公开(公告)号：JP2005330345A

公开(公告)日：2005-12-02

申请号：JP2004148592

申请日：2004-05-19

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： SUGIURA MAKOTO ,  SUGIE NORIHIKO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/033 ,  C08F16/26 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is responsive to a radiation having a wavelength of 200 nm or shorter, high in transparency to radiation and high in resolution, superior in the solubility of its resin component to an alkali developer, of which the solubility is easily controllable, and also, which is superior in sensitivity and dry etching resistance and the like, and a new polymer useful as the resin component of the radiation-sensitive resin composition and the like.
SOLUTION: The polymer has repeated units expressed by general formula (I), in which each of R's shows a hydrogen atom or a univalent acid-dissociative group. The radiation-sensitive resin composition contains a polymer (a) which is insoluble or hardly soluble to alkali and which becomes easily-soluble to alkali when the acid-dissociative group dissociates among the polymers, and a radiation-sensitive acid generating agent (b).
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：为了提供对波长为200nm或更短的辐射，对辐射的透明度高和分辨率高的辐射敏感性树脂组合物，其树脂组分的溶解度优于 其溶解度易于控制的碱性显影剂，以及其灵敏度和耐干蚀刻性等优异的新型聚合物和用作辐射敏感性树脂组合物的树脂组分等的新型聚合物。 解决方案：聚合物具有由通式（I）表示的重复单元，其中每个R表示氢原子或一价酸解离基团。 辐射敏感性树脂组合物含有对碱不溶或几乎不溶的聚合物（a），当酸解离基团在聚合物中解离时，其易溶于碱，而辐射敏感性酸产生剂（b） 。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2005241963A

公开(公告)日：2005-09-08

申请号：JP2004051548

申请日：2004-02-26

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： KONNO KEIJI ,  NOMURA NAKAATSU ,  SUGITA HIKARI ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/11 ,  G03F7/004 ,  H01L21/027

CPC classification number: B82Y30/00 ,  B82Y20/00

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming an antireflection film from which a resist pattern having excellent dry etching durability, a high antireflection effect and excellent resolution and accuracy without causing intermixing can be formed, and to provide an antireflection film formed by using the above composition. SOLUTION: The composition for forming an antireflection film contains a polymer obtained from at least one kind of compound expressed by formula (3) or formula (4) and at least one kind of fullerene compound selected from a group (B) consisting of fullerenes and fullerene derivatives. In formulae, R 1 independently represents a hydrogen atom, a fluorine atom or a monovalent group; R 4 represents a halogen atom or a monovalent group; and each of R 5 , R 6 and R 7 independently represents a hydrogen atom, a halogen atom or a monovalent group. COPYRIGHT: (C)2005,JPO&NCIPI

Abstract translation: 解决问题：提供一种抗反射膜的组合物，可以形成具有优异的耐蚀刻耐久性，高抗反射效果和优异的分辨率和精度的抗蚀剂图案，而不会产生混合，并且可以形成抗反射膜 通过使用上述组合物形成。 解决方案：用于形成抗反射膜的组合物含有由式（3）或式（4）表示的至少一种化合物和至少一种选自（B）的富勒烯化合物中的至少一种 的富勒烯和富勒烯衍生物。 在式中，R“1”独立地表示氢原子，氟原子或一价基团; R 4 表示卤素原子或一价基团; R SP 5，R SP 6，R SP 7，R SP 7各自独立地表示氢原子，卤素原子或一价基团。 版权所有（C）2005，JPO＆NCIPI

公开(公告)号：JP2004210771A

公开(公告)日：2004-07-29

申请号：JP2003420199

申请日：2003-12-17

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  SHIMOKAWA TSUTOMU ,  HAYASHI AKIHIRO ,  SUGIE NORIHIKO

IPC: G03F7/039 ,  C07C35/52 ,  C07F7/18 ,  C08G77/24 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To obtain a new polysiloxane having a fluorine-containing norbornane skeleton, having high transparency to radiations of ≤200nm wavelength, excellent in resolution and useful as a resin component of a resist easily controlled its solubility to an alkali developing solution, a new silicon-containing compound useful as a raw material and the like for synthesizing the polysiloxane, a new norbornene-based compound useful as a raw material and the like for synthesizing the silicon-containing compound, and a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: The norbornene-based compound is expressed by general formula (α) (wherein n expresses 0 or 1). The silicon-containing compound has a structure of the norbornene to which triethoxysilane or the like is added. The polysiloxane has a structural unit derived from the silicon-containing compound. The radiation-sensitive resin composition contains the polysiloxane and a radiation-sensitive acid generator. COPYRIGHT: (C)2004,JPO&NCIPI

