus Petrus Engelen , Jozef Maria Finders , Paul Gräupner , Johannes Catharinus Hubertus Mulkens , Jan Bernard Plechelmus Van Schoot
CPC classification number: G03F7/70341 , G03F7/70333
Abstract: In an immersion lithography apparatus or device manufacturing method, the position of focus of the projected image is changed during imaging to increase focus latitude. In an embodiment, the focus may be varied using the liquid supply system of the immersion lithographic apparatus.
Abstract translation: 在浸没光刻设备或设备制造方法中，在成像期间投影图像的焦点位置改变以增加焦点宽度。 在一个实施例中，焦点可以使用浸没式光刻设备的液体供应系统来改变。
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公开(公告)号：US20160062248A1
公开(公告)日：2016-03-03
申请号：US14937724
申请日：2015-11-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Joeri LOF , Joannes Theodoor De Smit , Roelof Aeilko Siebrand Ritsema , Klaus Simon , Theodorus Marinus Modderman , Johannes Catharinus Hubertus Mulkens , Hendricus Johannes Maria Meijer , Erik Roelof Loopstra
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/707 , G03F7/7085 , G03F9/7003 , G03F9/7034 , G03F9/7088
Abstract: A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment.
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69.发明授权Lithographic apparatus and device manufacturing method involving a groove to collect liquid 有权平版印刷设备和装置制造方法涉及一个槽以收集液体公开(公告)号：US09207543B2
公开(公告)日：2015-12-08
申请号：US14273310
申请日：2014-05-08
Applicant: ASML NETHERLANDS B.V.
Inventor： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.
Abstract translation: 公开了一种浸没式光刻设备的衬底台，其包括构造成收集液体的阻挡层。 屏障围绕基板并与衬底间隔开。 以这种方式，可以收集从液体供应系统溢出的任何液体，以减少光刻投影设备的精细部件污染的风险。
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公开(公告)号：US09134622B2
公开(公告)日：2015-09-15
申请号：US14107734
申请日：2013-12-16
Applicant: ASML NETHERLANDS B.V.
Inventor： Bob Streefkerk , Johannes Jacobus Matheus Baselmans , Richard Joseph Bruls , Marcel Mathijs Theodore Marie Dierichs , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Erik Roelof Loopstra , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Ronald Walther Jeanne Severijns , Sergei Shulepov , Herman Boom , Timotheus Franciscus Sengers
IPC: G03F7/20
CPC classification number: G03F7/70341 , G03F7/2041 , G03F7/70908 , G03F7/70958
Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.
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