中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

197 records (took 0.024 seconds)

    ENCODER
    62.
    发明专利
    ENCODER 未知

    公开(公告)号：CA1328131C

    公开(公告)日：1994-03-29

    申请号：CA575623

    申请日：1988-08-24

    Applicant: CANON KK

    Inventor： YANAGISAWA YOSHIHIRO ,  MORIKAWA YUKO ,  MATSUDA HIROSHI ,  KAWADA HARUKI ,  SAKAI KUNIHIRO ,  KAWADE HISAAKI ,  EGUCHI KEN ,  KAWAKAMI EIGO ,  KAWASE TOSHIMITSU ,  YOSHII MINORU ,  SAITOH KENJI ,  YAMANO AKIHIKO ,  NOSE HIROYASU

    IPC: G01D5/244 ,  H03M1/00

    Abstract: An encoder includes an electrically conductive reference scale having surface steps formed at predetermined positions; an electrically conductive probe having a tip disposed opposed to the reference scale; wherein the reference scale and the probe are relatively movable in a direction different from the opposing direction of the tip of the probe and the reference scale; a portion for applying an electric voltage to between the reference scale and the probe, a portion for detecting a change in a tunnel current between the reference scale and the probe, to between which the electric voltage is applied by the voltage applying portion at the time of the relative movement between the scale and the probe, the detecting portion detecting the change in the tunnel current when the probe passes a position opposed to a surface step of the reference scale; and portion for detecting the amount of the relative movement between the scale and probe, on the basis of the detection by the change detecting portion.

    64.
    发明专利
    未知

    公开(公告)号：DE3630385A1

    公开(公告)日：1987-03-19

    申请号：DE3630385

    申请日：1986-09-05

    Applicant: CANON KK

    Inventor： KAWAKAMI EIGO ,  NIWA YUKICHI ,  OGINO YASUO ,  YOSHII MINORU ,  SUDA SHIGEYUKI ,  OHWADA MITSUTOSHI

    IPC: G02B27/64 ,  H04N5/232 ,  G02B7/00

    Abstract: An imaging device has detection means for detecting an image vibration of the imaging device and drive means for driving at least one of a photoelectric conversion device for converting a light of an object transmitted through a lens system of the imaging device to an electrical signal and the imaging device itself in a direction to cancel the vibration. For a high frequency image vibration, the vibration is compensated by using a piezoelectric device.

    EXPOSURE SYSTEM
    65.
    发明专利
    EXPOSURE SYSTEM 失效

    公开(公告)号：JP2001284223A

    公开(公告)日：2001-10-12

    申请号：JP2000095448

    申请日：2000-03-30

    Applicant: CANON KK

    Inventor： OSAWA MASARU ,  YOSHII MINORU ,  MURAKAMI EIICHI

    IPC: G03F7/20 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To provide an exposure system, wherein a fluorine (F2) excimer laser beam is used, and an optical axis can be easily aligned. SOLUTION: An exposure system projects a mask pattern onto a photosensitive substrate using a fluorine excimer laser as a light source, where the beam of the excimer laser whose wavelengths are in a wavelength range of vacuum ultraviolet rays are used as an exposure light, and an optical axis aligning means in which visible light or infrared beams emitted from the fluorine excimer laser at the same time are used is provided. At this point, visible light or infrared beams which are used in the optical axis aligning means are wave front-split by a dichroic mirror provided in a lighting system and guided to the outside of the lighting system through a glass window, the position of a visible light beam or an infrared beam is detected with a sensor such as a photoelectric conversion device or the like, and an optical member such as a dichroic mirror or the like is controlled on a real time based on the above detection result so as to make the optical axis of a lighting system and the center of a laser beam coincident with each other.