Abstract translation: 要解决的问题为了获得具有含氟降冰片烷骨架的新型聚硅氧烷，对波长≤200nm的辐射具有高透明度，分辨率优异并且作为抗蚀剂的树脂成分有用，容易控制其对碱的溶解度 显影液，用作合成聚硅氧烷的原料等的新的含硅化合物，用作合成含硅化合物的原料等的新型降冰片烯系化合物等，以及辐射敏感性树脂 含有聚硅氧烷的组合物。 解决方案：降冰片烯类化合物由通式（α）表示（其中n表示0或1）。 含硅化合物具有加入三乙氧基硅烷等的降冰片烯的结构。 聚硅氧烷具有衍生自含硅化合物的结构单元。 辐射敏感性树脂组合物含有聚硅氧烷和辐射敏感性酸发生剂。 版权所有（C）2004，JPO＆NCIPI

公开(公告)号：JP2004184859A

公开(公告)日：2004-07-02

申请号：JP2002353954

申请日：2002-12-05

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： CHIBA TAKASHI ,  IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  G03F7/004 ,  G03F7/075 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition excellent in transparency at ≤193 nm wavelength, solubility contrast and resolution and suitable for a chemical amplifying resist. SOLUTION: The radiation-sensitive resin composition comprises: (A) an acid dissociating group-containing resin which becomes alkali-soluble by the effect of an acid; (B) a radiation-sensitive acid generating agent; and (C) a compound expressed by formula (1) or formula (2) and/or a polymer having a repeating unit expressed by formula (3) or formula (4). In formulae (1), (2), (3) and (4), X represent a hydrogen atom, a trifluoromethyl group, a group expressed by formula (i), or the like. In formulae (1) and (2), at least one X represents a group of formula (i), and each of p and q represents 0 to 2. In formula (i), Rf 1 represents a hydrogen atom, a methyl group or a trifluoromethyl group, Y represents a single bond, a methylene group, a cyclohexylene group or a phenylene group, Z represents a hydrogen atom or an acid dissociating organic group, z represents 0 to 3, and r represents 0 to 1. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2004013126A

公开(公告)日：2004-01-15

申请号：JP2002170618

申请日：2002-06-11

Applicant: Jsr Corp ,  Jsr株式会社

Inventor： NISHIMURA YUKIO ,  NISHIMURA ISAO ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition which is suitably used as a chemical amplification type resist useful for the microfabrication which uses various kinds of radiations such as far UV rays of KrF excimer laser, ArF excimer laser or the like. SOLUTION: The radiation-sensitive resin composition contains (1) a resin containing an acid-dissociated functional group which contains a repeating unit expressed by general formula (1) and which is hardly soluble or insoluble in an alkali and converted into easily soluble in an alkali by the effect of an acid; and (2) a radiation-sensitive acid generating agent (1/(4/n/butoxynaphthalene/1/yl) tetrahydrothiophenium nonafluoro/n/butanesulfonate or the like). The composition may further contain (3) an acid diffusion controlling agent (phenylbenzimidazole or the like). COPYRIGHT: (C)2004,JPO

公开(公告)号：JP2003173027A

公开(公告)日：2003-06-20

申请号：JP2001371311

申请日：2001-12-05

Applicant: JSR CORP

Inventor： IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/075 ,  C07C309/17 ,  C07C309/19 ,  C07C309/23 ,  C07C381/12 ,  C07D333/46 ,  C07D333/78 ,  C07D335/02 ,  C07D347/00 ,  C08G77/14 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation-sensitive resin composition containing a dissociable group-containing polysiloxane as a resin component and suitable as a chemically amplified resist excellent particularly in resolution. SOLUTION: The radiation-sensitive resin composition comprises (A) an acid-dissociable group-containing polysiloxane and (B) a radiation-sensitive acid generator containing a compound that generates trifluoromethanesulfonic acid or an acid of formula (I) upon irradiation with a radiation as an essential component. In the formula (I), each Rf is F or trifluoromethyl; Ra is H, F, a 1-20C linear or branched alkyl, a 1-20C linear or branched fluoroalkyl, a 3-20C cyclic monovalent hydrocarbon group or a 3-20C cyclic monovalent fluorinated hydrocarbon group; and the cyclic monovalent hydrocarbon group and the cyclic monovalent fluorinated hydrocarbon group may be substituted. COPYRIGHT: (C)2003,JPO

公开(公告)号：JP2003043677A

公开(公告)日：2003-02-13

申请号：JP2001234136

申请日：2001-08-01

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： NAGAI TOMOKI ,  KOBAYASHI HIDEKAZU ,  SHIMOKAWA TSUTOMU

IPC: G03F7/004 ,  G03F7/038 ,  G03F7/039 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive composition excellent in storage stability as well as in resolution and environmental resistance as a chemical amplification type resist sensitive to active radiations, e.g. UV rays such as g- or i-line, KrF, ArF or F2 excimer laser light, far UV typified by EUV (extreme-ultraviolet radiation) or an electron beam. SOLUTION: The radiation sensitive resin composition contains a nitrogen- containing compound having a specified structure.

Abstract translation: 要解决的问题：提供具有优异的储存稳定性以及分辨率和耐环境性的辐射敏感性组合物，作为对活性辐射敏感的化学放大型抗蚀剂，例如， 诸如g-或i-线，KrF，ArF或F2准分子激光的紫外线，由EUV（极紫外辐射）代表的远紫外线或电子束。 解决方案：辐射敏感性树脂组合物含有具有特定结构的含氮化合物。

公开(公告)号：JP2003020335A

公开(公告)日：2003-01-24

申请号：JP2002048643

申请日：2002-02-25

Applicant: Jsr Corp ,  ジェイエスアール株式会社

Inventor： IWAZAWA HARUO ,  HAYASHI AKIHIRO ,  SHIMOKAWA TSUTOMU ,  YAMAMOTO MASASHI

IPC: C08G77/08 ,  C08G77/22 ,  C08G77/24 ,  G03F7/004 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027

CPC classification number: G03F7/0397 ,  C08G77/08 ,  C08G77/24 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0757

Abstract: PROBLEM TO BE SOLVED: To provide a novel polysiloxane which exhibits a high transparency at a wavelength of 193 nm or lower, even at a wavelength of 157 nm or lower, and even at a wavelength of 147 nm, 134 nm, etc., and is excellent in resistance to dry etching; and a radiation-sensitive resin composition containing the polysiloxane. SOLUTION: This polysiloxane has structural units (I) and/or structural units (II) represented by formula (1) (wherein R is a fluorinated or fluoroalkylated monovalent aromatic or alicyclic group; and R is the above monovalent aromatic or alicyclic group, H, a halogen, a monovalent hydrocarbon group, a haloalkyl group or an amino group) and has acid-associable groups. The radiation-sensitive resin composition contains the polysiloxane and a radiation-sensitive acid generator.

Abstract translation: 要解决的问题：即使在157nm或更低的波长，甚至在147nm，134nm等的波长下，也提供了在193nm以下的波长下显示高透明度的新型聚硅氧烷，以及 耐干蚀刻性优异; 和含有聚硅氧烷的辐射敏感性树脂组合物。 解决方案：该聚硅氧烷具有由式（1）表示的结构单元（I）和/或结构单元（II）（其中R 1是氟化或氟代烷基化的单价芳族或脂环族基团; R 2是上述一价 芳族或脂环族基团，H，卤素，一价烃基，卤代烷基或氨基），并且具有酸相关基团。 辐射敏感性树脂组合物含有聚硅氧烷和辐射敏感性酸发生剂。

公开(公告)号：JP2002296789A

公开(公告)日：2002-10-09

申请号：JP2001097348

申请日：2001-03-29

Applicant: JSR CORP

Inventor： KAWAGUCHI KAZUO ,  TANAKA MASATO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/11 ,  C08F32/08 ,  C08F299/02 ,  C08G10/00 ,  C08K5/00 ,  C08L45/00 ,  C08L61/18 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a composition for forming the laser layer film for a multilayered resist process which has excellent durability against RIE and which can be used as a sufficient thin film to form a high definition pattern. SOLUTION: The composition for forming the lower layer film for a multilayered resist process contains polymers having structural units expressed by (1) and a solvent. In formula (1), R is a univalent atom or group, n is an integer 0 to 4 and each of R and R is a univalent atom or group.

公开(公告)号：JP2002268212A

公开(公告)日：2002-09-18

申请号：JP2001067307

申请日：2001-03-09

Applicant: JSR CORP

Inventor： SANO KIMIYASU ,  MIYAJIMA FUMINAO ,  SHIMOKAWA TSUTOMU

IPC: G03F7/022 ,  C08G8/12 ,  C08K5/42 ,  C08L61/06 ,  G03F7/023 ,  H01L21/027

Abstract: PROBLEM TO BE SOLVED: To provide a radiation sensitive resin composition excellent in resolution, developability, heat resistance, pattern shape, margin for exposure and focus latitude, having good balance of these characteristics and suitable for use as a positive type resist. SOLUTION: The radiation sensitive resin composition contains (A) an alkali- soluble novolak resin obtained by condensing specified first phenols (2,4- dimethylphenol, 2-methyl-4-ethylphenol, etc.), specified second phenols (m-cresol, p-cresol, 2,5-dimethylphenol, etc.), and an aldehyde and (B) a quinonediazidosulfonic ester compound of a phenol compound having a structure corresponding to quaternary carbon in a position adjacent to a hydroxyl group.