    POSITION DETECTING METHOD AND DEVICE, AND MANUFACTURE OF DEVICE
    66.
    发明专利
    POSITION DETECTING METHOD AND DEVICE, AND MANUFACTURE OF DEVICE 失效

    公开(公告)号：JP2000058427A

    公开(公告)日：2000-02-25

    申请号：JP22995398

    申请日：1998-08-03

    Applicant: CANON KK

    Inventor： SATO TAKASHI ,  HASEGAWA MASANORI ,  INE HIDEKI ,  YOSHII MINORU

    IPC: G03F7/22 ,  H01L21/027

    Abstract: PROBLEM TO BE SOLVED: To enable an alignment operation of high accuracy to be carried out without being affected by uneven application of resist by a method wherein a rugged pattern of high symmetry is preferentially selected out of rugged patterns, and position data as to the rugged patterns are detected resting on a picture image obtained by picking up the rugged pattern. SOLUTION: The position (center position) of a mark is detected through an optical system. At this point, the mark which is judged excellent in symmetry resting on its cross sectional shape is preferentially selected out of marks (S4), and the picture image of the selected alignment mark of high symmetry is picked up by an image sensing means provided in a detection system, and position data on the alignment mark are detected resting on the picture image picked up by the image sensing means (S5). A circuit pattern on a reticule and a wafer are aligned with each other through the detected position data as to the alignment mark (S6), and a circuit pattern is transferred onto the wafer by exposure (S7). After an exposure operation that is carried out for all shots is finished, the wafer is taken out from a movable stage (S8), and processing is finished.

    PATTERN FORMING CONDITION DETECTOR AND PROJECTION ALIGNER USING THE SAME
    67.
    发明专利
    PATTERN FORMING CONDITION DETECTOR AND PROJECTION ALIGNER USING THE SAME 失效

    公开(公告)号：JPH0936037A

    公开(公告)日：1997-02-07

    申请号：JP13961096

    申请日：1996-05-09

    Applicant: CANON KK

    Inventor： YOSHII MINORU ,  TAKEUCHI SEIJI ,  HASEGAWA MASANORI ,  MIYAZAKI KYOICHI

    IPC: G03F7/20 ,  H01L21/027 ,  H01L21/66

    Abstract: PROBLEM TO BE SOLVED: To determine an optimum exposure condition to expose a mass of wafers under this condition by irradiating a photosensitive pattern with an incident light beam, detecting the change of this beam, using signals from light receiving means to obtain the forming condition of the photosensitive pattern. SOLUTION: A beam 305 emitted from an optical source 301 reflects on the surface of a resist formed on a wafer 103 and the surface of the wafer. Combined beam thereof changes such that the phase difference between P- and S-polarizations and amplitude ratio thereof vary according to the birefringences n1 and n2 of the resist on the wafer 103. The beam is detected by a detector 3021 after passing through a rotating quarter wavelength plate 3024 and analyzer 3022. Thus, processing means 3022 obtains sinusoidal electric signals responding to the phase difference Δ and amplitude ratio Ψ and computes the phase difference Δ and amplitude ratio Ψ from the phase information of sine waves having amplitudes and d-c components corresponding thereto.

    68.
    发明专利
    失效

    公开(公告)号：JP2556671B2

    公开(公告)日：1996-11-20

    申请号：JP28801694

    申请日：1994-11-22

    Applicant: CANON KK

    Inventor： BABA TAKESHI ,  NIWA JUKICHI ,  YOSHII MINORU

    IPC: G03B13/36 ,  G02B7/28 ,  H04N5/232

    Abstract: PURPOSE:To prevent malfunction of focus detection caused by the deterioration in sharpness due to hand=shake or a movement of an object. CONSTITUTION:An image pickup signal outputted from an image pickup element 1 is fed to a gate circuit 17 to extract only the image pickup signal corresponding to a signal resident in a focal detection area and a high pass filter 18 is used to detect a sharpness signal from the image pickup signal in the focus detection area and a detection circuit 19, an integration capacitor 20 and an A/D converter 21 are used to generate a focus signal and a microprocessor 30 is used to detect focusing. Furthermore, a binarizing circuit 25, a multiplexer 26 and memories 27, 28 and a speed detection circuit 29 are used to detect a motion vector from the image pickup signal and the microprocessor 30 controls the gate circuit 17 so as to move the focus detection area in a direction of motion represented by the motion vector.

Patent Agency Ranking